TWI488703B - Scribing method and scribing apparatus for substrate of brittle material - Google Patents

Scribing method and scribing apparatus for substrate of brittle material Download PDF

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TWI488703B
TWI488703B TW101138193A TW101138193A TWI488703B TW I488703 B TWI488703 B TW I488703B TW 101138193 A TW101138193 A TW 101138193A TW 101138193 A TW101138193 A TW 101138193A TW I488703 B TWI488703 B TW I488703B
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brittle material
laser
cutting
material substrate
substrate
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TW101138193A
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Chinese (zh)
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TW201336612A (en
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Masanao Murakami
Seiji Shimizu
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Mitsuboshi Diamond Ind Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/04Cutting or splitting in curves, especially for making spectacle lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D3/00Cutting work characterised by the nature of the cut made; Apparatus therefor
    • B26D3/08Making a superficial cut in the surface of the work without removal of material, e.g. scoring, incising
    • B26D3/085On sheet material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/027Scoring tool holders; Driving mechanisms therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Laser Beam Processing (AREA)

Description

脆性材料基板的切割方法及切割裝置Cutting method and cutting device for brittle material substrate

本發明係關於一種脆性材料基板的切割(scribe)方法,尤其關於一種沿著脆性材料基板的切割預定線(line)來形成切割溝之切割方法。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a method of dicing a substrate of a brittle material, and more particularly to a method of forming a dicing trench along a line of cutting of a substrate of a brittle material.

就將用以切割之切割溝形成於玻璃(glass)基板之方法而言,係有使用雷射(laser)光來加以形成之方法。在該情形中,係沿著切割預定線照射雷射光使基板的一部分溶解、蒸發,藉此形成切割溝。然而,在該方法中,所溶解、蒸發之基板的一部分會附著於基板表面,而有伴隨著品質的劣化之情形。再者,在所溶解、蒸發之部分形成之傷痕會成為基板端面強度降低之原因。A method of forming a dicing groove for cutting into a glass substrate is a method of forming using laser light. In this case, the laser light is irradiated along the line to cut so that a part of the substrate is dissolved and evaporated, thereby forming a dicing groove. However, in this method, a part of the substrate which is dissolved and evaporated adheres to the surface of the substrate, which is accompanied by deterioration of quality. Furthermore, the flaw formed in the dissolved and evaporated portion causes a decrease in the strength of the end face of the substrate.

因此,就其他的玻璃基板的切割方法而言,提供有一種利用會吸收於玻璃基板表面之CO2 雷射之加工方法。在該方法中係藉由將雷射照射於玻璃基板上並進行掃描而將基板表面予以加熱。並且,藉由從冷卻噴頭(nozzle)所噴射之冷卻媒體對加熱區域進行冷卻來使龜裂擴大。藉此,沿著切割預定線形成切割溝並切割玻璃基板。Therefore, as for the other glass substrate cutting method, there is provided a processing method using a CO 2 laser which is absorbed on the surface of the glass substrate. In this method, the surface of the substrate is heated by irradiating a laser onto a glass substrate and scanning. Then, the heating region is cooled by a cooling medium ejected from a cooling nozzle to expand the crack. Thereby, a dicing groove is formed along the line to be cut and the glass substrate is cut.

然而,在該種方法中,由於雷射射束的形狀係呈現橢圓形,故難以沿著曲線狀的切割預定線形成切割溝,或進行切割。再者,由於根據雷射長度及寬度而存在有最佳加工條件,故必須找出該等加工條件。再者,在至少數mm/s左右之實用性的加工速度條件中,由於通常需要數mm之寬度的射束,故從基板到切割線為止之距離(以下,係稱為「凸緣寬」)會有限制。亦即,當凸緣寬極小而成為射束的寬度以下時,會無法沿著如此之切割預定線進行切割。However, in this method, since the shape of the laser beam is elliptical, it is difficult to form a cutting groove along the curved planned cutting line, or to perform cutting. Furthermore, since there are optimum processing conditions depending on the length and width of the laser, it is necessary to find the processing conditions. Further, in the practical processing speed condition of at least several mm/s, since a beam having a width of several mm is usually required, the distance from the substrate to the cutting line (hereinafter, referred to as "the flange width") There will be restrictions. That is, when the flange width is extremely small and becomes below the width of the beam, it is impossible to cut along such a planned cutting line.

另外,在專利文獻1中揭示有,當沿著曲線狀之切割預定線對玻璃基板等進行切割時,使具有預定長度的直線狀之射束點(beam spot)的兩端的強度明顯地增大,並使該兩端移動成位於切斷預定線上而進行加工。Further, Patent Document 1 discloses that when the glass substrate or the like is cut along a curved planned cutting line, the strength of both ends of a linear beam spot having a predetermined length is significantly increased. And moving the both ends to be processed on the cutting line.

