JP2008054277A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008054277A5 JP2008054277A5 JP2007045045A JP2007045045A JP2008054277A5 JP 2008054277 A5 JP2008054277 A5 JP 2008054277A5 JP 2007045045 A JP2007045045 A JP 2007045045A JP 2007045045 A JP2007045045 A JP 2007045045A JP 2008054277 A5 JP2008054277 A5 JP 2008054277A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- piezoelectric substrate
- expansion coefficient
- linear expansion
- main surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 12
- 239000000463 material Substances 0.000 claims 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims 1
- 229910052580 B4C Inorganic materials 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- 238000002425 crystallisation Methods 0.000 claims 1
- 230000008025 crystallization Effects 0.000 claims 1
- PSHMSSXLYVAENJ-UHFFFAOYSA-N dilithium;[oxido(oxoboranyloxy)boranyl]oxy-oxoboranyloxyborinate Chemical compound [Li+].[Li+].O=BOB([O-])OB([O-])OB=O PSHMSSXLYVAENJ-UHFFFAOYSA-N 0.000 claims 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims 1
- 239000000395 magnesium oxide Substances 0.000 claims 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000002002 slurry Substances 0.000 claims 1
- 239000006104 solid solution Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007045045A JP4247282B2 (ja) | 2006-07-27 | 2007-02-26 | 圧電基板及びその製造方法 |
| US11/880,168 US7569976B2 (en) | 2006-07-27 | 2007-07-20 | Piezo-electric substrate and manufacturing method of the same |
| EP07014595.8A EP1885062B1 (en) | 2006-07-27 | 2007-07-25 | Piezo-electric substrate and manufacturing method of the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006204740 | 2006-07-27 | ||
| JP2007045045A JP4247282B2 (ja) | 2006-07-27 | 2007-02-26 | 圧電基板及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008262370A Division JP4773495B2 (ja) | 2006-07-27 | 2008-10-09 | 圧電素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008054277A JP2008054277A (ja) | 2008-03-06 |
| JP2008054277A5 true JP2008054277A5 (enExample) | 2008-08-21 |
| JP4247282B2 JP4247282B2 (ja) | 2009-04-02 |
Family
ID=39237840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007045045A Active JP4247282B2 (ja) | 2006-07-27 | 2007-02-26 | 圧電基板及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4247282B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2010007805A1 (ja) * | 2008-07-17 | 2012-01-05 | 株式会社村田製作所 | 分波器 |
| JP6907026B2 (ja) * | 2016-05-30 | 2021-07-21 | 日東電工株式会社 | 透明電極付き圧電フィルムおよび圧力センサ |
| TW201743176A (zh) * | 2016-05-30 | 2017-12-16 | 日東電工股份有限公司 | 壓電膜 |
| JP7577559B2 (ja) * | 2021-02-15 | 2024-11-05 | 太陽誘電株式会社 | 弾性波デバイス、ウエハ、フィルタおよびマルチプレクサ |
-
2007
- 2007-02-26 JP JP2007045045A patent/JP4247282B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008054276A5 (enExample) | ||
| JP2014010882A5 (enExample) | ||
| JP2016003392A (ja) | 傾斜機能金属セラミック複合材料、及びその製造方法 | |
| JP2013516331A5 (enExample) | ||
| JP2008275305A5 (enExample) | ||
| JP2014506724A5 (enExample) | ||
| JPWO2011136136A1 (ja) | 配向性ｍａｘ相セラミック及びその製造方法 | |
| JP2008100345A5 (enExample) | ||
| JP2008054277A5 (enExample) | ||
| JP2014041342A5 (ja) | 電子写真用部材、電子写真用部材の製造方法、定着装置および電子写真画像形成装置 | |
| RU2009125451A (ru) | Абразив высокотемпературного связывания (варианты) и способ его получения | |
| JP2015067473A5 (enExample) | ||
| JP2010138036A5 (enExample) | ||
| JP2008516015A5 (enExample) | ||
| JP6357146B2 (ja) | 酸化物セラミック単結晶製造のための坩堝 | |
| JP2006326723A5 (enExample) | ||
| RU2019126941A (ru) | Режущий инструмент | |
| TW200912037A (en) | Rare earth oxide-containing thermal-sprayed substrate, and method for producing the same | |
| JP2005179167A5 (ja) | 半導体素子 | |
| WO2012111279A1 (ja) | 圧電素子 | |
| JP2016117950A (ja) | 円筒型ターゲット材の製造方法および円筒型ターゲット材 | |
| CN103305801B (zh) | 一种TiNi基形状记忆合金多层薄膜及其制备方法 | |
| JP3848899B2 (ja) | 電気音響変換器用振動板 | |
| JP2010242109A5 (enExample) | ||
| TW201231261A (en) | Composite substrate |