TWI469938B - Scribing method of glass substrate - Google Patents
Scribing method of glass substrate Download PDFInfo
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- TWI469938B TWI469938B TW100148833A TW100148833A TWI469938B TW I469938 B TWI469938 B TW I469938B TW 100148833 A TW100148833 A TW 100148833A TW 100148833 A TW100148833 A TW 100148833A TW I469938 B TWI469938 B TW I469938B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/033—Apparatus for opening score lines in glass sheets
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/07—Cutting armoured, multi-layered, coated or laminated, glass products
- C03B33/072—Armoured glass, i.e. comprising reinforcement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D3/00—Cutting work characterised by the nature of the cut made; Apparatus therefor
- B26D3/08—Making a superficial cut in the surface of the work without removal of material, e.g. scoring, incising
- B26D3/085—On sheet material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
- C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/10—Glass-cutting tools, e.g. scoring tools
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
Description
本發明係有關於玻璃(glass)基板的切割方法,特別有關於將表面形成有強化層之強化玻璃予以切割(scribe)之玻璃基板的切割方法。 The present invention relates to a method of cutting a glass substrate, and more particularly to a method of cutting a glass substrate in which a tempered glass having a reinforcing layer formed thereon is diced.
以於玻璃基板形成供切斷用之切割溝的方法而言,係有使用雷射(laser)光而形成之方法。此種情況係藉由沿著切割預定線照射雷射光而使一部分基板溶解並蒸發,以形成切割溝。但是,在此方法中,會有已溶解並已蒸發之一部分基板附著於基板表面,且帶來品質劣化的情況。此外,在已溶解並已蒸發之部分所形成之切割痕會成為基板端面強度降低的原因。 A method of forming a dicing groove for cutting a glass substrate is a method of forming using laser light. In this case, a part of the substrate is dissolved and evaporated by irradiating the laser light along the line to cut to form a cutting groove. However, in this method, a part of the substrate which has been dissolved and evaporated has adhered to the surface of the substrate, and the quality is deteriorated. In addition, the cut marks formed in the dissolved and evaporated portions may cause a decrease in the strength of the end face of the substrate.
因此,以其他的切割溝形成方法而言,有專利文獻1或2所揭示之方法。在此,係於玻璃基板的切割溝起點之部位形成初期裂痕,並對該初期裂痕照射雷射光。藉此,於雷射照射部分產生熱應力,使裂痕伸展而形成切割溝。 Therefore, in the other dicing groove forming method, there is a method disclosed in Patent Document 1 or 2. Here, an initial crack is formed at a portion of the start of the dicing groove of the glass substrate, and the initial crack is irradiated with the laser light. Thereby, thermal stress is generated in the laser irradiation portion, and the crack is stretched to form a cutting groove.
此外,在專利文獻3係揭示一種改善所切斷之基板剖面的直角度以及真直度之雷射切割方法。在此,係在沿著切割預定線於基板形成切割溝時,於切割預定線的終端附近,形成未形成切割溝之區域者。 Further, Patent Document 3 discloses a laser cutting method for improving the straight angle and the straightness of the cross section of the cut substrate. Here, when a dicing groove is formed in the substrate along the line to be cut, a region in which the dicing groove is not formed is formed in the vicinity of the end of the line to be cut.
專利文獻1:日本特開平3-489號公報 Patent Document 1: Japanese Patent Laid-Open No. 3-489
專利文獻2:日本特開平9-1370號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 9-1370
專利文獻3:日本再公表特許2007/094348號公報 Patent Document 3: Japanese Reissue No. 2007/094348
然而,在最近的FPD(Flat Panel Display,平板顯示器)業界中,因重視基板端面的強度,故以玻璃基板而言,主要係使用於表面形成有強化層之化學強化玻璃。該化學強化玻璃係藉由離子(ion)交換處理,而於表面具有具備壓縮應力的層(強化層),最近,係使用於特別要求端面強度的觸控面板(touch panel)等之覆蓋玻璃(cover glass)。 However, in the recent industry of FPD (Flat Panel Display), since the strength of the end surface of the substrate is emphasized, the glass substrate is mainly used for chemically strengthened glass having a reinforcing layer formed on its surface. The chemically strengthened glass is subjected to an ion exchange treatment and has a layer (strengthening layer) having a compressive stress on its surface. Recently, it is used for a cover glass such as a touch panel which particularly requires end face strength ( Cover glass).
此種強化玻璃係耐久性高而不易刮傷。因此,欲穩定地於強化玻璃之端面形成初期裂痕並形成切割溝,實為困難。例如,在初期裂痕的深度淺時,並不會形成切割溝。此外,反之在初期裂痕過深時,無法使初期裂痕沿著切割預定線伸展,而無法形成期望之切割溝。 Such tempered glass is highly durable and is not easily scratched. Therefore, it is difficult to form an initial crack on the end surface of the tempered glass and form a dicing groove. For example, when the depth of the initial crack is shallow, the cutting groove is not formed. Further, on the other hand, when the initial crack is too deep, the initial crack cannot be stretched along the line to be cut, and the desired cut groove cannot be formed.
此外,此種強化玻璃係於表面具有強大之壓縮應力,且於內部具有拉伸應力。因此,當對強化玻璃以習知方法照射雷射光,以形成切割溝時,裂痕主要以形成於雷射光之開始掃描側的基板端面之切割溝(裂痕)為起點,而大多會有遍及厚度方向整體而伸展的情形。如此裂痕遍及基板的全深度而形成時,基板會沿著切割預定線自然地分離(以下,將藉由切割而完全地切斷基板稱為「完全切割」(full cut))。在此種狀況中,正交切割(cross scribe)步驟,亦即,要沿著與先前之切割線(scribe line)正交之切割線形成切割溝的步驟就變為非常地困難。 In addition, such tempered glass has a strong compressive stress on the surface and tensile stress inside. Therefore, when the tempered glass is irradiated with laser light by a conventional method to form a dicing groove, the crack mainly starts from a cutting groove (crack) formed on the end surface of the substrate on the scanning side of the laser light, and most of them have a thickness direction. The overall situation of stretching. When the crack is formed over the entire depth of the substrate, the substrate is naturally separated along the line to be cut (hereinafter, the substrate is completely cut by cutting and referred to as "full cut"). In this case, the orthogonal scribe step, i.e., the step of forming a dicing groove along a dicing line orthogonal to the previous scribe line becomes extremely difficult.
