JP2014506724A5 - - Google Patents
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- Publication number
- JP2014506724A5 JP2014506724A5 JP2013549778A JP2013549778A JP2014506724A5 JP 2014506724 A5 JP2014506724 A5 JP 2014506724A5 JP 2013549778 A JP2013549778 A JP 2013549778A JP 2013549778 A JP2013549778 A JP 2013549778A JP 2014506724 A5 JP2014506724 A5 JP 2014506724A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate according
- substrate
- alloy
- base body
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 28
- 229910045601 alloy Inorganic materials 0.000 claims 11
- 239000000956 alloy Substances 0.000 claims 11
- 239000011159 matrix material Substances 0.000 claims 8
- 239000002131 composite material Substances 0.000 claims 5
- 239000002245 particle Substances 0.000 claims 5
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims 4
- 229910000765 intermetallic Inorganic materials 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 3
- 229910052802 copper Inorganic materials 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- 238000010587 phase diagram Methods 0.000 claims 3
- 238000005498 polishing Methods 0.000 claims 3
- 229910002056 binary alloy Inorganic materials 0.000 claims 2
- 239000000919 ceramic Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910000838 Al alloy Inorganic materials 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910000881 Cu alloy Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910000905 alloy phase Inorganic materials 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- WPPDFTBPZNZZRP-UHFFFAOYSA-N aluminum copper Chemical compound [Al].[Cu] WPPDFTBPZNZZRP-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000001556 precipitation Methods 0.000 claims 1
- 238000004881 precipitation hardening Methods 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161434869P | 2011-01-21 | 2011-01-21 | |
| DE102011002953.2 | 2011-01-21 | ||
| US61/434,869 | 2011-01-21 | ||
| DE201110002953 DE102011002953A1 (de) | 2011-01-21 | 2011-01-21 | Substrat für Spiegel für die EUV-Lithographie |
| PCT/EP2012/050533 WO2012098062A2 (en) | 2011-01-21 | 2012-01-14 | Substrate for mirrors for euv lithography |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014506724A JP2014506724A (ja) | 2014-03-17 |
| JP2014506724A5 true JP2014506724A5 (enExample) | 2015-02-26 |
| JP6023083B2 JP6023083B2 (ja) | 2016-11-09 |
Family
ID=46510655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013549778A Active JP6023083B2 (ja) | 2011-01-21 | 2012-01-14 | Ｅｕｖリソグラフィ用のミラーの基板 |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US20130301151A1 (enExample) |
| EP (2) | EP3489374B1 (enExample) |
| JP (1) | JP6023083B2 (enExample) |
| KR (1) | KR102080180B1 (enExample) |
| CN (3) | CN105353433B (enExample) |
| DE (1) | DE102011002953A1 (enExample) |
| ES (1) | ES2933686T3 (enExample) |
| PL (1) | PL3489374T3 (enExample) |
| WO (1) | WO2012098062A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| DE102011002953A1 (de) * | 2011-01-21 | 2012-07-26 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
| DE102013107192A1 (de) * | 2013-07-08 | 2015-01-08 | Carl Zeiss Laser Optics Gmbh | Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich |
| DE102013215541A1 (de) | 2013-08-07 | 2015-02-12 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| WO2017158989A1 (ja) * | 2016-03-16 | 2017-09-21 | 東洋アルミニウム株式会社 | 紫外線反射材用アルミニウム箔およびその製造方法 |
| DE102016209359A1 (de) * | 2016-05-31 | 2017-11-30 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| CA3099808C (en) | 2018-05-09 | 2024-01-02 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Mirror support for a composite optical mirror and method for its production |
| IL281070B2 (en) * | 2018-08-27 | 2025-08-01 | Materion Corp | UV reflective mirrors for display manufacturing |
