JP2013528320A5 - - Google Patents
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- Publication number
- JP2013528320A5 JP2013528320A5 JP2013511632A JP2013511632A JP2013528320A5 JP 2013528320 A5 JP2013528320 A5 JP 2013528320A5 JP 2013511632 A JP2013511632 A JP 2013511632A JP 2013511632 A JP2013511632 A JP 2013511632A JP 2013528320 A5 JP2013528320 A5 JP 2013528320A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- carrier structure
- substrate carrier
- support
- support unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 57
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 7
- 239000004020 conductor Substances 0.000 claims 4
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10163959.9 | 2010-05-26 | ||
| EP10163959A EP2390906A1 (en) | 2010-05-26 | 2010-05-26 | Apparatus and method for electrostatic discharge (ESD) reduction |
| PCT/EP2011/058362 WO2011147775A1 (en) | 2010-05-26 | 2011-05-23 | Apparatus and method for electrostatic discharge (esd) reduction |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013528320A JP2013528320A (ja) | 2013-07-08 |
| JP2013528320A5 true JP2013528320A5 (https=) | 2014-08-07 |
| JP5876037B2 JP5876037B2 (ja) | 2016-03-02 |
Family
ID=42664837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013511632A Expired - Fee Related JP5876037B2 (ja) | 2010-05-26 | 2011-05-23 | 静電放電（ｅｓｄ）の低減のための装置及び方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8531198B2 (https=) |
| EP (1) | EP2390906A1 (https=) |
| JP (1) | JP5876037B2 (https=) |
| KR (1) | KR101506937B1 (https=) |
| CN (1) | CN102906868B (https=) |
| TW (1) | TWI459503B (https=) |
| WO (1) | WO2011147775A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012100927A1 (de) * | 2012-02-06 | 2013-08-08 | Roth & Rau Ag | Prozessmodul |
| US9229446B2 (en) | 2012-05-08 | 2016-01-05 | International Business Machines Corporation | Production line quality processes |
| KR102205030B1 (ko) | 2013-12-17 | 2021-01-20 | 삼성디스플레이 주식회사 | 표시장치 |
| KR102271585B1 (ko) | 2014-02-10 | 2021-07-01 | 삼성디스플레이 주식회사 | 표시 장치 |
| CN115901831A (zh) * | 2014-12-22 | 2023-04-04 | 应用材料公司 | 用于检查基板的设备、用于检查基板的方法、大面积基板检查设备及其操作方法 |
| CN110178238B (zh) * | 2017-01-11 | 2023-07-28 | 应用材料公司 | 用于处理基板的方法和设备和对应的显示元件 |
| CN108470851B (zh) * | 2018-03-26 | 2020-03-06 | 京东方科技集团股份有限公司 | 基板处理方法和基板处理装置 |
| CN110899271B (zh) * | 2018-09-17 | 2021-10-15 | 北京北方华创微电子装备有限公司 | 远程等离子源的调整装置及远程等离子源清洗系统 |
| CN119375567A (zh) * | 2023-07-25 | 2025-01-28 | Jcet星科金朋韩国有限公司 | 用于测试电子器件的设备 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06219513A (ja) * | 1993-01-27 | 1994-08-09 | Nikon Corp | 搬送装置 |
| US5966021A (en) * | 1996-04-03 | 1999-10-12 | Pycon, Inc. | Apparatus for testing an integrated circuit in an oven during burn-in |
| JPH11145266A (ja) * | 1997-11-07 | 1999-05-28 | Tokyo Electron Ltd | 静電吸着装置および静電吸着方法、ならびにそれを用いた基板搬送装置および基板搬送方法 |
| JPH11219882A (ja) * | 1998-02-02 | 1999-08-10 | Nikon Corp | ステージ及び露光装置 |
| US6445202B1 (en) * | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
| US6319102B1 (en) * | 1999-07-09 | 2001-11-20 | International Business Machines Corporation | Capacitor coupled chuck for carbon dioxide snow cleaning system |
| JP4590031B2 (ja) * | 2000-07-26 | 2010-12-01 | 東京エレクトロン株式会社 | 被処理体の載置機構 |
| US6914423B2 (en) * | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
| US6326220B1 (en) * | 2000-11-11 | 2001-12-04 | Macronix International Co., Ltd. | Method for determining near-surface doping concentration |
| US6824612B2 (en) * | 2001-12-26 | 2004-11-30 | Applied Materials, Inc. | Electroless plating system |
| JP4421874B2 (ja) * | 2003-10-31 | 2010-02-24 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| US6833717B1 (en) * | 2004-02-12 | 2004-12-21 | Applied Materials, Inc. | Electron beam test system with integrated substrate transfer module |
| JP4905135B2 (ja) * | 2004-12-01 | 2012-03-28 | 株式会社ニコン | ステージ装置及び露光装置 |
| US7535238B2 (en) * | 2005-04-29 | 2009-05-19 | Applied Materials, Inc. | In-line electron beam test system |
| US20060273815A1 (en) | 2005-06-06 | 2006-12-07 | Applied Materials, Inc. | Substrate support with integrated prober drive |
| JP4895635B2 (ja) * | 2006-02-20 | 2012-03-14 | セイコーインスツル株式会社 | 搬送装置 |
| TW200746268A (en) * | 2006-04-11 | 2007-12-16 | Applied Materials Inc | Process for forming cobalt-containing materials |
| US8008166B2 (en) * | 2007-07-26 | 2011-08-30 | Applied Materials, Inc. | Method and apparatus for cleaning a substrate surface |
| JP5142634B2 (ja) * | 2007-08-27 | 2013-02-13 | 新電元工業株式会社 | 電界効果型半導体装置 |
| JP2009054746A (ja) * | 2007-08-27 | 2009-03-12 | Nikon Corp | 静電チャック及び静電チャック方法 |
| JP5276921B2 (ja) * | 2008-08-08 | 2013-08-28 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| EP2180327A1 (en) * | 2008-10-21 | 2010-04-28 | Applied Materials, Inc. | Apparatus and method for active voltage compensation |
-
2010
- 2010-05-26 EP EP10163959A patent/EP2390906A1/en not_active Withdrawn
- 2010-06-16 US US12/816,798 patent/US8531198B2/en active Active
-
2011
- 2011-05-09 TW TW100116197A patent/TWI459503B/zh active
- 2011-05-23 WO PCT/EP2011/058362 patent/WO2011147775A1/en not_active Ceased
- 2011-05-23 JP JP2013511632A patent/JP5876037B2/ja not_active Expired - Fee Related
- 2011-05-23 KR KR1020127027935A patent/KR101506937B1/ko active Active
- 2011-05-23 CN CN201180020890.7A patent/CN102906868B/zh active Active
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