(先前技術文獻)(previous technical literature) (專利文獻)(Patent Literature)

專利文獻1:日本特表2003-516236號公報Patent Document 1: Japanese Patent Publication No. 2003-516236

在專利文獻1中所揭示之加工方法中,必須將直線狀之射束點的兩端沿著切割預定線上來進行掃描。為了進行如此之掃描,必須執行非常複雜之控制。再者,能夠進行切割之曲線形狀亦受到限定,例如並無法沿著曲率較小之曲線進行切割。並且,由於無法減小射束寬度,故無法解決在能夠加工之凸緣寬上產生限制之問題。In the processing method disclosed in Patent Document 1, it is necessary to scan both ends of a linear beam spot along a line to be cut. In order to perform such a scan, very complicated control must be performed. Furthermore, the shape of the curve capable of cutting is also limited, for example, it is not possible to cut along a curve having a small curvature. Further, since the beam width cannot be reduced, the problem of limitation in the flange width that can be processed cannot be solved.

本發明之課題為提供一種切割方法,係能夠沿著曲線 狀之切割預定線而容易地進行切割,並且可減小凸緣寬。The object of the present invention is to provide a cutting method capable of following a curve The cut is easily cut by the predetermined line, and the flange width can be reduced.

第1發明之脆性材料基板的切割方法係沿著脆性材料基板的切割預定線來形成切割溝之方法,並包括以下步驟。The method of cutting a brittle material substrate according to the first aspect of the invention is a method of forming a dicing groove along a line to be cut of a brittle material substrate, and includes the following steps.

加熱/冷卻步驟:以令焦點位於從基板的表面到背面之範圍內之方式,將相對於脆性材料基板具有吸收性及穿透性之波長之雷射予以聚焦並進行照射,並且在對雷射照射區域進行雷射照射之同時噴射冷卻媒體。Heating/cooling step: focusing and illuminating a laser having a wavelength of absorption and penetration with respect to a brittle material substrate in such a manner that the focus is in a range from the surface of the substrate to the back surface, and in the laser The irradiation area is irradiated with the cooling medium while performing laser irradiation.

掃描步驟:將雷射照射之射束點及冷卻媒體的噴射之冷卻點沿著切割預定線進行掃描。Scanning step: scanning the laser irradiation spot of the laser beam and the cooling point of the cooling medium along the line to be cut.

在此,將相對於基板具有某種程度之穿透性及吸收性之雷射照射於基板。藉由該雷射之照射,基板係不僅於表面亦至內部為止受到加熱。再者,在該加熱之同時,藉由冷卻媒體對所加熱之部分進行冷卻。因此,在基板內部會產生溫度梯度。由於該溫度梯度,於基板表面產生拉伸應力,而在基板內部產生壓縮應力。因此,基板會產生龜裂。並且,藉由將以上之射束點及冷卻點沿著切割預定線進行掃描,龜裂會沿著切割預定線擴展,而形成切割溝。Here, a laser having a certain degree of transparency and absorption with respect to the substrate is irradiated onto the substrate. By the irradiation of the laser, the substrate is heated not only from the surface but also from the inside. Further, at the same time as the heating, the heated portion is cooled by the cooling medium. Therefore, a temperature gradient is generated inside the substrate. Due to this temperature gradient, tensile stress is generated on the surface of the substrate, and compressive stress is generated inside the substrate. Therefore, the substrate is cracked. Further, by scanning the above beam spot and the cooling point along the line to be cut, the crack spreads along the line to be cut to form a cutting groove.

在該方法中,由於雷射的焦點係聚光於基板表面至背面之間,亦即以位於表面附近之方式聚光,且在雷射照射於雷射照射位置之同時形成冷卻點,故可沿著曲線狀的切割預定線容易地對基板進行切割。再者,由於幾乎沒有從雷射照射之加熱至冷卻媒體之冷卻為止的時間差,故對於周圍之溫度擴散會變小。因此,即便在凸緣寬較小之情形 時,亦不容易產生基板的端側與相反側之間的溫度的非對稱性。結果,與以往的加工方法相比較,係可進行凸緣寬較小之加工。In this method, since the focus of the laser is concentrated between the surface of the substrate and the back surface, that is, the light is collected in the vicinity of the surface, and the cooling point is formed while the laser is irradiated to the laser irradiation position, The substrate is easily cut along a curved cut line. Further, since there is almost no time difference from the heating of the laser irradiation to the cooling of the cooling medium, the temperature diffusion to the surroundings is reduced. Therefore, even in the case where the flange width is small At the same time, it is not easy to cause temperature asymmetry between the end side and the opposite side of the substrate. As a result, it is possible to perform processing with a small flange width as compared with the conventional processing method.

第2發明之脆性材料基板的切割方法係於第1發明之方法中,復包括在脆性材料基板的表面的切割預定線的掃描開始端形成初始龜裂之初始龜裂形成步驟,以作為加熱/冷卻步驟之前步驟。According to a second aspect of the invention, in the method of the first aspect of the invention, the initial crack forming step of forming an initial crack at the scanning start end of the planned cutting line on the surface of the brittle material substrate is used as heating/ The steps before the cooling step.

