JP2013112532A - Scribing method of brittle material substrate - Google Patents

Scribing method of brittle material substrate Download PDF

Info

Publication number
JP2013112532A
JP2013112532A JP2011257039A JP2011257039A JP2013112532A JP 2013112532 A JP2013112532 A JP 2013112532A JP 2011257039 A JP2011257039 A JP 2011257039A JP 2011257039 A JP2011257039 A JP 2011257039A JP 2013112532 A JP2013112532 A JP 2013112532A
Authority
JP
Japan
Prior art keywords
laser
brittle material
substrate
material substrate
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011257039A
Other languages
Japanese (ja)
Other versions
JP5879106B2 (en
Inventor
Masanao Murakami
政直 村上
Seiji Shimizu
政二 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsuboshi Diamond Industrial Co Ltd
Original Assignee
Mitsuboshi Diamond Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Industrial Co Ltd filed Critical Mitsuboshi Diamond Industrial Co Ltd
Priority to JP2011257039A priority Critical patent/JP5879106B2/en
Priority to TW101138193A priority patent/TWI488703B/en
Priority to KR1020120125872A priority patent/KR101440481B1/en
Priority to CN201210482627.6A priority patent/CN103130409B/en
Publication of JP2013112532A publication Critical patent/JP2013112532A/en
Application granted granted Critical
Publication of JP5879106B2 publication Critical patent/JP5879106B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/04Cutting or splitting in curves, especially for making spectacle lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D3/00Cutting work characterised by the nature of the cut made; Apparatus therefor
    • B26D3/08Making a superficial cut in the surface of the work without removal of material, e.g. scoring, incising
    • B26D3/085On sheet material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/027Scoring tool holders; Driving mechanisms therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Laser Beam Processing (AREA)

Abstract

PROBLEM TO BE SOLVED: To disrupt easily along a curved disruption projected line, and to reduce a lug width.SOLUTION: This scribing method which is a method for forming a scribe groove along a disruption projected line of a glass substrate, includes a heating-cooling step and a scanning step. In the heating-cooling step, a laser having an absorptive and transmissible wavelength is condensed so that the focal point is positioned on the periphery of the substrate surface to thereby irradiate a glass substrate, and a cooling medium is jetted out onto a laser irradiation region simultaneously with laser irradiation. In the scanning step, a laser spot by laser irradiation and a cooling spot by jetting out of the cooling medium are scanned along the disruption projected line.

Description

本発明は、脆性材料基板のスクライブ方法、特に、脆性材料基板の分断予定ラインに沿ってスクライブ溝を形成するスクライブ方法に関する。   The present invention relates to a scribing method for a brittle material substrate, and more particularly, to a scribing method for forming a scribe groove along a planned cutting line of a brittle material substrate.

ガラス基板に、分断のためのスクライブ溝を形成する方法として、レーザ光を用いて形成する方法がある。この場合は、分断予定ラインに沿ってレーザ光を照射して基板の一部を溶解、蒸発させることにより、スクライブ溝が形成される。ただ、この方法では、溶解、蒸発された基板の一部が基板表面に付着し、品質の劣化を伴う場合がある。また、溶解、蒸発された部分で形成された疵痕は基板端面強度が低下する原因になる。   As a method of forming a scribe groove for dividing in a glass substrate, there is a method of forming using a laser beam. In this case, a scribe groove is formed by melting and evaporating a part of the substrate by irradiating a laser beam along the division line. However, in this method, a part of the dissolved and evaporated substrate may adhere to the surface of the substrate, which may be accompanied by deterioration of quality. In addition, the scar formed in the melted and evaporated part causes a reduction in the strength of the substrate end face.

そこで、他のガラス基板の分断方法として、ガラス基板表面で吸収されるCOレーザを利用した加工方法が提供されている。ここでは、ガラス基板上にレーザを照射及び走査することによって基板表面が加熱される。そして、この加熱領域を、冷却ノズルから噴射される冷却媒体によって冷却することによって、亀裂を進展させる。これにより、分断予定ラインに沿ってスクライブ溝が形成されて、ガラス基板が分断される。 Therefore, as the cutting method other glass substrate processing method using a CO 2 laser which is absorbed by the glass substrate surface is provided. Here, the substrate surface is heated by irradiating and scanning a laser on the glass substrate. And a crack is advanced by cooling this heating area | region with the cooling medium injected from a cooling nozzle. Thereby, a scribe groove | channel is formed along the parting plan line and a glass substrate is parted.

しかし、このような方法では、レーザビームの形状が楕円形になるために、曲線状の分断予定ラインに沿ってスクライブ溝を形成したり、分断したりすることが困難である。また、ビームの長さや幅によって最適な加工条件が存在するために、これらの加工条件を見出す必要がある。さらに、少なくとも数mm/s程度の実用的な加工速度の条件では、通常、数mmの幅のビームが必要になるために、基板から分断ラインまでの距離(以下、「耳幅」と呼ぶ)に制限がある。すなわち、耳幅が極端に小さくビームの幅以下になると、このような分断予定ラインに沿って分断することが不可能になる。   However, in such a method, since the shape of the laser beam becomes an ellipse, it is difficult to form or divide a scribe groove along a curved line to be cut. In addition, since there are optimum machining conditions depending on the length and width of the beam, it is necessary to find these machining conditions. Furthermore, since a beam with a width of several millimeters is usually required under conditions of a practical processing speed of at least several millimeters / s, the distance from the substrate to the cutting line (hereinafter referred to as “ear width”) There are limitations. In other words, when the ear width is extremely small and becomes less than the beam width, it becomes impossible to divide along such a division line.

