JP2013254942A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013254942A5 JP2013254942A5 JP2013097234A JP2013097234A JP2013254942A5 JP 2013254942 A5 JP2013254942 A5 JP 2013254942A5 JP 2013097234 A JP2013097234 A JP 2013097234A JP 2013097234 A JP2013097234 A JP 2013097234A JP 2013254942 A5 JP2013254942 A5 JP 2013254942A5
- Authority
- JP
- Japan
- Prior art keywords
- contact
- insulating film
- conductive layer
- oxide semiconductor
- drain electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 14
- 239000004065 semiconductor Substances 0.000 claims 14
- 229910052757 nitrogen Inorganic materials 0.000 claims 7
- 238000003795 desorption Methods 0.000 claims 4
- 238000005121 nitriding Methods 0.000 claims 3
- 238000004458 analytical method Methods 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 230000007423 decrease Effects 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims 2
- 238000004611 spectroscopical analysis Methods 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013097234A JP6077382B2 (ja) | 2012-05-11 | 2013-05-06 | 半導体装置および半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012109762 | 2012-05-11 | ||
| JP2012109762 | 2012-05-11 | ||
| JP2013097234A JP6077382B2 (ja) | 2012-05-11 | 2013-05-06 | 半導体装置および半導体装置の作製方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017003571A Division JP6275294B2 (ja) | 2012-05-11 | 2017-01-12 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013254942A JP2013254942A (ja) | 2013-12-19 |
| JP2013254942A5 true JP2013254942A5 (enExample) | 2016-05-19 |
| JP6077382B2 JP6077382B2 (ja) | 2017-02-08 |
Family
ID=49952185
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013097234A Expired - Fee Related JP6077382B2 (ja) | 2012-05-11 | 2013-05-06 | 半導体装置および半導体装置の作製方法 |
| JP2017003571A Expired - Fee Related JP6275294B2 (ja) | 2012-05-11 | 2017-01-12 | 半導体装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017003571A Expired - Fee Related JP6275294B2 (ja) | 2012-05-11 | 2017-01-12 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JP6077382B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015114476A1 (en) * | 2014-01-28 | 2015-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US9443876B2 (en) | 2014-02-05 | 2016-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic device including the semiconductor device, the display device, and the display module |
| WO2015121771A1 (en) | 2014-02-14 | 2015-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device |
| JP6486712B2 (ja) * | 2014-04-30 | 2019-03-20 | 株式会社半導体エネルギー研究所 | 酸化物半導体膜 |
| DE112014006711B4 (de) | 2014-05-30 | 2021-01-21 | Semiconductor Energy Laboratory Co., Ltd. | Halbleitervorrichtung, Herstellungsverfahren dafür und elektronische Vorrichtung |
| KR102788207B1 (ko) | 2015-04-13 | 2025-03-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| DE112015007226T5 (de) | 2015-12-23 | 2018-09-13 | Intel Corporation | Fertigung von nicht-planaren IGZO-Vorrichtungen für eine verbesserte Elektrostatik |
| JP2020004861A (ja) | 2018-06-28 | 2020-01-09 | 堺ディスプレイプロダクト株式会社 | 薄膜トランジスタ、表示装置及び薄膜トランジスタの製造方法 |
| US11495689B2 (en) | 2018-08-08 | 2022-11-08 | Sakai Display Products Corporation | Thin-film transistor and method for producing same |
| JP7262474B2 (ja) * | 2018-10-26 | 2023-04-21 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| CN113875022B (zh) | 2019-06-04 | 2024-05-14 | 堺显示器制品株式会社 | 薄膜晶体管及其制造方法以及显示装置 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5052033B2 (ja) * | 2005-04-28 | 2012-10-17 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP5168142B2 (ja) * | 2006-05-17 | 2013-03-21 | 日本電気株式会社 | 半導体装置 |
| KR102133478B1 (ko) * | 2008-10-03 | 2020-07-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치 |
| JP5587591B2 (ja) * | 2008-11-07 | 2014-09-10 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP5587592B2 (ja) * | 2008-11-07 | 2014-09-10 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP2010272571A (ja) * | 2009-05-19 | 2010-12-02 | Panasonic Corp | 半導体装置及びその製造方法 |
| EP2526622B1 (en) * | 2010-01-20 | 2015-09-23 | Semiconductor Energy Laboratory Co. Ltd. | Semiconductor device |
| US8692243B2 (en) * | 2010-04-20 | 2014-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| WO2011145467A1 (en) * | 2010-05-21 | 2011-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| WO2011155295A1 (en) * | 2010-06-10 | 2011-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Dc/dc converter, power supply circuit, and semiconductor device |
| JP5705559B2 (ja) * | 2010-06-22 | 2015-04-22 | ルネサスエレクトロニクス株式会社 | 半導体装置、及び、半導体装置の製造方法 |
| US8871565B2 (en) * | 2010-09-13 | 2014-10-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
-
2013
- 2013-05-06 JP JP2013097234A patent/JP6077382B2/ja not_active Expired - Fee Related
-
2017
- 2017-01-12 JP JP2017003571A patent/JP6275294B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2013254942A5 (enExample) | ||
| JP2011243971A5 (enExample) | ||
| JP2011243972A5 (ja) | 半導体装置の作製方法 | |
| JP2011243973A5 (enExample) | ||
| JP2015109425A5 (ja) | 半導体装置 | |
| JP2013102149A5 (enExample) | ||
| JP2012216787A5 (ja) | 半導体装置 | |
| JP2011243975A5 (enExample) | ||
| JP2016021559A5 (ja) | 半導体装置および半導体装置の作製方法 | |
| JP2012019207A5 (ja) | 半導体装置 | |
| JP2013016862A5 (enExample) | ||
| JP2014241403A5 (enExample) | ||
| JP2012033913A5 (enExample) | ||
| JP2010141304A5 (enExample) | ||
| JP2013042154A5 (enExample) | ||
| JP2014057052A5 (enExample) | ||
| JP2012064929A5 (enExample) | ||
| JP2014082389A5 (ja) | 半導体装置の作製方法 | |
| JP2012195574A5 (ja) | 半導体装置 | |
| JP2010157702A5 (ja) | 半導体装置 | |
| JP2012146946A5 (enExample) | ||
| JP2011199272A5 (enExample) | ||
| JP2013179294A5 (ja) | 半導体装置 | |
| JP2016046527A5 (ja) | 半導体装置及びその作製方法 | |
| JP2012023360A5 (enExample) |