JP2013230594A5 - - Google Patents
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- Publication number
- JP2013230594A5 JP2013230594A5 JP2012103357A JP2012103357A JP2013230594A5 JP 2013230594 A5 JP2013230594 A5 JP 2013230594A5 JP 2012103357 A JP2012103357 A JP 2012103357A JP 2012103357 A JP2012103357 A JP 2012103357A JP 2013230594 A5 JP2013230594 A5 JP 2013230594A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- resin layer
- photosensitive resin
- manufacturing
- discharge head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 26
- 239000011347 resin Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 9
- 238000007599 discharging Methods 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 238000007747 plating Methods 0.000 claims 2
- 239000000463 material Substances 0.000 description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012103357A JP6029316B2 (ja) | 2012-04-27 | 2012-04-27 | 液体吐出ヘッドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012103357A JP6029316B2 (ja) | 2012-04-27 | 2012-04-27 | 液体吐出ヘッドの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013230594A JP2013230594A (ja) | 2013-11-14 |
| JP2013230594A5 true JP2013230594A5 (enrdf_load_stackoverflow) | 2015-05-28 |
| JP6029316B2 JP6029316B2 (ja) | 2016-11-24 |
Family
ID=49677514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012103357A Expired - Fee Related JP6029316B2 (ja) | 2012-04-27 | 2012-04-27 | 液体吐出ヘッドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6029316B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6238760B2 (ja) * | 2014-01-16 | 2017-11-29 | キヤノン株式会社 | 構造物の製造方法及び液体吐出ヘッドの製造方法 |
| JP6525698B2 (ja) * | 2015-04-14 | 2019-06-05 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6566709B2 (ja) * | 2015-05-07 | 2019-08-28 | キヤノン株式会社 | インクジェット記録ヘッド用基板 |
| JP2018024211A (ja) * | 2016-08-12 | 2018-02-15 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| US20220048763A1 (en) * | 2019-04-29 | 2022-02-17 | Hewlett-Packard Development Company, L.P. | Manufacturing a corrosion tolerant micro-electromechanical fluid ejection device |
| US11787180B2 (en) | 2019-04-29 | 2023-10-17 | Hewlett-Packard Development Company, L.P. | Corrosion tolerant micro-electromechanical fluid ejection device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2694054B2 (ja) * | 1990-12-19 | 1997-12-24 | キヤノン株式会社 | 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置 |
| JPH11245425A (ja) * | 1998-02-27 | 1999-09-14 | Casio Comput Co Ltd | サーマルインクジェットヘッドの製造方法 |
| JP2007083711A (ja) * | 2005-08-23 | 2007-04-05 | Canon Inc | インクジェット記録ヘッドの製造方法 |
| US8268539B2 (en) * | 2010-07-23 | 2012-09-18 | Caron Kabushiki Kaisha | Method of manufacturing liquid ejection head |
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2012
- 2012-04-27 JP JP2012103357A patent/JP6029316B2/ja not_active Expired - Fee Related