JP2013214434A - 積層構造体の製造方法、積層構造体および電子機器 - Google Patents

積層構造体の製造方法、積層構造体および電子機器 Download PDF

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Publication number
JP2013214434A
JP2013214434A JP2012084583A JP2012084583A JP2013214434A JP 2013214434 A JP2013214434 A JP 2013214434A JP 2012084583 A JP2012084583 A JP 2012084583A JP 2012084583 A JP2012084583 A JP 2012084583A JP 2013214434 A JP2013214434 A JP 2013214434A
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JP
Japan
Prior art keywords
substrate
layer
resin layer
laminated structure
graphene film
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Pending
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JP2012084583A
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English (en)
Japanese (ja)
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JP2013214434A5 (enExample
Inventor
Nozomi Kimura
望 木村
Keisuke Shimizu
圭輔 清水
Toshio Fukuda
敏生 福田
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Sony Corp
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Sony Corp
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Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2012084583A priority Critical patent/JP2013214434A/ja
Priority to KR1020147016812A priority patent/KR102074004B1/ko
Priority to EP13722590.0A priority patent/EP2834071A1/en
Priority to PCT/JP2013/002101 priority patent/WO2013150746A1/en
Priority to KR1020207002283A priority patent/KR102202997B1/ko
Priority to CN201380017197.3A priority patent/CN104203577A/zh
Priority to US14/387,760 priority patent/US10022947B2/en
Publication of JP2013214434A publication Critical patent/JP2013214434A/ja
Publication of JP2013214434A5 publication Critical patent/JP2013214434A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/10—Removing layers, or parts of layers, mechanically or chemically
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/005—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
    • B32B9/007—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
    • H10D62/882—Graphene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B32B2037/243—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/02—2 layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208—Touch screens
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
    • B32B37/025—Transfer laminating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

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  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Position Input By Displaying (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
JP2012084583A 2012-04-03 2012-04-03 積層構造体の製造方法、積層構造体および電子機器 Pending JP2013214434A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2012084583A JP2013214434A (ja) 2012-04-03 2012-04-03 積層構造体の製造方法、積層構造体および電子機器
KR1020147016812A KR102074004B1 (ko) 2012-04-03 2013-03-27 적층 구조체 제조 방법, 적층 구조체, 및 전자 장치
EP13722590.0A EP2834071A1 (en) 2012-04-03 2013-03-27 Laminated structure manufacturing method, laminated structure, and electronic apparatus
PCT/JP2013/002101 WO2013150746A1 (en) 2012-04-03 2013-03-27 Laminated structure manufacturing method, laminated structure, and electronic apparatus
KR1020207002283A KR102202997B1 (ko) 2012-04-03 2013-03-27 적층 구조체 제조 방법, 적층 구조체, 및 전자 장치
CN201380017197.3A CN104203577A (zh) 2012-04-03 2013-03-27 层压结构制造方法、层压结构和电子设备
US14/387,760 US10022947B2 (en) 2012-04-03 2013-03-27 Laminated structure manufacturing method, laminated structure, and electronic apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012084583A JP2013214434A (ja) 2012-04-03 2012-04-03 積層構造体の製造方法、積層構造体および電子機器

Publications (2)

Publication Number Publication Date
JP2013214434A true JP2013214434A (ja) 2013-10-17
JP2013214434A5 JP2013214434A5 (enExample) 2015-03-19

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JP2012084583A Pending JP2013214434A (ja) 2012-04-03 2012-04-03 積層構造体の製造方法、積層構造体および電子機器

Country Status (6)

Country Link
US (1) US10022947B2 (enExample)
EP (1) EP2834071A1 (enExample)
JP (1) JP2013214434A (enExample)
KR (2) KR102202997B1 (enExample)
CN (1) CN104203577A (enExample)
WO (1) WO2013150746A1 (enExample)

Cited By (3)

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JP2017152643A (ja) * 2016-02-26 2017-08-31 住友電気工業株式会社 電子装置およびその製造方法
JP2018107138A (ja) * 2018-02-14 2018-07-05 株式会社東芝 透明導電体の製造方法
US10306752B2 (en) 2014-03-05 2019-05-28 Kabushiki Kaisha Toshiba Transparent conductor and device

