JP2013115421A - インダクタ及びその製造方法 - Google Patents
インダクタ及びその製造方法 Download PDFInfo
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- JP2013115421A JP2013115421A JP2012033668A JP2012033668A JP2013115421A JP 2013115421 A JP2013115421 A JP 2013115421A JP 2012033668 A JP2012033668 A JP 2012033668A JP 2012033668 A JP2012033668 A JP 2012033668A JP 2013115421 A JP2013115421 A JP 2013115421A
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- insulating layer
- layer
- polymer
- forming
- inductor
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- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 229920000642 polymer Polymers 0.000 claims abstract description 89
- 238000000034 method Methods 0.000 claims description 45
- 238000007747 plating Methods 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000000919 ceramic Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 238000000206 photolithography Methods 0.000 claims description 7
- 239000004642 Polyimide Substances 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 229920000307 polymer substrate Polymers 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000009413 insulation Methods 0.000 abstract 2
- 239000002861 polymer material Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F17/0013—Printed inductances with stacked layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/29—Terminals; Tapping arrangements for signal inductances
- H01F27/292—Surface mounted devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Coils Or Transformers For Communication (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
Abstract
【解決芋段】本発明のインダクタ100は、積層構造体101と、この積層構造体101の外部に形成された外部電極体130とを含む。この積層構造体130は、絶縁層110と、この絶縁層110上に積層されたポリマ層120とを備える。
【選択図】図1
Description
101 積層構造体
110 絶縁層
120 ポリマ層
122 感光性ポリマ絶縁層
124 コイルパターン
126 導電性ビア
127 シード層
128 レジストパターン
130 外部電極体
Claims (13)
- 積層構造体と、
前記積層構造体の外部に形成された外部電極体とを含み、
前記積層構造体は、絶縁層と、
前記絶縁層上に積層されたポリマ層とを備えるインダクタ。 - 前記ポリマ層は、
複数の感光性ポリマ絶縁層と、前記感光性ポリマ絶縁シート上に形成されたコイルパターンとを含む請求項1に記載のインダクタ。 - 前記コイルパターンは、前記感光性ポリマ絶縁層に対してフォトリソグラフィ工程及びめっき工程を行って形成される請求項2に記載のインダクタ。
- 前記絶縁層は、セラミックまたはポリイミド材料の絶縁性ポリマ基板を含む請求項1に記載のインダクタ。
- 前記ポリマ層は、誘電率(k)が5以下の感光性ポリマ絶縁層を含む請求項1に記載のインダクタ。
- 前記ポリマ層は、
異なる平面上に置かれたコイルパターンと、前記コイルパターンを電気的に接続するように、前記ポリマ層内に設けられた導電性ビアとをさらに含む請求項1に記載のインダクタ。 - 絶縁層を準備するステップと、
前記絶縁層上にポリマ層を形成するステップと、
前記絶縁層及び前記ポリマ層を熱処理して、積層構造体を形成するステップと、
前記積層構造体に外部電極を形成するステップ
とを含むインダクタ製造方法。 - 前記感光性ポリマ絶縁層を形成するステップは、
前記絶縁層上に感光性ポリマをコーティングして感光性ポリマ絶縁層を形成するステップと、
前記感光性ポリマ層上にフォトリソグラブイ工程及びめっき工程を用いてコイルパターンを形成するステップとを含む請求項7に記載のインダクタ製造方法。 - 前記コイルパターンを形成するステップは、前記絶縁層上にシード層を形成するステップと、前記シード層上にレジストパターンを形成するステップと、前記レジストパターンによって選択的に露出する前記シード層をシードとして金属めっき膜を形成するステップとを含む請求項8に記載のインダクタ製造
方法。 - 前記めっき工程を行うステップの後に、前記レジストパターン及び前記シード層を取り除くステップを含む請求項9に記載のインダクタ製造方法。
- 前記絶縁層を準備するステップは、セラミック系列またはポリイミド系列材料の絶縁性ポリマ基板を準備するステップを含む請求項8に記載のインダクタ製造方法。
- 前記ポリマ層を形成するステップは、誘電率が5以下の感光性ポリマを前記絶縁層上にコーティングするステップを含む請求項8に記載のインダクタ製造方法。
- 前記ポリマ層を形成するステップは、前記絶縁層上に感光性ポリマ絶縁層を形成するステップと、前記感光性ポリマ絶縁層上にコイルパターンを形成するステップと、異なる平面に形成された前記コイルパターンを電気的に接続するように、前記ポリマ層に導電性ビアを形成するステップとを含む請求項8に記載のインダクタ製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110124298A KR20130058340A (ko) | 2011-11-25 | 2011-11-25 | 인덕터 및 그 제조 방법 |