なお、特許文献1には、曲線状の分断予定ラインに沿ってガラス基板等を分断する際に、所定の長さを有する直線状のビームスポットの両端の強度を著しく増大させ、この両端が分断予定ライン上に位置するように移動させて、加工を行うことが示されている。   In Patent Document 1, when a glass substrate or the like is divided along a curved dividing line, the strength of both ends of a linear beam spot having a predetermined length is remarkably increased, and both ends are divided. It is shown that the machining is performed by moving it so as to be positioned on the planned line.

特表2003−516236号公報Special table 2003-516236 gazette

特許文献1に示された加工方法では、直線状のビームスポットの両端を分断予定ライン上に沿って走査する必要がある。このような走査を行うためには、非常に複雑な制御を実行する必要がある。また、分断可能な曲線形状も限定され、例えば曲率の小さな曲線に沿って分断することはできない。しかも、ビーム幅を小さくすることができないので、加工可能な耳幅に制限が生じるという問題を解決することはできない。   In the processing method disclosed in Patent Document 1, it is necessary to scan both ends of a linear beam spot along a planned dividing line. In order to perform such scanning, it is necessary to execute very complicated control. Moreover, the curve shape which can be divided | segmented is also limited, For example, it cannot cut along the curve with a small curvature. In addition, since the beam width cannot be reduced, the problem that the ear width that can be processed is limited cannot be solved.

本発明の課題は、曲線状の分断予定ラインに沿って容易に分断を行うことができ、しかも耳幅を小さくすることができるスクライブ方法を提供することにある。   It is an object of the present invention to provide a scribing method that can be easily divided along a curved dividing line and that can reduce the width of the ear.

第1発明に係る脆性材料基板のスクライブ方法は、脆性材料基板の分断予定ラインに沿ってスクライブ溝を形成する方法であって、以下の工程を含んでいる。   The brittle material substrate scribing method according to the first aspect of the present invention is a method of forming a scribe groove along a planned cutting line of the brittle material substrate, and includes the following steps.

加熱・冷却工程:脆性材料基板に対して吸収性及び透過性を有する波長のレーザを基板の表面から裏面の範囲内に焦点が位置するように集光して照射するとともに、レーザ照射領域にレーザ照射と同時に冷却媒体を噴射する。   Heating / cooling process: Condensing and irradiating a laser having a wavelength that absorbs and transmits with respect to the brittle material substrate so that the focal point is located within the range from the front surface to the back surface of the substrate, and the laser irradiation region A cooling medium is injected simultaneously with irradiation.

走査工程:レーザ照射によるビームスポット及び冷却媒体の噴射による冷却スポットを分断予定ラインに沿って走査する。   Scanning step: A beam spot by laser irradiation and a cooling spot by jetting of a cooling medium are scanned along a line to be divided.

ここでは、基板に対してある程度の透過性及び吸収性を有するレーザが基板に照射される。このレーザ照射によって、基板は、表面だけではなく内部まで加熱される。また、この加熱と同時に、加熱された部分が冷却媒体によって冷却される。このため、基板内部には温度勾配が生じる。この温度勾配に起因して、基板表面には引張応力が生じ、基板内部には圧縮応力が生じる。これにより、基板に亀裂が生じる。そして、以上のビームスポット及び冷却スポットを分断予定ラインに沿って走査することにより、分断予定ラインに沿って亀裂が進展し、スクライブ溝が形成される。   Here, the substrate is irradiated with a laser having a certain degree of transparency and absorption with respect to the substrate. By this laser irradiation, the substrate is heated not only to the surface but also to the inside. Simultaneously with this heating, the heated portion is cooled by the cooling medium. For this reason, a temperature gradient is generated inside the substrate. Due to this temperature gradient, tensile stress is generated on the substrate surface, and compressive stress is generated inside the substrate. This causes a crack in the substrate. Then, by scanning the beam spot and the cooling spot as described above along the planned dividing line, the crack progresses along the planned dividing line and a scribe groove is formed.

この方法では、レーザの焦点が基板表面から裏面の間、すなわち表面近傍に位置するように集光され、かつ冷却スポットがレーザ照射位置にレーザ照射と同時に形成されるので、曲線状の分断予定ラインに沿って容易に基板をスクライブすることができる。また、レーザ照射による加熱から冷却媒体による冷却までの時間差がほとんどないために、周囲への温度の広がりが小さくなる。このため、耳幅が小さい場合であっても、基板の端側と逆側との間の温度の非対称性が生じにくい。この結果、従来の加工方法に比較して、耳幅が小さい加工が可能になる。   In this method, the focal point of the laser is focused between the front surface and the back surface of the substrate, that is, in the vicinity of the front surface, and the cooling spot is formed at the laser irradiation position simultaneously with the laser irradiation. The substrate can be easily scribed along the line. In addition, since there is almost no time difference from heating by laser irradiation to cooling by the cooling medium, the temperature spread to the surroundings becomes small. For this reason, even when the ear width is small, temperature asymmetry between the end side and the opposite side of the substrate hardly occurs. As a result, processing with a small ear width is possible as compared with the conventional processing method.

第2発明に係る脆性材料基板のスクライブ方法は、第1発明の方法において、加熱・冷却工程の前工程として、脆性材料基板の表面の分断予定ラインの走査開始端に初期亀裂を形成する初期亀裂形成工程をさらに含む。   The brittle material substrate scribing method according to the second invention is the method of the first invention, wherein an initial crack is formed as a pre-process of the heating / cooling step at the scanning start end of the line to be cut on the surface of the brittle material substrate. It further includes a forming step.

