JP2014525141A5 - - Google Patents
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- JP2014525141A5 JP2014525141A5 JP2014517117A JP2014517117A JP2014525141A5 JP 2014525141 A5 JP2014525141 A5 JP 2014525141A5 JP 2014517117 A JP2014517117 A JP 2014517117A JP 2014517117 A JP2014517117 A JP 2014517117A JP 2014525141 A5 JP2014525141 A5 JP 2014525141A5
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- Prior art keywords
- energy
- pulse
- optical system
- pulses
- substrate
- Prior art date
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- 230000003287 optical effect Effects 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 30
- 230000010287 polarization Effects 0.000 claims description 26
- 238000005070 sampling Methods 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000003786 synthesis reaction Methods 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 4
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 3
- 230000002194 synthesizing effect Effects 0.000 claims 2
- 238000003491 array Methods 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000007173 Abies balsamea Nutrition 0.000 description 1
- 239000004857 Balsam Substances 0.000 description 1
- 244000018716 Impatiens biflora Species 0.000 description 1
- 241000220225 Malus Species 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161500727P | 2011-06-24 | 2011-06-24 | |
| US61/500,727 | 2011-06-24 | ||
| US13/194,552 | 2011-07-29 | ||
| US13/194,552 US20120325784A1 (en) | 2011-06-24 | 2011-07-29 | Novel thermal processing apparatus |
| US13/194,775 US8569187B2 (en) | 2011-06-24 | 2011-07-29 | Thermal processing apparatus |
| US13/194,775 | 2011-07-29 | ||
| PCT/US2012/043323 WO2012177743A2 (en) | 2011-06-24 | 2012-06-20 | Novel thermal processing apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016164422A Division JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014525141A JP2014525141A (ja) | 2014-09-25 |
| JP2014525141A5 true JP2014525141A5 (enExample) | 2015-08-06 |
| JP6096184B2 JP6096184B2 (ja) | 2017-03-15 |
Family
ID=47360854
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014517117A Active JP6096184B2 (ja) | 2011-06-24 | 2012-06-20 | 新規の熱処理装置 |
| JP2016164422A Active JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
| JP2017025629A Active JP6321237B2 (ja) | 2011-06-24 | 2017-02-15 | 新規の熱処理装置 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016164422A Active JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
| JP2017025629A Active JP6321237B2 (ja) | 2011-06-24 | 2017-02-15 | 新規の熱処理装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US8569187B2 (enExample) |
| EP (1) | EP2724364B1 (enExample) |
| JP (3) | JP6096184B2 (enExample) |
| KR (1) | KR101987398B1 (enExample) |
| CN (2) | CN106141424B (enExample) |
| TW (4) | TWI700736B (enExample) |
| WO (1) | WO2012177743A2 (enExample) |
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| US8569187B2 (en) * | 2011-06-24 | 2013-10-29 | Applied Materials, Inc. | Thermal processing apparatus |
| FR2989388B1 (fr) * | 2012-04-17 | 2019-10-18 | Saint-Gobain Glass France | Procede d'obtention d'un substrat muni d'un revetement |
| SG11201405535PA (en) * | 2012-04-18 | 2014-11-27 | Applied Materials Inc | Apparatus and method to reduce particles in advance anneal process |
| US9390926B2 (en) | 2013-03-11 | 2016-07-12 | Applied Materials, Inc. | Process sheet resistance uniformity improvement using multiple melt laser exposures |
| WO2014143327A1 (en) * | 2013-03-11 | 2014-09-18 | Applied Materials, Inc. | Apparatus for speckle reduction, pulse stretching, and beam homogenization |
| KR102091652B1 (ko) | 2013-03-12 | 2020-03-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 레이저 어닐링 시스템들에서의 에지 프로파일의 제어를 위한 맞춤화된 퍼필 스톱 장치 |
| KR102163606B1 (ko) * | 2013-03-27 | 2020-10-08 | 고쿠리쓰다이가쿠호진 규슈다이가쿠 | 레이저 어닐링 장치 |
| CN105453231B (zh) * | 2013-08-08 | 2019-06-11 | 应用材料公司 | 用于使用耗尽光束形成亚微米特征结构的反应物的光子活化 |
| WO2015023791A1 (en) | 2013-08-16 | 2015-02-19 | Applied Materials, Inc. | Dynamic optical valve for mitigating non-uniform heating in laser processing |
| US11204506B2 (en) * | 2014-03-05 | 2021-12-21 | TeraDiode, Inc. | Polarization-adjusted and shape-adjusted beam operation for materials processing |