本發明之課題係在於能比較容易且穩定地對表面已強化之強化玻璃形成所期望的切割溝。 An object of the present invention is to enable a desired cutting groove to be formed on a tempered glass whose surface has been strengthened relatively easily and stably.
本發明之其他課題係在於能容易地將玻璃基板切斷為期望的形狀。 Another object of the present invention is to easily cut a glass substrate into a desired shape.
第1發明之玻璃基板的切割方法,係為將表面具有具備壓縮應力之強化層的強化玻璃予以切割之方法,包含第1步驟、及第2步驟。第1步驟係於強化玻璃之表面形成超過強化層之深度之初期裂痕。第2步驟係對初期裂痕照射雷射光而予以加熱,並且冷卻已加熱之區域,而使裂痕沿著切割預定線伸展。 The method for cutting a glass substrate according to the first aspect of the invention is a method of cutting a tempered glass having a reinforcing layer having a compressive stress on its surface, and includes a first step and a second step. The first step is to form an initial crack that exceeds the depth of the reinforcing layer on the surface of the tempered glass. In the second step, the initial crack is irradiated with laser light to be heated, and the heated region is cooled, and the crack is stretched along the line to be cut.
在此,係於強化玻璃之表面形成超過強化層深度之初期裂痕。其後,對初期裂痕照射雷射光而加熱,並進一步冷卻已加熱之區域。藉此初期裂痕會沿著切割預定線伸展。 Here, an initial crack exceeding the depth of the reinforcing layer is formed on the surface of the tempered glass. Thereafter, the initial crack is irradiated with laser light to be heated, and the heated region is further cooled. Thereby the initial crack will extend along the line to be cut.
第2發明之玻璃基板的切割方法,係為於第1發明之切割方法中,在第1步驟中,初期裂痕的深度係為強化玻璃之強化層的厚度之1.14倍以上,且1.67倍以下。 In the dicing method of the first aspect of the invention, in the first step, the depth of the initial crack is 1.14 times or more and 1.67 times or less the thickness of the reinforced glass reinforcing layer.
在此,在初期裂痕的深度未達強化玻璃之強化層的厚度之1.14倍時,殘留有強化層,而即使在後序步驟中藉由雷射光照射進行加熱處理以及冷卻處理,裂痕也不會伸展,而難以形成切割溝。另一方面,在初期裂痕的深度超過強化玻璃之強化層的厚度之1.67倍時,因為後序步驟中的加熱及冷卻,裂痕會不符預期,或朝與形成切割線之方向不同之方向伸展,而難以形成期望之切割溝。 Here, when the depth of the initial crack is less than 1.14 times the thickness of the reinforcing layer of the tempered glass, the strengthening layer remains, and even if the heat treatment and the cooling treatment are performed by laser irradiation in the subsequent step, the crack does not occur. Stretching, it is difficult to form a cutting groove. On the other hand, when the depth of the initial crack exceeds 1.67 times the thickness of the reinforcing layer of the tempered glass, the crack may be unsatisfactory due to heating and cooling in the subsequent step, or may be extended in a direction different from the direction in which the cutting line is formed. It is difficult to form the desired cutting groove.
因此,在本發明中,係將初期裂痕的深度設為強化玻璃之強化層的厚度之1.14倍以上,且1.67倍以下。因此,能穩定地形成期望的切割溝。 Therefore, in the present invention, the depth of the initial crack is set to be 1.14 times or more and 1.67 times or less the thickness of the reinforcing layer of the tempered glass. Therefore, the desired cutting groove can be stably formed.
第3發明之玻璃基板的切割方法,係於第2發明之切割方法中,在第1步驟中,初期裂痕係為不超過強化玻璃之全厚度的5.4%的深度。 The dicing method of the glass substrate according to the third aspect of the invention is the dicing method according to the second aspect of the invention, wherein in the first step, the initial crack is a depth not exceeding 5.4% of the total thickness of the tempered glass.
初期裂痕的深度即使如同前述為強化層的1.14至1.67倍,在玻璃基板整體的厚度為薄的情況時,當將初期裂痕形成為較深時,會有裂痕不沿切割預定線伸展的情況。 Even if the depth of the initial crack is 1.14 to 1.67 times as described above as the thickness of the reinforcing layer, when the thickness of the entire glass substrate is thin, when the initial crack is formed deep, cracks may not extend along the line to be cut.
因此,在本發明中,係將初期裂痕的深度設為不超過強化玻璃之全厚度的5.4%。因此,能穩定地形成期望的切割溝。 Therefore, in the present invention, the depth of the initial crack is set to not exceed 5.4% of the total thickness of the tempered glass. Therefore, the desired cutting groove can be stably formed.
第4發明之玻璃基板的切割方法,係為將表面具有具備壓縮應力之強化層的強化玻璃予以切割之方法,且包含第1步驟、及2步驟。第1步驟係將初期裂痕形成於由切割預定線之開始掃描側的玻璃基板端面到預定距離內側之強化玻璃表面。第2步驟係除了開始掃描側的端部區域之外,由初期裂痕開始沿著切割預定線照射雷射光而予以加熱,並且冷卻已加熱之區域,而使裂痕沿著切割預定線伸展。 The method for cutting a glass substrate according to the fourth aspect of the invention is a method of cutting a tempered glass having a reinforcing layer having a compressive stress on its surface, and includes the first step and the second step. In the first step, the initial crack is formed on the surface of the tempered glass from the end surface of the glass substrate on the scanning side from the start of the cutting line to the inner side of the predetermined distance. The second step is to heat the laser beam by irradiating the laser light along the line to cut starting from the initial crack, in addition to the end region on the scanning side, and to cool the heated region so that the crack extends along the line to cut.
