JP6096184B2 - 新規の熱処理装置 - Google Patents
新規の熱処理装置 Download PDFInfo
- Publication number
- JP6096184B2 JP6096184B2 JP2014517117A JP2014517117A JP6096184B2 JP 6096184 B2 JP6096184 B2 JP 6096184B2 JP 2014517117 A JP2014517117 A JP 2014517117A JP 2014517117 A JP2014517117 A JP 2014517117A JP 6096184 B2 JP6096184 B2 JP 6096184B2
- Authority
- JP
- Japan
- Prior art keywords
- pulse
- energy
- substrate
- optical system
- pulses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/18, H10D48/04 and H10D48/07, with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/477—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
- F27B5/14—Arrangements of heating devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- High Energy & Nuclear Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161500727P | 2011-06-24 | 2011-06-24 | |
| US61/500,727 | 2011-06-24 | ||
| US13/194,552 | 2011-07-29 | ||
| US13/194,552 US20120325784A1 (en) | 2011-06-24 | 2011-07-29 | Novel thermal processing apparatus |
| US13/194,775 US8569187B2 (en) | 2011-06-24 | 2011-07-29 | Thermal processing apparatus |
| US13/194,775 | 2011-07-29 | ||
| PCT/US2012/043323 WO2012177743A2 (en) | 2011-06-24 | 2012-06-20 | Novel thermal processing apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016164422A Division JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014525141A JP2014525141A (ja) | 2014-09-25 |
| JP2014525141A5 JP2014525141A5 (enExample) | 2015-08-06 |
| JP6096184B2 true JP6096184B2 (ja) | 2017-03-15 |
Family
ID=47360854
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014517117A Active JP6096184B2 (ja) | 2011-06-24 | 2012-06-20 | 新規の熱処理装置 |
| JP2016164422A Active JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
| JP2017025629A Active JP6321237B2 (ja) | 2011-06-24 | 2017-02-15 | 新規の熱処理装置 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016164422A Active JP6290997B2 (ja) | 2011-06-24 | 2016-08-25 | 新規の熱処理装置 |
| JP2017025629A Active JP6321237B2 (ja) | 2011-06-24 | 2017-02-15 | 新規の熱処理装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US8569187B2 (enExample) |
| EP (1) | EP2724364B1 (enExample) |
| JP (3) | JP6096184B2 (enExample) |
| KR (1) | KR101987398B1 (enExample) |
| CN (2) | CN106141424B (enExample) |
| TW (4) | TWI700736B (enExample) |
| WO (1) | WO2012177743A2 (enExample) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9498845B2 (en) * | 2007-11-08 | 2016-11-22 | Applied Materials, Inc. | Pulse train annealing method and apparatus |
| US8569187B2 (en) * | 2011-06-24 | 2013-10-29 | Applied Materials, Inc. | Thermal processing apparatus |
| FR2989388B1 (fr) * | 2012-04-17 | 2019-10-18 | Saint-Gobain Glass France | Procede d'obtention d'un substrat muni d'un revetement |
| SG11201405535PA (en) * | 2012-04-18 | 2014-11-27 | Applied Materials Inc | Apparatus and method to reduce particles in advance anneal process |
| US9390926B2 (en) | 2013-03-11 | 2016-07-12 | Applied Materials, Inc. | Process sheet resistance uniformity improvement using multiple melt laser exposures |
