JP2014505322A5 - - Google Patents

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Publication number
JP2014505322A5
JP2014505322A5 JP2013542066A JP2013542066A JP2014505322A5 JP 2014505322 A5 JP2014505322 A5 JP 2014505322A5 JP 2013542066 A JP2013542066 A JP 2013542066A JP 2013542066 A JP2013542066 A JP 2013542066A JP 2014505322 A5 JP2014505322 A5 JP 2014505322A5
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JP
Japan
Prior art keywords
dopant source
source gas
gas
ion implantation
container
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Application number
JP2013542066A
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English (en)
Japanese (ja)
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JP6355336B2 (ja
JP2014505322A (ja
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Priority claimed from PCT/US2011/062168 external-priority patent/WO2012074889A2/en
Publication of JP2014505322A publication Critical patent/JP2014505322A/ja
Publication of JP2014505322A5 publication Critical patent/JP2014505322A5/ja
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Publication of JP6355336B2 publication Critical patent/JP6355336B2/ja
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JP2013542066A 2010-11-30 2011-11-26 遠隔ドーパント源を含むイオン注入機システム及び当該イオン注入機システムを備える方法 Active JP6355336B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41840210P 2010-11-30 2010-11-30
US61/418,402 2010-11-30
PCT/US2011/062168 WO2012074889A2 (en) 2010-11-30 2011-11-26 Ion implanter system including remote dopant source, and method comprising same

Publications (3)

Publication Number Publication Date
JP2014505322A JP2014505322A (ja) 2014-02-27
JP2014505322A5 true JP2014505322A5 (enExample) 2018-05-24
JP6355336B2 JP6355336B2 (ja) 2018-07-11

Family

ID=46172480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013542066A Active JP6355336B2 (ja) 2010-11-30 2011-11-26 遠隔ドーパント源を含むイオン注入機システム及び当該イオン注入機システムを備える方法

Country Status (8)

Country Link
US (1) US20130251913A1 (enExample)
EP (1) EP2647036B1 (enExample)
JP (1) JP6355336B2 (enExample)
KR (1) KR101953401B1 (enExample)
CN (1) CN103329252B (enExample)
SG (2) SG10201509808WA (enExample)
TW (1) TWI557771B (enExample)
WO (1) WO2012074889A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201530041A (zh) * 2013-10-11 2015-08-01 Applied Materials Inc 促進對於多腔室的系統單點連接之緊密危險性氣體線分配
JP6385708B2 (ja) 2014-04-18 2018-09-05 日立ジョンソンコントロールズ空調株式会社 スクリュー圧縮機
US10229840B2 (en) * 2014-10-30 2019-03-12 Entegris, Inc. Ion implanter comprising integrated ventilation system
SG11201706560PA (en) 2015-02-12 2017-09-28 Entegris Inc Smart package
CN109196617B (zh) * 2016-05-13 2021-02-12 恩特格里斯公司 于氮离子植入中改善离子源效能的氟化组合物
TWI693656B (zh) * 2019-04-25 2020-05-11 晨碩國際有限公司 離子佈植機用之供氣系統
JP7255952B2 (ja) * 2019-06-20 2023-04-11 直嗣 山本 イオンビーム源
JP7449747B2 (ja) * 2020-03-30 2024-03-14 住友重機械工業株式会社 イオン源ガス配管構造およびイオン源ガス配管システム
US11527380B2 (en) 2020-04-01 2022-12-13 Taiwan Semiconductor Manufacturing Co., Ltd. Ion implanter toxic gas delivery system
US11569062B2 (en) * 2020-05-22 2023-01-31 Taiwan Semiconductor Manufacturing Co., Ltd. Gas delivery system for ion implanter
WO2025058838A1 (en) * 2023-09-12 2025-03-20 Lam Research Corporation Prevention of atmosphere exposure in gas delivery system

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6298543A (ja) * 1985-10-24 1987-05-08 Sony Corp イオンビ−ム発生装置
FR2633143B1 (fr) * 1988-06-21 1990-10-12 Eferel Sa Procede et dispositif pour l'alimentation, en gaz de traitement, d'un reacteur situe dans une zone soumise a des champs electriques et/ou electromagnetiques intenses
US5518528A (en) * 1994-10-13 1996-05-21 Advanced Technology Materials, Inc. Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds
US5980608A (en) * 1998-01-07 1999-11-09 Advanced Technology Materials, Inc. Throughflow gas storage and dispensing system
US6500238B1 (en) * 2000-08-10 2002-12-31 Advanced Technology Materials, Inc. Fluid storage and dispensing system
US6515290B1 (en) * 2000-09-05 2003-02-04 Axcelis Technologies, Inc. Bulk gas delivery system for ion implanters
JP4866534B2 (ja) * 2001-02-12 2012-02-01 エーエスエム アメリカ インコーポレイテッド 半導体膜の改良された堆積方法
US6857447B2 (en) 2002-06-10 2005-02-22 Advanced Technology Materials, Inc. Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases
US6717079B2 (en) * 2002-06-21 2004-04-06 Varian Semiconductr Equipmentassociates, Inc. Electrical switches and methods of establishing an electrical connection
JP3971965B2 (ja) * 2002-07-04 2007-09-05 株式会社神戸製鋼所 イオン源への材料ガスの供給方法及びその装置
US6770117B2 (en) * 2002-10-31 2004-08-03 Advanced Technology Materials, Inc. Ion implantation and wet bench systems utilizing exhaust gas recirculation
WO2005060602A2 (en) * 2003-12-12 2005-07-07 Semequip, Inc. Controlling the flow of vapors sublimated from solids
US7955797B2 (en) * 2004-10-25 2011-06-07 Advanced Technology Materials, Inc. Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
DE102004052580B4 (de) * 2004-10-29 2008-09-25 Advanced Micro Devices, Inc., Sunnyvale Vorrichtung und Verfahren zum Zuführen von Vorstufengasen zu einer Implantationsanlage
CN101213008B (zh) * 2005-05-03 2011-09-28 高级技术材料公司 流体储存和分配系统以及包含该系统的流体供应方法
KR20080041285A (ko) * 2005-08-30 2008-05-09 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 저압 가스 이송 장치 및 방법
JP5105775B2 (ja) * 2006-06-05 2012-12-26 キヤノン株式会社 絶縁配管、プラズマ処理装置及び方法
US7775236B2 (en) * 2007-02-26 2010-08-17 Applied Materials, Inc. Method and apparatus for controlling gas flow to a processing chamber
KR100855002B1 (ko) * 2007-05-23 2008-08-28 삼성전자주식회사 플라즈마 이온 주입시스템
DE102007030106A1 (de) * 2007-06-28 2009-01-02 Intega Gmbh Verfahren und Vorrichtung zum Behandeln eines Halbleitersubstrats
EP2247819B1 (en) * 2008-01-18 2022-11-02 Pivotal Systems Corporation Method and apparatus for in situ testing of gas flow controllers
US8271211B2 (en) * 2009-12-09 2012-09-18 Pivotal Systems Corporation Method and apparatus for enhancing in-situ gas flow measurement performance
US8997686B2 (en) * 2010-09-29 2015-04-07 Mks Instruments, Inc. System for and method of fast pulse gas delivery

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