| CN114868083A (zh) * | 2019-12-19 | 2022-08-05 | Asml荷兰有限公司 | 真空中增强的热导率 |
| CN112662918A (zh) * | 2020-12-02 | 2021-04-16 | 国网电力科学研究院武汉南瑞有限责任公司 | Al2O3-TiC颗粒增强铝基复合材料及其制备方法 |
| WO2025201772A1 (en) | 2024-03-28 | 2025-10-02 | Asml Netherlands B.V. | Substrate and method for a high power laser system |
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| US1877141A (en) * | 1930-04-07 | 1932-09-13 | Alfred J Lyon | Aluminum casting alloy |
| US3826688A (en) * | 1971-01-08 | 1974-07-30 | Reynolds Metals Co | Aluminum alloy system |
| US4093349A (en) * | 1976-10-27 | 1978-06-06 | Northrop Corporation | High reflectivity laser mirrors |
| US4412870A (en) * | 1980-12-23 | 1983-11-01 | Aluminum Company Of America | Wrought aluminum base alloy products having refined intermetallic phases and method |
| DE3107612A1 (de) * | 1981-02-27 | 1982-09-16 | Siemens AG, 1000 Berlin und 8000 München | Laserspiegel, insbesondere laser-polygonspiegel |
| DE3376076D1 (en) * | 1982-09-03 | 1988-04-28 | Alcan Int Ltd | Aluminium alloys |
| JPS61266535A (ja) * | 1985-05-21 | 1986-11-26 | Nissan Motor Co Ltd | 銅基複合材料 |
| US4643543A (en) * | 1986-01-27 | 1987-02-17 | Atlantic Richfield Company | Mirror optic article |
| JPS62180301A (ja) * | 1986-02-04 | 1987-08-07 | Toshiba Corp | 反射鏡 |
| US4659548A (en) * | 1986-02-13 | 1987-04-21 | The United States Of America As Represented By The Secretary Of The Navy | Fabrication of metal matrix composite mirror |
| US4755221A (en) * | 1986-03-24 | 1988-07-05 | Gte Products Corporation | Aluminum based composite powders and process for producing same |
| US4803334A (en) * | 1987-11-16 | 1989-02-07 | Westinghouse Electric Corp. | Method for laser beam welding metal matrix composite components |
| JPH0715523B2 (ja) * | 1988-05-31 | 1995-02-22 | 住友電気工業株式会社 | レーザ用非球面鏡 |
| US5045280A (en) * | 1989-10-04 | 1991-09-03 | Mintek | Intermetallic compounds |
| ES2028537A6 (es) * | 1990-09-17 | 1992-07-01 | Martin Gutierrez Antonio | Procedimiento para la decoracion de espejos circulares. |
| JPH06279897A (ja) * | 1992-02-06 | 1994-10-04 | Chuetsu Gokin Chuko Kk | 高軟化特性析出硬化型銅合金 |
| JP2684927B2 (ja) * | 1992-06-16 | 1997-12-03 | 日本鋼管株式会社 | 光学素子基板 |
| JP3304021B2 (ja) * | 1994-07-20 | 2002-07-22 | 日産自動車株式会社 | 高温耐摩耗性に優れた銅合金 |
| DE69520268T2 (de) * | 1995-02-01 | 2001-08-09 | Brush Wellman Inc., Cleveland | Behandlung von Legierungen und danach hergestellte Gegenstände |
| US5699188A (en) * | 1995-06-26 | 1997-12-16 | Minnesota Mining And Manufacturing Co. | Metal-coated multilayer mirror |
| ATE217366T1 (de) * | 1996-08-15 | 2002-05-15 | Alcan Tech & Man Ag | Reflektor mit resistenter oberfläche |
| US6183877B1 (en) * | 1997-03-21 | 2001-02-06 | Inco Limited | Cast-alumina metal matrix composites |
| JPH11311704A (ja) * | 1998-02-26 | 1999-11-09 | Nikon Corp | 紫外光用ミラー |
| US6377655B1 (en) * | 1998-05-08 | 2002-04-23 | Nikon Corporation | Reflective mirror for soft x-ray exposure apparatus |
| JPH11326598A (ja) * | 1998-05-08 | 1999-11-26 | Nikon Corp | 反射鏡およびその製造方法 |
| JP3316191B2 (ja) * | 1998-12-24 | 2002-08-19 | 日本碍子株式会社 | 鏡面性に優れたベリリウム−銅−亜鉛合金 |
| JP4410367B2 (ja) * | 1999-12-24 | 2010-02-03 | キヤノン電子株式会社 | 金属鏡および金属回転多面鏡およびその製造方法 |
| US6587263B1 (en) * | 2000-03-31 | 2003-07-01 | Lockheed Martin Corporation | Optical solar reflectors |
| EP1154289A1 (de) * | 2000-05-09 | 2001-11-14 | Alcan Technology & Management AG | Reflektor |
| DE10127086A1 (de) * | 2001-06-02 | 2002-12-05 | Zeiss Carl | Vorrichtung zur Reflexion von elektromagnetischen Wellen |
| DE10134267B4 (de) | 2001-07-18 | 2007-03-01 | Gkss-Forschungszentrum Geesthacht Gmbh | Einrichtung zur Reflexion von Röntgenstrahlen |
| US6634760B2 (en) * | 2001-08-27 | 2003-10-21 | The Regents Of The University Of California | Low-cost method for producing extreme ultraviolet lithography optics |