| WO2014143327A1 (en) * | 2013-03-11 | 2014-09-18 | Applied Materials, Inc. | Apparatus for speckle reduction, pulse stretching, and beam homogenization |
| KR102091652B1 (ko) | 2013-03-12 | 2020-03-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 레이저 어닐링 시스템들에서의 에지 프로파일의 제어를 위한 맞춤화된 퍼필 스톱 장치 |
| KR102163606B1 (ko) * | 2013-03-27 | 2020-10-08 | 고쿠리쓰다이가쿠호진 규슈다이가쿠 | 레이저 어닐링 장치 |
| CN105453231B (zh) * | 2013-08-08 | 2019-06-11 | 应用材料公司 | 用于使用耗尽光束形成亚微米特征结构的反应物的光子活化 |
| WO2015023791A1 (en) | 2013-08-16 | 2015-02-19 | Applied Materials, Inc. | Dynamic optical valve for mitigating non-uniform heating in laser processing |
| US11204506B2 (en) * | 2014-03-05 | 2021-12-21 | TeraDiode, Inc. | Polarization-adjusted and shape-adjusted beam operation for materials processing |
| US9889524B2 (en) * | 2014-03-05 | 2018-02-13 | TeraDiode, Inc. | Polarization-adjusted beam operation for materials processing |
| JP6430142B2 (ja) * | 2014-04-25 | 2018-11-28 | 浜松ホトニクス株式会社 | レーザ加工モニタ及びレーザ加工装置 |
| US10239155B1 (en) * | 2014-04-30 | 2019-03-26 | The Boeing Company | Multiple laser beam processing |
| KR20170037633A (ko) * | 2014-07-21 | 2017-04-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 스캐닝형 펄스 어닐링 장치 및 방법 |
| US10095114B2 (en) | 2014-11-14 | 2018-10-09 | Applied Materials, Inc. | Process chamber for field guided exposure and method for implementing the process chamber |
| CN106158609B (zh) * | 2015-03-31 | 2019-07-23 | 上海微电子装备(集团)股份有限公司 | 一种激光退火装置及其退火方法 |
| US9864276B2 (en) | 2015-04-07 | 2018-01-09 | Applied Materials, Inc. | Laser annealing and electric field |
| EP3368314A4 (en) | 2015-10-30 | 2019-05-01 | Seurat Technologies, Inc. | MULTIFUNCTIONAL INGESTER SYSTEM FOR GENERATIVE MANUFACTURING |
| CN109564857B (zh) * | 2016-09-06 | 2023-05-16 | 极光先进雷射株式会社 | 激光装置和激光退火装置 |
| EP3523083B1 (en) * | 2016-11-18 | 2023-08-09 | IPG Photonics Corporation | System and method for laser processing of materials. |
| US10012544B2 (en) * | 2016-11-29 | 2018-07-03 | Cymer, Llc | Homogenization of light beam for spectral feature metrology |
| DE112018000643T5 (de) * | 2017-02-02 | 2019-11-14 | Mitsubishi Electric Corporation | Wärmebehandlungseinrichtung, wärmebehandlungsverfahren und verfahren zum herstellen einer halbleitervorrichtung |
| CN107886823B (zh) * | 2017-11-15 | 2024-05-10 | 中国工程物理研究院电子工程研究所 | 一种优化集成式单光路激光电离效应模拟系统 |
| JP7254444B2 (ja) * | 2018-02-13 | 2023-04-10 | 旭化成株式会社 | 金属配線の製造方法及び金属配線製造装置 |
| JP7048372B2 (ja) * | 2018-03-20 | 2022-04-05 | 株式会社Screenホールディングス | 熱処理装置および熱処理方法 |
| CN112385028B (zh) * | 2018-04-12 | 2024-06-25 | 玛特森技术公司 | 低热量预算退火 |
| CN119439649A (zh) | 2019-01-18 | 2025-02-14 | 应用材料公司 | 用于电场引导的光刻胶图案化工艺的膜结构 |
| EP3685954B1 (en) * | 2019-01-22 | 2024-01-24 | Synova S.A. | Method for cutting a workpiece with a complex fluid-jet-guided laser beam |
| CN110767576B (zh) * | 2019-10-17 | 2022-10-21 | 上海华力集成电路制造有限公司 | 激光退火设备及激光退火工艺 |
| GB2593456B (en) * | 2020-03-18 | 2024-02-28 | Thermo Fisher Scient Ecublens Sarl | Double-pulse laser system |
