JP2014075391A5 - - Google Patents

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Publication number
JP2014075391A5
JP2014075391A5 JP2012220632A JP2012220632A JP2014075391A5 JP 2014075391 A5 JP2014075391 A5 JP 2014075391A5 JP 2012220632 A JP2012220632 A JP 2012220632A JP 2012220632 A JP2012220632 A JP 2012220632A JP 2014075391 A5 JP2014075391 A5 JP 2014075391A5
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JP
Japan
Prior art keywords
solvent
substrate
liquid reservoir
unit
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012220632A
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English (en)
Japanese (ja)
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JP2014075391A (ja
JP5939118B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2012220632A priority Critical patent/JP5939118B2/ja
Priority claimed from JP2012220632A external-priority patent/JP5939118B2/ja
Priority to KR1020130114384A priority patent/KR101696709B1/ko
Publication of JP2014075391A publication Critical patent/JP2014075391A/ja
Publication of JP2014075391A5 publication Critical patent/JP2014075391A5/ja
Application granted granted Critical
Publication of JP5939118B2 publication Critical patent/JP5939118B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012220632A 2012-10-02 2012-10-02 基板処理装置、基板処理方法及び記憶媒体 Expired - Fee Related JP5939118B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012220632A JP5939118B2 (ja) 2012-10-02 2012-10-02 基板処理装置、基板処理方法及び記憶媒体
KR1020130114384A KR101696709B1 (ko) 2012-10-02 2013-09-26 기판 처리 장치, 기판 처리 방법 및 기억 매체

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012220632A JP5939118B2 (ja) 2012-10-02 2012-10-02 基板処理装置、基板処理方法及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2014075391A JP2014075391A (ja) 2014-04-24
JP2014075391A5 true JP2014075391A5 (enExample) 2014-12-18
JP5939118B2 JP5939118B2 (ja) 2016-06-22

Family

ID=50652087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012220632A Expired - Fee Related JP5939118B2 (ja) 2012-10-02 2012-10-02 基板処理装置、基板処理方法及び記憶媒体

Country Status (2)

Country Link
JP (1) JP5939118B2 (enExample)
KR (1) KR101696709B1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202314405A (zh) * 2021-06-15 2023-04-01 美商蘭姆研究公司 用於晶圓中的乾式顯影副產物揮發的乾式顯影設備及方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04328667A (ja) 1991-04-27 1992-11-17 Nec Corp ２ポートｒａｍデータ送受方式及び装置
JP2004031750A (ja) * 2002-06-27 2004-01-29 Tokyo Electron Ltd 基板処理装置および基板処理方法
JP4328667B2 (ja) * 2003-06-06 2009-09-09 東京エレクトロン株式会社 基板の処理膜の表面荒れを改善する方法及び基板の処理装置
JP2005259862A (ja) * 2004-03-10 2005-09-22 Mitsui Eng & Shipbuild Co Ltd レジスト除去方法、レジスト除去剤噴射装置、およびレジスト除去装置
JP2012087983A (ja) * 2010-10-19 2012-05-10 Tokyo Electron Ltd 流体加熱装置及び基板処理装置
JP5278469B2 (ja) * 2011-03-03 2013-09-04 東京エレクトロン株式会社 基板処理方法、基板処理装置及び記憶媒体

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