JP5395269B2 - 光源の能動スペクトル制御 - Google Patents

光源の能動スペクトル制御 Download PDF

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Publication number
JP5395269B2
JP5395269B2 JP2012526719A JP2012526719A JP5395269B2 JP 5395269 B2 JP5395269 B2 JP 5395269B2 JP 2012526719 A JP2012526719 A JP 2012526719A JP 2012526719 A JP2012526719 A JP 2012526719A JP 5395269 B2 JP5395269 B2 JP 5395269B2
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Prior art keywords
light beam
spectral
characteristic value
exposure apparatus
optical
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Japanese (ja)
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JP2013503477A (ja
JP2013503477A5 (enExample
Inventor
ナクグォン ソン
アイヴァン ビー ラロヴィック
ナイジェル アール ファーラー
ロバート ジェイ ラファック
ジョセフ ジェイ ベンディク
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サイマー インコーポレイテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
JP2012526719A 2009-08-25 2010-08-24 光源の能動スペクトル制御 Active JP5395269B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23684809P 2009-08-25 2009-08-25
US61/236,848 2009-08-25
US12/860,288 2010-08-20
US12/860,288 US8520186B2 (en) 2009-08-25 2010-08-20 Active spectral control of optical source
PCT/US2010/002320 WO2011028246A1 (en) 2009-08-25 2010-08-24 Active spectral control of optical source

Publications (3)

Publication Number Publication Date
JP2013503477A JP2013503477A (ja) 2013-01-31
JP2013503477A5 JP2013503477A5 (enExample) 2013-10-17
JP5395269B2 true JP5395269B2 (ja) 2014-01-22

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ID=43649552

Family Applications (1)

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JP2012526719A Active JP5395269B2 (ja) 2009-08-25 2010-08-24 光源の能動スペクトル制御

Country Status (7)

Country Link
US (1) US8520186B2 (enExample)
EP (1) EP2471150B1 (enExample)
JP (1) JP5395269B2 (enExample)
KR (1) KR101576109B1 (enExample)
CN (1) CN102484350B (enExample)
TW (1) TWI427878B (enExample)
WO (1) WO2011028246A1 (enExample)

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NL2014572B1 (en) * 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN106502055B (zh) * 2015-09-06 2019-04-19 中芯国际集成电路制造(上海)有限公司 光刻失焦的检测方法
WO2017102321A1 (en) * 2015-12-14 2017-06-22 Cymer, Llc Optimization of source and bandwidth for new and existing patterning devices
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US9997888B2 (en) * 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
DE102017115365B4 (de) 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
KR102428750B1 (ko) 2017-10-19 2022-08-02 사이머 엘엘씨 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
WO2019103299A1 (ko) * 2017-11-23 2019-05-31 주식회사 프로텍 인쇄 전자 시스템용 레이저 장치 및 그의 작동 방법
CN114997408A (zh) * 2018-06-14 2022-09-02 诺威有限公司 半导体度量方法和半导体度量系统
WO2020197719A1 (en) * 2019-03-27 2020-10-01 Cymer, Llc Pressure-controlled spectral feature adjuster
JP7454038B2 (ja) 2020-03-19 2024-03-21 ギガフォトン株式会社 露光システム、レーザ制御パラメータの作成方法、及び電子デバイスの製造方法
WO2021186697A1 (ja) 2020-03-19 2021-09-23 ギガフォトン株式会社 露光システム及び電子デバイスの製造方法
US20230266168A1 (en) * 2020-08-18 2023-08-24 Cymer, Llc Predictive calibration scheduling apparatus and method
CN115997171B (zh) 2020-09-24 2025-08-15 极光先进雷射株式会社 电子器件的制造方法
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Also Published As

Publication number Publication date
TW201129874A (en) 2011-09-01
CN102484350A (zh) 2012-05-30
US20110205512A1 (en) 2011-08-25
WO2011028246A1 (en) 2011-03-10
US8520186B2 (en) 2013-08-27
KR20120080181A (ko) 2012-07-16
EP2471150A1 (en) 2012-07-04
CN102484350B (zh) 2014-07-23
TWI427878B (zh) 2014-02-21
JP2013503477A (ja) 2013-01-31
EP2471150A4 (en) 2017-12-27
KR101576109B1 (ko) 2015-12-09
EP2471150B1 (en) 2019-01-23

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