FR2963355B1 - Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie. - Google Patents

Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie.

Info

Publication number
FR2963355B1
FR2963355B1 FR1056336A FR1056336A FR2963355B1 FR 2963355 B1 FR2963355 B1 FR 2963355B1 FR 1056336 A FR1056336 A FR 1056336A FR 1056336 A FR1056336 A FR 1056336A FR 2963355 B1 FR2963355 B1 FR 2963355B1
Authority
FR
France
Prior art keywords
nanoorganized
block copolymers
thin films
films based
nanotechnology applications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1056336A
Other languages
English (en)
French (fr)
Other versions
FR2963355A1 (fr
Inventor
Karim Aissou
Sami Halila
Sebastien Fort
Redouane Borsali
Thierry Baron
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique
Original Assignee
Centre National de la Recherche Scientifique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique filed Critical Centre National de la Recherche Scientifique
Priority to FR1056336A priority Critical patent/FR2963355B1/fr
Priority to PCT/FR2011/051843 priority patent/WO2012013911A1/fr
Priority to EP11755386.7A priority patent/EP2599109B1/fr
Priority to US13/812,904 priority patent/US9377684B2/en
Priority to JP2013522283A priority patent/JP6008854B2/ja
Priority to ES11755386.7T priority patent/ES2561673T3/es
Publication of FR2963355A1 publication Critical patent/FR2963355A1/fr
Application granted granted Critical
Publication of FR2963355B1 publication Critical patent/FR2963355B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D105/00—Coating compositions based on polysaccharides or on their derivatives, not provided for in groups C09D101/00 or C09D103/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • C09D187/005—Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/681—Floating-gate IGFETs having only two programming levels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/6891—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode
    • H10D30/6893—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode wherein the floating gate has multiple non-connected parts, e.g. multi-particle floating gate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31645—Next to addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
    • Y10T428/31692—Next to addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31971—Of carbohydrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Semiconductor Memories (AREA)
  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Non-Volatile Memory (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FR1056336A 2010-07-30 2010-07-30 Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie. Active FR2963355B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1056336A FR2963355B1 (fr) 2010-07-30 2010-07-30 Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie.
PCT/FR2011/051843 WO2012013911A1 (fr) 2010-07-30 2011-07-29 Films minces nanoorganisés à base de copolymères à blocs polysaccharidiques pour des applications en nanotechnologie
EP11755386.7A EP2599109B1 (fr) 2010-07-30 2011-07-29 Films minces nanoorganisés à base de copolymères à blocs polysaccharidiques pour des applications en nanotechnologie
US13/812,904 US9377684B2 (en) 2010-07-30 2011-07-29 Thin films organized in nanodomains on the basis of copolymers having polysaccharide blocks for applications in nanotechnology
JP2013522283A JP6008854B2 (ja) 2010-07-30 2011-07-29 ナノ技術的への応用のための、多糖ブロックを持つコポリマー系のナノ領域で組織化された膜
ES11755386.7T ES2561673T3 (es) 2010-07-30 2011-07-29 Películas delgadas nanoorganizadas a base de copolímeros de bloques de polisacáridos para aplicaciones en nanotecnología

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1056336A FR2963355B1 (fr) 2010-07-30 2010-07-30 Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie.

Publications (2)

Publication Number Publication Date
FR2963355A1 FR2963355A1 (fr) 2012-02-03
FR2963355B1 true FR2963355B1 (fr) 2013-07-12

Family

ID=43501578

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1056336A Active FR2963355B1 (fr) 2010-07-30 2010-07-30 Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie.

Country Status (6)

Country Link
US (1) US9377684B2 (enExample)
EP (1) EP2599109B1 (enExample)
JP (1) JP6008854B2 (enExample)
ES (1) ES2561673T3 (enExample)
FR (1) FR2963355B1 (enExample)
WO (1) WO2012013911A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109071823B (zh) * 2015-12-25 2021-03-23 王子控股株式会社 图案形成用自身组织化组合物及图案形成方法
TWI732825B (zh) * 2016-05-20 2021-07-11 日商王子控股股份有限公司 圖案形成用定向自組裝組成物、圖案形成用定向自組裝組成物用單體及圖案形成方法
JP2018046202A (ja) * 2016-09-15 2018-03-22 東芝メモリ株式会社 パターン形成方法、自己組織化材料、半導体装置の製造方法
JP6813028B2 (ja) * 2016-10-28 2021-01-13 王子ホールディングス株式会社 パターン形成方法、下地剤及び積層体
WO2019182978A1 (en) * 2018-03-19 2019-09-26 Virginia Polytechnic Institute And State University Copolymer compatibilizers and uses thereof
CN114420787B (zh) * 2021-12-22 2024-06-14 西安隆基乐叶光伏科技有限公司 一种太阳能电池退火方法及退火设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0884769A (ja) * 1994-09-14 1996-04-02 Case Western Reserve Univ 非トロンボゲン形成インプラント表面
US6794245B2 (en) 2002-07-18 2004-09-21 Micron Technology, Inc. Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules
US7045851B2 (en) 2003-06-20 2006-05-16 International Business Machines Corporation Nonvolatile memory device using semiconductor nanocrystals and method of forming same
US20070155907A1 (en) * 2005-12-30 2007-07-05 Zhao Jonathon Z Biologically active block copolymers
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
FR2927467B1 (fr) 2008-02-08 2011-09-23 Commissariat Energie Atomique Procede de realisation d'une grille flottante ayant une alternance de lignes en premier et second materiaux
FR2932485A1 (fr) 2008-06-12 2009-12-18 Univ Pasteur Polymere a liberation colique specifique quel que soit le ph
US20130022785A1 (en) * 2011-06-21 2013-01-24 Board of Regents, The University of the Texas System Oligosaccharide/silicon-containing block copolymers for lithography applications

Also Published As

Publication number Publication date
WO2012013911A1 (fr) 2012-02-02
FR2963355A1 (fr) 2012-02-03
JP2013539420A (ja) 2013-10-24
EP2599109A1 (fr) 2013-06-05
US9377684B2 (en) 2016-06-28
EP2599109B1 (fr) 2015-11-04
US20130189609A1 (en) 2013-07-25
ES2561673T3 (es) 2016-02-29
JP6008854B2 (ja) 2016-10-19

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