ここでは、分断予定ラインの走査開始端に初期亀裂が形成される。その後、加熱・冷却工程及び走査工程が実行される。この場合は、初期亀裂から分断予定ラインに沿って亀裂が進展し、スクライブ溝が形成される。   Here, an initial crack is formed at the scanning start end of the line to be divided. Thereafter, a heating / cooling step and a scanning step are performed. In this case, the crack progresses along the planned split line from the initial crack, and a scribe groove is formed.

第3発明に係る脆性材料基板のスクライブ方法は、第1又は第2発明の方法において、加熱・冷却工程におけるレーザの波長は、2.7μm以上4.0μm以下である。   The brittle material substrate scribing method according to the third invention is the method of the first or second invention, wherein the laser wavelength in the heating / cooling step is 2.7 μm or more and 4.0 μm or less.

このようなレーザを用いて、例えばガラス基板を照射することにより、ガラス基板の表面だけではなく内部まで加熱することができる。   By using such a laser to irradiate, for example, a glass substrate, not only the surface of the glass substrate but also the inside can be heated.

第4発明に係る脆性材料基板のスクライブ方法は、第1から第3発明のいずれかの方法において、脆性材料基板はガラス基板である。   The brittle material substrate scribing method according to a fourth aspect of the present invention is the method according to any one of the first to third aspects, wherein the brittle material substrate is a glass substrate.

第5発明に係る脆性材料基板のスクライブ方法は、第1から第4発明のいずれかの方法において、冷却媒体は、噴射痕の中心にレーザ照射による噴射加工痕が位置するように基板表面に噴射される。   The brittle material substrate scribing method according to a fifth aspect of the present invention is the method according to any one of the first to fourth aspects of the present invention, wherein the cooling medium is sprayed onto the substrate surface so that a jet processing trace by laser irradiation is located at the center of the jet trace. Is done.

第6発明に係る脆性材料基板のスクライブ方法は、第1から第5発明のいずれかの方法において、加熱・冷却工程の前工程として、脆性材料基板の裏面にレーザを反射する反射板を設置する準備工程をさらに含む。   The brittle material substrate scribing method according to a sixth aspect of the present invention is the method according to any one of the first to fifth aspects, wherein a reflector for reflecting the laser is installed on the back surface of the brittle material substrate as a pre-process of the heating / cooling step. It further includes a preparation step.

前述のように、基板の厚みが薄い場合は、レーザを照射しても基板はレーザを十分に吸収することができず、加熱が不足になる。そこで、この第5発明では、基板のレーザ照射側の面と逆側の面に、レーザを反射する反射板を設置する。この工程を実行することにより、薄い基板であってもレーザを十分に吸収することができ、基板内部を十分に加熱することができる。   As described above, when the thickness of the substrate is thin, the substrate cannot sufficiently absorb the laser even when the laser is irradiated, and heating is insufficient. Therefore, in the fifth aspect of the invention, a reflecting plate that reflects the laser is installed on the surface of the substrate opposite to the surface on the laser irradiation side. By performing this step, the laser can be sufficiently absorbed even in a thin substrate, and the inside of the substrate can be sufficiently heated.

以上のように、本発明では、曲線状の分断予定ラインに沿って容易に分断を行うことができ、しかも耳幅を小さくすることができる。   As described above, according to the present invention, the cutting can be easily performed along the curved dividing line, and the ear width can be reduced.

本発明の一実施形態によるスクライブ方法を実施するための装置の概略構成図。The schematic block diagram of the apparatus for enforcing the scribe method by one Embodiment of this invention. レーザ波長に対するソーダガラスの透過率を示す図。The figure which shows the transmittance | permeability of soda glass with respect to a laser wavelength. 板厚ごとのレーザの基板透過率及び吸収率を示す図。The figure which shows the board | substrate transmittance | permeability and absorption factor of the laser for every plate | board thickness. レーザ照射領域(照射痕)と冷却スポット(噴射痕)とを示す写真。The photograph which shows a laser irradiation area | region (irradiation trace) and a cooling spot (jetting trace). レーザの焦点位置(基板表面、内部、裏面)とスクライブマージンとの関係を説明するための図。The figure for demonstrating the relationship between the focus position (a substrate surface, the inside, a back surface) of a laser, and a scribe margin. レーザの焦点位置(基板上方)とスクライブマージンとの関係を説明するための図。The figure for demonstrating the relationship between the focus position (above a board | substrate) of a laser, and a scribe margin. 本発明の一実施形態による加工方法で直線状の分断予定ラインに沿って加工した場合の分断予定ラインからのズレ量を示す図。The figure which shows the deviation | shift amount from the parting plan line at the time of processing along the straight parting plan line by the processing method by one Embodiment of this invention. 本発明の一実施形態による加工方法で曲線状の分断予定ラインに沿って加工した場合の分断予定ラインからのズレ量を示す図。The figure which shows the deviation | shift amount from the parting plan line at the time of processing along the curvilinear parting plan line by the processing method by one Embodiment of this invention.

[装置構成]
図1は、本発明の一実施形態による方法を実施するためのスクライブ装置の概略構成を示す図である。スクライブ装置1は、例えば、1枚のマザー基板を複数のガラス基板に分断するための装置である。ここでのガラス基板は、例えばソーダガラス基板である。
[Device configuration]
FIG. 1 is a diagram showing a schematic configuration of a scribing apparatus for carrying out a method according to an embodiment of the present invention. The scribing apparatus 1 is an apparatus for dividing a single mother substrate into a plurality of glass substrates, for example. The glass substrate here is, for example, a soda glass substrate.

スクライブ装置1は、加工対象としてのガラス基板Gが載置されるテーブル2と、レーザ発振器3と、レーザ発振器3からのレーザをテーブル2側に導く反射ミラー4と、集光レンズ5と、冷却ノズル6と、を備えている。   The scribing apparatus 1 includes a table 2 on which a glass substrate G to be processed is placed, a laser oscillator 3, a reflection mirror 4 that guides the laser from the laser oscillator 3 to the table 2, a condenser lens 5, and a cooling device. Nozzle 6.

