JP6297038B2 - 薄膜太陽電池及び薄膜太陽電池の製造方法 - Google Patents
薄膜太陽電池及び薄膜太陽電池の製造方法 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 238000000034 method Methods 0.000 title description 34
- 230000031700 light absorption Effects 0.000 claims description 101
- 239000010408 film Substances 0.000 claims description 96
- 239000002243 precursor Substances 0.000 claims description 63
- 150000001875 compounds Chemical class 0.000 claims description 40
- 229910052733 gallium Inorganic materials 0.000 claims description 31
- 229910052802 copper Inorganic materials 0.000 claims description 25
- 229910052717 sulfur Inorganic materials 0.000 claims description 25
- 229910052738 indium Inorganic materials 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 19
- 229910021476 group 6 element Inorganic materials 0.000 claims description 18
- 229910052711 selenium Inorganic materials 0.000 claims description 18
- 239000012495 reaction gas Substances 0.000 claims description 12
- 239000006096 absorbing agent Substances 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 239000011669 selenium Substances 0.000 description 40
- 238000006243 chemical reaction Methods 0.000 description 35
- 230000000052 comparative effect Effects 0.000 description 32
- 238000007740 vapor deposition Methods 0.000 description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 238000004544 sputter deposition Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000012691 Cu precursor Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical group [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000001336 glow discharge atomic emission spectroscopy Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
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Description
以下に説明するようにして、実施例1の薄膜太陽電池を製造した。基板11は、ガラス基板を用いた。第1電極層12は、Moを用いて、スパッタ法によって形成した。
p型光吸収層13は、上述した方法(1)を用いて形成された。I族元素としてCuを用いた。III族元素として、Ga及びInを用いた。VI族元素として、Se及びSを用いた。p型光吸収層13は、第1電極層上にプリカーサ膜として、まずCuGa膜を、スパッタ法を用いて形成し、次に、Cu膜を、スパッタ法を用いて形成し、次に、In膜を、スパッタ法を用いて形成した。そして、形成されたプリカーサ膜の積層膜に対して、セレン化及び硫化を行った。バッファ層14は、Zn(O、S、OH)xを用いて、溶液成長法によって形成した。第2電極層15は、ZnO:B(ボロンドープの酸化亜鉛)を用いて、MOCVD法によって形成した。p型光吸収層13の層全体におけるCuとIII族元素の原子数の比C1は、0.86〜0.98の範囲であった。p型光吸収層13の第2電極層15側の表面におけるCuとIII族元素の原子数の比C2は、1.00であった。p型光吸収層13の層全体におけるGaとIII族元素の原子数の比G1は、0.35〜0.45の範囲であった。p型光吸収層13の第2電極層15側の表面におけるGaとIII族元素の原子数の比G2は、0.06であった。原子数の比は、試料の表面をスパッタ法を用いて削りながら、グロー放電発光分析法を用いて原子数を測定して得た。