在此,係於強化玻璃表面形成初期裂痕,其後,對初期裂痕照射雷射光而加熱,並進一步冷卻已加熱之區域。藉此初期裂痕會沿著切割預定線伸展。此時,初期裂痕會形成於由切割預定線之開始掃描側的玻璃基板端面到預定 距離內側之強化玻璃表面,且由該初期裂痕開始照射雷射光。亦即,在由雷射光之開始掃描側之玻璃端面到初期裂痕為止之端部區域,並不進行利用雷射光之加熱以及加熱區域之冷卻處理。 Here, an initial crack is formed on the surface of the tempered glass, and thereafter, the initial crack is irradiated with laser light to be heated, and the heated region is further cooled. Thereby the initial crack will extend along the line to be cut. At this time, the initial crack is formed on the end surface of the glass substrate on the scanning side from the start of the cutting line to the predetermined The tempered glass surface on the inner side is irradiated with laser light from the initial crack. That is, in the end region from the glass end surface on the scanning side from the start of the laser light to the initial crack, the heating by the laser light and the cooling treatment of the heating region are not performed.
如同以上所述,因在雷射光的開始掃描側之端部區域並未照射雷射光,故能避免使用習知方法切割強化玻璃時所產生之基板的自然分離。因此,容易地進行例如正交切割等後序的加工步驟。 As described above, since the end portion of the scanning light on the scanning side is not irradiated with the laser light, the natural separation of the substrate which is produced when the tempered glass is cut by a conventional method can be avoided. Therefore, the subsequent processing steps such as orthogonal cutting are easily performed.
第5發明之之玻璃基板的切割方法,係為於第4發明的切割方法中,於強化玻璃的表面中,在切割預定線的開始掃略側之端部區域,形成反射雷射光之反射膜。而且,第2步驟係對於形成有反射膜之強化玻璃表面執行處理。 In the dicing method according to the fourth aspect of the invention, in the dicing method of the fourth aspect of the invention, the reflective film of the reflected laser light is formed on the surface of the tempered glass at the end portion of the striated side at the beginning of the dicing line. . Further, the second step performs processing on the surface of the tempered glass on which the reflective film is formed.
在形成不照射雷射光之區域時,係能藉由使雷射振盪的導通(on)、及關斷(off)控制與光學系統等之移動同步來形成。但是,如同本發明,藉由在不照射雷射光之區域形成反射膜,能更容易地實施第2步驟。再者,以反射膜而言,可考慮反射雷射光之金屬圖案(pattern)膜、及ITO(Indium Tin Oxide,氧化銦錫)膜等。 When the region where the laser light is not irradiated is formed, it can be formed by synchronizing the ON and OFF control of the laser oscillation with the movement of the optical system or the like. However, as in the present invention, the second step can be more easily performed by forming a reflective film in a region where the laser light is not irradiated. Further, as the reflective film, a metal pattern film for reflecting laser light, an ITO (Indium Tin Oxide) film, or the like can be considered.
第6發明之玻璃基板的切割方法,係為於第4或第5發明的切割方法中,在第2步驟中,在由切割預定線之結束掃描側的玻璃基板端面到預定距離內側為止的端部區域中,停止雷射光照射所進行之加熱以及加熱區域之冷卻。 In the cutting method according to the fourth or fifth aspect of the invention, in the second step, in the second step, the end of the glass substrate on the scanning side from the end of the cutting line is reached to the inner side of the predetermined distance. In the portion region, the heating by the laser irradiation and the cooling of the heating region are stopped.
在此,雷射光並未照射於開始掃描側的端部區域以及結束掃描側的端部區域。因此,能更確實地避免基板的自 然分離。 Here, the laser light is not irradiated on the end region on the scanning side and the end region on the scanning side. Therefore, it is possible to more reliably avoid the self of the substrate Separate.
第7發明之之玻璃基板的切割方法,係為於第6發明的切割方法中,第2步驟係藉由在切割預定線的開始掃描側以及結束掃描側的端部區域形成反射雷射光之反射膜而實施。 The dicing method of the glass substrate according to the seventh aspect of the invention is the dicing method according to the sixth aspect of the invention, wherein the second step is to form a reflection of the reflected laser light by the end portion of the cutting line and the end portion of the scanning side. Implemented as a film.
在此,如同前述,藉由在未照射雷射光的區域形成反射膜,即可更容易地實施第2步驟。 Here, as described above, the second step can be performed more easily by forming the reflective film in the region where the laser light is not irradiated.
第8發明之玻璃基板的切割方法,係於第4發明至第7發明中任一發明的切割方法中,在第1步驟中,初期裂痕的深度係為強化玻璃的強化層厚度之1.14倍以上,且1.67倍以下。 In the dicing method according to any one of the fourth to seventh aspects of the present invention, in the first step, the depth of the initial crack is 1.14 times or more the thickness of the reinforced layer of the tempered glass. And 1.67 times or less.
在此,與第2發明同樣地,能穩定地形成期望之切割溝。 Here, as in the second invention, the desired cutting groove can be stably formed.
第9發明之玻璃基板的切割方法,係於第8發明之切割方法中,在第1步驟中,初期裂痕係為不超過強化玻璃之全厚度的5.4%之深度。 The dicing method of the glass substrate according to the ninth invention is the dicing method according to the eighth aspect of the invention, wherein in the first step, the initial crack is a depth not exceeding 5.4% of the total thickness of the tempered glass.
在此,與第3發明同樣地,能穩定地形成期望之切割溝。 Here, as in the third invention, the desired cutting groove can be stably formed.
如同以上所述,在本發明中,能對於表面已強化之強化玻璃,比較容易且穩定地形成期望的切割溝。 As described above, in the present invention, it is possible to form a desired cutting groove relatively easily and stably for the tempered glass whose surface has been strengthened.
此外,在其他觀點之發明中,係當對表面已強化之強化玻璃形成切割溝時,能防止完全切割,並能容易地將玻璃基板切斷為期望的形狀。 Further, in another aspect of the invention, when the tempered glass having the surface strengthened is formed into a dicing groove, complete dicing can be prevented, and the glass substrate can be easily cut into a desired shape.