ここで、レーザ発振器3は、ガラス基板Gに対して吸収性及び透過性を有する波長のレーザを出力する。集光レンズ5は、焦点がガラス基板Gの表面から裏面の間に位置するようにレーザを集光する。冷却ノズル6は、図示しない冷媒源から供給される冷媒をガラス基板Gの表面に噴射して冷却スポットを形成する。なお、図示していないが、ガラス基板Gが載置されたテーブル2を水平面内で移動するテーブル移動機構と、集光レンズ5を上下に移動させるレンズ移動機構と、が設けられている。テーブル移動機構によって、レーザの照射領域(ビームスポット)と、冷却スポットとが、分断予定ラインに沿って走査される。   Here, the laser oscillator 3 outputs a laser having a wavelength having absorptivity and transparency to the glass substrate G. The condensing lens 5 condenses the laser so that the focal point is located between the front surface and the back surface of the glass substrate G. The cooling nozzle 6 injects a coolant supplied from a coolant source (not shown) onto the surface of the glass substrate G to form a cooling spot. Although not shown, a table moving mechanism that moves the table 2 on which the glass substrate G is placed in a horizontal plane and a lens moving mechanism that moves the condenser lens 5 up and down are provided. The table moving mechanism scans the laser irradiation area (beam spot) and the cooling spot along the planned dividing line.

なお、ここでは図示していないが、ガラス基板Gの走査開始側の端部に、スクライブの起点となる初期亀裂を形成するための初期亀裂形成手段が設けられている。初期亀裂形成手段としては、圧子やカッターホイール等の機械的ツールが用いられるが、レーザアブレーション加工によって初期亀裂を形成することも可能である。   Although not shown here, an initial crack forming means for forming an initial crack serving as a starting point of scribing is provided at the end of the glass substrate G on the scanning start side. As the initial crack forming means, a mechanical tool such as an indenter or a cutter wheel is used, but it is also possible to form an initial crack by laser ablation processing.

[スクライブ方法]
まず、カッターホイール等の初期亀裂形成手段を用いて、ガラス基板Gの分断予定ラインの走査開始側の端部にスクライブの起点となる初期亀裂が形成される。
[Scribe method]
First, using an initial crack forming means such as a cutter wheel, an initial crack serving as a starting point for scribing is formed at the end portion on the scanning start side of the division line of the glass substrate G.

次に、ガラス基板Gに対して、レーザが照射される。レーザは、集光レンズ5によって、焦点がガラス基板Gの表面、あるいは表面から裏面の間に位置するように集光される。また、レーザの照射と同時に、かつレーザが照射された領域に、冷却ノズル6から冷却媒体が噴射される。   Next, the glass substrate G is irradiated with a laser. The laser is condensed by the condensing lens 5 so that the focal point is located on the front surface of the glass substrate G or between the front surface and the back surface. In addition, the cooling medium is jetted from the cooling nozzle 6 simultaneously with the laser irradiation and onto the region irradiated with the laser.

ここで、レーザとして、ガラス基板Gに対して吸収性及び透過性を有する波長のレーザが用いられるので、レーザ照射によって、ガラス基板Gの表面及び内部が加熱される。一方で、レーザ照射領域に冷却媒体が噴射されて冷却される。このため、基板内部には温度勾配が生じ、ガラス基板Gの表面には引張応力が生じ、内部には圧縮応力が生じる。これにより、基板に亀裂が生じる。   Here, since a laser having a wavelength that absorbs and transmits the glass substrate G is used as the laser, the surface and the inside of the glass substrate G are heated by the laser irradiation. On the other hand, a cooling medium is injected into the laser irradiation region to be cooled. For this reason, a temperature gradient is generated inside the substrate, a tensile stress is generated on the surface of the glass substrate G, and a compressive stress is generated inside. This causes a crack in the substrate.

以上のレーザスポット及び冷却スポットを分断予定ラインに沿って走査することにより、分断予定ラインに沿って亀裂が進展し、スクライブ溝が形成される。   By scanning the above laser spot and cooling spot along the planned dividing line, the crack progresses along the planned dividing line and a scribe groove is formed.

<レーザ>
図2Aに、種々の厚みを有するソーダガラスに対するレーザ(Erファイバレーザ)の波長と透過率との関係を示している。また、図2Bに、板厚ごとの透過率と吸収率とを示している。なお、吸収率は計算値である。
<Laser>
FIG. 2A shows the relationship between the wavelength and transmittance of a laser (Er fiber laser) for soda glass having various thicknesses. Moreover, the transmittance | permeability and absorption factor for every board thickness are shown in FIG. 2B. The absorption rate is a calculated value.

これらの図から明らかなように、波長が2.8μm〜4.0μmの範囲では、厚みが1.3mm(実線)及び1.8mm(破線)のガラス基板では、透過率がそれぞれ55%、46%、吸収率がそれぞれ45%、54%であり、ある程度の吸収性及び透過性を有している。これらの厚みの基板では、照射されたレーザは基板内部に吸収され、スクライブが可能であった。   As is clear from these figures, in the wavelength range of 2.8 μm to 4.0 μm, the transmittance is 55% and 46% for glass substrates having thicknesses of 1.3 mm (solid line) and 1.8 mm (broken line), respectively. % And the absorption rate are 45% and 54%, respectively, and have some absorbency and permeability. With these thickness substrates, the irradiated laser was absorbed inside the substrate and could be scribed.