於此係於切割預定線的掃描開始端形成初始龜裂。之後,再執行加熱/冷卻步驟以及掃描步驟。此時,龜裂會從初始龜裂開始沿著切割預定線擴展,而形成切割溝。Here, an initial crack is formed at the scanning start end of the cut line. Thereafter, the heating/cooling step and the scanning step are performed. At this time, the crack will expand from the initial crack along the planned cutting line to form a cutting groove.

第3發明之脆性材料基板之切割方法係於第1或第2發明之方法中,加熱/冷卻步驟之雷射的波長為2.7μm以上4.0μm以下。The method of cutting a brittle material substrate according to the third aspect of the invention is the method according to the first or second aspect of the invention, wherein the wavelength of the laser in the heating/cooling step is 2.7 μm or more and 4.0 μm or less.

藉由使用如此之雷射來照射例如玻璃基板,係不僅於基板的表面加熱亦能夠對內部進行加熱。By irradiating, for example, a glass substrate using such a laser, it is possible to heat the inside not only on the surface of the substrate but also on the surface of the substrate.

第4發明之脆性材料基板的切割方法係在第1至第3發明中任一方法中,脆性材料基板係玻璃基板。A method of cutting a brittle material substrate according to a fourth aspect of the invention is the method of any one of the first to third aspects, wherein the brittle material substrate is a glass substrate.

第5發明之脆性材料基板的切割方法係在第1至第4發明中任一方法中,冷卻媒體係以使雷射照射之噴射加工痕位於噴射痕的中心之方式被噴射於基板表面。In the method of cutting a brittle material substrate according to the fifth aspect of the invention, the cooling medium is sprayed onto the surface of the substrate such that the jet processing mark of the laser irradiation is located at the center of the ejection mark.

第6發明之脆性材料基板的切割方法係在第1至第5發明中任一方法中,復包括在脆性材料基板的背面設置用以反射雷射之反射板之準備步驟,以作為加熱/冷卻步驟之前步驟。The cutting method of the brittle material substrate according to the sixth aspect of the invention is the method of any one of the first to fifth invention, further comprising the step of preparing a reflecting plate for reflecting the laser on the back surface of the brittle material substrate as heating/cooling Steps before the steps.

如前所述,在基板的厚度較薄時,即便照射雷射,基板亦無法充分地吸收雷射,而使加熱變得不充分。因此,在該第5發明中,係在基板之與照射雷射側之面相反側的面設置用以反射雷射之反射板。藉由執行該步驟,即便為較薄之基板,亦可充分地吸收雷射,而可將基板內部充分地加熱。As described above, when the thickness of the substrate is thin, even if the laser is irradiated, the substrate cannot sufficiently absorb the laser, and the heating is insufficient. Therefore, in the fifth aspect of the invention, a reflecting plate for reflecting a laser is provided on a surface of the substrate opposite to the surface on which the laser side is irradiated. By performing this step, even if it is a thin substrate, the laser can be sufficiently absorbed, and the inside of the substrate can be sufficiently heated.

第7發明之脆性材料基板的切割裝置係沿著脆性材料基板的切割預定線來形成切割溝之裝置,具備有:工作台(table);雷射振盪器;光學系統;聚光透鏡(lens);冷卻噴嘴;以及移動機構。工作台係載置作為加工對象之脆性材料基板。雷射振盪器係輸出相對於脆性材料基板具有吸收性及穿透性之波長的雷射。光學系統係將來自雷射振盪器之雷射光引導至工作台。聚光透鏡係以使引導至工作台之雷射光的焦點位於脆性材料基板的表面至背面的範圍內之方式來將雷射予以聚光。冷卻噴嘴係在進行雷射照射之同時對脆性材料基板的雷射照射區域噴射冷媒而形成冷卻點。移動機構係使雷射光的照射區域及冷卻點相對於脆性材料基板在水平面內相對性地移動。A cutting device for a brittle material substrate according to a seventh aspect of the present invention is a device for forming a dicing groove along a line to be cut of a brittle material substrate, comprising: a table; a laser oscillator; an optical system; a condensing lens (lens) ; cooling nozzle; and moving mechanism. The table is placed as a substrate for a brittle material to be processed. A laser oscillator outputs a laser having a wavelength that is absorptive and penetrable with respect to a brittle material substrate. The optical system directs the laser light from the laser oscillator to the table. The concentrating lens condenses the laser light so that the focus of the laser light guided to the table is in the range from the surface to the back surface of the brittle material substrate. The cooling nozzle forms a cooling point by injecting a refrigerant to a laser irradiation region of the brittle material substrate while performing laser irradiation. The moving mechanism relatively moves the irradiation region and the cooling point of the laser light in the horizontal plane with respect to the brittle material substrate.

第8發明之脆性材料基板的切割裝置係於第7發明之裝置中,復包括使聚光透鏡上下移動之透鏡移動機構。A cutting device for a brittle material substrate according to a seventh aspect of the invention is the device of the seventh aspect of the invention, further comprising a lens moving mechanism for moving the condensing lens up and down.

