JP2014086579A - 真空チャンバ用反射部材 - Google Patents

真空チャンバ用反射部材 Download PDF

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Publication number
JP2014086579A
JP2014086579A JP2012234584A JP2012234584A JP2014086579A JP 2014086579 A JP2014086579 A JP 2014086579A JP 2012234584 A JP2012234584 A JP 2012234584A JP 2012234584 A JP2012234584 A JP 2012234584A JP 2014086579 A JP2014086579 A JP 2014086579A
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JP
Japan
Prior art keywords
vacuum chamber
chamber
light
wafer
semiconductor wafer
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Pending
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JP2012234584A
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English (en)
Japanese (ja)
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JP2014086579A5 (enExample
Inventor
Shin Kitamura
伸 北村
Yuji Aoki
裕司 青木
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Applied Materials Inc
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Applied Materials Inc
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Publication of JP2014086579A publication Critical patent/JP2014086579A/ja
Publication of JP2014086579A5 publication Critical patent/JP2014086579A5/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
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JP2012234584A 2012-10-19 2012-10-24 真空チャンバ用反射部材 Pending JP2014086579A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261716062P 2012-10-19 2012-10-19
US61/716,062 2012-10-19

Publications (2)

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JP2014086579A true JP2014086579A (ja) 2014-05-12
JP2014086579A5 JP2014086579A5 (enExample) 2015-12-10

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JP2012234584A Pending JP2014086579A (ja) 2012-10-19 2012-10-24 真空チャンバ用反射部材

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JP (1) JP2014086579A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021140757A1 (enExample) * 2020-01-06 2021-07-15

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303737A (ja) * 1988-05-31 1989-12-07 Canon Inc 位置決め装置
JPH04280430A (ja) * 1991-03-08 1992-10-06 Fuji Electric Co Ltd プラズマ処理装置
JPH05173005A (ja) * 1991-12-19 1993-07-13 Asahi Optical Co Ltd アルミニウム表面反射鏡
JPH07183361A (ja) * 1993-12-24 1995-07-21 Kokusai Electric Co Ltd ウェーハ検知方法
JPH0915407A (ja) * 1995-06-29 1997-01-17 Nikon Corp 反射光学素子
JPH09195034A (ja) * 1996-01-09 1997-07-29 Canon Inc 光学素子の製造方法
JPH10242233A (ja) * 1997-02-26 1998-09-11 Hitachi Ltd 半導体製造方法
JPH11145254A (ja) * 1997-11-07 1999-05-28 Nikon Corp 基板角度位置検出装置
JP2002270534A (ja) * 2001-03-14 2002-09-20 Tokyo Electron Ltd 熱処理装置
JP2006220903A (ja) * 2005-02-10 2006-08-24 Canon Inc 反射ミラー、露光装置及びデバイス製造方法
JP2007011333A (ja) * 2005-06-17 2007-01-18 Schott Ag 金属反射鏡および金属反射鏡の製作方法
JP2007157968A (ja) * 2005-12-05 2007-06-21 Yaskawa Electric Corp 半導体ウエハ角度調整装置
JP2007165655A (ja) * 2005-12-14 2007-06-28 Varian Semiconductor Equipment Associates Inc ウエハ方向センサー
JP2009281990A (ja) * 2008-05-26 2009-12-03 Nikon Corp 光学式エンコーダのスケール及びその製造方法
JP2011186401A (ja) * 2010-03-11 2011-09-22 Nagoya City アルミニウム反射鏡及びアルミニウム反射鏡の製造方法
JP2011221208A (ja) * 2010-04-08 2011-11-04 Konica Minolta Opto Inc アルミニウム表面反射鏡
JP2011222733A (ja) * 2010-04-09 2011-11-04 Nissin Ion Equipment Co Ltd ウェーハハンドリング方法およびイオン注入装置

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303737A (ja) * 1988-05-31 1989-12-07 Canon Inc 位置決め装置
JPH04280430A (ja) * 1991-03-08 1992-10-06 Fuji Electric Co Ltd プラズマ処理装置
JPH05173005A (ja) * 1991-12-19 1993-07-13 Asahi Optical Co Ltd アルミニウム表面反射鏡
JPH07183361A (ja) * 1993-12-24 1995-07-21 Kokusai Electric Co Ltd ウェーハ検知方法
JPH0915407A (ja) * 1995-06-29 1997-01-17 Nikon Corp 反射光学素子
JPH09195034A (ja) * 1996-01-09 1997-07-29 Canon Inc 光学素子の製造方法
JPH10242233A (ja) * 1997-02-26 1998-09-11 Hitachi Ltd 半導体製造方法
JPH11145254A (ja) * 1997-11-07 1999-05-28 Nikon Corp 基板角度位置検出装置
JP2002270534A (ja) * 2001-03-14 2002-09-20 Tokyo Electron Ltd 熱処理装置
JP2006220903A (ja) * 2005-02-10 2006-08-24 Canon Inc 反射ミラー、露光装置及びデバイス製造方法
JP2007011333A (ja) * 2005-06-17 2007-01-18 Schott Ag 金属反射鏡および金属反射鏡の製作方法
JP2007157968A (ja) * 2005-12-05 2007-06-21 Yaskawa Electric Corp 半導体ウエハ角度調整装置
JP2007165655A (ja) * 2005-12-14 2007-06-28 Varian Semiconductor Equipment Associates Inc ウエハ方向センサー
JP2009281990A (ja) * 2008-05-26 2009-12-03 Nikon Corp 光学式エンコーダのスケール及びその製造方法
JP2011186401A (ja) * 2010-03-11 2011-09-22 Nagoya City アルミニウム反射鏡及びアルミニウム反射鏡の製造方法
JP2011221208A (ja) * 2010-04-08 2011-11-04 Konica Minolta Opto Inc アルミニウム表面反射鏡
JP2011222733A (ja) * 2010-04-09 2011-11-04 Nissin Ion Equipment Co Ltd ウェーハハンドリング方法およびイオン注入装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021140757A1 (enExample) * 2020-01-06 2021-07-15
WO2021140757A1 (ja) * 2020-01-06 2021-07-15 セントラル硝子株式会社 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法
US12378659B2 (en) 2020-01-06 2025-08-05 Central Glass Company, Limited Metal material, method of producing metal material, method of passivating semiconductor processing apparatus, method of manufacturing semiconductor device, and method of manufacturing filled container
JP7719370B2 (ja) 2020-01-06 2025-08-06 セントラル硝子株式会社 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法

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