第1圖係為用以實施本發明第1實施形態之方法的切割裝置之概略構成的圖。切割裝置1係例如為將母玻璃基板分割為使用於FPD(平板顯示器)之複數個基板的裝置。此處之玻璃基板,主要係使用表面形成有強化層之化學強化玻璃。如同前述,該化學強化玻璃係藉由離子交換而於表面具有具備壓縮應力之強化層。 Fig. 1 is a view showing a schematic configuration of a cutting device for carrying out the method of the first embodiment of the present invention. The dicing apparatus 1 is, for example, a device that divides a mother glass substrate into a plurality of substrates used for an FPD (Flat Panel Display). Here, the glass substrate is mainly a chemically strengthened glass in which a reinforcing layer is formed on the surface. As described above, the chemically strengthened glass has a reinforcing layer having a compressive stress on the surface by ion exchange.
切割裝置1係具備將雷射光束(laser beam)朝向玻璃基板G照射之照射部2、冷卻部3、及未圖示之移動部。冷卻部3係透過噴嘴(nozzle)4而噴射未圖示之冷媒源,以形成冷卻部位(spot)CP。移動部係在與玻璃基板G之間,使照射部2以及冷卻部3的噴嘴4,沿著設定於玻璃基板G的切割預定線SL1至SL5相對移動。 The dicing apparatus 1 includes an illuminating unit 2 that irradiates a laser beam toward the glass substrate G, a cooling unit 3, and a moving unit (not shown). The cooling unit 3 sprays a refrigerant source (not shown) through a nozzle 4 to form a cooling spot CP. The moving portion is moved between the glass substrate G and the nozzles 4 of the irradiation unit 2 and the cooling unit 3 along the planned cutting lines SL1 to SL5 set on the glass substrate G.
照射部2係具有照射雷射光束LB之雷射振盪器(例如,CO2雷射),並透過光學系統將該雷射光束LB作為光束點(beam spot)LS,照射至玻璃基板G上。 The illuminating unit 2 has a laser oscillator (for example, a CO 2 laser) that irradiates the laser beam LB, and irradiates the laser beam LB as a beam spot LS through the optical system to the glass substrate G.
再者,此處雖未圖示,但係設置有初期裂痕形成手段,係用以於玻璃基板G之端部形成作為切割起點之初期裂痕。以初期裂痕形成手段而言,雖使用壓痕器或刀輪(cutter wheel)等機械性工具,但亦能藉由雷射剝蝕(laser ablation)加工形成初期裂痕。 Further, although not shown in the drawings, an initial crack forming means is provided for forming an initial crack as a cutting starting point at the end portion of the glass substrate G. In the initial crack formation means, although a mechanical tool such as an indenter or a cutter wheel is used, an initial crack can be formed by laser ablation processing.
首先,如第1圖所示,使用刀輪等初期裂痕形成手段而於玻璃基板G的端部形成作為切割起點之初期裂痕TR。此時,初期裂痕的深度係設為將形成於強化玻璃表面之具有壓縮應力的強化層予以去除之程度的深度。具體而言,係將初期裂痕的深度強化層厚度之1.14倍以上且1.67倍以下。 First, as shown in Fig. 1, an initial crack TR as a cutting starting point is formed at the end of the glass substrate G by using an initial crack forming means such as a cutter wheel. At this time, the depth of the initial crack is a depth to the extent that the reinforcing layer having the compressive stress formed on the surface of the tempered glass is removed. Specifically, the thickness of the deep strengthening layer of the initial crack is 1.14 times or more and 1.67 times or less.
接著,由照射部2對玻璃基板G照射雷射光束LB。該雷射光束LB係作為光束點LS照射於玻璃基板G上。而且,由照射部2射出之雷射光束LB係沿著切割預定線SL而與玻璃基板G相對性地移動。玻璃基板G係藉由光束點LS而被加熱至低於玻璃基板G的軟化點之溫度。此外,使冷卻部位CP跟隨於光束點LS之移動方向後方。 Next, the glass substrate G is irradiated with the laser beam LB by the irradiation unit 2. This laser beam LB is irradiated onto the glass substrate G as a beam spot LS. Further, the laser beam LB emitted from the illuminating unit 2 moves relative to the glass substrate G along the planned cutting line SL. The glass substrate G is heated to a temperature lower than the softening point of the glass substrate G by the beam spot LS. Further, the cooling portion CP is caused to follow the moving direction of the beam spot LS.
如以上方式,雖因雷射光束LB之照射而於已加熱之光束點LS的附近產生壓縮應力,但於其瞬後,藉由噴射冷媒而產生冷卻部位CP,故會產生對形成垂直裂紋(crack)有效之拉伸應力。藉由該拉伸應力,以形成於玻璃基板G之端部的初期裂痕TR為起點,並沿著切割預定線SL形成垂直裂紋,且形成期望之切割溝。 As described above, although the compressive stress is generated in the vicinity of the heated beam spot LS due to the irradiation of the laser beam LB, after the instant, the cooling portion CP is generated by the injection of the refrigerant, so that vertical cracks are formed. Crack) Effective tensile stress. By the tensile stress, the initial crack TR formed at the end portion of the glass substrate G is used as a starting point, and a vertical crack is formed along the line to cut SL, and a desired dicing groove is formed.
首先,如第2圖所示,準備於4邊端部區域形成有反射雷射光之反射膜RC1至RC4的玻璃基板G。反射膜RC1係當沿著切割預定線SL1,SL2執行形成切割溝的處理(以下,記載為切割處理)時,形成於照射雷射光之開始掃描側的端部區域。反射膜RC2係於沿著切割預定線SL1,SL2執 行切割處理時,形成於照射雷射光之結束掃描側的端部區域。此外,反射膜RC3係於沿著切割預定線SL3,SL4,SL5執行切割處理時,形成於照射雷射光之開始掃描側的端部區域,且反射膜RC4係於沿著切割預定線SL3,SL4,SL5執行切割處理時,形成於照射雷射光之結束掃描側的端部區域。再者,形成於開始掃描側的端部區域之反射膜RC1,RC3,係宜為3mm至5mm的寬度。此外,形成於結束掃描側的端部區域之反射膜RC2,RC4,係宜為8mm至20mm的寬度。 First, as shown in Fig. 2, a glass substrate G on which the reflection films RC1 to RC4 reflecting the laser light are formed is formed in the four end portions. The reflection film RC1 is formed in an end region on the scanning start side where the laser beam is irradiated when the dicing groove is formed along the planned cutting lines SL1 and SL2 (hereinafter referred to as a dicing process). The reflective film RC2 is attached along the cutting line SL1, SL2 In the row cutting process, it is formed in an end region on the scanning side where the laser light is irradiated. Further, the reflective film RC3 is formed on the end portion of the scanning side on which the laser light is irradiated when the cutting process is performed along the cutting planned lines SL3, SL4, SL5, and the reflecting film RC4 is tied along the cutting line SL3, SL4. When SL5 performs the dicing process, it is formed in the end region on the scanning side where the laser light is irradiated. Further, the reflection films RC1, RC3 formed at the end regions on the scanning side are preferably 3 mm to 5 mm wide. Further, the reflection films RC2, RC4 formed on the end region on the side of the scanning side are preferably a width of 8 mm to 20 mm.
