JP2014514229A5 - - Google Patents
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- Publication number
- JP2014514229A5 JP2014514229A5 JP2013554843A JP2013554843A JP2014514229A5 JP 2014514229 A5 JP2014514229 A5 JP 2014514229A5 JP 2013554843 A JP2013554843 A JP 2013554843A JP 2013554843 A JP2013554843 A JP 2013554843A JP 2014514229 A5 JP2014514229 A5 JP 2014514229A5
- Authority
- JP
- Japan
- Prior art keywords
- hours
- beaker
- quartz glass
- temperature
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011004532.5 | 2011-02-22 | ||
| DE102011004532A DE102011004532A1 (de) | 2011-02-22 | 2011-02-22 | Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen |
| PCT/EP2012/052251 WO2012113655A1 (de) | 2011-02-22 | 2012-02-10 | Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014514229A JP2014514229A (ja) | 2014-06-19 |
| JP2014514229A5 true JP2014514229A5 (OSRAM) | 2015-01-22 |
| JP5897043B2 JP5897043B2 (ja) | 2016-03-30 |
Family
ID=45688164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013554843A Active JP5897043B2 (ja) | 2011-02-22 | 2012-02-10 | 石英ガラス適用のための高純度シリカ顆粒並びにその製造法 |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US20140072803A1 (OSRAM) |
| EP (1) | EP2678280B1 (OSRAM) |
| JP (1) | JP5897043B2 (OSRAM) |
| KR (1) | KR101911566B1 (OSRAM) |
| CN (2) | CN108658451A (OSRAM) |
| CA (1) | CA2827899C (OSRAM) |
| DE (1) | DE102011004532A1 (OSRAM) |
| ES (1) | ES2628382T3 (OSRAM) |
| PL (1) | PL2678280T3 (OSRAM) |
| RU (1) | RU2602859C2 (OSRAM) |
| TW (1) | TWI557073B (OSRAM) |
| WO (1) | WO2012113655A1 (OSRAM) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012113650A2 (de) | 2011-02-22 | 2012-08-30 | Evonik Degussa Gmbh | Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen |
| CN104860322B (zh) * | 2015-05-07 | 2017-09-26 | 中海油天津化工研究设计院有限公司 | 一种低钠离子含量高纯硅溶胶的制备方法 |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| CN108698887B (zh) * | 2015-12-18 | 2022-01-21 | 贺利氏石英玻璃有限两合公司 | 由均质石英玻璃制得的玻璃纤维和预成形品 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| US10618833B2 (en) | 2015-12-18 | 2020-04-14 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a synthetic quartz glass grain |
| JP7390198B2 (ja) * | 2019-01-28 | 2023-12-01 | 三井金属鉱業株式会社 | ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法 |
| CN111943215B (zh) * | 2019-05-14 | 2022-02-22 | 中天科技精密材料有限公司 | 石英粉的制备方法 |
| RU2723623C1 (ru) * | 2019-12-30 | 2020-06-16 | Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") | Способ получения кускового силикагеля |
| CN111976485B (zh) * | 2020-08-17 | 2022-01-11 | 宿州竹梦光学科技有限公司 | 一种汽车中控触屏ag玻璃 |
| CN113104855B (zh) * | 2021-04-30 | 2022-03-15 | 武汉大学 | 球形二氧化硅的制备方法 |
| CN113880098B (zh) * | 2021-11-17 | 2022-12-09 | 江苏海格新材料有限公司 | 一种高纯球形硅微粉的生产方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3459522A (en) | 1963-07-08 | 1969-08-05 | Corning Glass Works | Method of treating a porous,high silica content glass |
| US4042361A (en) | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
| JPS60204612A (ja) * | 1984-03-29 | 1985-10-16 | Nippon Sheet Glass Co Ltd | 高純度二酸化珪素の製造方法 |
| JPS60215532A (ja) * | 1984-04-12 | 1985-10-28 | Seiko Epson Corp | 石英ガラスの製造方法 |
| JPS6212608A (ja) * | 1985-07-11 | 1987-01-21 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製造方法 |
