JP2013524549A - 結晶性太陽電池上の機能的および光学的グレーデッドARC層のための多層SiN - Google Patents
結晶性太陽電池上の機能的および光学的グレーデッドARC層のための多層SiN Download PDFInfo
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- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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Abstract
Description
図1A〜図1Fは、太陽電池100の表面(例えば、上面105)上にパッシベーション/ARC層120を形成するために使用される処理シーケンス内の異なるステージ期間の、太陽電池基板110の概略断面図を例示する。図2は、太陽電池基板110上のパッシベーション層を形成するため使用されるプロセスシーケンス200を例示する。図2に見られるシーケンスは、図1A〜図1Fに描かれるステージに対応する。太陽電池100の一実施形態において、底面106を有し結晶シリコンを含むp型基板110は、ベース領域101、およびイオン注入を含む他のプロセスを使用することができるが、典型的にはドーピングおよび拡散/アニールプロセスによってベース領域101上に形成されるn型ドープされたエミッタ領域102を有する。基板110は、太陽電池のベース領域101とエミッタ領域102の間に配設され、太陽電池100が光の入射光子によって照射されるとき電子−正孔対が生成される領域である、p−n接合領域103も含む。
大面積基板を処理するように構成されるプラズマ化学気相堆積(PECVD)システムは、優れた膜均一性を有するSiN層を速い堆積速度で堆積することができる。これは、特に、平行板、高周波PECVDシステムに当てはまり、この場合では、1つまたは複数の基板が、プラズマチャンバ内の2つの実質的に平行な電極間に配置される。チャンバのガス分配プレートが、一般的に第1の電極の役割を果たし、チャンバの基板支持体が第2の電極の役割を果たす。前駆体ガス混合物は、チャンバ内に導入され、電極のうちの1つに高周波(RF)電力を印加することによってプラズマ状態へとエネルギーを与えられ、基板の表面にわたって流されて、所望の材料の層を堆積する結果になる。チャンバのガスシャワーヘッドが堆積する平面の真上にあるチャンバの形状寸法は、システムにかなりのコスト、サイズ、または複雑さを追加せずに、高スループットで複数のグレーデッド層を形成するのに最適である。
Claims (15)
- 太陽電池基板上にパッシベーション反射防止層を形成する方法であって、
第1のプロセス混合ガスを、処理チャンバ内のプロセス容積内に流すステップと、
前記処理チャンバ内で、0.65W/cm2より大きい電力密度でプラズマを生成するステップと、
前記プロセス容積内の太陽電池基板上に窒化ケイ素含有インターフェイスサブレイヤを堆積するステップと、
第2のプロセス混合ガスを前記プロセス容積内に流すステップと、
前記窒化ケイ素含有インターフェイスサブレイヤ上に窒化ケイ素含有バルクサブレイヤを堆積するステップと
を含む方法。 - 前記インターフェイスサブレイヤが、前記結果として得られるバルクサブレイヤの屈折率(n)よりも大きい屈折率(n)を有し、前記インターフェイスサブレイヤと前記バルクサブレイヤの両方が、0から0.1の吸光係数(k値)を有する、請求項1に記載の方法。
- 前記インターフェイスサブレイヤが、2.4から2.6の屈折率を有し、前記バルクサブレイヤが2.00から2.15の屈折率を有する、請求項2に記載の方法。
- 前記第1のプロセス混合ガスが窒素およびシランを含む、請求項1に記載の方法。
- 前記窒素とシランの比が14:7である、請求項4に記載の方法。
- 前記第2のプロセス混合ガスが、窒素、シラン、およびアンモニアを含む、請求項1に記載の方法。
- 前記窒素とシランの比が約8.35であり、前記アンモニアとシランの比が約0.90である、請求項6に記載の方法。
- 前記パッシベーション反射防止層が、実質的に、前記インターフェイスサブレイヤおよび前記バルクサブレイヤの両方を全体的に貫通するピンホールのない、請求項1に記載の方法。
- 前記第2のプロセス混合ガスを前記プロセス容積内に流すステップの前に、前記プラズマを消すステップと、
前記第2のプロセス混合ガスを前記プロセス容積内に流すステップの後に、前記プラズマを再点火するステップと
をさらに含む、請求項1に記載の方法。 - 太陽電池デバイス内に形成されるパッシベーション/ARC層であって、
太陽電池の表面に形成される1つまたは複数のp型にドープされた領域の上に配設されるシリコン−窒素含有インターフェイスサブレイヤと、
前記シリコン−窒素含有サブレイヤの上に配設されるシリコン−窒素含有バルクサブレイヤとを備え、前記インターフェイスサブレイヤが前記バルクサブレイヤの屈折率(n)よりも大きい屈折率(n)を有し、前記インターフェイスサブレイヤと前記バルクサブレイヤの両方が0から0.1の吸光係数(k値)を有する、
パッシベーション/ARC層。 - 前記パッシベーション/ARC層内の正味の正電荷の量が、前記太陽電池基板の前記表面において、1x1012クーロン/cm2より大きい電荷密度を有する、請求項10に記載のパッシベーション/ARC層。
- 実質的に、前記インターフェイスサブレイヤおよび前記バルクサブレイヤの両方を全体的に貫通するピンホールのない、請求項10に記載のパッシベーション/ARC層。
- 太陽電池上のパッシベーション層内に形成されるピンホールを検出する方法であって、
太陽電池上に形成されたパッシベーション層を有する太陽電池を電解質の中に浸すステップと、
前記太陽電池の金属に覆われる後側を介して電流を印加し、前記パッシベーション層の外面から前記太陽電池のドープされた領域に延びる任意のピンホールをメッキするステップと、
前記ピンホールのいずれかの中をメッキする任意の金属を検出するステップと
を含む方法。 - 接合領域を有する基板と、
前記基板の表面上のパッシベーション反射防止層であって、
窒化ケイ素含有インターフェイスサブレイヤ、および
前記インターフェイスサブレイヤの直ぐ上の窒化ケイ素含有バルクサブレイヤを備えるパッシベーション反射防止層と
を備え、前記インターフェイスサブレイヤが前記バルクサブレイヤよりも大きい屈折率(n)を有し、前記パッシベーション層が実質的に前記インターフェイスサブレイヤおよび前記バルクサブレイヤの両方を全体的に貫通するピンホールのない太陽電池。 - 太陽電池上に膜を形成するシステムであって、
処理チャンバの処理容積内の太陽電池基板上にパッシベーション/ARC層を形成するためのプラズマ処理チャンバであって、前記パッシベーション/ARC層が
第1のプロセス混合ガスから生成されるプラズマを使用して0.65W/cm2より大きな電力密度で前記太陽電池基板上に形成される窒化ケイ素含有インターフェイスサブレイヤ、および
第2のプロセス混合ガスから生成されるプラズマを使用して0.65W/cm2より大きな電力密度で前記インターフェイスサブレイヤ上に形成される窒化ケイ素含有バルクサブレイヤ
を備えるプラズマ処理チャンバと、
前記プラズマ処理チャンバと通信するシステムコントローラと
を備え、前記システムコントローラが、前記プラズマ出力密度、前記第1のプロセス混合ガスの流量、前記第2のプロセス混合ガスの流量を制御するように構成され、そのため、前記インターフェイスサブレイヤが、前記結果として得られるバルクサブレイヤの屈折率(n)よりも大きい屈折率(n)を有し、前記インターフェイスサブレイヤと前記バルクサブレイヤの両方が、0から0.1の吸光係数(k値)を有するシステム。
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PCT/US2011/030782 WO2011130017A2 (en) | 2010-04-13 | 2011-03-31 | Multi-layer sin for functional and optical graded arc layers on crystalline solar cells |
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US20110272024A1 (en) | 2011-11-10 |
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WO2011130017A3 (en) | 2012-01-19 |
DE112011101329T5 (de) | 2013-02-07 |
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