なお、板厚が薄いなどの理由により吸収率が低い場合であっても、吸収率が10%以上以上あれば、より高出力のレーザを用いる、またはレーザが照射される面と逆側の面にレーザを反射する反射板を設けることにより、レーザを基板内部で十分に吸収させることができる。また、冷却を、レーザ照射面と逆側の面から行うことによって、基板内部に亀裂進展に十分な温度勾配を付けることができる。   Even if the absorptance is low due to a thin plate thickness or the like, if the absorptance is 10% or more, a higher output laser is used, or the surface opposite to the surface irradiated with the laser By providing a reflecting plate for reflecting the laser, the laser can be sufficiently absorbed inside the substrate. In addition, by performing cooling from the surface opposite to the laser irradiation surface, a temperature gradient sufficient for crack propagation can be provided inside the substrate.

なお、以下の実験では、すべて波長が2.8μmのErファイバレーザを用いている。   In the following experiments, an Er fiber laser having a wavelength of 2.8 μm is used.

<ビームスポットと冷却スポット>
図3に加工部分の詳細を拡大して示した写真を示している。図3において、中心部の円Lで示した部分がレーザの照射痕であり、円Cで示した部分が冷却媒体の噴射痕である。この図3から明らかなように、冷却スポットの中心にビームスポットが位置するように、レーザ照射及び冷却媒体の噴射が同時に実行される。
<Beam spot and cooling spot>
FIG. 3 shows an enlarged photograph showing details of the processed portion. In FIG. 3, the portion indicated by the circle L at the center is the laser irradiation trace, and the portion indicated by the circle C is the jet trace of the cooling medium. As apparent from FIG. 3, the laser irradiation and the cooling medium injection are simultaneously performed so that the beam spot is positioned at the center of the cooling spot.

<焦点位置の影響>
図4に、レーザの焦点位置を、基板表面(a)、基板中央(b)、基板裏面(c)とし、レーザ出力及び走査速度を種々変えて、スクライブが可能か否か、すなわち焦点位置によってスクライブマージンがどのように変わるかを実験した結果を示す。なお、この実験で用いたガラス基板は厚みが1.3mmのソーダガラスである。
<Influence of focus position>
In FIG. 4, the focal position of the laser is the substrate surface (a), the substrate center (b), and the substrate back surface (c), and various laser outputs and scanning speeds are used to determine whether scribing is possible, that is, depending on the focal position. The result of having experimented how a scribe margin changes is shown. The glass substrate used in this experiment is soda glass having a thickness of 1.3 mm.

図4において、「○」はスクライブ可能(初期亀裂から分断予定ラインに沿って亀裂が進展した)、「×」はスクライブ不可能(分断予定ラインに沿った亀裂が初期亀裂から進展しない)、「止」は加工停止(分断予定ラインに沿った亀裂が初期亀裂から進展するものの加工途中で亀裂の進展が停止した)、「先」は先走り(分断予定ラインに沿わない亀裂が進展した)であることを示している。   In FIG. 4, “◯” indicates that scribing is possible (a crack has progressed along the line to be divided from the initial crack), “×” indicates that scribing is not possible (a crack along the line to be divided does not progress from the initial crack), “ "Stop" is processing stop (crack along the planned split line progresses from the initial crack, but the crack progress stops during processing), and "first" is the first run (crack not along the planned split line has progressed) It is shown that.

図4から、焦点位置を基板表面と裏面との間で変えても、スクライブマージンはほぼ同じであることがわかる。   FIG. 4 shows that the scribe margin is almost the same even when the focal position is changed between the front surface and the back surface of the substrate.

一方、図5は、図4と同様のガラス基板に対して、焦点位置をガラス基板の上面から10mmだけ上方に離して加工を行った実験結果である。この場合は、ガラス基板の表面におけるビーム径は660μmである。したがって、基板表面におけるビームパワー密度が低く、基板温度が十分に高くならない。このため、走査速度を遅くし、かつレーザ出力を高くしないとスクライブができない。   On the other hand, FIG. 5 shows experimental results obtained by processing a glass substrate similar to that shown in FIG. 4 with the focal position separated upward by 10 mm from the upper surface of the glass substrate. In this case, the beam diameter on the surface of the glass substrate is 660 μm. Therefore, the beam power density on the substrate surface is low, and the substrate temperature is not sufficiently high. For this reason, scribing cannot be performed unless the scanning speed is reduced and the laser output is increased.

以上の実験結果から、レーザの焦点位置をガラス基板の表面から裏面の間に設定して加工を行うことが望ましいことがわかる。   From the above experimental results, it can be seen that it is desirable to perform processing with the focal position of the laser set between the front surface and the back surface of the glass substrate.

<分断予定ラインからのズレ>
図6は、本実施形態の加工方法を実施した場合に、分断予定ラインから亀裂がどの程度ずれて形成されたかを示す実験例である。横軸は分断ラインに沿った位置(0mmは初期亀裂側の基板端を示している)を示し、縦軸は分断予定ラインからのズレ量を示している。なお、実験に用いたガラス基板は、厚みが1.3mmのソーダガラスで長さは55mmである。また、レーザ出力は7.5W、走査速度は20mm/sである。
<Deviation from the planned dividing line>
FIG. 6 is an experimental example showing how much the crack is formed from the planned dividing line when the processing method of the present embodiment is performed. The horizontal axis indicates the position along the dividing line (0 mm indicates the substrate end on the initial crack side), and the vertical axis indicates the amount of deviation from the planned dividing line. The glass substrate used in the experiment is soda glass with a thickness of 1.3 mm and a length of 55 mm. The laser output is 7.5 W and the scanning speed is 20 mm / s.

