CN102484350B - 光源的主动光谱控制 - Google Patents

光源的主动光谱控制 Download PDF

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Publication number
CN102484350B
CN102484350B CN201080038324.4A CN201080038324A CN102484350B CN 102484350 B CN102484350 B CN 102484350B CN 201080038324 A CN201080038324 A CN 201080038324A CN 102484350 B CN102484350 B CN 102484350B
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CN
China
Prior art keywords
light beam
spectral quality
described light
spectral
information
Prior art date
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CN201080038324.4A
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English (en)
Chinese (zh)
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CN102484350A (zh
Inventor
成乐根
I·B·拉洛维奇
N·R·法勒
R·J·拉法克
J·J·班迪克
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Cymer Inc
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Cymer Inc
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
CN201080038324.4A 2009-08-25 2010-08-24 光源的主动光谱控制 Active CN102484350B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23684809P 2009-08-25 2009-08-25
US61/236,848 2009-08-25
US12/860,288 2010-08-20
US12/860,288 US8520186B2 (en) 2009-08-25 2010-08-20 Active spectral control of optical source
PCT/US2010/002320 WO2011028246A1 (en) 2009-08-25 2010-08-24 Active spectral control of optical source

Publications (2)

Publication Number Publication Date
CN102484350A CN102484350A (zh) 2012-05-30
CN102484350B true CN102484350B (zh) 2014-07-23

Family

ID=43649552

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080038324.4A Active CN102484350B (zh) 2009-08-25 2010-08-24 光源的主动光谱控制

Country Status (7)

Country Link
US (1) US8520186B2 (enExample)
EP (1) EP2471150B1 (enExample)
JP (1) JP5395269B2 (enExample)
KR (1) KR101576109B1 (enExample)
CN (1) CN102484350B (enExample)
TW (1) TWI427878B (enExample)
WO (1) WO2011028246A1 (enExample)

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US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
US9715180B2 (en) * 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
JP2016122676A (ja) * 2014-12-24 2016-07-07 株式会社アドバンテスト 露光装置および露光方法
CN104658942A (zh) * 2015-03-13 2015-05-27 合肥京东方光电科技有限公司 关键尺寸测量设备的光源亮度调整系统和方法
NL2014572B1 (en) * 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN106502055B (zh) * 2015-09-06 2019-04-19 中芯国际集成电路制造(上海)有限公司 光刻失焦的检测方法
WO2017102321A1 (en) * 2015-12-14 2017-06-22 Cymer, Llc Optimization of source and bandwidth for new and existing patterning devices
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US9997888B2 (en) * 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
DE102017115365B4 (de) 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
KR102428750B1 (ko) 2017-10-19 2022-08-02 사이머 엘엘씨 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
WO2019103299A1 (ko) * 2017-11-23 2019-05-31 주식회사 프로텍 인쇄 전자 시스템용 레이저 장치 및 그의 작동 방법
CN114997408A (zh) * 2018-06-14 2022-09-02 诺威有限公司 半导体度量方法和半导体度量系统
WO2020197719A1 (en) * 2019-03-27 2020-10-01 Cymer, Llc Pressure-controlled spectral feature adjuster
JP7454038B2 (ja) 2020-03-19 2024-03-21 ギガフォトン株式会社 露光システム、レーザ制御パラメータの作成方法、及び電子デバイスの製造方法
WO2021186697A1 (ja) 2020-03-19 2021-09-23 ギガフォトン株式会社 露光システム及び電子デバイスの製造方法
US20230266168A1 (en) * 2020-08-18 2023-08-24 Cymer, Llc Predictive calibration scheduling apparatus and method
CN115997171B (zh) 2020-09-24 2025-08-15 极光先进雷射株式会社 电子器件的制造方法
WO2022135843A1 (en) * 2020-12-24 2022-06-30 Asml Netherlands B.V. Lithographic method
JP2024525290A (ja) * 2021-07-13 2024-07-12 サイマー リミテッド ライアビリティ カンパニー 光学源のための予測装置及び方法

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Also Published As

Publication number Publication date
TW201129874A (en) 2011-09-01
CN102484350A (zh) 2012-05-30
US20110205512A1 (en) 2011-08-25
WO2011028246A1 (en) 2011-03-10
US8520186B2 (en) 2013-08-27
KR20120080181A (ko) 2012-07-16
EP2471150A1 (en) 2012-07-04
JP5395269B2 (ja) 2014-01-22
TWI427878B (zh) 2014-02-21
JP2013503477A (ja) 2013-01-31
EP2471150A4 (en) 2017-12-27
KR101576109B1 (ko) 2015-12-09
EP2471150B1 (en) 2019-01-23

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Owner name: CYMER INC.

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Effective date: 20141222

C41 Transfer of patent application or patent right or utility model
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Address after: American California

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Patentee before: Cymer, Inc.