JP2013212952A - 炭化珪素単結晶の製造方法 - Google Patents

炭化珪素単結晶の製造方法 Download PDF

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Publication number
JP2013212952A
JP2013212952A JP2012083613A JP2012083613A JP2013212952A JP 2013212952 A JP2013212952 A JP 2013212952A JP 2012083613 A JP2012083613 A JP 2012083613A JP 2012083613 A JP2012083613 A JP 2012083613A JP 2013212952 A JP2013212952 A JP 2013212952A
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Japan
Prior art keywords
silicon carbide
single crystal
raw material
carbide single
seed substrate
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Pending
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JP2012083613A
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English (en)
Japanese (ja)
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JP2013212952A5 (https=
Inventor
Hiroki Inoue
博揮 井上
Makoto Sasaki
信 佐々木
Makoto Harada
真 原田
Eiryo Takasuka
英良 高須賀
Shinsuke Fujiwara
伸介 藤原
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Sumitomo Electric Industries Ltd
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Sumitomo Electric Industries Ltd
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Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP2012083613A priority Critical patent/JP2013212952A/ja
Priority to US13/780,127 priority patent/US20130255568A1/en
Publication of JP2013212952A publication Critical patent/JP2013212952A/ja
Publication of JP2013212952A5 publication Critical patent/JP2013212952A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/025—Epitaxial-layer growth characterised by the substrate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2012083613A 2012-04-02 2012-04-02 炭化珪素単結晶の製造方法 Pending JP2013212952A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012083613A JP2013212952A (ja) 2012-04-02 2012-04-02 炭化珪素単結晶の製造方法
US13/780,127 US20130255568A1 (en) 2012-04-02 2013-02-28 Method for manufacturing silicon carbide single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012083613A JP2013212952A (ja) 2012-04-02 2012-04-02 炭化珪素単結晶の製造方法

Publications (2)

Publication Number Publication Date
JP2013212952A true JP2013212952A (ja) 2013-10-17
JP2013212952A5 JP2013212952A5 (https=) 2015-02-19

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JP2012083613A Pending JP2013212952A (ja) 2012-04-02 2012-04-02 炭化珪素単結晶の製造方法

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US (1) US20130255568A1 (https=)
JP (1) JP2013212952A (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015212207A (ja) * 2014-05-02 2015-11-26 新日鐵住金株式会社 炭化珪素単結晶インゴットの製造方法
JP2016088801A (ja) * 2014-11-04 2016-05-23 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
JP2016088789A (ja) * 2014-10-31 2016-05-23 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
JP2016088812A (ja) * 2014-11-06 2016-05-23 新日鐵住金株式会社 炭化珪素単結晶インゴットの製造方法及び製造装置
JP2019073441A (ja) * 2019-02-20 2019-05-16 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
KR102187449B1 (ko) * 2019-05-28 2020-12-11 에스케이씨 주식회사 탄화규소 잉곳의 제조방법, 탄화규소 잉곳 및 이의 성장 시스템
JP2021104912A (ja) * 2019-12-26 2021-07-26 昭和電工株式会社 単結晶製造装置
US11359306B2 (en) 2019-10-29 2022-06-14 Senic Inc. Method for preparing a SiC ingot and device for preparing a SiC ingot wherein electrical resistance of crucible body is 2.9 ohms or more

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10724151B2 (en) * 2014-10-31 2020-07-28 Sumitomo Electric Industries, Ltd. Device of manufacturing silicon carbide single crystal
EP4407079A3 (en) 2015-09-24 2024-10-30 Pallidus, Inc. Vapor deposition apparatus and techniques using high purity polymer derived silicon carbide
CN113652740A (zh) * 2021-08-27 2021-11-16 宁波合盛新材料有限公司 一种碳化硅单晶的制备方法及一种单晶长晶炉、单晶长晶炉的加热装置
EP4431643A1 (en) * 2023-03-15 2024-09-18 SiCrystal GmbH Sublimation system and method of growing at least one single crystal
CN116676661B (zh) * 2023-08-03 2023-10-17 北京青禾晶元半导体科技有限责任公司 一种在溶液法生长碳化硅过程中防止籽晶掉落的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005112637A (ja) * 2003-10-02 2005-04-28 Bridgestone Corp 炭化ケイ素単結晶製造装置
JP2006096578A (ja) * 2004-09-28 2006-04-13 Nippon Steel Corp 炭化珪素単結晶の製造方法及び炭化珪素単結晶インゴット
JP2006143497A (ja) * 2004-11-17 2006-06-08 Bridgestone Corp 炭化ケイ素単結晶製造装置
JP2008074662A (ja) * 2006-09-21 2008-04-03 Nippon Steel Corp 炭化珪素単結晶製造装置
JP2011219287A (ja) * 2010-04-06 2011-11-04 Nippon Steel Corp 炭化珪素単結晶インゴットの製造方法及び炭化珪素単結晶インゴット
JP2011219295A (ja) * 2010-04-07 2011-11-04 Nippon Steel Corp 炭化珪素単結晶インゴットの製造装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6863728B2 (en) * 2001-02-14 2005-03-08 The Fox Group, Inc. Apparatus for growing low defect density silicon carbide
DE102008063129B4 (de) * 2008-12-24 2013-05-16 Sicrystal Ag Herstellungsverfahren für einen codotierten SiC-Volumeneinkristall und hochohmiges SiC-Substrat

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005112637A (ja) * 2003-10-02 2005-04-28 Bridgestone Corp 炭化ケイ素単結晶製造装置
JP2006096578A (ja) * 2004-09-28 2006-04-13 Nippon Steel Corp 炭化珪素単結晶の製造方法及び炭化珪素単結晶インゴット
JP2006143497A (ja) * 2004-11-17 2006-06-08 Bridgestone Corp 炭化ケイ素単結晶製造装置
JP2008074662A (ja) * 2006-09-21 2008-04-03 Nippon Steel Corp 炭化珪素単結晶製造装置
JP2011219287A (ja) * 2010-04-06 2011-11-04 Nippon Steel Corp 炭化珪素単結晶インゴットの製造方法及び炭化珪素単結晶インゴット
JP2011219295A (ja) * 2010-04-07 2011-11-04 Nippon Steel Corp 炭化珪素単結晶インゴットの製造装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015212207A (ja) * 2014-05-02 2015-11-26 新日鐵住金株式会社 炭化珪素単結晶インゴットの製造方法
JP2016088789A (ja) * 2014-10-31 2016-05-23 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
JP2016088801A (ja) * 2014-11-04 2016-05-23 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
JP2016088812A (ja) * 2014-11-06 2016-05-23 新日鐵住金株式会社 炭化珪素単結晶インゴットの製造方法及び製造装置
JP2019073441A (ja) * 2019-02-20 2019-05-16 住友電気工業株式会社 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法
KR102187449B1 (ko) * 2019-05-28 2020-12-11 에스케이씨 주식회사 탄화규소 잉곳의 제조방법, 탄화규소 잉곳 및 이의 성장 시스템
US11359306B2 (en) 2019-10-29 2022-06-14 Senic Inc. Method for preparing a SiC ingot and device for preparing a SiC ingot wherein electrical resistance of crucible body is 2.9 ohms or more
JP2021104912A (ja) * 2019-12-26 2021-07-26 昭和電工株式会社 単結晶製造装置
JP7351219B2 (ja) 2019-12-26 2023-09-27 株式会社レゾナック 単結晶製造装置

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