図6に示されるように、分断予定ラインからのズレ量は、+7μmから−10μmであり、本実施形態の加工方法によっても大きなズレがないことがわかる。   As shown in FIG. 6, the amount of deviation from the parting planned line is +7 μm to −10 μm, and it can be seen that there is no significant deviation even by the processing method of this embodiment.

なお、図7に示すような曲線状の分断予定ラインSLに沿って本実施形態の加工方法を実施した場合は、形成されたスクライブ溝は最大20μmのズレ量が発生した。ただし、分断予定ラインSLの一方側にずれる傾向があるので、このズレを見込んで加工を行うことが可能である。   In addition, when the processing method of this embodiment was implemented along the curvilinear division | segmentation scheduled line SL as shown in FIG. 7, the amount of deviation | shift of a maximum of 20 micrometers generate | occur | produced in the formed scribe groove | channel. However, since there is a tendency to shift to one side of the planned dividing line SL, it is possible to perform processing in consideration of this deviation.

[特徴]
(1)レーザの焦点が基板表面近傍に設定され、かつ冷却スポットがレーザ照射位置にレーザ照射と同時に形成されるので、曲線状の分断予定ラインに沿って容易に基板をスクライブすることができる。
[Feature]
(1) Since the focal point of the laser is set in the vicinity of the substrate surface and the cooling spot is formed at the laser irradiation position simultaneously with the laser irradiation, the substrate can be easily scribed along a curved cutting line.

(2)基板の同じ領域に加熱と冷却とが同時に実行されるので、周囲への温度の広がりが小さくなる。このため、耳幅が小さい場合であっても、基板の端側と逆側との間の温度の非対称性が生じにくい。この結果、従来の加工方法に比較して、耳幅が小さい加工が可能になる。   (2) Since heating and cooling are simultaneously performed on the same region of the substrate, the temperature spread to the surroundings is reduced. For this reason, even when the ear width is small, temperature asymmetry between the end side and the opposite side of the substrate hardly occurs. As a result, processing with a small ear width is possible as compared with the conventional processing method.

(3)ガラス基板に対して波長が2.8μm以上4.0μm以下のレーザを用いることによって、基板表面から内部にわたって効果的に加熱することができる。したがって、亀裂がスムーズに進展し、分断予定ラインからのズレが抑えられる。   (3) By using a laser having a wavelength of 2.8 μm or more and 4.0 μm or less with respect to the glass substrate, it can be effectively heated from the substrate surface to the inside. Therefore, a crack progresses smoothly and deviation from a parting schedule line is suppressed.

(4)板厚が1.0mm以上2.0mm以下のガラス基板では、波長が2.8μm以上4.0μm以下のレーザを用いることによって、基板の内部まで十分に加熱することができ、良好なスクライブ溝を形成することができる。   (4) In a glass substrate having a plate thickness of 1.0 mm or more and 2.0 mm or less, by using a laser having a wavelength of 2.8 μm or more and 4.0 μm or less, it is possible to sufficiently heat the inside of the substrate. A scribe groove can be formed.

[他の実施形態]
本発明は以上のような実施形態に限定されるものではなく、本発明の範囲を逸脱することなく種々の変形又は修正が可能である。
[Other Embodiments]
The present invention is not limited to the above-described embodiments, and various changes or modifications can be made without departing from the scope of the present invention.

例えば、前記実施形態では、脆性材料基板としてソーダガラスを用いて実験例を示したが、脆性材料基板としてはソーダガラスに限定されない。   For example, in the said embodiment, although the experiment example was shown using soda glass as a brittle material substrate, as a brittle material substrate, it is not limited to soda glass.

2 テーブル
3 レーザ発振器
5 集光レンズ
6 冷却ノズル
2 Table 3 Laser oscillator 5 Condensing lens 6 Cooling nozzle

Claims (6)

脆性材料基板の分断予定ラインに沿ってスクライブ溝を形成する脆性材料基板のスクライブ方法であって、
前記脆性材料基板に対して吸収性及び透過性を有する波長のレーザを前記基板の表面から裏面の範囲内に焦点が位置するように集光して照射するとともに、レーザ照射領域にレーザ照射と同時に冷却媒体を噴射する加熱・冷却工程と、
前記レーザ照射によるビームスポット及び冷却媒体の噴射による冷却スポットを前記分断予定ラインに沿って走査する走査工程と、
を含む脆性材料基板のスクライブ方法。
A brittle material substrate scribing method for forming a scribe groove along a planned cutting line of a brittle material substrate,
A laser having a wavelength that absorbs and transmits light with respect to the brittle material substrate is focused and irradiated so that the focal point is located within the range from the front surface to the back surface of the substrate, and the laser irradiation region is simultaneously irradiated with the laser. A heating / cooling process for injecting a cooling medium;
A scanning step of scanning the beam spot by the laser irradiation and the cooling spot by the jetting of the cooling medium along the planned dividing line;
A method for scribing a brittle material substrate comprising:
前記加熱・冷却工程の前工程として、前記脆性材料基板の表面の分断予定ラインの走査開始端に初期亀裂を形成する初期亀裂形成工程をさらに含む、請求項1に記載の脆性材料基板のスクライブ方法。   The scribe method for a brittle material substrate according to claim 1, further comprising an initial crack forming step of forming an initial crack at a scanning start end of a line to be divided on the surface of the brittle material substrate as a pre-step of the heating / cooling step. . 前記加熱・冷却工程におけるレーザの波長は、2.7μm以上4.0μm以下である、請求項1又は2に記載の脆性材料基板のスクライブ方法。   The brittle material substrate scribing method according to claim 1 or 2, wherein a wavelength of the laser in the heating / cooling step is 2.7 µm or more and 4.0 µm or less. 前記脆性材料基板の板厚はガラス基板である、請求項1から3のいずれかに記載の脆性材料基板のスクライブ方法。   The brittle material substrate scribing method according to any one of claims 1 to 3, wherein a thickness of the brittle material substrate is a glass substrate. 前記冷却媒体は、噴射痕の中心に前記レーザ照射による噴射加工痕が位置するように前記基板表面に噴射される、請求項1から4のいずれかに記載の脆性材料基板のスクライブ方法。   The brittle material substrate scribing method according to claim 1, wherein the cooling medium is sprayed onto the substrate surface such that a jet processing trace by the laser irradiation is located at the center of the jet trace. 前記加熱・冷却工程の前工程として、前記脆性材料基板のレーザ照射側の面と逆側の面にレーザを反射する反射板を設置する準備工程をさらに含む、請求項1から5のいずれかに記載の脆性材料基板のスクライブ方法。
The preparatory step of the heating / cooling step further includes a preparatory step of installing a reflector that reflects the laser on the surface opposite to the laser irradiation side of the brittle material substrate. The brittle material substrate scribing method described.
JP2011257039A 2011-11-25 2011-11-25 Method for scribing a brittle material substrate Expired - Fee Related JP5879106B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011257039A JP5879106B2 (en) 2011-11-25 2011-11-25 Method for scribing a brittle material substrate
TW101138193A TWI488703B (en) 2011-11-25 2012-10-17 Scribing method and scribing apparatus for substrate of brittle material
KR1020120125872A KR101440481B1 (en) 2011-11-25 2012-11-08 Method for scribing brittle material substrate and device for scribing brittle material substrate
CN201210482627.6A CN103130409B (en) 2011-11-25 2012-11-23 The scribble method of brittle substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011257039A JP5879106B2 (en) 2011-11-25 2011-11-25 Method for scribing a brittle material substrate

