JP2014506391A - 太陽電池、及び太陽電池の製造方法 - Google Patents
太陽電池、及び太陽電池の製造方法 Download PDFInfo
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Abstract
C=A/B (1)
1.1<C<1.8 (2)
【選択図】図2
Description
1.1<C<1.8 (2)
式(1)において、Aはp型半導体層最表面(n型層に最も近い側)におけるX/(In+X)比、Bはp型半導体層の深さ方向組成分布を分析した際に最もX/(In+X)比が低い深さにおけるX/(In+X)比である。上記本発明では、Ib族元素、元素X、およびVIb族元素がそれぞれCu,Ga及びSeである場合、比C=A/Bが1.40〜1.80であることが好ましい。
図1に示すように、本実施形態に係る太陽電池2は、ソーダライムガラス4(青板ガラス)と、ソーダライムガラス4上に形成された裏面電極層6と、裏面電極層6上に形成されたp型光吸収層8と、p型光吸収層8上に形成されたn型バッファ層10と、n型バッファ層10上に形成された半絶縁層12と、半絶縁層12上に形成された窓層14(透明導電層)と、窓層14上に形成された上部電極16(取り出し電極)と、を備える薄膜型太陽電池である。
本実施形態では、まず、ソーダライムガラス4上に裏面電極層6を形成する。裏面電極層6は、通常、Moから構成される金属層である。裏面電極層6の形成方法としては、例えばMoターゲットのスパッタリング等が挙げられる。
縦10cm×横10cm×厚さ1mmの青板ガラスを洗浄乾燥した後、Mo単体から構成される膜状の裏面電極をスパッタリングにより青板ガラス上に形成した。裏面電極の膜厚は1μmとした。
In: 5.0x10−7torr
Ga: 5.0x10−8torr
Se: 5.0x10−6torr
Cu: 1.0x10−7torr
Se: 5.0x10−6torr
In: 5.0x10−7torr
Ga: 9.0x10−8torr
Se: 5.0x10−6torr
p型半導体層成膜工程において、第三段階目用フラックスを表1に示す値に設定した。
実施例1と同様の方法で、裏面電極を形成した。
In: 5.0x10−7torr
Ga: 8.0x10−8torr
S: 5.0x10−6torr
Cu: 1.0x10−7torr
S: 5.0x10−6torr
In: 5.0x10−7torr
Ga: 8.9x10−8torr
S: 5.0x10−6torr
p型半導体層成膜工程において、第三段階目用フラックスを表2に示す値に設定した。
実施例1と同様の方法で、裏面電極を形成した。
In: 5.0x10−7torr
Ga: 1.3x10−7torr
Se: 5.0x10−6torr
Ag: 1.0x10−7torr
Se: 5.0x10−6torr
In: 5.0x10−7torr
Ga: 1.51x10−8torr
Se: 5.0x10−6torr
p型半導体層成膜工程において、第三段階目用フラックスを表3に示す値に設定した。
実施例1と同様の方法で、裏面電極を形成した。
In: 5.0x10−7torr
Al: 5.0x10−8torr
Se: 5.0x10−6torr
Cu: 1.0x10−7torr
Se: 5.0x10−6torr
In: 5.0x10−7torr
Al: 5.75x10−8torr
Se: 5.0x10−6torr
p型半導体層成膜工程において、第三段階目用フラックスを表3に示す値に設定した。
実施例1と同様の方法で、裏面電極を形成した。
実施例1と同様の方法で、裏面電極を形成した。
実施例1〜17、および比較例1〜10の各太陽電池の特性を表6に示す。
Eg:光吸収層のバンドギャップエネルギーを表す。それぞれの太陽電池の量子効率測定を行い、その吸収端から算出する。
Voc:当該薄膜太陽電池の開放電圧
Claims (13)
- Ib族元素、In、およびIn以外のIIIb族元素から選ばれる一種の元素X、およびVIb族元素を含むp型半導体層を光吸収層として備え、前記p型半導体層が膜厚方向にX/(In+X)比の勾配を持ち、p形半導体層の最表面のX/(In+X)比Aと膜中最小X/(In+X)比である深さにおけるX/(In+X)比Bのそれぞれの値の比C=A/Bの値が1.1〜1.8である、太陽電池。
- 前記p型半導体層に含まれるIn以外のIIIb族元素XがGaである、請求項1に記載の太陽電池。
- 前記p型半導体層に含まれるIb族元素がCuである、請求項1または2に記載の太陽電池。
- 前記p型半導体層に含まれるVIb族元素がSeおよびSから選ばれる一種または二種である、請求項1〜3いずれか一項に記載の太陽電池。
- 前記Ib族元素、前記元素X、および前記VIb族元素がそれぞれCu,Ga及びSeであり、
前記比C=A/Bが1.40〜1.80である、請求項1〜4のいずれか一項に記載の太陽電池。 - InおよびIn以外のIIIb族元素から選ばれる一種の元素XおよびVIb族元素を同時に蒸着する第一の工程に引き続き、Ib族およびVIb族を同時に蒸着する第二の工程、その後再びInおよびIn以外のIIIb族元素から選ばれる一種の元素XおよびVI族元素を同時に蒸着する第三の工程、を備えるp型半導体製造工程において、第三の工程におけるInおよび元素XそれぞれのフラックスPIn3およびPX3の比P3=PX3/PIn3が、第一の工程におけるIn、元素X各々のフラックス比P1=PX1/PIn1より大きい工程を備える、太陽電池の製造方法。
- 前記第一の工程と第三の工程におけるInおよび元素Xそれぞれのフラックス比P1=PX1/PIn1およびP3=PX3/PIn3の比P3/P1の値が1.1〜1.8である、請求項6記載の太陽電池の製造方法。
- 前記第一の工程と第三の工程において用いるIn以外のIIIb族元素XがGaである請求項6または7に記載の太陽電池の製造方法。
- 前記第二の工程で用いるIb族元素がCuである、請求項6〜8いずれか一項に記載の太陽電池の製造方法。
- 前記p型半導体製造工程で用いるVIb族元素がSeおよびSから選ばれる一種または二種である、請求項6〜9いずれか一項に記載の太陽電池の製造方法。
- 前記Ib族元素、前記元素X、および前記VIb族元素がそれぞれCu,Ga及びSeであり、
前記比P3=PX3/PIn3が1.35〜1.80である、請求項6〜10のいずれか一項に記載の太陽電池の製造方法。 - 請求項6〜11のいずれか一項に記載の製造方法により製造された請求項1〜5のいずれか一項に記載の太陽電池。
- CuおよびIn以外のIIIb族元素から選ばれる一種の元素Xを含む第一のターゲットおよびInを含む第二のターゲットを用いてスパッタリングを行い前躯体層を積層する工程と、前記前躯体をVIb族元素を含む雰囲気下で加熱する熱処理工程を備える製造方法により製造された、請求項1〜5のいずれか一項に記載の太陽電池。
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JPH10513606A (ja) * | 1993-04-12 | 1998-12-22 | ミドウェスト リサーチ インスティチュート | 太陽電池用の高効率Cu(In,Ga)(Se,S)2薄膜の製法 |
JP2003273135A (ja) * | 2002-03-18 | 2003-09-26 | Matsushita Electric Ind Co Ltd | 化合物半導体薄膜の製造方法 |
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JP3249407B2 (ja) * | 1996-10-25 | 2002-01-21 | 昭和シェル石油株式会社 | カルコパイライト系多元化合物半導体薄膜光吸収層からなる薄膜太陽電池 |
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JPWO2008093834A1 (ja) * | 2007-02-02 | 2010-05-20 | ローム株式会社 | 固体撮像装置およびその製造方法 |
WO2008151067A2 (en) * | 2007-05-30 | 2008-12-11 | University Of Florida Research Foundation, Inc. | CHEMICAL VAPOR DEPOSITION OF CuInXGa1- X(SeyS1-y)2 THIN FILMS AND USES THEREOF |
JP5185171B2 (ja) * | 2009-03-24 | 2013-04-17 | 本田技研工業株式会社 | 薄膜太陽電池の光吸収層の形成方法 |
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JPH10513606A (ja) * | 1993-04-12 | 1998-12-22 | ミドウェスト リサーチ インスティチュート | 太陽電池用の高効率Cu(In,Ga)(Se,S)2薄膜の製法 |
JP2003273135A (ja) * | 2002-03-18 | 2003-09-26 | Matsushita Electric Ind Co Ltd | 化合物半導体薄膜の製造方法 |
JP2007335792A (ja) * | 2006-06-19 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 薄膜太陽電池 |
JP2010219097A (ja) * | 2009-03-13 | 2010-09-30 | Tdk Corp | 太陽電池、及び太陽電池の製造方法 |
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