接著,使用刀輪等初期裂痕形成手段,於玻璃基板G的端部形成作為切割起點之初期裂痕TR。此時,初期裂痕的位置係鄰接於反射膜,且為其內側。此時,初期裂痕的深度係設為將形成於強化玻璃表面之具有壓縮應力的強化層予以去除之程度的深度。具體而言,係將初期裂痕的深度設為強化層厚度之1.14倍以上且1.67倍以下。 Next, an initial crack TR as a cutting start point is formed on the end portion of the glass substrate G by using an initial crack forming means such as a cutter wheel. At this time, the position of the initial crack is adjacent to the reflective film and is the inner side thereof. At this time, the depth of the initial crack is a depth to the extent that the reinforcing layer having the compressive stress formed on the surface of the tempered glass is removed. Specifically, the depth of the initial crack is set to be 1.14 times or more and 1.67 times or less of the thickness of the reinforcing layer.
接著,由照射部2對玻璃基板G照射雷射光束LB。該雷射光束LB係作為光束點LS照射於玻璃基板G上。而且,由照射部2射出之雷射光束LB係沿著各切割預定線SL1至SL5而與玻璃基板G相對性地移動。 Next, the glass substrate G is irradiated with the laser beam LB by the irradiation unit 2. This laser beam LB is irradiated onto the glass substrate G as a beam spot LS. Further, the laser beam LB emitted from the illuminating unit 2 moves relative to the glass substrate G along the respective cutting planned lines SL1 to SL5.
此時,在開始掃描側以及結束掃描側的端部區域,因形成有反射膜RC1至RC4,故雷射光束LB在該等端部區域反射,而不會照射至玻璃基板G。因此,玻璃基板G在形成有該等反射膜RC1至RC4的區域中不會被加熱。 At this time, since the reflection films RC1 to RC4 are formed in the end regions on the scanning side and the end scanning side, the laser beam LB is reflected in the end regions without being irradiated to the glass substrate G. Therefore, the glass substrate G is not heated in the region where the reflection films RC1 to RC4 are formed.
在未形成有反射膜RC1至RC4的區域中,玻璃基板G係藉由光束點LS而被加熱至低於玻璃基板G之軟化點的溫 度。此外,藉由使冷卻部位CP跟隨於光束點LS之移動方向後方,而冷卻經加熱之區域。 In a region where the reflective films RC1 to RC4 are not formed, the glass substrate G is heated to a temperature lower than the softening point of the glass substrate G by the beam spot LS. degree. Further, the heated region is cooled by causing the cooling portion CP to follow the moving direction of the beam spot LS.
如以上方式,雖因雷射光束LB之照射而於已加熱之光束點LS的附近產生壓縮應力,但因於其瞬後藉由噴射冷媒而形成冷卻部位CP,故會產生對形成垂直裂紋有效之拉伸應力。藉由該拉伸應力,以形成於玻璃基板G之端部的初期裂痕TR為起點,並沿著切割預定線SL形成垂直裂紋,且形成期望之切割溝。而且,在未照射雷射光束LB之端部區域中,即使裂痕未伸展或裂痕有伸展,皆僅為淺的區域。 As described above, although the compressive stress is generated in the vicinity of the heated beam spot LS due to the irradiation of the laser beam LB, since the cooling portion CP is formed by the injection of the refrigerant in an instant, it is effective for forming the vertical crack. Tensile stress. By the tensile stress, the initial crack TR formed at the end portion of the glass substrate G is used as a starting point, and a vertical crack is formed along the line to cut SL, and a desired dicing groove is formed. Moreover, in the end region where the laser beam LB is not irradiated, even if the crack is not stretched or the crack is stretched, it is only a shallow region.
在如同以上之切割方法中,裂痕不會由初期裂痕伸展至玻璃基板G的全深度,而能防止基板自然地切斷。 In the cutting method like the above, the crack does not extend from the initial crack to the full depth of the glass substrate G, and the substrate can be prevented from being naturally cut.
第3圖係顯示習知方法、亦即無須形成反射膜而由切割預定線之開始端到結束端為止進行雷射加熱以及冷卻之情況的例。基板係為整體厚度0.7mm且強化層厚度為18μm之強化玻璃。此外,雷射光束的條件,係雷射輸出為200W、掃描速度為200mm/sec。再者,在第3圖中,未顯示玻璃基板的端部區域。 Fig. 3 shows an example of a conventional method, that is, a case where laser heating and cooling are performed from the start end to the end end of the planned cutting line without forming a reflecting film. The substrate was a tempered glass having an overall thickness of 0.7 mm and a reinforcing layer thickness of 18 μm. In addition, the condition of the laser beam is a laser output of 200 W and a scanning speed of 200 mm/sec. Further, in Fig. 3, the end region of the glass substrate is not shown.
第3圖(a)係為切割瞬後之狀態。在此,切割線(切割溝)係為未伸展遍及基板全深度的狀態(以下,將此狀態記載為「半切割」(half cut)),且在圖示中以淺色線表示。 Figure 3 (a) shows the state after the cutting. Here, the cutting line (cutting groove) is in a state in which the entire depth of the substrate is not stretched (hereinafter, this state is described as "half cut"), and is indicated by a light color line in the drawing.