| US6921177B2 (en) * | 2003-02-24 | 2005-07-26 | Raytheon Company | High precision mirror, and a method of making it |
| JP2005259949A (ja) * | 2004-03-11 | 2005-09-22 | Nikon Corp | ミラー及び照明光学装置 |
| JP2005268359A (ja) * | 2004-03-17 | 2005-09-29 | Nikon Corp | ミラー及び照明光学装置 |
| CN1253731C (zh) * | 2004-05-20 | 2006-04-26 | 中国科学院上海技术物理研究所 | 大口径轻质复合材料反射镜及制备方法 |
| JP4210239B2 (ja) * | 2004-06-01 | 2009-01-14 | 日鉱金属株式会社 | 強度、導電性及び曲げ加工性に優れるチタン銅及びその製造方法 |
| DE102004062289B4 (de) * | 2004-12-23 | 2007-07-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich |
| JP2006190862A (ja) * | 2005-01-07 | 2006-07-20 | Taiheiyo Cement Corp | 露光用反射鏡 |
| US8926898B2 (en) * | 2005-03-29 | 2015-01-06 | Kobe Steel, Ltd. | Al base alloy excellent in heat resistance, workability and rigidity |
| DE102005026418B4 (de) | 2005-06-08 | 2008-05-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Spiegelträger für einen optischen Spiegel |
| CN1719287A (zh) * | 2005-06-29 | 2006-01-11 | 中国人民解放军国防科学技术大学 | 三明治式结构SiC基复合材料轻质反射镜及其制备方法 |
| WO2007030701A2 (en) * | 2005-09-07 | 2007-03-15 | M Cubed Technologies, Inc. | Metal matrix composite bodies, and methods for making same |
| US7612285B2 (en) * | 2007-01-08 | 2009-11-03 | Edtek, Inc. | Conversion of solar energy to electrical and/or heat energy |
| US9279178B2 (en) * | 2007-04-27 | 2016-03-08 | Honeywell International Inc. | Manufacturing design and processing methods and apparatus for sputtering targets |
| US20090148334A1 (en) * | 2007-12-05 | 2009-06-11 | United States of America as represented by the Administrator of the National Aeronautics and | Nanophase dispersion strengthened low cte alloy |
| DE102009000099A1 (de) * | 2009-01-09 | 2010-07-22 | Carl Zeiss Smt Ag | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
| US8057203B2 (en) * | 2008-10-02 | 2011-11-15 | Gap Engineering LLC | Pyrospherelator |
| WO2010085678A1 (en) * | 2009-01-22 | 2010-07-29 | Alcoa Inc. | Improved aluminum-copper alloys containing vanadium |
| DE102009039400A1 (de) * | 2009-08-31 | 2011-03-03 | Carl Zeiss Laser Optics Gmbh | Reflektives optisches Element zur Verwendung in einem EUV-System |
| DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| US8810775B2 (en) * | 2010-04-16 | 2014-08-19 | Media Lario S.R.L. | EUV mirror module with a nickel electroformed curved mirror |
| DE102011079933A1 (de) * | 2010-08-19 | 2012-02-23 | Carl Zeiss Smt Gmbh | Optisches Element für die UV- oder EUV-Lithographie |
| DE102010039927A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
| DE102011002953A1 (de) * | 2011-01-21 | 2012-07-26 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
| DE102016217735A1 (de) * | 2016-09-16 | 2018-03-22 | Carl Zeiss Smt Gmbh | Komponente für eine Spiegelanordnung für die EUV-Lithographie |
-
2011
- 2011-01-21 DE DE201110002953 patent/DE102011002953A1/de not_active Ceased
-
2012
- 2012-01-14 ES ES18207117T patent/ES2933686T3/es active Active
- 2012-01-14 EP EP18207117.5A patent/EP3489374B1/en active Active
- 2012-01-14 KR KR1020137021852A patent/KR102080180B1/ko active Active
- 2012-01-14 WO PCT/EP2012/050533 patent/WO2012098062A2/en not_active Ceased
- 2012-01-14 JP JP2013549778A patent/JP6023083B2/ja active Active
- 2012-01-14 PL PL18207117.5T patent/PL3489374T3/pl unknown
- 2012-01-14 EP EP12702447.9A patent/EP2665839B1/en active Active
- 2012-01-14 CN CN201510870929.4A patent/CN105353433B/zh active Active
- 2012-01-14 CN CN201280006089.1A patent/CN103328664B/zh active Active
- 2012-01-14 CN CN201910693451.0A patent/CN110376670B/zh active Active
-
2013
- 2013-07-19 US US13/946,516 patent/US20130301151A1/en not_active Abandoned
-
2017
- 2017-01-05 US US15/399,495 patent/US10935704B2/en active Active
-
2021
- 2021-01-29 US US17/162,439 patent/US20210149093A1/en active Pending
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