| JPS63291808A (ja) * | 1987-05-25 | 1988-11-29 | Kawatetsu Kogyo Kk | 高純度シリカの製造方法 |
| US4973462A (en) * | 1987-05-25 | 1990-11-27 | Kawatetsu Mining Company, Ltd. | Process for producing high purity silica |
| JPH02229735A (ja) * | 1989-02-28 | 1990-09-12 | Shin Etsu Chem Co Ltd | 石英ガラス部材 |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| US5063179A (en) | 1990-03-02 | 1991-11-05 | Cabot Corporation | Process for making non-porous micron-sized high purity silica |
| JPH054827A (ja) * | 1990-09-07 | 1993-01-14 | Mitsubishi Kasei Corp | シリカガラス粉末及びその製法並びにこれを用いたシリカガラス成形体 |
| DE69109026T2 (de) | 1990-09-07 | 1995-12-07 | Mitsubishi Chem Corp | Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand. |
| DE19601415A1 (de) | 1995-02-04 | 1996-08-08 | Degussa | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| CN1315725C (zh) * | 1999-12-28 | 2007-05-16 | 株式会社渡边商行 | 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法 |
| JP2001192225A (ja) * | 1999-12-28 | 2001-07-17 | Watanabe Shoko:Kk | 石英ガラスの製造方法 |
| DE10058616A1 (de) * | 2000-11-25 | 2002-05-29 | Degussa | Fällungskieselsäuren mit hoher Struktur |
| EP1258456A1 (en) | 2001-05-18 | 2002-11-20 | Degussa AG | Silica glass formation process |
| DK1283195T3 (da) | 2001-08-01 | 2005-12-12 | Novara Technology Srl | Sol-gel fremgangsmåde til fremstilling af præformer for optiske fibre |
| DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| DE102004005409A1 (de) * | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophile Fällungskieselsäure für Entschäumerformulierungen |
| EP1717202A1 (en) | 2005-04-29 | 2006-11-02 | Degussa AG | Sintered silicon dioxide materials |
| JP2010018470A (ja) * | 2008-07-09 | 2010-01-28 | Tosoh Corp | 高純度熔融石英ガラスおよびその製造方法並びに、これを用いた部材および装置 |
| DE102008035867A1 (de) * | 2008-08-01 | 2010-02-04 | Evonik Degussa Gmbh | Neuartige Fällungskieselsäuren für Trägeranwendungen |
| EP2331464A1 (de) * | 2008-09-30 | 2011-06-15 | Evonik Degussa GmbH | Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen |
| JP2012504102A (ja) * | 2008-09-30 | 2012-02-16 | エボニック デグサ ゲーエムベーハー | シリカート溶液からの高純度ＳｉＯ２の製造方法 |
| CN101844770A (zh) * | 2010-04-27 | 2010-09-29 | 中国神华能源股份有限公司 | 一种利用粉煤灰提铝残渣制备白炭黑的方法 |
-
2011
- 2011-02-22 DE DE102011004532A patent/DE102011004532A1/de not_active Withdrawn
-
2012
- 2012-02-10 PL PL12704510T patent/PL2678280T3/pl unknown
- 2012-02-10 EP EP12704510.2A patent/EP2678280B1/de active Active
- 2012-02-10 ES ES12704510.2T patent/ES2628382T3/es active Active
- 2012-02-10 CA CA2827899A patent/CA2827899C/en active Active
- 2012-02-10 WO PCT/EP2012/052251 patent/WO2012113655A1/de not_active Ceased
- 2012-02-10 CN CN201810913825.0A patent/CN108658451A/zh active Pending
- 2012-02-10 JP JP2013554843A patent/JP5897043B2/ja active Active
- 2012-02-10 KR KR1020137024272A patent/KR101911566B1/ko active Active
- 2012-02-10 US US14/000,954 patent/US20140072803A1/en not_active Abandoned
- 2012-02-10 RU RU2013142832/03A patent/RU2602859C2/ru active
- 2012-02-10 CN CN2012800100352A patent/CN103402933A/zh active Pending
- 2012-02-20 TW TW101105523A patent/TWI557073B/zh not_active IP Right Cessation
-
2016
- 2016-10-17 US US15/295,899 patent/US20170066654A1/en not_active Abandoned
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