第3圖(b)係為切割處理開始5秒後的狀態。在此,切割線係由切割的開始點側(圖示右側)到圖示中央附近為 止被完全切割(在圖示中以深色線表示)。 Fig. 3(b) shows the state after 5 seconds from the start of the cutting process. Here, the cutting line is from the start point side of the cut (the right side of the figure) to the vicinity of the center of the figure. It is completely cut (indicated by dark lines in the illustration).
第3圖(b)係為切割處理開始20秒後的狀態。在此,在以圖示表示之全部部分中,切割線被完全切割(在圖示中以深色線表示)。 Fig. 3(b) shows the state after 20 seconds from the start of the cutting process. Here, in all the parts shown in the drawing, the cutting line is completely cut (indicated by a dark line in the drawing).
如此,遍及由切割預定線之開始端到結束端為止之全部,而進行雷射加熱以及冷卻時,基板被自然地切斷(被完全切斷) In this way, the substrate is naturally cut (completely cut) when laser heating and cooling are performed from the start end to the end end of the line to cut.
第1表係顯示包含以第2實施形態之切割方法進行切割處理之例的驗證結果。在此,成為對象之玻璃基板係為與第3圖所示之比較例相同。此外,雷射光束之條件亦與第3圖所示之比較例相同。 The first table shows the results of verification including an example in which the cutting process was performed by the cutting method of the second embodiment. Here, the glass substrate to be used is the same as the comparative example shown in FIG. In addition, the conditions of the laser beam are also the same as those of the comparative example shown in FIG.
於第1表中,「基板Edge Start」係意指切割(掃描)開始側之基板端部,「基板Edge End」係意指切割(掃描)結束側之基板端部。此外,「遮蔽」係意指反射膜。再者,「n/5」係表示進行5次切割處理,不構成完全切斷而可達成n次半切斷的切割處理。 In the first table, "substrate Edge Start" means the end portion of the substrate on the cutting (scanning) start side, and "substrate edge end" means the end portion of the substrate on the cutting (scanning) end side. Further, "shadowing" means a reflective film. In addition, "n/5" means that the dicing process is performed five times, and the dicing process of n-times and half-cutting is not completed.
此外,在此等例中,初期裂痕係形成於由切割(掃描)開始側之基板端面進入10mm內側的位置。 Further, in these examples, the initial crack is formed at a position on the inner side of the substrate which is cut (scanned) on the side of the substrate by 10 mm.
再者,遮蔽條件係如下所述。 Furthermore, the shielding conditions are as follows.
「基板Edge Start」:當遮蔽初期裂痕時,因裂痕未伸展,故以不遮蔽初期裂痕的方式,遮蔽距切割(掃描)開始側之基板端面5mm的範圍。 "Substrate Edge Start": When the initial crack is shielded, since the crack is not stretched, the range of 5 mm from the end surface of the substrate on the cutting start (scanning) side is masked so as not to cover the initial crack.
「基板Edge End」:遮蔽距切割(掃描)結束側之基板 端面10mm的範圍。再者,關於遮蔽結束側,在寬度為5mm時,裂痕會有自然地伸展至端面部為止,而由該處成為完全切斷的情況。因此,未完全切斷之切割(掃描)結束側的遮蔽寬度,宜為8mm以上。 "Substrate Edge End": a substrate that is shielded from the end side of the cutting (scanning) The range of the end face is 10 mm. Further, regarding the end side of the mask, when the width is 5 mm, the crack naturally extends to the end surface portion, and the portion is completely cut. Therefore, the shielding width at the end of the cutting (scanning) which is not completely cut is preferably 8 mm or more.
以反射膜而言,在第1表的實驗中,係將鋁箔膠帶(aluminum tape)黏貼於基板表面來應對。 In the case of the reflective film, in the experiment of the first table, an aluminum foil tape was adhered to the surface of the substrate to cope with it.
以如同以上之條件,從玻璃基板之端部到端部為止遍及整體的線照射雷射光束。 Under the above conditions, the laser beam is irradiated from the end portion to the end portion of the glass substrate over the entire line.
由第1表之驗證可得知,在設為雷射光束至少不照射至切割開始側的端部區域時(設為反射雷射光束),能以40%的機率實現半切斷之切割。而且,除了遮蔽切割開始側之外亦遮蔽切割結束側時,能以100%的機率實現半切斷之切割。 As can be seen from the verification of the first table, when it is assumed that the laser beam is not irradiated at least to the end region on the cutting start side (the reflected laser beam is reflected), the half-cut cutting can be realized with a 40% probability. Further, when the cutting end side is shielded in addition to the mask cutting start side, the half cut cutting can be achieved with a probability of 100%.
另一方面,不遮蔽切割開始側,而僅遮蔽切割結束側時,能實現半切斷之切割的機率減少為20%。此外,在雙方之端部區域不遮蔽時,第3圖中雖亦有顯示,但無法實現半切斷的切割,而變成完全切斷。 On the other hand, when the cutting start side is not shielded and only the cutting end side is shielded, the probability of cutting by half cutting can be reduced to 20%. In addition, when the end regions of both sides are not shielded, although they are also shown in Fig. 3, the cutting of the half cut is not possible, and the cutting is completely cut off.
接著,將有關初期裂痕之深度的實驗例顯示如下。 Next, an experimental example regarding the depth of the initial crack is shown below.
第4圖及第2表係為顯示對整體厚度0.55mm且強化層厚度為18μm之強化玻璃形成切割溝之實驗例1。具體而言,第4圖及第2表係顯示形成初期裂痕時之工具(壓痕器)對玻璃之按壓負載與當時的溝深度之關係,並且顯示其後之雷射加熱以及冷卻處理所進行之切割結果。 Fig. 4 and Fig. 2 are Experimental Example 1 showing the formation of a dicing groove for a tempered glass having an overall thickness of 0.55 mm and a thickness of the reinforcing layer of 18 μm. Specifically, Fig. 4 and Fig. 2 show the relationship between the pressing load of the glass (indenter) and the groove depth at the time of forming the initial crack, and the subsequent laser heating and cooling treatment are performed. The result of the cutting.
此時供加熱處理用的雷射輸出係為200W、且加工速度係為230mm/sec。此外,冷卻條件係為於光束後端高度4mm的位置配置冷卻噴嘴,並將冷卻水以及空氣(air)送出至以射束點加熱之部分。 At this time, the laser output for heat treatment was 200 W, and the processing speed was 230 mm/sec. Further, the cooling condition is such that a cooling nozzle is disposed at a position where the rear end of the beam is 4 mm in height, and cooling water and air are sent to a portion heated at the beam spot.
由該實驗例1可得知,若初期裂痕的溝深度為19至30μm(強化層厚度之1.05至1.67倍),則能沿著切割預定線形成期望之切割溝。而且,可得知當裂痕在溝深度未達19μm時無法確實地伸展(不穩定),且當超過30μm時會產生破裂,而於切割預定線以外形成裂痕。 From the experimental example 1, it is understood that if the groove depth of the initial crack is 19 to 30 μm (1.05 to 1.67 times the thickness of the reinforcing layer), the desired cutting groove can be formed along the line to be cut. Further, it was found that cracks could not be surely stretched (unstable) when the groove depth was less than 19 μm, and cracks were generated when it exceeded 30 μm, and cracks were formed outside the line to be cut.
再者,將初期裂痕的溝深度之例顯示於第5圖。如該第5圖所示,將到達確保預定面積之最深的部分為止之深度設為「溝深度」,且忽略一部分尖銳地到達深部為止之裂痕。 Further, an example of the groove depth of the initial crack is shown in Fig. 5. As shown in FIG. 5, the depth until the deepest portion of the predetermined area is reached is referred to as "ditch depth", and a portion of the crack that reaches the deep portion sharply is ignored.
第6圖及第3表係為顯示對整體厚度0.7mm且強化層厚度為21μm之強化玻璃形成切割溝之實驗例2。圖示之橫軸與縱軸關係係與第4圖相同。此外,此時供加熱處理用的雷射輸出係為200W、且加工速度係為170mm/sec。此外,冷卻條件係與實驗例1相同。 Fig. 6 and Fig. 3 show Experimental Example 2 in which a dicing groove was formed for a tempered glass having an overall thickness of 0.7 mm and a thickness of the reinforcing layer of 21 μm. The relationship between the horizontal axis and the vertical axis shown in the figure is the same as in Fig. 4. Further, at this time, the laser output for the heat treatment was 200 W, and the processing speed was 170 mm/sec. Further, the cooling conditions were the same as in Experimental Example 1.
由該實驗例2可得知,若初期裂痕的溝深度為24至50μm(強化層厚度之1.14至2.38倍),則沿著切割預定線形成期望之切割溝。而且,可得知當裂痕在溝深度未達24μm時無法確實地伸展(不穩定),且當超過50μm時會產生破裂,而於切割預定線以外形成裂痕。再者,若按壓負載為約6至24N,則即使溝深度超過50μm,亦能形成期望之切割溝,但當僅注重溝深度時,則初期裂痕之溝深度為約24至50μm較妥當。 From the experimental example 2, it is understood that if the groove depth of the initial crack is 24 to 50 μm (1.14 to 2.38 times the thickness of the reinforcing layer), a desired cutting groove is formed along the line to be cut. Further, it was found that cracks could not be surely stretched (unstable) when the groove depth was less than 24 μm, and cracks were generated when it exceeded 50 μm, and cracks were formed outside the line to be cut. Further, if the pressing load is about 6 to 24 N, the desired cutting groove can be formed even if the groove depth exceeds 50 μm, but when only the groove depth is emphasized, the groove depth of the initial crack is preferably about 24 to 50 μm.
第7圖及第4表係為顯示對整體厚度1.1mm且強化層厚度為34μm之強化玻璃形成切割溝之實驗例3。圖示之橫軸與縱軸關係係與第4圖相同。此外,此時供加熱處理用的雷射輸出係為200W、且加工速度係為170mm/sec。此外,冷卻條件係與實驗例1相同。 Fig. 7 and Fig. 4 show Experimental Example 3 in which a dicing groove was formed for a tempered glass having an overall thickness of 1.1 mm and a thickness of the reinforcing layer of 34 μm. The relationship between the horizontal axis and the vertical axis shown in the figure is the same as in Fig. 4. Further, at this time, the laser output for the heat treatment was 200 W, and the processing speed was 170 mm/sec. Further, the cooling conditions were the same as in Experimental Example 1.
由該實驗例3可得知,若初期裂痕的溝深度為24至60μm(強化層厚度之0.71至1.76倍),則能沿著切割預定線形成期望之切割溝。而且,可得知當裂痕在溝深度太淺時無法確實地伸展(不穩定),且當超過60μm時裂痕伸展會不穩定。再者,與實驗例2相同地,若按壓負載為約6N至24N,則即使溝深度超過60μm,亦能形成期望之切割溝,但當僅注重溝深度時,則初期裂痕之溝深度為約24至60μm較妥當。 As is apparent from the experimental example 3, if the groove depth of the initial crack is 24 to 60 μm (0.71 to 1.76 times the thickness of the reinforcing layer), the desired cutting groove can be formed along the line to be cut. Moreover, it can be known that when the crack is too shallow when the groove depth is too shallow (unstable), the crack stretching is unstable when it exceeds 60 μm. Further, in the same manner as in Experimental Example 2, if the pressing load is about 6 N to 24 N, the desired cutting groove can be formed even if the groove depth exceeds 60 μm, but when only the groove depth is emphasized, the groove depth of the initial crack is about 24 to 60 μm is more appropriate.
根據以上可得知,為了要沿著切割預定線形成期望之切割溝,初期裂痕的深度較佳為強化玻璃的強化層厚度之1.14倍以上且1.67倍以下。此外,亦可得知初期裂痕的深度宜為:玻璃板厚在0.55mm時為30μm(5.5%)以下、玻璃板厚在0.7mm時為50μm(7.1%)以下、及玻璃板厚在1.1mm時為60μm(5.4%)以下。此情形係顯示初期裂痕的深度宜為玻璃板厚之5.4%以下。 From the above, it can be seen that the depth of the initial crack is preferably 1.14 times or more and 1.67 times or less the thickness of the reinforcing layer of the tempered glass in order to form a desired dicing groove along the line to be cut. Further, it is also known that the depth of the initial crack is preferably 30 μm (5.5%) or less when the thickness of the glass sheet is 0.55 mm, 50 μm (7.1%) or less when the thickness of the glass sheet is 0.7 mm, and the thickness of the glass sheet is 1.1 mm. The time is 60 μm (5.4%) or less. In this case, the depth of the initial crack is preferably 5.4% or less of the thickness of the glass sheet.
(1)在第2實施形態中,因不對切割線的開始掃描側以及結束掃描側的端部區域照射雷射光,故能實現基板的半切斷,並能避免基板的自然分離。因此,容易進行正交切割等之後的加工步驟。 (1) In the second embodiment, since the laser beam is irradiated to the end portion on the scanning side and the scanning end side of the cutting line, the substrate can be half-cut and the natural separation of the substrate can be avoided. Therefore, it is easy to perform a processing step after orthogonal cutting or the like.
(2)於第2實施形態中,就為了不被雷射光束照射的手段而言,因於基板的兩端部區域形成反射膜,故能容易 地形成雷射光束的非照射區域。 (2) In the second embodiment, it is easy to form a reflection film on both end portions of the substrate in order not to be irradiated by the laser beam. The ground forms a non-irradiated area of the laser beam.
(3)於形成初期裂痕時,因將初期裂痕的深度設為強化玻璃的強化層厚度之1.14倍以上且1.67倍以下,故能穩定地形成期望之切割溝。 (3) When the initial crack is formed, the depth of the initial crack is set to be 1.14 times or more and 1.67 times or less the thickness of the reinforcing layer of the tempered glass, so that the desired dicing groove can be stably formed.
(4)因將初期裂痕的深度設為強化玻璃之全厚度的5.4%以下,故能抑制裂痕朝未預期之方向伸展。 (4) Since the depth of the initial crack is set to 5.4% or less of the total thickness of the tempered glass, it is possible to suppress the crack from spreading in an unexpected direction.
本發明並非限定於以上之實施形態,並能在不脫離本發明之範圍下進行種種變形或修正。 The present invention is not limited to the above embodiments, and various modifications and changes can be made without departing from the scope of the invention.
在前述第2實施形態中,雖於基板形成反射膜而形成雷射光束的非照射區域,但亦可於各端部區域關斷雷射振盪而形成雷射光束的非照射區域。 In the second embodiment, the non-irradiation region of the laser beam is formed by forming the reflection film on the substrate. However, the laser beam may be turned off at each end region to form a non-irradiation region of the laser beam.
1‧‧‧切割裝置 1‧‧‧ cutting device
2‧‧‧照射部 2‧‧‧ Department of Irradiation
3‧‧‧冷卻部 3‧‧‧ Cooling Department
4‧‧‧噴嘴 4‧‧‧ nozzle
CP‧‧‧冷卻部位 CP‧‧‧ Cooling parts
G‧‧‧玻璃基板 G‧‧‧glass substrate
LB‧‧‧雷射光束 LB‧‧‧Laser beam
LS‧‧‧光束點 LS‧‧‧beam point
RC1、RC2、RC3、RC4‧‧‧反射膜 RC1, RC2, RC3, RC4‧‧·reflective film
SL1、SL2、SL3、SL4、SL5‧‧‧切割預定線 SL1, SL2, SL3, SL4, SL5‧‧‧ cutting line
TR‧‧‧切割起點(初期裂痕) TR‧‧‧ cutting starting point (initial crack)
第1圖係為用以實施本發明第1實施形態之切割方法的裝置之概略構成圖。 Fig. 1 is a schematic configuration diagram of an apparatus for carrying out the cutting method according to the first embodiment of the present invention.
第2圖係為用以實施本發明第2實施形態之切割方法的裝置之概略構成圖。 Fig. 2 is a schematic configuration diagram of an apparatus for carrying out the cutting method according to the second embodiment of the present invention.
第3圖係為顯示在藉由習知方法實施切割時基板自然地分離之模樣的圖。 Fig. 3 is a view showing a pattern in which the substrate is naturally separated when the cutting is performed by a conventional method.
第4圖係為顯示用以對厚度0.55mm之強化玻璃形成初期裂痕之按壓負載與初期裂痕之關係以及切割結果的圖。 Fig. 4 is a view showing the relationship between the pressing load and the initial crack for forming the initial crack of the tempered glass having a thickness of 0.55 mm, and the cutting result.
第5圖係為形成有初期裂痕之強化玻璃一部分的放大剖面圖。 Fig. 5 is an enlarged cross-sectional view showing a part of the tempered glass in which the initial crack is formed.
第6圖係為顯示用以對厚度0.7mm之強化玻璃形成初期裂痕之按壓負載與初期裂痕之關係以及切割結果的圖。 Fig. 6 is a view showing the relationship between the pressing load and the initial crack for forming the initial crack of the tempered glass having a thickness of 0.7 mm, and the cutting result.
第7圖係為顯示用以對厚度1.1mm之強化玻璃形成初期裂痕之按壓負載與初期裂痕之關係以及切割結果的圖。 Fig. 7 is a view showing the relationship between the pressing load and the initial crack for forming the initial crack of the tempered glass having a thickness of 1.1 mm, and the cutting result.
1‧‧‧切割裝置 1‧‧‧ cutting device
2‧‧‧照射部 2‧‧‧ Department of Irradiation
3‧‧‧冷卻部 3‧‧‧ Cooling Department
4‧‧‧噴嘴 4‧‧‧ nozzle
CP‧‧‧冷卻部位 CP‧‧‧ Cooling parts
G‧‧‧玻璃基板 G‧‧‧glass substrate
LB‧‧‧雷射光束 LB‧‧‧Laser beam
LS‧‧‧光束點 LS‧‧‧beam point
SL‧‧‧切割預定線 SL‧‧‧ cutting line
TR‧‧‧切割起點(初期裂痕) TR‧‧‧ cutting starting point (initial crack)
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