JP2013534542A5 - - Google Patents

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Publication number
JP2013534542A5
JP2013534542A5 JP2013512801A JP2013512801A JP2013534542A5 JP 2013534542 A5 JP2013534542 A5 JP 2013534542A5 JP 2013512801 A JP2013512801 A JP 2013512801A JP 2013512801 A JP2013512801 A JP 2013512801A JP 2013534542 A5 JP2013534542 A5 JP 2013534542A5
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JP
Japan
Prior art keywords
self
polymer
molecular structure
monomer
molecular
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Pending
Application number
JP2013512801A
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English (en)
Japanese (ja)
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JP2013534542A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/EP2011/056308 external-priority patent/WO2011151109A1/en
Publication of JP2013534542A publication Critical patent/JP2013534542A/ja
Publication of JP2013534542A5 publication Critical patent/JP2013534542A5/ja
Pending legal-status Critical Current

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JP2013512801A 2010-06-04 2011-04-20 自己組織化可能な重合体及びリソグラフィにおける使用方法 Pending JP2013534542A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US35169310P 2010-06-04 2010-06-04
US61/351,693 2010-06-04
PCT/EP2011/056308 WO2011151109A1 (en) 2010-06-04 2011-04-20 Self-assemblable polymer and method for use in lithography

Publications (2)

Publication Number Publication Date
JP2013534542A JP2013534542A (ja) 2013-09-05
JP2013534542A5 true JP2013534542A5 (enExample) 2014-06-05

Family

ID=45066197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013512801A Pending JP2013534542A (ja) 2010-06-04 2011-04-20 自己組織化可能な重合体及びリソグラフィにおける使用方法

Country Status (6)

Country Link
US (1) US8921032B2 (enExample)
JP (1) JP2013534542A (enExample)
KR (1) KR101826774B1 (enExample)
CN (1) CN102933628A (enExample)
NL (1) NL2006639A (enExample)
WO (1) WO2011151109A1 (enExample)

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US10151981B2 (en) 2008-05-22 2018-12-11 Micron Technology, Inc. Methods of forming structures supported by semiconductor substrates
US8796155B2 (en) * 2008-12-04 2014-08-05 Micron Technology, Inc. Methods of fabricating substrates
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US8575032B2 (en) 2011-05-05 2013-11-05 Micron Technology, Inc. Methods of forming a pattern on a substrate
US9177794B2 (en) * 2012-01-13 2015-11-03 Micron Technology, Inc. Methods of patterning substrates
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WO2013120051A1 (en) 2012-02-10 2013-08-15 E. I. Du Pont De Nemours And Company Preparation, purification and use of high-x diblock copolymers
EP2812383A1 (en) 2012-02-10 2014-12-17 E. I. Du Pont de Nemours and Company Preparation, purification and use of high-x diblock copolymers
US8629048B1 (en) 2012-07-06 2014-01-14 Micron Technology, Inc. Methods of forming a pattern on a substrate
CN107219721B (zh) 2012-07-10 2020-08-21 株式会社尼康 标记形成方法和器件制造方法
JP5881565B2 (ja) * 2012-09-07 2016-03-09 東京エレクトロン株式会社 基板処理方法、プログラム及びコンピュータ記憶媒体
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JP6263378B2 (ja) * 2013-02-20 2018-01-17 東京応化工業株式会社 下地剤及びパターン形成方法
TWI672788B (zh) * 2013-03-27 2019-09-21 日商尼康股份有限公司 標記形成方法、標記檢測方法、及元件製造方法
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