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KR101932778B1 (ko) 2011-10-03 2018-12-27 히타치가세이가부시끼가이샤 도전 패턴의 형성 방법, 도전 패턴 기판 및 터치 패널 센서
CN103935988B (zh) * 2014-03-24 2017-01-11 无锡格菲电子薄膜科技有限公司 一种石墨烯薄膜的转移方法
CN104538562B (zh) * 2015-01-15 2017-04-26 京东方科技集团股份有限公司 一种oled器件及其封装方法和封装装置
CN106201039B (zh) * 2015-04-30 2023-05-23 安徽精卓光显技术有限责任公司 触摸屏及保护膜
KR102581899B1 (ko) * 2015-11-04 2023-09-21 삼성전자주식회사 투명 전극 및 이를 포함하는 소자
FR3045826A1 (fr) * 2015-12-17 2017-06-23 Commissariat Energie Atomique Supports amplificateurs de contraste utilisant un materiau bidimensionnel
WO2018133053A1 (en) * 2017-01-21 2018-07-26 Southern University Of Science And Technology Graphene film and direct method for transfering graphene film onto flexible and transparent substrates
CN106827380B (zh) * 2017-01-23 2019-03-15 业成科技（成都）有限公司 带有抗眩光薄膜的三维工件制作方法
JP7154698B2 (ja) * 2018-09-06 2022-10-18 株式会社ディスコ ウェーハの加工方法
JP7171134B2 (ja) * 2018-10-17 2022-11-15 株式会社ディスコ ウェーハの加工方法
JP7503886B2 (ja) * 2018-11-06 2024-06-21 株式会社ディスコ ウェーハの加工方法
US12289839B2 (en) 2021-05-18 2025-04-29 Mellanox Technologies, Ltd. Process for localized repair of graphene-coated lamination stacks and printed circuit boards
US12004308B2 (en) * 2021-05-18 2024-06-04 Mellanox Technologies, Ltd. Process for laminating graphene-coated printed circuit boards
US11963309B2 (en) 2021-05-18 2024-04-16 Mellanox Technologies, Ltd. Process for laminating conductive-lubricant coated metals for printed circuit boards
US12221695B2 (en) 2021-05-18 2025-02-11 Mellanox Technologies, Ltd. CVD system with flange assembly for facilitating uniform and laminar flow
US12163228B2 (en) 2021-05-18 2024-12-10 Mellanox Technologies, Ltd. CVD system with substrate carrier and associated mechanisms for moving substrate therethrough

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JPH0316147A (ja) * 1989-03-09 1991-01-24 Hitachi Chem Co Ltd 回路の接続方法及びそれに用いる接着剤フィルム
JPH07168003A (ja) * 1993-10-18 1995-07-04 Asahi Glass Co Ltd 反射防止層を有する光学物品
JP2005514672A (ja) * 2002-01-18 2005-05-19 オーファオデー キネグラム アーゲー 導光体を組み込んだ回折型セキュリティー素子
JP2007197498A (ja) * 2006-01-24 2007-08-09 Sumitomo Metal Mining Co Ltd 導電性接着剤
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10306752B2 (en) 2014-03-05 2019-05-28 Kabushiki Kaisha Toshiba Transparent conductor and device
JP2017152643A (ja) * 2016-02-26 2017-08-31 住友電気工業株式会社 電子装置およびその製造方法
JP2018107138A (ja) * 2018-02-14 2018-07-05 株式会社東芝 透明導電体の製造方法

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Publication number Publication date
KR102074004B1 (ko) 2020-02-05
KR20150002574A (ko) 2015-01-07
KR20200015947A (ko) 2020-02-13
CN104203577A (zh) 2014-12-10
WO2013150746A1 (en) 2013-10-10
US20150064470A1 (en) 2015-03-05
EP2834071A1 (en) 2015-02-11
US10022947B2 (en) 2018-07-17
KR102202997B1 (ko) 2021-01-13

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