第9發明之脆性材料基板的切割裝置係於第7或第8發明之裝置中,復包括用以於脆性材料基板之一部分形成做為切割起點之初始龜裂之初始龜裂形成手段。A cutting device for a brittle material substrate according to a ninth aspect of the invention is the device according to the seventh or eighth aspect of the present invention, which comprises an initial crack forming means for forming an initial crack as a cutting starting point in a portion of the brittle material substrate.

如以上所述,本發明係能夠容易地沿著曲線狀的切割預定線進行切割,並可減小凸緣寬。As described above, the present invention can easily perform cutting along a curved cutting line and can reduce the flange width.

1‧‧‧切割裝置1‧‧‧ cutting device

2‧‧‧工作台2‧‧‧Workbench

3‧‧‧雷射振盪器3‧‧‧Laser oscillator

4‧‧‧反射鏡4‧‧‧Mirror

5‧‧‧聚光透鏡5‧‧‧ Concentrating lens

6‧‧‧冷卻噴嘴6‧‧‧Cooling nozzle

10‧‧‧工作台移動機構10‧‧‧Workbench moving mechanism

11‧‧‧透鏡移動機構11‧‧‧Lens moving mechanism

12‧‧‧初始龜裂形成手段12‧‧‧Initial crack formation

G‧‧‧玻璃基板G‧‧‧glass substrate

第1圖係用以實施本發明一實施形態之切割方法之裝置的概略構成圖。Fig. 1 is a schematic configuration diagram of an apparatus for carrying out a cutting method according to an embodiment of the present invention.

第2A圖係顯示相對於雷射波長之鈉鈣玻璃(soda-lime glass)的穿透率之圖。Figure 2A is a graph showing the transmittance of soda-lime glass relative to the laser wavelength.

第2B圖係顯示依每個板厚之雷射的基板穿透率及吸收率之圖。Figure 2B is a graph showing substrate penetration and absorption for each plate thickness of the laser.

第3圖係顯示雷射照射區域(照射痕)及冷卻點(噴射痕)之照片。Fig. 3 is a photograph showing a laser irradiation area (irradiation mark) and a cooling point (spray mark).

第4圖(a)至(c)係用以說明雷射的聚焦位置(基板表面、內部、背面)與切割邊緣的關係之圖。Fig. 4 (a) to (c) are diagrams for explaining the relationship between the focus position of the laser (substrate surface, inside, and back surface) and the cutting edge.

第5圖係用以說明雷射的聚焦位置(基板上方)與切割邊緣的關係之圖。Figure 5 is a diagram for explaining the relationship between the focus position of the laser (above the substrate) and the cutting edge.

第6圖係顯示藉由本發明一實施形態之加工方法沿著直線狀的切割預定線進行加工時之從切割預定線的偏移量之圖。Fig. 6 is a view showing the amount of shift from the planned cutting line when the processing method according to the embodiment of the present invention is processed along a linear cutting line.

第7圖係顯示藉由本發明一實施形態之加工方法沿著曲線狀的切割預定線進行加工時之從切割預定線的偏移量之圖。Fig. 7 is a view showing the amount of shift from the planned cutting line when the machining method according to the embodiment of the present invention is processed along a curved cutting line.

[裝置構成][Device configuration]

第1圖係顯示用以實施本發明一實施形態之方法之切 割裝置的概略構成圖。切割裝置1係例如用以將一張母(mother)基板分割成複數個玻璃基板之裝置。其中,玻璃基板係例如鈉鈣玻璃基板。Figure 1 is a diagram showing the method for carrying out an embodiment of the present invention. A schematic diagram of the cutting device. The cutting device 1 is, for example, a device for dividing a mother substrate into a plurality of glass substrates. Among them, the glass substrate is, for example, a soda lime glass substrate.

切割裝置1係具備:載置作為加工對象之玻璃基板G之工作台2;雷射振盪器3;將來自雷射振盪器3之雷射引導至工作台2側之反射鏡(mirror)4;聚光透鏡5;以及冷卻噴嘴6。The cutting device 1 includes: a table 2 on which a glass substrate G to be processed is placed; a laser oscillator 3; and a mirror 4 for guiding the laser from the laser oscillator 3 to the table 2 side; a condenser lens 5; and a cooling nozzle 6.

其中,雷射振盪器3係輸出相對於玻璃基板G具有吸收性及穿透性之波長之雷射。聚光透鏡5係以令焦點位於玻璃基板G的表面至背面之間之方式來將雷射予以聚光。冷卻噴嘴6係將自未圖示之冷媒源所供給之冷媒予以噴射至玻璃基板G的表面而形成冷卻點。Among them, the laser oscillator 3 outputs a laser having a wavelength of absorption and penetration with respect to the glass substrate G. The condensing lens 5 condenses the laser light so that the focus is located between the surface of the glass substrate G and the back surface. The cooling nozzle 6 sprays a refrigerant supplied from a refrigerant source (not shown) onto the surface of the glass substrate G to form a cooling point.

再者,該切割裝置1係設置有在水平面內將載置有玻璃基板G之工作台2予以移動之工作台移動機構10,以及使聚光透鏡5上下移動之透鏡移動機構11。藉由工作台移動機構10,雷射的照射區域(射束點)與冷卻點係沿著切斷預定線進行掃描。Further, the cutting device 1 is provided with a table moving mechanism 10 that moves a table 2 on which a glass substrate G is placed in a horizontal plane, and a lens moving mechanism 11 that moves the collecting lens 5 up and down. By the table moving mechanism 10, the irradiation area (beam spot) of the laser and the cooling point are scanned along the line to cut.

再者,於該切割裝置1係設置有用以於玻璃基板G的掃描開始側之端部形成屬於切割起點之初始龜裂之初始龜裂形成手段12。就初始龜裂形成手段12而言,雖採用壓頭(indenter)或切刀輪(cutter wheel)等機械工具,惟亦可藉由雷射切割(laser ablation)加工來形成初始龜裂。In addition, the cutting device 1 is provided with an initial crack forming means 12 for forming an initial crack belonging to the cutting start point at the end portion on the scanning start side of the glass substrate G. In the initial crack forming means 12, a mechanical tool such as an indenter or a cutter wheel is used, but initial cracking can be formed by laser ablation processing.

[切割方法][Cutting method]

首先,使用切刀輪等初始龜裂形成手段而於玻璃基板 G的切割預定線的掃描開始側的端部形成屬於切割起點之初始龜裂。First, using a primary crack forming means such as a cutter wheel on a glass substrate The end portion on the scanning start side of the cutting planned line of G forms an initial crack belonging to the cutting start point.

接著,對玻璃基板G照射雷射。藉由聚光透鏡5,以焦點位於玻璃基板G的表面或位於從表面至背面之間之方式將雷射予以聚光。再者,在進行雷射照射之同時,由冷卻噴嘴6對雷射所照射之區域噴射冷卻媒體。Next, the glass substrate G is irradiated with a laser. The laser is condensed by the condensing lens 5 so that the focus is on the surface of the glass substrate G or between the surface and the back surface. Further, while the laser irradiation is being performed, the cooling nozzle 6 ejects the cooling medium to the area irradiated by the laser.

其中,就雷射而言,係由於使用相對於玻璃基板G具有吸收性及穿透性之波長之雷射,故藉由雷射照射而對玻璃基板G的表面及內部予以加熱。另一方面,對雷射照射區域噴射冷卻媒體而將其冷卻。因此,在基板內部會產生溫度梯度,進而於基板G的表面產生拉伸應力,且於內部產生壓縮應力。藉此於基板產生龜裂。In the laser, since the laser having a wavelength of absorption and penetration with respect to the glass substrate G is used, the surface and the inside of the glass substrate G are heated by laser irradiation. On the other hand, the cooling medium is sprayed on the laser irradiation area to cool it. Therefore, a temperature gradient is generated inside the substrate, and tensile stress is generated on the surface of the substrate G, and a compressive stress is generated inside. Thereby, cracks are generated in the substrate.

藉由將以上之雷射點及冷卻點沿著切割預定線進行掃描,龜裂係沿著切割預定線擴展,而形成切割溝。By scanning the above laser spot and cooling point along the line to be cut, the crack system spreads along the line to be cut to form a cutting groove.

(實施例)(Example) <雷射><Laser>

第2A圖係顯示相對於具有各種厚度之鈉鈣玻璃之雷射(Er光纖雷射)的波長與穿透率的關係。再者,第2B圖係顯示依每個板厚之穿透率及吸收率。另外,吸收率係計算值。Fig. 2A shows the relationship between the wavelength and the transmittance of a laser (Er fiber laser) having a soda lime glass having various thicknesses. Furthermore, Figure 2B shows the penetration and absorption rate for each plate thickness. In addition, the absorption rate is a calculated value.

由該等圖式明顯可知,在波長為2.8μm至4.0μm之範圍內,就厚度為1.3mm(實線)及1.8mm(虛線)之玻璃基板而言,穿透率分別為55%、46%,吸收率分別為45%、54%,而具有某種程度之吸收性及穿透性。在該等厚度之基板 中,所照射之雷射係吸收於基板內部,而可進行切割。As is apparent from the figures, the transmittances of the glass substrates having a thickness of 1.3 mm (solid line) and 1.8 mm (dashed line) in the range of 2.8 μm to 4.0 μm, respectively, are 55%, 46, respectively. %, the absorption rate is 45%, 54%, respectively, and has a certain degree of absorption and penetration. Substrates of the thickness The laser beam that is irradiated absorbs the inside of the substrate and can be cut.

另外,即便在吸收率因板厚較薄等理由而較低時,只要吸收率為10%以上,即可藉由採用更高輸出之雷射,或在與雷射所照射之面相反側之面設置用以反射雷射之反射板,即可使雷射在基板內部充分地被吸收。再者,藉由從與雷射照射面相反側之面進行冷卻,即可對基板內部賦予龜裂擴展所需之充分之溫度梯度。Further, even when the absorption rate is low due to reasons such as a thin plate thickness, if the absorption rate is 10% or more, a laser having a higher output or a side opposite to the surface irradiated by the laser can be used. The reflector is provided to reflect the laser, so that the laser is sufficiently absorbed inside the substrate. Further, by cooling from the surface opposite to the laser irradiation surface, a sufficient temperature gradient required for crack propagation can be imparted to the inside of the substrate.

另外,在以下的實驗中係全部使用波長為2.8μm之Er光纖雷射(fiber laser)。In addition, in the following experiments, an Er fiber laser having a wavelength of 2.8 μm was used.

<射束點及冷卻點><beam point and cooling point>

第3圖係顯示將加工部分的詳細態樣擴大顯示之照片。於第3圖中,中心部的圓L所示之部分為雷射的照射痕,而圓C所示之部分為冷卻媒體的噴射痕。由第3圖係明顯地可知,係以射束點位於冷卻點的中心之方式,同時地執行雷射照射及冷卻媒體的噴射。Fig. 3 is a photograph showing an enlarged display of the detailed state of the processed portion. In Fig. 3, the portion indicated by the circle L of the center portion is the irradiation mark of the laser, and the portion indicated by the circle C is the ejection mark of the cooling medium. As is apparent from Fig. 3, the laser irradiation and the ejection of the cooling medium are simultaneously performed so that the beam spot is located at the center of the cooling point.

<焦點位置的影響><Impact of focus position>

第4圖係顯示將雷射的焦點位置設為基板表面(a)、基板中央(b)、基板背面(c),並對雷射輸出及掃描速度做各種改變,而實驗是否可進行切割,亦即實驗切割邊緣因應於焦點位置會如何變化之結果。另外,該實驗所採用之玻璃基板係厚度為1.3mm鈉鈣玻璃基板。Figure 4 shows the focus position of the laser as the substrate surface (a), the substrate center (b), the substrate back surface (c), and various changes to the laser output and scanning speed, and whether the experiment can be cut, That is, the result of the experimental cutting edge depending on how the focus position changes. In addition, the glass substrate used in this experiment was a 1.3 mm soda lime glass substrate.

於第4圖中,「○」係顯示可進行切割(龜裂從初始龜裂沿著切割預定線擴展),「×」係顯示不可進行切割(沿著切割預定線之龜裂不會從初始龜裂開始擴展),「止」係顯 示加工停止(沿著切割預定線之龜裂雖從初始龜裂擴展,但在加工途中龜裂的擴展會停止),「先」係顯示先行擴展(未沿著切割預定線之龜裂會擴展)。In Fig. 4, "○" shows that cutting is possible (the crack spreads from the initial crack along the planned cutting line), and the "×" shows that the cutting is impossible (the crack along the planned cutting line does not start from the initial The crack begins to expand) The processing stops (the crack along the planned cutting line expands from the initial crack, but the expansion of the crack stops during the processing), the "first" shows the expansion first (the crack does not expand along the cutting line) ).

由第4圖可知,即便將焦點位置在基板表面與背面之間變換,分割邊緣亦大致相同。As can be seen from Fig. 4, even if the focus position is changed between the surface of the substrate and the back surface, the divided edges are substantially the same.

另一方面,第5圖係對於與第4圖相同之玻璃基板,使焦點位置從玻璃基板的上面往上方離開達10mm而進行加工之實驗結果。在此情形下,玻璃基板表面的射束直徑為660μm。因此,基板表面之射束功率(beam power)密度較低,而基板溫度不會充分地升高。因此,若使掃描速度變慢,且不將雷射輸出提高,即無法進行切割。On the other hand, Fig. 5 is an experimental result of processing the glass substrate which is the same as that of Fig. 4 by leaving the focus position upward from the upper surface of the glass substrate up to 10 mm. In this case, the beam diameter of the surface of the glass substrate was 660 μm. Therefore, the beam power density of the substrate surface is low, and the substrate temperature is not sufficiently increased. Therefore, if the scanning speed is slowed and the laser output is not increased, the cutting cannot be performed.

依據以上實驗結果可知,較佳為將雷射的焦點位置設定於從基板表面至背面之間來進行加工。According to the above experimental results, it is preferable to set the focus position of the laser from the surface of the substrate to the back surface for processing.

<從切割預定線的偏移><offset from the cut line to be cut>

第6圖係顯示在實施本實施形態的加工方法時,龜裂從切割預定線以何種程度偏移而形成之實驗例。橫軸係顯示沿著切割線之位置(0mm係顯示初始龜裂側的基板端),縱軸係顯示從切割預定線之偏移量。另外,實驗所採用之玻璃基板係厚度為1.3mm之鈉鈣玻璃基板且長度為55mm。再者,雷射輸出為7.5W,掃描速度為20mm/s。Fig. 6 is a view showing an experimental example in which the crack is formed by the degree of deviation of the planned cutting line when the processing method of the present embodiment is carried out. The horizontal axis shows the position along the cutting line (0 mm indicates the substrate end on the initial crack side), and the vertical axis shows the offset from the planned cutting line. Further, the glass substrate used in the experiment was a soda lime glass substrate having a thickness of 1.3 mm and a length of 55 mm. Furthermore, the laser output is 7.5W and the scanning speed is 20mm/s.

如第6圖所示,從切割預定線之偏移量係在+7μm至-10μm之間,可知依據本實施形態之加工方法亦不會有較大的偏移。As shown in Fig. 6, the offset from the planned cutting line is between +7 μm and -10 μm, and it is understood that the processing method according to the present embodiment does not have a large offset.

另外,在沿著第7圖所示之曲線狀的分割預定線SL 而實施本實施形態之加工方法時,所形成之切割溝係產生最大20μm之偏移量。然而,由於會有偏移至分割預定線SL的一方側之傾向,故能夠預期該偏移來進行加工。In addition, in the curved dividing line SL along the curved line shown in FIG. When the processing method of the present embodiment is carried out, the formed dicing groove is offset by a maximum of 20 μm. However, since there is a tendency to shift to one side of the division planned line SL, the offset can be expected to be processed.

[特徵][feature]

(1)由於將雷射的焦點設定於基板表面附近,且冷卻點係在進行雷射照射之同時形成於雷射照射位置,故可沿著曲線狀的切割預定線而容易地對基板進行切割。(1) Since the focus of the laser is set near the surface of the substrate, and the cooling point is formed at the laser irradiation position while performing the laser irradiation, the substrate can be easily cut along the curved cutting line. .

(2)由於對基板的相同區域同時執行加熱及冷卻,故對於周圍之溫度擴散會變小。因此,即便在凸緣寬較小之情形,亦不容易產生在基板的端側與另一側之間之溫度的非對稱性。結果,與以往的加工方法相比較,係能夠進行凸緣寬較小之加工。(2) Since heating and cooling are simultaneously performed on the same region of the substrate, the temperature diffusion to the surroundings is reduced. Therefore, even in the case where the flange width is small, the asymmetry of the temperature between the end side and the other side of the substrate is not easily generated. As a result, it is possible to perform processing with a small flange width as compared with the conventional processing method.

(3)藉由對於玻璃基板使用波長為2.8μm以上4.0μm以下之雷射,即可從基板表面遍及至內部有效地進行加熱。因此,龜裂會順暢地(smooth)擴展,且可抑制從切割預定線之偏移。(3) By using a laser having a wavelength of 2.8 μm or more and 4.0 μm or less for the glass substrate, heating can be efficiently performed from the surface of the substrate to the inside. Therefore, the crack spreads smoothly, and the offset from the planned cutting line can be suppressed.

(4)就板厚為1.0mm以上2.0mm以下之玻璃基板而言,藉由使用波長為2.8μm以上4.0μm以下之雷射,則至基板的內部為止皆可充分地加熱,而能夠形成良好的切割溝。(4) In the case of a glass substrate having a thickness of 1.0 mm or more and 2.0 mm or less, by using a laser having a wavelength of 2.8 μm or more and 4.0 μm or less, the substrate can be sufficiently heated to the inside of the substrate, and can be formed well. Cutting groove.

[其他實施形態][Other Embodiments]

本發明並非由以上之實施形態所限定者,只要在不脫離本發明的範圍內皆可有各種變形或修正。The present invention is not limited to the above embodiments, and various modifications and changes can be made without departing from the scope of the invention.

例如,在前述實施形態中,雖顯示了使用鈉鈣玻璃作為脆性材料基板之實驗例,惟就脆性材料基板而言並不限 定於鈉鈣玻璃。For example, in the above embodiment, an experimental example using soda lime glass as a brittle material substrate is shown, but the brittle material substrate is not limited. Set in soda lime glass.

1‧‧‧切割裝置1‧‧‧ cutting device

2‧‧‧工作台2‧‧‧Workbench

3‧‧‧雷射振盪器3‧‧‧Laser oscillator

4‧‧‧反射鏡4‧‧‧Mirror

5‧‧‧聚光透鏡5‧‧‧ Concentrating lens

6‧‧‧冷卻噴嘴6‧‧‧Cooling nozzle

10‧‧‧工作台移動機構10‧‧‧Workbench moving mechanism

11‧‧‧透鏡移動機構11‧‧‧Lens moving mechanism

12‧‧‧初始龜裂形成手段12‧‧‧Initial crack formation

G‧‧‧玻璃基板G‧‧‧glass substrate

Claims (9)

一種脆性材料基板的切割方法,係沿著脆性材料基板的切割預定線來形成切割溝者,係包括以下步驟:加熱/冷卻步驟,係以令焦點位於從前述基板的表面到背面之範圍內之方式,將相對於前述脆性材料基板具有吸收性及穿透性之波長之雷射予以聚光並進行照射,並且在對雷射照射區域進行雷射照射之同時噴射冷卻媒體;以及掃描步驟,係將前述雷射照射之射束點及冷卻媒體的噴射之冷卻點沿著前述切割預定線進行掃描。 A method for cutting a substrate of a brittle material, which is formed by cutting a predetermined line along a line of cutting of a brittle material substrate, comprising the steps of: heating/cooling step so that the focus is in a range from the surface to the back of the substrate; a method of concentrating and irradiating a laser having a wavelength of absorption and penetration with respect to the brittle material substrate, and spraying a cooling medium while performing laser irradiation on the laser irradiation region; and a scanning step The laser beam of the aforementioned laser irradiation and the cooling point of the cooling medium are scanned along the aforementioned cutting line. 如申請專利範圍第1項所述之脆性材料基板的切割方法,復包括:作為前述加熱/冷卻步驟的前步驟之初始龜裂形成步驟,係在前述脆性材料基板的表面的切割預定線的掃描開始端形成初始龜裂。 The method for cutting a brittle material substrate according to claim 1, further comprising: an initial crack forming step as a pre-step of the heating/cooling step, scanning a predetermined line of the surface of the brittle material substrate The initial crack is formed at the beginning. 如申請專利範圍第1項或第2項所述之脆性材料基板的切割方法,其中,前述加熱/冷卻步驟之雷射的波長為2.7μm以上4.0μm以下。 The method of cutting a brittle material substrate according to the first or second aspect of the invention, wherein the wavelength of the laser in the heating/cooling step is 2.7 μm or more and 4.0 μm or less. 如申請專利範圍第1項所述之脆性材料基板的切割方法,其中,前述脆性材料基板係玻璃基板。 The method of cutting a brittle material substrate according to claim 1, wherein the brittle material substrate is a glass substrate. 如申請專利範圍第1項所述之脆性材料基板的切割方法,其中,前述冷卻媒體係以使前述雷射照射之噴射加工痕位於噴射痕的中心之方式被噴射於前述基板表面。 The method of cutting a brittle material substrate according to the first aspect of the invention, wherein the cooling medium is sprayed onto the surface of the substrate such that the jet processing mark of the laser irradiation is located at a center of the ejection mark. 如申請專利範圍第1項所述之脆性材料基板的切割方 法,復包括:作為前述加熱/冷卻步驟之前步驟之準備步驟,係在前述脆性材料基板之與雷射照射側的面為相反側之面設置用以反射雷射之反射板。 The cutting side of the brittle material substrate as described in claim 1 of the patent application scope The method includes a step of preparing a step before the heating/cooling step, and providing a reflecting plate for reflecting the laser on a surface of the brittle material substrate opposite to the surface on the laser irradiation side. 一種脆性材料基板的切割裝置,係沿著脆性材料基板的切割預定線來形成切割溝者,係包括:工作台,載置作為加工對象之脆性材料基板;雷射振盪器,係輸出相對於前述脆性材料基板具有吸收性及穿透性之波長的雷射;光學系統,係將來自前述雷射振盪器之雷射光引導至前述工作台;聚光透鏡,係以引導至前述工作台之雷射光的焦點位於前述脆性材料基板的表面至背面之間之方式將雷射予以聚光;冷卻噴嘴,係在進行雷射照射之同時對前述脆性材料基板的雷射照射區域噴射冷媒而形成冷卻點;以及移動機構,係用以使前述雷射光的照射區域及冷卻點相對於前述脆性材料基板在水平面內相對性地移動。 A cutting device for a brittle material substrate, which is formed by cutting a predetermined line along a cutting line of a brittle material substrate, comprising: a working table on which a brittle material substrate as a processing object is placed; and a laser oscillator outputting relative to the foregoing a brittle material substrate having a laser having an absorptive and penetrating wavelength; an optical system for directing laser light from the laser oscillator to the aforementioned stage; and a collecting lens for directing the laser light to the aforementioned table The focus is on the surface of the brittle material substrate between the surface and the back surface to condense the laser; the cooling nozzle is sprayed with a refrigerant to the laser irradiation region of the brittle material substrate to form a cooling point while performing laser irradiation; And a moving mechanism for relatively moving the irradiation region and the cooling point of the laser light in a horizontal plane with respect to the brittle material substrate. 如申請專利範圍第7項所述之脆性材料基板的切割裝置,復包括:透鏡移動機構,係使前述聚光透鏡上下移動。 The cutting device for a brittle material substrate according to claim 7, further comprising: a lens moving mechanism for moving the condensing lens up and down. 如申請專利範圍第7項或第8項所述之脆性材料基板的切割裝置,復包括:初始龜裂形成手段,係用以在 前述脆性材料基板的一部分形成做為切割起點之初始龜裂。The cutting device for a brittle material substrate according to claim 7 or 8, further comprising: an initial crack forming means for A part of the aforementioned brittle material substrate forms an initial crack as a starting point of cutting.
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