Publications (2)

Publication Number Publication Date
JP2013112532A true JP2013112532A (en) 2013-06-10
JP5879106B2 JP5879106B2 (en) 2016-03-08

Family

ID=48490924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011257039A Expired - Fee Related JP5879106B2 (en) 2011-11-25 2011-11-25 Method for scribing a brittle material substrate

Country Status (4)

Country Link
JP (1) JP5879106B2 (en)
KR (1) KR101440481B1 (en)
CN (1) CN103130409B (en)
TW (1) TWI488703B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015048255A (en) * 2013-08-30 2015-03-16 三星ダイヤモンド工業株式会社 Glass substrate fusion method by laser beam and laser processing device
JP2015048254A (en) * 2013-08-30 2015-03-16 三星ダイヤモンド工業株式会社 Glass substrate fusion method by laser beam and laser processing device
CN107199410A (en) * 2017-07-25 2017-09-26 东莞市盛雄激光设备有限公司 A kind of laser cutting device and its cutting method
KR102216294B1 (en) 2020-07-22 2021-02-18 주식회사 아이티아이 Method and equipment of cutting ceramic
KR102216298B1 (en) 2020-04-28 2021-02-18 주식회사 아이티아이 Method and equipment of cutting ceramic
KR102241518B1 (en) 2020-11-17 2021-04-19 주식회사 아이티아이 Method and equipement of cutting ceramic
WO2021221378A1 (en) 2020-04-28 2021-11-04 주식회사 아이티아이 Ceramic cutting method and equipment

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105436712B (en) * 2015-12-07 2017-12-12 武汉铱科赛科技有限公司 The fragility splinter method and system of a kind of brittle semiconductor materials
JP6775822B2 (en) * 2016-09-28 2020-10-28 三星ダイヤモンド工業株式会社 Brittle material substrate fragmentation method and fragmentation device
WO2019065533A1 (en) * 2017-09-27 2019-04-04 三星ダイヤモンド工業株式会社 Cutting device for glass substrate, cutting method, program, and storage medium

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004098120A (en) * 2002-09-09 2004-04-02 Sumitomo Heavy Ind Ltd Method and device of laser beam machining
JP2005314127A (en) * 2004-04-27 2005-11-10 Japan Steel Works Ltd:The Method and apparatus for cutting glass plate
JP2007261915A (en) * 2006-03-29 2007-10-11 Joyo Kogaku Kk Method and apparatus for cutting glass by laser
JP2008272832A (en) * 2007-04-03 2008-11-13 Bbele.Com Kk Method and apparatus for cutting brittle material by laser
JP2009262408A (en) * 2008-04-24 2009-11-12 Lemi Ltd Method for scribing brittle material substrate and device therefor
JP2010527319A (en) * 2007-05-15 2010-08-12 コーニング インコーポレイテッド Method and apparatus for scoring and separating brittle materials with a single radiation beam
WO2011026074A1 (en) * 2009-08-31 2011-03-03 Corning Incorporated Methods for laser scribing and breaking thin glass
JP2011057494A (en) * 2009-09-09 2011-03-24 Lemi Ltd Cleavage method and device for brittle material
JP2011088799A (en) * 2009-10-26 2011-05-06 Mitsubishi Electric Corp Method of manufacturing semiconductor device and laser machining device
JP2011092961A (en) * 2009-10-28 2011-05-12 Tottori Institute Of Industrial Technology Attachment
WO2011066337A2 (en) * 2009-11-30 2011-06-03 Corning Incorporated Methods for laser scribing and separating glass substrates
JP2011517624A (en) * 2008-03-31 2011-06-16 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド Laser machining of sintered ceramics and other hard and / or thick materials