KR10-2011-0124298 | 2011-11-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013115421A true JP2013115421A (ja) | 2013-06-10 |
JP5968640B2 JP5968640B2 (ja) | 2016-08-10 |
Family
ID=48466303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012033668A Expired - Fee Related JP5968640B2 (ja) | 2011-11-25 | 2012-02-20 | インダクタ及びその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US20130135074A1 (ja) |
JP (1) | JP5968640B2 (ja) |
KR (1) | KR20130058340A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015038959A (ja) * | 2013-08-19 | 2015-02-26 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | コイル部品及びその実装基板 |
JP7447212B2 (ja) | 2018-03-30 | 2024-03-11 | ローム株式会社 | チップインダクタ |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9741655B2 (en) * | 2013-01-15 | 2017-08-22 | Silergy Semiconductor Technology (Hangzhou) Ltd | Integrated circuit common-mode filters with ESD protection and manufacturing method |
KR101693749B1 (ko) | 2015-04-06 | 2017-01-06 | 삼성전기주식회사 | 인덕터 소자 및 그 제조방법 |
US20160379943A1 (en) * | 2015-06-25 | 2016-12-29 | Skyworks Solutions, Inc. | Method and apparatus for high performance passive-active circuit integration |
KR20170116499A (ko) * | 2016-04-11 | 2017-10-19 | 삼성전기주식회사 | 인덕터 제조방법 및 인덕터 |
Citations (8)
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JPH11204336A (ja) * | 1998-01-07 | 1999-07-30 | Murata Mfg Co Ltd | 高周波インダクタの製造方法 |
JP2000040633A (ja) * | 1998-07-23 | 2000-02-08 | Murata Mfg Co Ltd | 電子部品の製造方法 |
JP2000508116A (ja) * | 1995-10-31 | 2000-06-27 | ザ ウィタカー コーポレーション | 多層金属ポリマ構造を使用するrfトランス |
JP2003158015A (ja) * | 2001-11-26 | 2003-05-30 | Murata Mfg Co Ltd | インダクタ部品およびそのインダクタンス値調整方法 |
JP2006324462A (ja) * | 2005-05-19 | 2006-11-30 | Matsushita Electric Ind Co Ltd | チップ部品 |
JP2008034626A (ja) * | 2006-07-28 | 2008-02-14 | Tdk Corp | 電子部品及びその製造方法 |
JP2010062412A (ja) * | 2008-09-05 | 2010-03-18 | Panasonic Corp | 電子部品 |
JP2010287722A (ja) * | 2009-06-11 | 2010-12-24 | Murata Mfg Co Ltd | 電子部品 |
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US6194248B1 (en) * | 1997-09-02 | 2001-02-27 | Murata Manufacturing Co., Ltd. | Chip electronic part |
JP3351738B2 (ja) | 1998-05-01 | 2002-12-03 | 太陽誘電株式会社 | 積層インダクタ及びその製造方法 |
SE520714C2 (sv) * | 2001-04-20 | 2003-08-12 | Aamic Ab | Mikroreplikerade miniatyriserade elektriska komponenter |
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2011
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2012
- 2012-02-20 JP JP2012033668A patent/JP5968640B2/ja not_active Expired - Fee Related
- 2012-02-22 US US13/402,804 patent/US20130135074A1/en not_active Abandoned
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2013
- 2013-07-29 US US13/953,580 patent/US9659708B2/en active Active
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JP2015038959A (ja) * | 2013-08-19 | 2015-02-26 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | コイル部品及びその実装基板 |
JP7447212B2 (ja) | 2018-03-30 | 2024-03-11 | ローム株式会社 | チップインダクタ |
Also Published As
Publication number | Publication date |
---|---|
KR20130058340A (ko) | 2013-06-04 |
JP5968640B2 (ja) | 2016-08-10 |
US20130135074A1 (en) | 2013-05-30 |
US20130316291A1 (en) | 2013-11-28 |
US9659708B2 (en) | 2017-05-23 |
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