JP2013503477A5 - - Google Patents

Download PDF

Info

Publication number
JP2013503477A5
JP2013503477A5 JP2012526719A JP2012526719A JP2013503477A5 JP 2013503477 A5 JP2013503477 A5 JP 2013503477A5 JP 2012526719 A JP2012526719 A JP 2012526719A JP 2012526719 A JP2012526719 A JP 2012526719A JP 2013503477 A5 JP2013503477 A5 JP 2013503477A5
Authority
JP
Japan
Prior art keywords
light beam
spectral
characteristic value
characteristic
estimating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012526719A
Other languages
English (en)
Japanese (ja)
Other versions
JP5395269B2 (ja
JP2013503477A (ja
Filing date
Publication date
Priority claimed from US12/860,288 external-priority patent/US8520186B2/en
Application filed filed Critical
Publication of JP2013503477A publication Critical patent/JP2013503477A/ja
Publication of JP2013503477A5 publication Critical patent/JP2013503477A5/ja
Application granted granted Critical
Publication of JP5395269B2 publication Critical patent/JP5395269B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012526719A 2009-08-25 2010-08-24 光源の能動スペクトル制御 Active JP5395269B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23684809P 2009-08-25 2009-08-25
US61/236,848 2009-08-25
US12/860,288 2010-08-20
US12/860,288 US8520186B2 (en) 2009-08-25 2010-08-20 Active spectral control of optical source
PCT/US2010/002320 WO2011028246A1 (en) 2009-08-25 2010-08-24 Active spectral control of optical source

Publications (3)

Publication Number Publication Date
JP2013503477A JP2013503477A (ja) 2013-01-31
JP2013503477A5 true JP2013503477A5 (enExample) 2013-10-17
JP5395269B2 JP5395269B2 (ja) 2014-01-22

Family

ID=43649552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012526719A Active JP5395269B2 (ja) 2009-08-25 2010-08-24 光源の能動スペクトル制御

Country Status (7)