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3938312B2 (en) 2001-06-14 2007-06-27 住友電工ハードメタル株式会社 Hard material processing method
JP2003088973A (en) * 2001-09-12 2003-03-25 Hamamatsu Photonics Kk Laser beam machining method
JP4408607B2 (en) * 2002-06-11 2010-02-03 三星ダイヤモンド工業株式会社 Scribing method and scribing apparatus
JP2005138143A (en) * 2003-11-06 2005-06-02 Disco Abrasive Syst Ltd Machining apparatus using laser beam
TW200738388A (en) * 2006-04-12 2007-10-16 Chung Shan Inst Of Science Device for cutting glass piece and method for the same
CN102046345A (en) * 2008-04-15 2011-05-04 三星钻石工业股份有限公司 Method for processing fragile material substrate
US8327666B2 (en) * 2009-02-19 2012-12-11 Corning Incorporated Method of separating strengthened glass
US20110127242A1 (en) * 2009-11-30 2011-06-02 Xinghua Li Methods for laser scribing and separating glass substrates

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004098120A (en) * 2002-09-09 2004-04-02 Sumitomo Heavy Ind Ltd Method and device of laser beam machining
JP2005314127A (en) * 2004-04-27 2005-11-10 Japan Steel Works Ltd:The Method and apparatus for cutting glass plate
JP2007261915A (en) * 2006-03-29 2007-10-11 Joyo Kogaku Kk Method and apparatus for cutting glass by laser
JP2008272832A (en) * 2007-04-03 2008-11-13 Bbele.Com Kk Method and apparatus for cutting brittle material by laser
JP2010527319A (en) * 2007-05-15 2010-08-12 コーニング インコーポレイテッド Method and apparatus for scoring and separating brittle materials with a single radiation beam
JP2011517624A (en) * 2008-03-31 2011-06-16 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド Laser machining of sintered ceramics and other hard and / or thick materials
JP2009262408A (en) * 2008-04-24 2009-11-12 Lemi Ltd Method for scribing brittle material substrate and device therefor
WO2011026074A1 (en) * 2009-08-31 2011-03-03 Corning Incorporated Methods for laser scribing and breaking thin glass
JP2011057494A (en) * 2009-09-09 2011-03-24 Lemi Ltd Cleavage method and device for brittle material
JP2011088799A (en) * 2009-10-26 2011-05-06 Mitsubishi Electric Corp Method of manufacturing semiconductor device and laser machining device
JP2011092961A (en) * 2009-10-28 2011-05-12 Tottori Institute Of Industrial Technology Attachment
WO2011066337A2 (en) * 2009-11-30 2011-06-03 Corning Incorporated Methods for laser scribing and separating glass substrates

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015048255A (en) * 2013-08-30 2015-03-16 三星ダイヤモンド工業株式会社 Glass substrate fusion method by laser beam and laser processing device
JP2015048254A (en) * 2013-08-30 2015-03-16 三星ダイヤモンド工業株式会社 Glass substrate fusion method by laser beam and laser processing device
CN107199410A (en) * 2017-07-25 2017-09-26 东莞市盛雄激光设备有限公司 A kind of laser cutting device and its cutting method
KR102216298B1 (en) 2020-04-28 2021-02-18 주식회사 아이티아이 Method and equipment of cutting ceramic
WO2021221378A1 (en) 2020-04-28 2021-11-04 주식회사 아이티아이 Ceramic cutting method and equipment
KR102216294B1 (en) 2020-07-22 2021-02-18 주식회사 아이티아이 Method and equipment of cutting ceramic
KR102241518B1 (en) 2020-11-17 2021-04-19 주식회사 아이티아이 Method and equipement of cutting ceramic
WO2022108234A1 (en) 2020-11-17 2022-05-27 주식회사 아이티아이 Method and apparatus for cutting ceramic

Also Published As

Publication number Publication date
TWI488703B (en) 2015-06-21
JP5879106B2 (en) 2016-03-08
KR20130058604A (en) 2013-06-04
TW201336612A (en) 2013-09-16
CN103130409B (en) 2016-02-10
CN103130409A (en) 2013-06-05
KR101440481B1 (en) 2014-09-18

Similar Documents

Publication Publication Date Title
JP5879106B2 (en) Method for scribing a brittle material substrate
TWI426057B (en) The method of stripping angle of brittle material substrate
TWI380963B (en) Method for processing brittle material substrates
CN103030266B (en) Laser cutting method and device
US20090320524A1 (en) Glass sheet cutting by laser-guided gyrotron beam
KR20140017421A (en) Laminated-substrate processing method and processing apparatus
JP5562254B2 (en) Brittle material splitting apparatus and splitting method
US20150059411A1 (en) Method of separating a glass sheet from a carrier
TW201529503A (en) Chamfering method of glass substrate and laser processing device
JP2009083119A (en) Processing method of brittle material substrate
JP2010150068A (en) Method for breaking brittle material substrate
JP5590642B2 (en) Scribing apparatus and scribing method
JP6094816B2 (en) Sheet glass cutting method
KR101396989B1 (en) Scribe method for glass substrate
WO2010092964A1 (en) Method for cutting brittle material substrate
JP2012240881A (en) Method of processing fragile material substrate
TW202106427A (en) Methods of cutting glass-metal laminates using a laser
WO2013073386A1 (en) Method for cutting glass plate and device for cutting glass plate
JP5560096B2 (en) Laser processing method
TWI587960B (en) Laser processing method and laser processing device
TWI716589B (en) Breaking method and breaking device of brittle material substrate
JP6255147B2 (en) Cutting device and method for cutting workpiece
JP2013075817A (en) Method of cutting glass plate
JP2013043802A (en) Scribing method for glass substrate
US20220161369A1 (en) Apparatus for processing glass laminate substrate and processing and cutting methods using the same

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140502

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140917

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141028

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141211

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150609

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150803

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160105

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160201

R150 Certificate of patent or registration of utility model

Ref document number: 5879106

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees