JP2013511128A5 - - Google Patents

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Publication number
JP2013511128A5
JP2013511128A5 JP2012538809A JP2012538809A JP2013511128A5 JP 2013511128 A5 JP2013511128 A5 JP 2013511128A5 JP 2012538809 A JP2012538809 A JP 2012538809A JP 2012538809 A JP2012538809 A JP 2012538809A JP 2013511128 A5 JP2013511128 A5 JP 2013511128A5
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JP
Japan
Prior art keywords
plasma
residue
ion
gas
predetermined condition
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JP2012538809A
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English (en)
Japanese (ja)
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JP5827235B2 (ja
JP2013511128A (ja
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Priority claimed from US12/616,662 external-priority patent/US20110108058A1/en
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Publication of JP2013511128A publication Critical patent/JP2013511128A/ja
Publication of JP2013511128A5 publication Critical patent/JP2013511128A5/ja
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Publication of JP5827235B2 publication Critical patent/JP5827235B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012538809A 2009-11-11 2010-11-12 残留物を清浄する方法および装置 Expired - Fee Related JP5827235B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/616,662 2009-11-11
US12/616,662 US20110108058A1 (en) 2009-11-11 2009-11-11 Method and apparatus for cleaning residue from an ion source component
PCT/US2010/002969 WO2011059504A2 (en) 2009-11-11 2010-11-12 Method and apparatus for cleaning residue from an ion source component

Publications (3)

Publication Number Publication Date
JP2013511128A JP2013511128A (ja) 2013-03-28
JP2013511128A5 true JP2013511128A5 (enExample) 2015-07-02
JP5827235B2 JP5827235B2 (ja) 2015-12-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012538809A Expired - Fee Related JP5827235B2 (ja) 2009-11-11 2010-11-12 残留物を清浄する方法および装置

Country Status (7)

Country Link
US (2) US20110108058A1 (enExample)
EP (1) EP2499653A2 (enExample)
JP (1) JP5827235B2 (enExample)
KR (1) KR101741405B1 (enExample)
CN (1) CN102612731B (enExample)
TW (1) TWI500064B (enExample)
WO (1) WO2011059504A2 (enExample)

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CN109447013B (zh) * 2018-11-06 2022-02-15 重庆工程职业技术学院 计算机用户身份识别设备
JP7385809B2 (ja) * 2019-09-05 2023-11-24 日新イオン機器株式会社 イオンビーム照射装置のクリーニング方法
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