JP2014053073A - 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 - Google Patents

荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 Download PDF

Info

Publication number
JP2014053073A
JP2014053073A JP2012194664A JP2012194664A JP2014053073A JP 2014053073 A JP2014053073 A JP 2014053073A JP 2012194664 A JP2012194664 A JP 2012194664A JP 2012194664 A JP2012194664 A JP 2012194664A JP 2014053073 A JP2014053073 A JP 2014053073A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
diaphragm
sample
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012194664A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014053073A5 (OSRAM
Inventor
Noriyuki Sakuma
憲之 佐久間
Yusuke Ominami
祐介 大南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2012194664A priority Critical patent/JP2014053073A/ja
Priority to US14/423,367 priority patent/US20150206705A1/en
Priority to PCT/JP2013/069050 priority patent/WO2014038287A1/ja
Priority to CN201380043744.5A priority patent/CN104584180A/zh
Priority to KR1020157003635A priority patent/KR20150036541A/ko
Publication of JP2014053073A publication Critical patent/JP2014053073A/ja
Publication of JP2014053073A5 publication Critical patent/JP2014053073A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2005—Seal mechanisms
    • H01J2237/2006—Vacuum seals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012194664A 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 Pending JP2014053073A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012194664A JP2014053073A (ja) 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
US14/423,367 US20150206705A1 (en) 2012-09-05 2013-07-11 Member for charged particle beam device, charged particle beam device and diaphragm member
PCT/JP2013/069050 WO2014038287A1 (ja) 2012-09-05 2013-07-11 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
CN201380043744.5A CN104584180A (zh) 2012-09-05 2013-07-11 带电粒子线装置用部件、带电粒子线装置以及隔膜部件
KR1020157003635A KR20150036541A (ko) 2012-09-05 2013-07-11 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012194664A JP2014053073A (ja) 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材

Publications (2)

Publication Number Publication Date
JP2014053073A true JP2014053073A (ja) 2014-03-20
JP2014053073A5 JP2014053073A5 (OSRAM) 2015-04-09

Family

ID=50236905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012194664A Pending JP2014053073A (ja) 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材

Country Status (5)

Country Link
US (1) US20150206705A1 (OSRAM)
JP (1) JP2014053073A (OSRAM)
KR (1) KR20150036541A (OSRAM)
CN (1) CN104584180A (OSRAM)
WO (1) WO2014038287A1 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019057387A (ja) * 2017-09-20 2019-04-11 浜松ホトニクス株式会社 電子放出管、電子照射装置及び電子放出管の製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
JP5853122B2 (ja) * 2013-05-10 2016-02-09 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112014003352B4 (de) * 2013-09-06 2023-02-02 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbilderfassungsverfahren
JP6140298B2 (ja) * 2013-12-05 2017-05-31 株式会社日立製作所 試料ホルダ及び真空分析装置
US10832885B2 (en) * 2015-12-23 2020-11-10 Massachusetts Institute Of Technology Electron transparent membrane for cold cathode devices
US20210233740A1 (en) * 2016-04-22 2021-07-29 Hitachi High-Technologies Corporation Charged Particle Microscope and Method of Imaging Sample
CN110186944B (zh) * 2018-02-23 2021-11-09 台湾电镜仪器股份有限公司 检验容器以及电子显微镜
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡
KR102791688B1 (ko) * 2021-11-25 2025-04-07 참엔지니어링(주) 대기중으로 빔을 인출하는 빔 가공 장치 및 그 제어 방법
WO2024142368A1 (ja) * 2022-12-28 2024-07-04 株式会社日立ハイテク 荷電粒子ビーム装置、及び荷電粒子ビーム装置の調整方法
KR102817234B1 (ko) * 2025-02-02 2025-06-09 (주)코셈 수동 xy 얼라인 수단 및 가스 주입수단을 구비한 대기압 전자 현미경용 멤브레인 어댑터, 및 이를 구비하는 대기압 전자현미경

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01117028A (ja) * 1987-10-30 1989-05-09 Nec Corp 電子線位置検出基準マーク
JP2003282411A (ja) * 2002-03-25 2003-10-03 Mitsubishi Materials Corp リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
WO2012104942A1 (ja) * 2011-01-31 2012-08-09 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5142461A (OSRAM) * 1974-10-09 1976-04-10 Ryoji Takahashi
WO2008050321A2 (en) * 2006-10-24 2008-05-02 B-Nano Ltd. An interface, a methof for observing an object within a non-vacuum environment and a scanning electron microscope
EP1956633A3 (en) * 2007-02-06 2009-12-16 FEI Company Particle-optical apparatus for simultaneous observing a sample with particles and photons
JP2008262886A (ja) * 2007-04-12 2008-10-30 Beam Seiko:Kk 走査型電子顕微鏡装置
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01117028A (ja) * 1987-10-30 1989-05-09 Nec Corp 電子線位置検出基準マーク
JP2003282411A (ja) * 2002-03-25 2003-10-03 Mitsubishi Materials Corp リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
WO2012104942A1 (ja) * 2011-01-31 2012-08-09 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019057387A (ja) * 2017-09-20 2019-04-11 浜松ホトニクス株式会社 電子放出管、電子照射装置及び電子放出管の製造方法

Also Published As

Publication number Publication date
KR20150036541A (ko) 2015-04-07
US20150206705A1 (en) 2015-07-23
CN104584180A (zh) 2015-04-29
WO2014038287A1 (ja) 2014-03-13

Similar Documents

Publication Publication Date Title
JP2014053073A (ja) 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
KR101840232B1 (ko) 주사 전자 현미경 및 화상 생성 방법
US8933400B2 (en) Inspection or observation apparatus and sample inspection or observation method
JP5909431B2 (ja) 荷電粒子線装置
CN104584181B (zh) 带电粒子线装置及试样观察方法
US9472375B2 (en) Charged particle beam device, sample stage unit, and sample observation method
JP5923412B2 (ja) 観察装置および光軸調整方法
JP2013175377A (ja) 荷電粒子線装置
WO2014069470A1 (ja) 試料格納容器、荷電粒子線装置、及び画像取得方法
WO2014167919A1 (ja) 荷電粒子線装置およびフィルタ部材
WO2015111307A1 (ja) 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
KR102000407B1 (ko) 하전 입자 현미경의 관찰 지원 유닛 및 이것을 사용한 시료 관찰 방법
US9633817B2 (en) Diaphragm mounting member and charged particle beam device
US9240305B2 (en) Charged particle beam device and sample observation method
WO2013129196A1 (ja) 荷電粒子線装置及び荷電粒子線照射方法
JP2017004787A (ja) 電子顕微鏡用試料保持体及びその作製方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150218

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151027

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20160308