JP2019511843A5 - - Google Patents
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- JP2019511843A5 JP2019511843A5 JP2018551134A JP2018551134A JP2019511843A5 JP 2019511843 A5 JP2019511843 A5 JP 2019511843A5 JP 2018551134 A JP2018551134 A JP 2018551134A JP 2018551134 A JP2018551134 A JP 2018551134A JP 2019511843 A5 JP2019511843 A5 JP 2019511843A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- dry cleaning
- cleaning process
- processing chamber
- parameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims 91
- 238000005108 dry cleaning Methods 0.000 claims 54
- 239000000758 substrate Substances 0.000 claims 30
- 238000000295 emission spectrum Methods 0.000 claims 21
- 238000004519 manufacturing process Methods 0.000 claims 20
- 238000012544 monitoring process Methods 0.000 claims 14
- 239000007789 gas Substances 0.000 claims 11
- 238000011065 in-situ storage Methods 0.000 claims 7
- 238000003860 storage Methods 0.000 claims 5
- 238000004140 cleaning Methods 0.000 claims 3
- 238000004993 emission spectroscopy Methods 0.000 claims 3
- 238000001228 spectrum Methods 0.000 claims 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 238000011066 ex-situ storage Methods 0.000 claims 2
- 230000000977 initiatory effect Effects 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 238000001020 plasma etching Methods 0.000 claims 2
- -1 F 2 Substances 0.000 claims 1
- 229910018194 SF 6 Inorganic materials 0.000 claims 1
- 238000004458 analytical method Methods 0.000 claims 1
- 238000013459 approach Methods 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000007405 data analysis Methods 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000001499 laser induced fluorescence spectroscopy Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
- 238000004611 spectroscopical analysis Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662316021P | 2016-03-31 | 2016-03-31 | |
| US62/316,021 | 2016-03-31 | ||
| PCT/US2017/024138 WO2017172536A1 (en) | 2016-03-31 | 2017-03-24 | Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019511843A JP2019511843A (ja) | 2019-04-25 |
| JP2019511843A5 true JP2019511843A5 (enExample) | 2020-04-30 |
| JP6974668B2 JP6974668B2 (ja) | 2021-12-01 |
Family
ID=59960577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018551134A Active JP6974668B2 (ja) | 2016-03-31 | 2017-03-24 | ウェハレスドライクリーニング発光分光法を使用するドライエッチングプロセス特徴の制御 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US10773282B2 (enExample) |
| JP (1) | JP6974668B2 (enExample) |
| KR (1) | KR102304823B1 (enExample) |
| CN (1) | CN109075066B (enExample) |
| SG (1) | SG11201808603VA (enExample) |
| TW (1) | TWI656573B (enExample) |
| WO (1) | WO2017172536A1 (enExample) |
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2017
- 2017-03-24 WO PCT/US2017/024138 patent/WO2017172536A1/en not_active Ceased
- 2017-03-24 KR KR1020187031515A patent/KR102304823B1/ko active Active
- 2017-03-24 US US15/469,303 patent/US10773282B2/en active Active
- 2017-03-24 SG SG11201808603VA patent/SG11201808603VA/en unknown
- 2017-03-24 US US15/469,317 patent/US20170287791A1/en not_active Abandoned
- 2017-03-24 JP JP2018551134A patent/JP6974668B2/ja active Active
- 2017-03-24 CN CN201780026814.4A patent/CN109075066B/zh active Active
- 2017-03-29 TW TW106110455A patent/TWI656573B/zh active
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2020
- 2020-09-11 US US17/018,767 patent/US11273469B2/en active Active
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