| US11429026B2 (en) | 2020-03-20 | 2022-08-30 | Applied Materials, Inc. | Lithography process window enhancement for photoresist patterning |
| US11909091B2 (en) | 2020-05-19 | 2024-02-20 | Kymeta Corporation | Expansion compensation structure for an antenna |
| KR102875674B1 (ko) * | 2020-07-21 | 2025-10-23 | 삼성디스플레이 주식회사 | 레이저 장치 및 표시 장치의 제조 방법 |
| US12162074B2 (en) | 2020-11-25 | 2024-12-10 | Lawrence Livermore National Security, Llc | System and method for large-area pulsed laser melting of metallic powder in a laser powder bed fusion application |
| WO2022205082A1 (en) * | 2021-03-31 | 2022-10-06 | Yangtze Memory Technologies Co., Ltd. | Laser system for dicing semiconductor structure and operation method thereof |
| JP2024172283A (ja) * | 2023-05-31 | 2024-12-12 | 三菱電機株式会社 | 半導体製造装置及び半導体装置の製造方法 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4663513A (en) * | 1985-11-26 | 1987-05-05 | Spectra-Physics, Inc. | Method and apparatus for monitoring laser processes |
| KR950034479A (ko) | 1994-05-24 | 1995-12-28 | 오노 시게오 | 조명광학계 |
| JP3435247B2 (ja) * | 1995-02-28 | 2003-08-11 | 株式会社東芝 | レーザ光照射装置及びレーザ光照射方法 |
| US5975703A (en) * | 1996-09-30 | 1999-11-02 | Digital Optics International | Image projection system |
| JP4322373B2 (ja) * | 1999-11-15 | 2009-08-26 | 日本電気株式会社 | 膜体部改質装置及び膜体部改質方法 |
| US8217304B2 (en) | 2001-03-29 | 2012-07-10 | Gsi Group Corporation | Methods and systems for thermal-based laser processing a multi-material device |
| US6366308B1 (en) * | 2000-02-16 | 2002-04-02 | Ultratech Stepper, Inc. | Laser thermal processing apparatus and method |
| JP2003124137A (ja) | 2001-10-10 | 2003-04-25 | Fujitsu Ltd | 半導体製造装置 |
| JP3903761B2 (ja) | 2001-10-10 | 2007-04-11 | 株式会社日立製作所 | レ−ザアニ−ル方法およびレ−ザアニ−ル装置 |
| JP2004063924A (ja) | 2002-07-31 | 2004-02-26 | Mitsubishi Heavy Ind Ltd | レーザアニール方法及び装置 |
| US6747245B2 (en) | 2002-11-06 | 2004-06-08 | Ultratech Stepper, Inc. | Laser scanning apparatus and methods for thermal processing |
| SG137674A1 (en) * | 2003-04-24 | 2007-12-28 | Semiconductor Energy Lab | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
| KR20080018774A (ko) * | 2003-09-19 | 2008-02-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 무전해 증착 종료점 검출 장치 및 방법 |
| JP2005116729A (ja) | 2003-10-07 | 2005-04-28 | Sharp Corp | レーザ加工装置およびレーザ加工方法 |
| US7813406B1 (en) | 2003-10-15 | 2010-10-12 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Temporal laser pulse manipulation using multiple optical ring-cavities |
| WO2005074002A2 (en) * | 2004-01-29 | 2005-08-11 | Applied Materials Israel, Ltd. | Focusing system and method for a charged particle imaging system |
| JP4610201B2 (ja) * | 2004-01-30 | 2011-01-12 | 住友重機械工業株式会社 | レーザ照射装置 |
| US20090011614A1 (en) * | 2004-06-18 | 2009-01-08 | Electro Scientific Industries, Inc. | Reconfigurable semiconductor structure processing using multiple laser beam spots |
| US8110775B2 (en) | 2004-06-18 | 2012-02-07 | Electro Scientific Industries, Inc. | Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing |
| US20060114948A1 (en) * | 2004-11-29 | 2006-06-01 | Lo Ho W | Workpiece processing system using a common imaged optical assembly to shape the spatial distributions of light energy of multiple laser beams |
| JP2006185933A (ja) * | 2004-12-24 | 2006-07-13 | Advanced Lcd Technologies Development Center Co Ltd | レーザアニール方法およびレーザアニール装置 |
| US7279721B2 (en) | 2005-04-13 | 2007-10-09 | Applied Materials, Inc. | Dual wavelength thermal flux laser anneal |
| JP2006344844A (ja) * | 2005-06-10 | 2006-12-21 | Sony Corp | レーザ処理装置 |
| JP2007059431A (ja) | 2005-08-22 | 2007-03-08 | Mitsubishi Electric Corp | 半導体装置の製造方法及びレーザ加工装置 |
| JP4956987B2 (ja) | 2005-12-16 | 2012-06-20 | 株式会社島津製作所 | レーザー結晶化装置及び結晶化方法 |
| US20070221640A1 (en) | 2006-03-08 | 2007-09-27 | Dean Jennings | Apparatus for thermal processing structures formed on a substrate |
| EP2029984A2 (en) * | 2006-06-01 | 2009-03-04 | Université de Liège | A thermal detector |
| JP5000944B2 (ja) * | 2006-08-02 | 2012-08-15 | 株式会社ディスコ | レーザー加工装置のアライメント方法 |
| JP4677392B2 (ja) | 2006-10-30 | 2011-04-27 | 住友重機械工業株式会社 | パルスレーザ熱処理装置とその制御方法 |
| US20090323739A1 (en) * | 2006-12-22 | 2009-12-31 | Uv Tech Systems | Laser optical system |
| US20080316748A1 (en) * | 2007-06-21 | 2008-12-25 | Carl Zeiss Laser Optics Gmbh | Illumination system |
| US8148663B2 (en) * | 2007-07-31 | 2012-04-03 | Applied Materials, Inc. | Apparatus and method of improving beam shaping and beam homogenization |
| US20090034072A1 (en) * | 2007-07-31 | 2009-02-05 | Dean Jennings | Method and apparatus for decorrelation of spatially and temporally coherent light |
| US8332922B2 (en) * | 2007-08-31 | 2012-12-11 | Microsoft Corporation | Transferable restricted security tokens |
| US20090120924A1 (en) * | 2007-11-08 | 2009-05-14 | Stephen Moffatt | Pulse train annealing method and apparatus |
| US8723073B2 (en) * | 2008-02-07 | 2014-05-13 | Cymer, Llc | Illumination apparatus and method for controlling energy of a laser source |
| US8674257B2 (en) * | 2008-02-11 | 2014-03-18 | Applied Materials, Inc. | Automatic focus and emissivity measurements for a substrate system |
| US7982160B2 (en) | 2008-03-31 | 2011-07-19 | Electro Scientific Industries, Inc. | Photonic clock stabilized laser comb processing |
| US8178818B2 (en) | 2008-03-31 | 2012-05-15 | Electro Scientific Industries, Inc. | Photonic milling using dynamic beam arrays |
| US7919348B2 (en) * | 2008-06-13 | 2011-04-05 | Aptina Imaging Corporation | Methods for protecting imaging elements of photoimagers during back side processing |
| US8614032B2 (en) * | 2009-09-02 | 2013-12-24 | Wi-A Corporation | Laser-reflective mask and method for manufacturing same |
| TWI575630B (zh) * | 2011-06-10 | 2017-03-21 | 應用材料股份有限公司 | 脈衝循環器 |
| US8569187B2 (en) * | 2011-06-24 | 2013-10-29 | Applied Materials, Inc. | Thermal processing apparatus |
-
2011
- 2011-07-29 US US13/194,775 patent/US8569187B2/en active Active
- 2011-07-29 US US13/194,552 patent/US20120325784A1/en not_active Abandoned
-
2012
- 2012-06-07 TW TW107145005A patent/TWI700736B/zh active
- 2012-06-07 TW TW105115758A patent/TWI600063B/zh active
- 2012-06-07 TW TW106128051A patent/TWI654669B/zh active
- 2012-06-07 TW TW101120494A patent/TWI547978B/zh active
- 2012-06-20 EP EP12802296.9A patent/EP2724364B1/en active Active
- 2012-06-20 WO PCT/US2012/043323 patent/WO2012177743A2/en not_active Ceased
- 2012-06-20 KR KR1020147001261A patent/KR101987398B1/ko active Active
- 2012-06-20 JP JP2014517117A patent/JP6096184B2/ja active Active
- 2012-06-20 CN CN201610565610.5A patent/CN106141424B/zh active Active
- 2012-06-20 CN CN201280027949.XA patent/CN103597587B/zh active Active
-
2014
- 2014-01-24 US US14/163,309 patent/US10181409B2/en active Active
-
2016
- 2016-08-25 JP JP2016164422A patent/JP6290997B2/ja active Active
-
2017
- 2017-02-15 JP JP2017025629A patent/JP6321237B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201926423A (zh) | 2019-07-01 |
| CN106141424A (zh) | 2016-11-23 |
| US20120325784A1 (en) | 2012-12-27 |
| JP2014525141A (ja) | 2014-09-25 |
| TWI600063B (zh) | 2017-09-21 |
| US10181409B2 (en) | 2019-01-15 |
| KR20140039300A (ko) | 2014-04-01 |
| CN103597587A (zh) | 2014-02-19 |
| TW201303977A (zh) | 2013-01-16 |
| CN103597587B (zh) | 2016-08-17 |
| KR101987398B1 (ko) | 2019-06-10 |
| TWI654669B (zh) | 2019-03-21 |
| EP2724364B1 (en) | 2020-04-29 |
| TWI547978B (zh) | 2016-09-01 |
| JP2017135390A (ja) | 2017-08-03 |
| JP2017041637A (ja) | 2017-02-23 |
| JP6321237B2 (ja) | 2018-05-09 |
| TW201637079A (zh) | 2016-10-16 |
| TWI700736B (zh) | 2020-08-01 |
| WO2012177743A2 (en) | 2012-12-27 |
| JP6290997B2 (ja) | 2018-03-07 |
| US8569187B2 (en) | 2013-10-29 |
| US20140138362A1 (en) | 2014-05-22 |
| US20120329178A1 (en) | 2012-12-27 |
| CN106141424B (zh) | 2018-05-29 |
| WO2012177743A3 (en) | 2013-04-04 |
| EP2724364A4 (en) | 2015-09-30 |
| TW201812868A (zh) | 2018-04-01 |
| EP2724364A2 (en) | 2014-04-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6321237B2 (ja) | 新規の熱処理装置 | |
| US9953851B2 (en) | Process sheet resistance uniformity improvement using multiple melt laser exposures | |
| JP2014525141A5 (enExample) | ||
| CN103489812B (zh) | 具超短驻留时间之雷射退火系统及方法 | |
| TWI582466B (zh) | 用於改良同調光的能源的均勻性的裝置及用於產生均勻照明場的裝置 | |
| CN101065649A (zh) | 基于激光器的退火系统中用于高温计的多带通过滤 | |
| KR100722723B1 (ko) | 열 처리를 위한 레이저 주사 장치 및 방법 | |
| KR20140048188A (ko) | 펄스 써큘레이터 | |
| US9455143B2 (en) | Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices | |
| US9146337B2 (en) | Apparatus for speckle reduction, pulse stretching, and beam homogenization |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150619 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150619 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160523 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160531 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160825 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170117 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170215 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6096184 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |