JP2014511567A5 - - Google Patents
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- Publication number
- JP2014511567A5 JP2014511567A5 JP2013553894A JP2013553894A JP2014511567A5 JP 2014511567 A5 JP2014511567 A5 JP 2014511567A5 JP 2013553894 A JP2013553894 A JP 2013553894A JP 2013553894 A JP2013553894 A JP 2013553894A JP 2014511567 A5 JP2014511567 A5 JP 2014511567A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- charged particle
- coil
- magnetic field
- lithographic apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 20
- 239000000758 substrate Substances 0.000 claims 12
- 239000000463 material Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 5
- 230000005855 radiation Effects 0.000 claims 3
- 238000000059 patterning Methods 0.000 claims 2
- 229910000595 mu-metal Inorganic materials 0.000 claims 1
- 230000035699 permeability Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161443475P | 2011-02-16 | 2011-02-16 | |
| US61/443,475 | 2011-02-16 | ||
| US201161561288P | 2011-11-18 | 2011-11-18 | |
| US61/561,288 | 2011-11-18 | ||
| PCT/EP2012/052431 WO2012110465A2 (en) | 2011-02-16 | 2012-02-13 | System for magnetic shielding |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014511567A JP2014511567A (ja) | 2014-05-15 |
| JP2014511567A5 true JP2014511567A5 (OSRAM) | 2015-04-23 |
| JP5902201B2 JP5902201B2 (ja) | 2016-04-13 |
Family
ID=45768189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013553894A Expired - Fee Related JP5902201B2 (ja) | 2011-02-16 | 2012-02-13 | 磁気シールド用システム |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8884253B2 (OSRAM) |
| EP (1) | EP2676168B1 (OSRAM) |
| JP (1) | JP5902201B2 (OSRAM) |
| KR (1) | KR101586202B1 (OSRAM) |
| CN (1) | CN103477285A (OSRAM) |
| RU (1) | RU2558646C2 (OSRAM) |
| TW (1) | TW201246261A (OSRAM) |
| WO (1) | WO2012110465A2 (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI562186B (en) * | 2010-11-13 | 2016-12-11 | Mapper Lithography Ip Bv | Charged particle lithography system and method for transferring a pattern onto a surface of a target and modulation device for use in a charged particle lithography system |
| JP2014209521A (ja) * | 2013-04-16 | 2014-11-06 | キヤノン株式会社 | ステージ装置、描画装置および物品の製造方法 |
| JP2015033162A (ja) * | 2013-07-31 | 2015-02-16 | キヤノン株式会社 | 駆動装置、荷電粒子線照射装置、リソグラフィ装置 |
| US9508526B2 (en) * | 2013-12-13 | 2016-11-29 | Ebara Corporation | Top opening-closing mechanism and inspection apparatus |
| CN104298299B (zh) * | 2014-09-29 | 2015-10-07 | 江汉大学 | 磁场精密补偿、调节系统及其构建方法 |
| US9952255B2 (en) * | 2015-10-30 | 2018-04-24 | Texas Instruments Incorporated | Magnetically shielded probe card |
| CN106937475A (zh) * | 2015-12-31 | 2017-07-07 | 中微半导体设备(上海)有限公司 | 等离子体处理装置 |
| TWI670502B (zh) * | 2018-10-25 | 2019-09-01 | 廣達電腦股份有限公司 | 訊號測試系統及其電波暗室 |
| CN110970191B (zh) * | 2019-12-25 | 2021-09-07 | 哈尔滨工业大学 | 一种多层屏蔽装置的退磁方法 |
| CN110993252B (zh) * | 2019-12-25 | 2020-10-30 | 哈尔滨工业大学 | 分布式退磁线圈系统、屏蔽装置及退磁方法 |
| CN110958830B (zh) * | 2019-12-27 | 2021-09-24 | 中国船舶重工集团有限公司第七一0研究所 | 一种复合式环境干扰磁场屏蔽系统 |
| CN111554470B (zh) * | 2020-05-15 | 2022-10-21 | 北京北方华创微电子装备有限公司 | 消磁装置及半导体加工设备 |
| US20230274911A1 (en) * | 2020-07-09 | 2023-08-31 | Lam Research Corporation | Adjustable geometry trim coil |
| JP7742877B2 (ja) * | 2020-09-18 | 2025-09-22 | ラム リサーチ コーポレーション | 磁場を用いるプラズマ放電の不均一性制御 |
| CN114823045B (zh) * | 2022-04-28 | 2024-01-05 | 北京航空航天大学宁波创新研究院 | 一种磁屏蔽室消磁线圈系统及其制备方法 |
| CN116068469A (zh) * | 2023-03-07 | 2023-05-05 | 杭州极弱磁场重大科技基础设施研究院 | 一种磁屏蔽房屏蔽层整体磁导率测试方法 |
| CN119924995A (zh) * | 2025-03-07 | 2025-05-06 | 景芮医疗科技(深圳)有限公司 | 一种用于磁共振的监护仪主机 |
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| SU856037A1 (ru) * | 1979-11-06 | 1981-08-15 | Минское Производственное Объединение "Горизонт" | Система магнитного экранировани масочного кинескопа |
| US4779707A (en) * | 1986-07-29 | 1988-10-25 | Montgomery Elevator Company | Modular elevator cab construction |
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| JPH0744143B2 (ja) * | 1988-09-20 | 1995-05-15 | 株式会社日立製作所 | 電子線描画装置の外部磁気補正方法 |
| US5073744A (en) * | 1989-05-01 | 1991-12-17 | Interstate Electronics Corp. | Method and apparatus for dynamic magnetic field neutralization |
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| US5225999A (en) * | 1990-07-06 | 1993-07-06 | The Trustees Of The University Of Pennsylvania | Magnetic environment stabilization for effective operation of magnetically sensitive instruments |
| JPH04370638A (ja) * | 1991-06-18 | 1992-12-24 | Jeol Ltd | 外部磁界の消去装置 |
| US5355650A (en) * | 1993-04-28 | 1994-10-18 | Agar Robert S | Batten mounting system |
| US5367221A (en) * | 1993-05-28 | 1994-11-22 | Barco N. V. | Magnetic immunity system (MIS) and monitor incorporating the MIS |
| US5473221A (en) * | 1994-11-18 | 1995-12-05 | Hughes Aircraft Company | Bucking field system and method for mitigating the effects of an external magnetic field on a cathode ray tube display |
| US5639150A (en) * | 1995-09-22 | 1997-06-17 | Amco Engineering Co. | Electronic component enclosure and method |
| US5938302A (en) * | 1995-09-22 | 1999-08-17 | Amco Engineering Co. | Multiple enclosures and method |
| US5749178A (en) * | 1996-08-06 | 1998-05-12 | Garmong; Victor H. | Shielded enclosure |
| DE19718649A1 (de) | 1997-05-02 | 1998-11-05 | Peter Heiland | Vorrichtung und Verfahren zur aktiven Kompensation magnetischer und elektromagnetischer Störfelder |
| TW530189B (en) * | 1998-07-01 | 2003-05-01 | Asml Netherlands Bv | Lithographic projection apparatus for imaging of a mask pattern and method of manufacturing a device using a lithographic projection apparatus |
| US6115885A (en) * | 1998-07-27 | 2000-09-12 | Hewlett-Packard Company | Twisted hinge |
| US6437347B1 (en) * | 1999-04-13 | 2002-08-20 | International Business Machines Corporation | Target locking system for electron beam lithography |
| US20050145662A1 (en) * | 1999-06-18 | 2005-07-07 | Let's Go Aero, Inc. | Equipment and cargo carrier systems |
| US6269008B1 (en) * | 1999-11-22 | 2001-07-31 | Lucent Technologies Inc. | Multi-walled electromagnetic interference shield |
| JP2001284239A (ja) * | 2000-04-03 | 2001-10-12 | Nikon Corp | 荷電粒子線露光装置、及び半導体デバイスの製造方法 |
| US6415558B1 (en) * | 2000-07-06 | 2002-07-09 | Autoquip Corporation | Tornado shelter |
| JP2002033262A (ja) | 2000-07-18 | 2002-01-31 | Nikon Corp | 荷電粒子線露光装置の磁気シールド方法 |
| JP2002170764A (ja) * | 2000-12-04 | 2002-06-14 | Nikon Corp | 荷電粒子線露光装置、荷電粒子線露光装置の調整方法及び半導体デバイスの製造方法 |
| JP2002217091A (ja) * | 2001-01-19 | 2002-08-02 | Nikon Corp | 荷電粒子線露光装置 |
| US20020153495A1 (en) * | 2001-04-21 | 2002-10-24 | Nikon Corporation. | Magnetically shielded enclosures for housing charged-particle-beam systems |
| JP2002324997A (ja) * | 2001-04-26 | 2002-11-08 | Nikon Corp | 磁気シールドルーム |
| JP2003068603A (ja) * | 2001-08-23 | 2003-03-07 | Nikon Corp | 荷電粒子線露光装置 |
| JP2004079603A (ja) * | 2002-08-12 | 2004-03-11 | Nikon Corp | 磁気シールド解析手法、磁気シールド解析プログラム及び荷電粒子線露光装置の設計手法 |
| US6957655B2 (en) * | 2002-09-20 | 2005-10-25 | Advanced Neuromodulation Systems, Inc. | Apparatus for dosage control |
| US7038450B2 (en) * | 2002-10-16 | 2006-05-02 | Trustees Of Princeton University | High sensitivity atomic magnetometer and methods for using same |
| EP2302459A3 (en) | 2002-10-25 | 2011-04-06 | Mapper Lithography Ip B.V. | Lithography system |
| CN101414129B (zh) | 2002-10-30 | 2012-11-28 | 迈普尔平版印刷Ip有限公司 | 电子束曝光系统 |
| JP4484868B2 (ja) | 2003-03-10 | 2010-06-16 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | 複数の小ビームを発生させるための装置 |
| US20070010702A1 (en) * | 2003-04-08 | 2007-01-11 | Xingwu Wang | Medical device with low magnetic susceptibility |
| US8065846B2 (en) * | 2003-04-17 | 2011-11-29 | Mcdonald Frank | Modular building panels, method of assembly of building panels and method of making building panels |
| KR101168200B1 (ko) | 2003-05-28 | 2012-07-25 | 마퍼 리쏘그라피 아이피 비.브이. | 대전 입자 빔렛 노광 시스템 |
| JP2006209980A (ja) * | 2005-01-25 | 2006-08-10 | Tokyo Seimitsu Co Ltd | 電子線露光装置 |
| JP2006287015A (ja) * | 2005-04-01 | 2006-10-19 | Canon Inc | 荷電粒子線露光装置 |
| US20090265972A1 (en) * | 2006-03-15 | 2009-10-29 | Cherng Chang | Sheet holders |
| US7521687B2 (en) * | 2006-03-30 | 2009-04-21 | Tokyo Electron Limited | Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate |
| DE102008035297B4 (de) * | 2007-07-31 | 2017-08-17 | Hitachi High-Technologies Corporation | Aberrationskorrektureinrichtung für Ladungsteilchenstrahlen in einem optischen System einer Ladungsteilchenstrahlvorrichtung und Ladungsteilchenstrahlvorrichtung mit der Aberrationskorrektureinrichtung |
| US8228688B2 (en) * | 2007-10-31 | 2012-07-24 | D-Wave Systems Inc. | Systems, methods, and apparatus for combined superconducting magnetic shielding and radiation shielding |
| WO2009099972A2 (en) * | 2008-01-31 | 2009-08-13 | D-Wave Systems Inc. | Magnetic vacuum systems and devices for use with superconducting-based computing systems |
| JP2010027993A (ja) * | 2008-07-24 | 2010-02-04 | Ricoh Co Ltd | 電子線描画装置 |
| CN102422380A (zh) | 2009-02-22 | 2012-04-18 | 迈普尔平版印刷Ip有限公司 | 带电粒子微影设备及真空腔室中产生真空的方法 |
-
2012
- 2012-02-13 JP JP2013553894A patent/JP5902201B2/ja not_active Expired - Fee Related
- 2012-02-13 CN CN2012800187587A patent/CN103477285A/zh active Pending
- 2012-02-13 RU RU2013142077/28A patent/RU2558646C2/ru active
- 2012-02-13 WO PCT/EP2012/052431 patent/WO2012110465A2/en not_active Ceased
- 2012-02-13 EP EP12706000.2A patent/EP2676168B1/en not_active Not-in-force
- 2012-02-13 KR KR1020137024363A patent/KR101586202B1/ko not_active Expired - Fee Related
- 2012-02-15 TW TW101104865A patent/TW201246261A/zh unknown
- 2012-02-16 US US13/397,703 patent/US8884253B2/en active Active
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