Country Link
US (1) US8520186B2 (enExample)
EP (1) EP2471150B1 (enExample)
JP (1) JP5395269B2 (enExample)
KR (1) KR101576109B1 (enExample)
CN (1) CN102484350B (enExample)
TW (1) TWI427878B (enExample)
WO (1) WO2011028246A1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101486372B1 (ko) 2007-07-25 2015-01-26 엘지전자 주식회사 디지털 방송 시스템 및 데이터 처리 방법
US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
US9715180B2 (en) * 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
JP2016122676A (ja) * 2014-12-24 2016-07-07 株式会社アドバンテスト 露光装置および露光方法
CN104658942A (zh) * 2015-03-13 2015-05-27 合肥京东方光电科技有限公司 关键尺寸测量设备的光源亮度调整系统和方法
NL2014572B1 (en) * 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN106502055B (zh) * 2015-09-06 2019-04-19 中芯国际集成电路制造(上海)有限公司 光刻失焦的检测方法
WO2017102321A1 (en) * 2015-12-14 2017-06-22 Cymer, Llc Optimization of source and bandwidth for new and existing patterning devices
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US9997888B2 (en) * 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
DE102017115365B4 (de) 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
KR102428750B1 (ko) 2017-10-19 2022-08-02 사이머 엘엘씨 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
WO2019103299A1 (ko) * 2017-11-23 2019-05-31 주식회사 프로텍 인쇄 전자 시스템용 레이저 장치 및 그의 작동 방법
CN114997408A (zh) * 2018-06-14 2022-09-02 诺威有限公司 半导体度量方法和半导体度量系统
WO2020197719A1 (en) * 2019-03-27 2020-10-01 Cymer, Llc Pressure-controlled spectral feature adjuster
JP7454038B2 (ja) 2020-03-19 2024-03-21 ギガフォトン株式会社 露光システム、レーザ制御パラメータの作成方法、及び電子デバイスの製造方法
WO2021186697A1 (ja) 2020-03-19 2021-09-23 ギガフォトン株式会社 露光システム及び電子デバイスの製造方法
US20230266168A1 (en) * 2020-08-18 2023-08-24 Cymer, Llc Predictive calibration scheduling apparatus and method
CN115997171B (zh) 2020-09-24 2025-08-15 极光先进雷射株式会社 电子器件的制造方法
WO2022135843A1 (en) * 2020-12-24 2022-06-30 Asml Netherlands B.V. Lithographic method
JP2024525290A (ja) * 2021-07-13 2024-07-12 サイマー リミテッド ライアビリティ カンパニー 光学源のための予測装置及び方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4678917A (en) 1985-02-19 1987-07-07 The Perkin-Elmer Corporation Instantaneous reading multichannel polychromatic spectrophotometer method and apparatus
US4937619A (en) * 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5303002A (en) * 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
JP3255312B2 (ja) * 1993-04-28 2002-02-12 株式会社ニコン 投影露光装置
US5627639A (en) 1995-06-06 1997-05-06 Lockheed Missiles & Space Company, Inc. Coded aperture imaging spectrometer
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6393037B1 (en) * 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
JP2000106463A (ja) * 1998-08-19 2000-04-11 Lambda Physik G Zur Herstellung Von Lasern Mbh エキシマレ―ザに対する波長較正方法及びシステム
US6218077B1 (en) * 1998-10-26 2001-04-17 Agere Systems Guardian Corp. Method of manufacturing an integrated circuit using a scanning system and a scanning system
CA2390123A1 (en) * 1999-11-30 2001-06-07 Richard L. Sandstrom High power gas discharge laser with helium purged line narrowing unit
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
EP1246014A1 (en) * 2001-03-30 2002-10-02 ASML Netherlands B.V. Lithographic apparatus
US7088758B2 (en) * 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
JP4154144B2 (ja) * 2001-11-13 2008-09-24 キヤノン株式会社 露光装置、発光制御方法、およびデバイス製造方法
US6834842B2 (en) 2002-01-09 2004-12-28 Scimed Life Systems, Inc. Fluid management valve
US6952267B2 (en) * 2003-07-07 2005-10-04 Cymer, Inc. Method and apparatus for measuring bandwidth of a laser output
US6829040B1 (en) * 2003-11-07 2004-12-07 Advanced Micro Devices, Inc. Lithography contrast enhancement technique by varying focus with wavelength modulation
US7053979B2 (en) * 2004-05-12 2006-05-30 Litel Instruments Process for amelioration of scanning synchronization error
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7366219B2 (en) * 2004-11-30 2008-04-29 Cymer, Inc. Line narrowing module
US7317536B2 (en) * 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
WO2007004567A1 (ja) * 2005-07-01 2007-01-11 Nikon Corporation 露光装置、露光方法及びデバイス製造方法、並びにシステム
US7439001B2 (en) * 2005-08-18 2008-10-21 International Business Machines Corporation Focus blur measurement and control method
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
JP2007305611A (ja) * 2006-05-08 2007-11-22 Sony Corp 露光装置
US8259764B2 (en) * 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7455939B2 (en) * 2006-07-31 2008-11-25 International Business Machines Corporation Method of improving grating test pattern for lithography monitoring and controlling
JP2008166612A (ja) * 2006-12-28 2008-07-17 Nikon Corp レーザ装置、露光装置、並びに制御方法、露光方法及びデバイス製造方法
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
JP2010153650A (ja) * 2008-12-25 2010-07-08 Canon Inc 露光装置およびデバイス製造方法
JP2011171521A (ja) * 2010-02-18 2011-09-01 Nikon Corp レーザ光源の評価方法、並びに露光方法及び装置

Similar Documents

Publication Publication Date Title
JP2013503477A5 (enExample)
JP7053536B2 (ja) パルス光ビームのスペクトルフィーチャ計測
JP6409076B2 (ja) パルス光ビームのスペクトル特徴推定
TW201129874A (en) Active spectral control of optical source
WO2013139483A3 (en) Measuring system for measuring an imaging quality of an euv lens
CN102073217A (zh) 一种波像差实时测量装置和方法
JP2010266736A5 (enExample)
JP2014126748A5 (enExample)
JP2014007262A5 (enExample)
TWI247464B (en) Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser
JP2009058360A (ja) 表面状態測定装置
JP2006173305A5 (enExample)
JP2008145203A5 (enExample)
JP2013019870A (ja) 鏡面冷却式露点計
US20150247798A1 (en) Optical system and optical quality measuring apparatus
KR101867527B1 (ko) 측광 장치 및 노광 장치
US9104115B2 (en) Method for controlling exposure apparatus and exposure apparatus
KR20160118134A (ko) 포토리소그래피 노광 시스템의 광원 조절 방법 및 포토리소그래피 장치를 위한 노광 어셈블리
JP2013219117A5 (enExample)
KR102022836B1 (ko) 광 측정 장치, 시스템 및 방법
CN112781506A (zh) 膜厚测量装置以及膜厚测量方法
JP2006191116A (ja) リアルタイムの均一性フィードバックのための方法および装置
JP6128737B2 (ja) 波長可変単色光源
KR101666732B1 (ko) 마흐-젠더 간섭계를 이용한 에어로졸의 광흡수계수 측정시스템
JP2021110905A5 (enExample)