比C2が1.10であり、比G2が0.07であることを除いては、実施例1と同様にして、実施例2の薄膜太陽電池を得た。比G2は0.07と実施例1とほぼ同等であるが、比C2を1.10とするために、プリカーサ膜成膜時のCuとIII族元素の原子数の比を高めた点が実施例1とは異なっている。
比G2が0.13であることを除いては、実施例2と同様にして、実施例3の薄膜太陽電池を得た。比G2を0.13とするために、p型光吸収層形成のための処理時間を、言い換えるならば、VI族元素との化合物を形成させる熱処理時間の熱処理時間を、実施形態1よりも長くした点が実施例2とは異なっている。
比C2が0.94であり、比G2が0.10であることを除いては、実施例1と同様にして、比較例1の薄膜太陽電池を得た。比C2を0.94とするために、後述のとおりセレン化の際のセレン濃度を高めた点と、比G2を0.10とするために、p型光吸収層形成のための処理時間を長くした点が実施例1とは異なっている。
比G2が0.18であることを除いては、比較例1と同様にして、比較例2の薄膜太陽電池を得た。比G2を0.18とするために、p型光吸収層形成のための処理時間を、比較例1よりも長くした点が比較例1とは異なっている。
比G2が0.15であることを除いては、実施例3と同様にして、比較例3の薄膜太陽電池を得た。比G2を0.15とするために、p型光吸収層形成のための処理時間を、実施例3よりも長くした点が実施例3とは異なっている。
比G2が0.24であることを除いては、実施例3と同様にして、比較例4の薄膜太陽電池を得た。比G2を0.24とするために、p型光吸収層形成のための処理時間を、実施例3よりも長くした点が実施例3とは異なっている。
比G2が0.35であることを除いては、実施例3と同様にして、比較例5の薄膜太陽電池を得た。比G2を0.35とするために、p型光吸収層形成のための処理時間を、実施例3よりも長くした点が実施例3とは異なっている。
11 基板
12 第1電極層
13 p型光吸収層
13a 領域
13b 領域
14 バッファ層
15 第2電極層
Claims (7)
- 基板と、
前記基板上に配置された第1電極層と、
前記第1電極層上に配置されたI−III−VI2族化合物により形成されるp型光吸収層と、
前記p型光吸収層上に配置されたn型の第2電極層と、
を備え、
前記p型光吸収層は、
I族元素として、Cuを含み、
III族元素として、Ga及びInを含み、
前記p型光吸収層の層全体におけるCuとIII族元素の原子数の比が1.0よりも低く、
前記第2電極層側の表面におけるGaとIII族元素の原子数の比が、0.13以下であり、
前記第2電極層側の表面におけるCuとIII族元素の原子数の比が、1.0以上の薄膜太陽電池。 - 前記第2電極層側の表面は、前記p型光吸収層の厚さ方向において、前記p型光吸収層の前記第2電極層側の表面から前記p型光吸収層の厚さの5%の部分を含む請求項1に記載の薄膜太陽電池。
- 前記p型光吸収層は、
VI族元素として、Se及びSを含む請求項1又は2に記載の薄膜太陽電池。 - 基板上に、第1電極層を形成する第1工程と、
前記第1電極層上に、I−III−VI2族化合物を含むp型光吸収層を形成する第2工程と、
前記p型光吸収層上に、n型の第2電極層を形成する第3工程と、
を備え、
前記p型光吸収層は、I族元素として、Cuを含み、III族元素として、Ga及びInを含み、
前記第2工程では、
前記p型光吸収層の層全体におけるCuとIII族元素の原子数の比が1.0よりも低く、
前記第2電極層側の表面におけるGaとIII族元素の原子数の比が、0.13以下であり、
前記第2電極層側の表面におけるCuとIII族元素の原子数の比が、1.0以上となるように、前記p型光吸収層を形成する薄膜太陽電池の製造方法。 - 前記第2工程は、
前記第1電極層上に、最初にGa及びCuを含む第1プリカーサ膜を形成し、次に、Inを含む第2プリカーサ膜を形成する第4工程と、
前記第1プリカーサ膜及び前記第2プリカーサ膜とVI族元素との化合物を形成する第5工程と、
を有する請求項4に記載の薄膜太陽電池の製造方法。 - 前記p型光吸収層は、VI族元素として、Seを含み、
前記第5工程では、前記第1プリカーサ膜及び前記第2プリカーサ膜とVI族元素との化合物を形成する時には、
まず、所定の濃度のSeを含む反応ガスを用いて、前記第1プリカーサ膜及び前記第2プリカーサ膜の積層膜と同じ構造を有する調節用プリカーサ膜と、Seとの化合物を形成して、前記調節用プリカーサ膜の表面におけるCuとIII族元素の原子数の比を調べ、
前記比が、CuとIII族元素の原子数の所望する比よりも小さい時には、反応ガス中のSeの濃度を前記所定の濃度よりも低減するように調節し、
前記比が、前記所望比よりも大きい時には、反応ガス中のSeの濃度を前記所定の濃度よりも増加するように調節し、
調節されたSeの濃度の反応ガスを用いて、前記第1プリカーサ膜及び前記第2プリカーサ膜とSeとの化合物を形成する請求項5に記載の薄膜太陽電池の製造方法。 - 前記第2工程は、
前記第1電極上に、最初にGaを蒸着し、次にInを蒸着し、最後に単独でCuを蒸着する請求項4に記載の薄膜太陽電池の製造方法。
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