JP2013214434A5 - - Google Patents
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- Publication number
- JP2013214434A5 JP2013214434A5 JP2012084583A JP2012084583A JP2013214434A5 JP 2013214434 A5 JP2013214434 A5 JP 2013214434A5 JP 2012084583 A JP2012084583 A JP 2012084583A JP 2012084583 A JP2012084583 A JP 2012084583A JP 2013214434 A5 JP2013214434 A5 JP 2013214434A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- laminated structure
- manufacturing
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- 229910021389 graphene Inorganic materials 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 claims 29
- 239000004840 adhesive resin Substances 0.000 claims 3
- 229920006223 adhesive resin Polymers 0.000 claims 3
- 230000003373 anti-fouling effect Effects 0.000 claims 2
- 239000002365 multiple layer Substances 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 239000002356 single layer Substances 0.000 claims 1
- 229920005992 thermoplastic resin Polymers 0.000 claims 1
- 229920001187 thermosetting polymer Polymers 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012084583A JP2013214434A (ja) | 2012-04-03 | 2012-04-03 | 積層構造体の製造方法、積層構造体および電子機器 |
| KR1020147016812A KR102074004B1 (ko) | 2012-04-03 | 2013-03-27 | 적층 구조체 제조 방법, 적층 구조체, 및 전자 장치 |
| EP13722590.0A EP2834071A1 (en) | 2012-04-03 | 2013-03-27 | Laminated structure manufacturing method, laminated structure, and electronic apparatus |
| PCT/JP2013/002101 WO2013150746A1 (en) | 2012-04-03 | 2013-03-27 | Laminated structure manufacturing method, laminated structure, and electronic apparatus |
| KR1020207002283A KR102202997B1 (ko) | 2012-04-03 | 2013-03-27 | 적층 구조체 제조 방법, 적층 구조체, 및 전자 장치 |
| CN201380017197.3A CN104203577A (zh) | 2012-04-03 | 2013-03-27 | 层压结构制造方法、层压结构和电子设备 |
| US14/387,760 US10022947B2 (en) | 2012-04-03 | 2013-03-27 | Laminated structure manufacturing method, laminated structure, and electronic apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012084583A JP2013214434A (ja) | 2012-04-03 | 2012-04-03 | 積層構造体の製造方法、積層構造体および電子機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013214434A JP2013214434A (ja) | 2013-10-17 |
| JP2013214434A5 true JP2013214434A5 (enExample) | 2015-03-19 |
Family
ID=48430897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012084583A Pending JP2013214434A (ja) | 2012-04-03 | 2012-04-03 | 積層構造体の製造方法、積層構造体および電子機器 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10022947B2 (enExample) |
| EP (1) | EP2834071A1 (enExample) |
| JP (1) | JP2013214434A (enExample) |
| KR (2) | KR102202997B1 (enExample) |
| CN (1) | CN104203577A (enExample) |
| WO (1) | WO2013150746A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101932778B1 (ko) | 2011-10-03 | 2018-12-27 | 히타치가세이가부시끼가이샤 | 도전 패턴의 형성 방법, 도전 패턴 기판 및 터치 패널 센서 |
| JP6466070B2 (ja) | 2014-03-05 | 2019-02-06 | 株式会社東芝 | 透明導電体およびこれを用いたデバイス |
| CN103935988B (zh) * | 2014-03-24 | 2017-01-11 | 无锡格菲电子薄膜科技有限公司 | 一种石墨烯薄膜的转移方法 |
| CN104538562B (zh) * | 2015-01-15 | 2017-04-26 | 京东方科技集团股份有限公司 | 一种oled器件及其封装方法和封装装置 |
| CN106201039B (zh) * | 2015-04-30 | 2023-05-23 | 安徽精卓光显技术有限责任公司 | 触摸屏及保护膜 |
| KR102581899B1 (ko) * | 2015-11-04 | 2023-09-21 | 삼성전자주식회사 | 투명 전극 및 이를 포함하는 소자 |
| FR3045826A1 (fr) * | 2015-12-17 | 2017-06-23 | Commissariat Energie Atomique | Supports amplificateurs de contraste utilisant un materiau bidimensionnel |
| JP6649800B2 (ja) * | 2016-02-26 | 2020-02-19 | 住友電気工業株式会社 | 電子装置およびその製造方法 |
| WO2018133053A1 (en) * | 2017-01-21 | 2018-07-26 | Southern University Of Science And Technology | Graphene film and direct method for transfering graphene film onto flexible and transparent substrates |
| CN106827380B (zh) * | 2017-01-23 | 2019-03-15 | 业成科技（成都）有限公司 | 带有抗眩光薄膜的三维工件制作方法 |
| JP2018107138A (ja) * | 2018-02-14 | 2018-07-05 | 株式会社東芝 | 透明導電体の製造方法 |
| JP7154698B2 (ja) * | 2018-09-06 | 2022-10-18 | 株式会社ディスコ | ウェーハの加工方法 |
| JP7171134B2 (ja) * | 2018-10-17 | 2022-11-15 | 株式会社ディスコ | ウェーハの加工方法 |
| JP7503886B2 (ja) * | 2018-11-06 | 2024-06-21 | 株式会社ディスコ | ウェーハの加工方法 |
| US12289839B2 (en) | 2021-05-18 | 2025-04-29 | Mellanox Technologies, Ltd. | Process for localized repair of graphene-coated lamination stacks and printed circuit boards |
| US12004308B2 (en) * | 2021-05-18 | 2024-06-04 | Mellanox Technologies, Ltd. | Process for laminating graphene-coated printed circuit boards |
| US11963309B2 (en) | 2021-05-18 | 2024-04-16 | Mellanox Technologies, Ltd. | Process for laminating conductive-lubricant coated metals for printed circuit boards |
| US12221695B2 (en) | 2021-05-18 | 2025-02-11 | Mellanox Technologies, Ltd. | CVD system with flange assembly for facilitating uniform and laminar flow |
| US12163228B2 (en) | 2021-05-18 | 2024-12-10 | Mellanox Technologies, Ltd. | CVD system with substrate carrier and associated mechanisms for moving substrate therethrough |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2833111B2 (ja) * | 1989-03-09 | 1998-12-09 | 日立化成工業株式会社 | 回路の接続方法及びそれに用いる接着剤フィルム |
| JP3531192B2 (ja) * | 1993-10-18 | 2004-05-24 | 旭硝子株式会社 | 反射防止層を有する光学物品 |
| JP3153142B2 (ja) * | 1997-02-25 | 2001-04-03 | 日本電気株式会社 | 導電性偏光板 |
| PL202810B1 (pl) * | 2002-01-18 | 2009-07-31 | Ovd Kinegram Ag | Dyfrakcyjny element zabezpieczający |
| JP2007197498A (ja) * | 2006-01-24 | 2007-08-09 | Sumitomo Metal Mining Co Ltd | 導電性接着剤 |
| WO2008128554A1 (en) * | 2007-04-20 | 2008-10-30 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Highly conductive, transparent carbon films as electrode materials |
| CN101669177B (zh) * | 2007-04-27 | 2016-06-01 | 株式会社可乐丽 | 透明导电膜及透明导电膜的制造方法 |
| JP4957376B2 (ja) * | 2007-05-18 | 2012-06-20 | コニカミノルタホールディングス株式会社 | 透明性導電膜形成用感光材料、それを用いた透明性導電膜、その製造方法及び電磁波遮蔽材料 |
| CA2711642C (en) * | 2008-01-07 | 2016-11-01 | Wisys Technology Foundation, Inc. | Method and apparatus for identifying and characterizing material solvents and composite matrices and methods of using same |
| JP5303957B2 (ja) * | 2008-02-20 | 2013-10-02 | 株式会社デンソー | グラフェン基板及びその製造方法 |
| KR101462401B1 (ko) | 2008-06-12 | 2014-11-17 | 삼성전자주식회사 | 그라펜 시트로부터 탄소화 촉매를 제거하는 방법, 탄소화촉매가 제거된 그라펜 시트를 소자에 전사하는 방법, 이에따른 그라펜 시트 및 소자 |
| US8753468B2 (en) * | 2009-08-27 | 2014-06-17 | The United States Of America, As Represented By The Secretary Of The Navy | Method for the reduction of graphene film thickness and the removal and transfer of epitaxial graphene films from SiC substrates |
| CN102656016B (zh) * | 2009-10-16 | 2015-12-16 | 石墨烯广场株式会社 | 石墨烯卷对卷转印方法、由该方法制成的石墨烯卷及石墨烯卷对卷转印装置 |
| TW201116606A (en) * | 2009-11-03 | 2011-05-16 | Nat Univ Tsing Hua | Method and an apparatus for transferring carbonaceous material layer |
| KR101095097B1 (ko) * | 2009-12-23 | 2011-12-20 | 삼성전기주식회사 | 투명 전극 필름 및 이의 제조 방법 |
| KR101656103B1 (ko) * | 2010-03-17 | 2016-09-08 | 동우 화인켐 주식회사 | 반사 방지 필름, 이를 포함하는 편광판 및 표시 장치 |
| KR101630291B1 (ko) | 2010-06-17 | 2016-06-14 | 한화테크윈 주식회사 | 그래핀의 전사 방법 |
| KR101793683B1 (ko) * | 2010-07-27 | 2017-11-03 | 한화테크윈 주식회사 | 그래핀 제조 방법 |
| JP5691524B2 (ja) * | 2011-01-05 | 2015-04-01 | ソニー株式会社 | グラフェン膜の転写方法および透明導電膜の製造方法 |
| CN102166866A (zh) * | 2011-01-05 | 2011-08-31 | 常州大学 | 应用石墨烯制备抗静电层压材料的方法 |
| KR101920713B1 (ko) * | 2011-12-23 | 2018-11-22 | 삼성전자주식회사 | 그래핀 소자 및 그 제조방법 |
-
2012
- 2012-04-03 JP JP2012084583A patent/JP2013214434A/ja active Pending
-
2013
- 2013-03-27 CN CN201380017197.3A patent/CN104203577A/zh active Pending
- 2013-03-27 US US14/387,760 patent/US10022947B2/en active Active
- 2013-03-27 EP EP13722590.0A patent/EP2834071A1/en not_active Withdrawn
- 2013-03-27 WO PCT/JP2013/002101 patent/WO2013150746A1/en not_active Ceased
- 2013-03-27 KR KR1020207002283A patent/KR102202997B1/ko active Active
- 2013-03-27 KR KR1020147016812A patent/KR102074004B1/ko active Active
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