JP2013539420A5 - - Google Patents

Info

Publication number

JP2013539420A5

JP2013539420A5 JP2013522283A JP2013522283A JP2013539420A5 JP 2013539420 A5 JP2013539420 A5 JP 2013539420A5 JP 2013522283 A JP2013522283 A JP 2013522283A JP 2013522283 A JP2013522283 A JP 2013522283A JP 2013539420 A5 JP2013539420 A5 JP 2013539420A5

Authority

JP

Japan

Prior art keywords

block

substrate

bipyridine

polymer

maltoheptaose

Prior art date

2011-07-29

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 239000000463 material Substances 0.000 claims 19
• 239000000758 substrate Substances 0.000 claims 7
• 229920001400 block copolymer Polymers 0.000 claims 4
• MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical compound C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 claims 3
• BNABBHGYYMZMOA-AHIHXIOASA-N alpha-maltoheptaose Chemical compound O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)O[C@H](O[C@@H]2[C@H](O[C@H](O[C@@H]3[C@H](O[C@H](O[C@@H]4[C@H](O[C@H](O[C@@H]5[C@H](O[C@H](O[C@@H]6[C@H](O[C@H](O)[C@H](O)[C@H]6O)CO)[C@H](O)[C@H]5O)CO)[C@H](O)[C@H]4O)CO)[C@H](O)[C@H]3O)CO)[C@H](O)[C@H]2O)CO)[C@H](O)[C@H]1O BNABBHGYYMZMOA-AHIHXIOASA-N 0.000 claims 3
• 229920000642 polymer Polymers 0.000 claims 3
• SSABEFIRGJISFH-UHFFFAOYSA-N 2-(2,4-difluorophenyl)pyridine Chemical compound FC1=CC(F)=CC=C1C1=CC=CC=N1 SSABEFIRGJISFH-UHFFFAOYSA-N 0.000 claims 2
• ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 claims 2
• 239000004793 Polystyrene Substances 0.000 claims 2
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
• 150000001408 amides Chemical class 0.000 claims 2
• 150000001412 amines Chemical class 0.000 claims 2
• 150000001735 carboxylic acids Chemical group 0.000 claims 2
• 150000004676 glycans Chemical class 0.000 claims 2
• 229910052739 hydrogen Inorganic materials 0.000 claims 2
• 239000001257 hydrogen Substances 0.000 claims 2
• 238000004519 manufacturing process Methods 0.000 claims 2
• 238000000034 method Methods 0.000 claims 2
• 238000006116 polymerization reaction Methods 0.000 claims 2
• 229920001282 polysaccharide Polymers 0.000 claims 2
• 239000005017 polysaccharide Substances 0.000 claims 2
• 229920002223 polystyrene Polymers 0.000 claims 2
• 229910052710 silicon Inorganic materials 0.000 claims 2
• 239000010703 silicon Substances 0.000 claims 2
• CCFAKBRKTKVJPO-UHFFFAOYSA-N 1-anthroic acid Chemical compound C1=CC=C2C=C3C(C(=O)O)=CC=CC3=CC2=C1 CCFAKBRKTKVJPO-UHFFFAOYSA-N 0.000 claims 1
• XGWFJBFNAQHLEF-UHFFFAOYSA-N 9-anthroic acid Chemical compound C1=CC=C2C(C(=O)O)=C(C=CC=C3)C3=CC2=C1 XGWFJBFNAQHLEF-UHFFFAOYSA-N 0.000 claims 1
• NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
• 238000000018 DNA microarray Methods 0.000 claims 1
• 125000000217 alkyl group Chemical group 0.000 claims 1
• 229920001577 copolymer Polymers 0.000 claims 1
• 238000000151 deposition Methods 0.000 claims 1
• 125000000524 functional group Chemical group 0.000 claims 1
• 239000011521 glass Substances 0.000 claims 1
• 238000010438 heat treatment Methods 0.000 claims 1
• 229920001600 hydrophobic polymer Polymers 0.000 claims 1
• 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
• 238000001459 lithography Methods 0.000 claims 1
• 239000002184 metal Substances 0.000 claims 1
• 229910044991 metal oxide Inorganic materials 0.000 claims 1
• 150000004706 metal oxides Chemical class 0.000 claims 1
• 238000013086 organic photovoltaic Methods 0.000 claims 1
• 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 claims 1
• 239000002243 precursor Substances 0.000 claims 1