| US9889524B2 (en) * | 2014-03-05 | 2018-02-13 | TeraDiode, Inc. | Polarization-adjusted beam operation for materials processing |
| JP6430142B2 (ja) * | 2014-04-25 | 2018-11-28 | 浜松ホトニクス株式会社 | レーザ加工モニタ及びレーザ加工装置 |
| US10239155B1 (en) * | 2014-04-30 | 2019-03-26 | The Boeing Company | Multiple laser beam processing |
| KR20170037633A (ko) * | 2014-07-21 | 2017-04-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 스캐닝형 펄스 어닐링 장치 및 방법 |
| US10095114B2 (en) | 2014-11-14 | 2018-10-09 | Applied Materials, Inc. | Process chamber for field guided exposure and method for implementing the process chamber |
| CN106158609B (zh) * | 2015-03-31 | 2019-07-23 | 上海微电子装备（集团）股份有限公司 | 一种激光退火装置及其退火方法 |
| US9864276B2 (en) | 2015-04-07 | 2018-01-09 | Applied Materials, Inc. | Laser annealing and electric field |
| EP3368314A4 (en) | 2015-10-30 | 2019-05-01 | Seurat Technologies, Inc. | MULTIFUNCTIONAL INGESTER SYSTEM FOR GENERATIVE MANUFACTURING |
| CN109564857B (zh) * | 2016-09-06 | 2023-05-16 | 极光先进雷射株式会社 | 激光装置和激光退火装置 |
| EP3523083B1 (en) * | 2016-11-18 | 2023-08-09 | IPG Photonics Corporation | System and method for laser processing of materials. |
| US10012544B2 (en) * | 2016-11-29 | 2018-07-03 | Cymer, Llc | Homogenization of light beam for spectral feature metrology |
| DE112018000643T5 (de) * | 2017-02-02 | 2019-11-14 | Mitsubishi Electric Corporation | Wärmebehandlungseinrichtung, wärmebehandlungsverfahren und verfahren zum herstellen einer halbleitervorrichtung |
| CN107886823B (zh) * | 2017-11-15 | 2024-05-10 | 中国工程物理研究院电子工程研究所 | 一种优化集成式单光路激光电离效应模拟系统 |
| JP7254444B2 (ja) * | 2018-02-13 | 2023-04-10 | 旭化成株式会社 | 金属配線の製造方法及び金属配線製造装置 |
| JP7048372B2 (ja) * | 2018-03-20 | 2022-04-05 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置および熱処理方法 |
| CN112385028B (zh) * | 2018-04-12 | 2024-06-25 | 玛特森技术公司 | 低热量预算退火 |
| CN119439649A (zh) | 2019-01-18 | 2025-02-14 | 应用材料公司 | 用于电场引导的光刻胶图案化工艺的膜结构 |
| EP3685954B1 (en) * | 2019-01-22 | 2024-01-24 | Synova S.A. | Method for cutting a workpiece with a complex fluid-jet-guided laser beam |
| CN110767576B (zh) * | 2019-10-17 | 2022-10-21 | 上海华力集成电路制造有限公司 | 激光退火设备及激光退火工艺 |
| GB2593456B (en) * | 2020-03-18 | 2024-02-28 | Thermo Fisher Scient Ecublens Sarl | Double-pulse laser system |
| US11429026B2 (en) | 2020-03-20 | 2022-08-30 | Applied Materials, Inc. | Lithography process window enhancement for photoresist patterning |
| US11909091B2 (en) | 2020-05-19 | 2024-02-20 | Kymeta Corporation | Expansion compensation structure for an antenna |
| KR102875674B1 (ko) * | 2020-07-21 | 2025-10-23 | 삼성디스플레이 주식회사 | 레이저 장치 및 표시 장치의 제조 방법 |
| US12162074B2 (en) | 2020-11-25 | 2024-12-10 | Lawrence Livermore National Security, Llc | System and method for large-area pulsed laser melting of metallic powder in a laser powder bed fusion application |
| WO2022205082A1 (en) * | 2021-03-31 | 2022-10-06 | Yangtze Memory Technologies Co., Ltd. | Laser system for dicing semiconductor structure and operation method thereof |
| JP2024172283A (ja) * | 2023-05-31 | 2024-12-12 | 三菱電機株式会社 | 半導体製造装置及び半導体装置の製造方法 |
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-
2011
- 2011-07-29 US US13/194,775 patent/US8569187B2/en active Active
- 2011-07-29 US US13/194,552 patent/US20120325784A1/en not_active Abandoned
-
2012
- 2012-06-07 TW TW107145005A patent/TWI700736B/zh active
- 2012-06-07 TW TW105115758A patent/TWI600063B/zh active
- 2012-06-07 TW TW106128051A patent/TWI654669B/zh active
- 2012-06-07 TW TW101120494A patent/TWI547978B/zh active
- 2012-06-20 EP EP12802296.9A patent/EP2724364B1/en active Active
- 2012-06-20 WO PCT/US2012/043323 patent/WO2012177743A2/en not_active Ceased
- 2012-06-20 KR KR1020147001261A patent/KR101987398B1/ko active Active
- 2012-06-20 JP JP2014517117A patent/JP6096184B2/ja active Active
- 2012-06-20 CN CN201610565610.5A patent/CN106141424B/zh active Active
- 2012-06-20 CN CN201280027949.XA patent/CN103597587B/zh active Active
-
2014
- 2014-01-24 US US14/163,309 patent/US10181409B2/en active Active
-
2016
- 2016-08-25 JP JP2016164422A patent/JP6290997B2/ja active Active
-
2017
- 2017-02-15 JP JP2017025629A patent/JP6321237B2/ja active Active
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