JP2013069812A5 - - Google Patents

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Publication number
JP2013069812A5
JP2013069812A5 JP2011206557A JP2011206557A JP2013069812A5 JP 2013069812 A5 JP2013069812 A5 JP 2013069812A5 JP 2011206557 A JP2011206557 A JP 2011206557A JP 2011206557 A JP2011206557 A JP 2011206557A JP 2013069812 A5 JP2013069812 A5 JP 2013069812A5
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JP
Japan
Prior art keywords
charged particle
particle beams
shielding plate
irradiation
blocked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011206557A
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English (en)
Japanese (ja)
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JP2013069812A (ja
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Publication date
Application filed filed Critical
Priority to JP2011206557A priority Critical patent/JP2013069812A/ja
Priority claimed from JP2011206557A external-priority patent/JP2013069812A/ja
Priority to US13/612,978 priority patent/US20130071791A1/en
Priority to KR1020120101434A priority patent/KR20130031788A/ko
Publication of JP2013069812A publication Critical patent/JP2013069812A/ja
Publication of JP2013069812A5 publication Critical patent/JP2013069812A5/ja
Pending legal-status Critical Current

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JP2011206557A 2011-09-21 2011-09-21 荷電粒子線照射装置、荷電粒子線描画装置及び物品製造方法 Pending JP2013069812A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011206557A JP2013069812A (ja) 2011-09-21 2011-09-21 荷電粒子線照射装置、荷電粒子線描画装置及び物品製造方法
US13/612,978 US20130071791A1 (en) 2011-09-21 2012-09-13 Charged particle beam irradiation apparatus, charged particle beam drawing apparatus, and method of manufacturing article
KR1020120101434A KR20130031788A (ko) 2011-09-21 2012-09-13 하전 입자 빔 조사 장치, 하전 입자 빔 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011206557A JP2013069812A (ja) 2011-09-21 2011-09-21 荷電粒子線照射装置、荷電粒子線描画装置及び物品製造方法

Publications (2)

Publication Number Publication Date
JP2013069812A JP2013069812A (ja) 2013-04-18
JP2013069812A5 true JP2013069812A5 (enExample) 2014-09-25

Family

ID=47880974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011206557A Pending JP2013069812A (ja) 2011-09-21 2011-09-21 荷電粒子線照射装置、荷電粒子線描画装置及び物品製造方法

Country Status (3)

Country Link
US (1) US20130071791A1 (enExample)
JP (1) JP2013069812A (enExample)
KR (1) KR20130031788A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101847429B1 (ko) * 2014-06-19 2018-04-10 후지필름 가부시키가이샤 감방사선성 또는 감활성광선성 수지 조성물과 그것을 이용한 레지스트막, 마스크 블랭크, 레지스트 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 전자 디바이스
JP2018078250A (ja) * 2016-11-11 2018-05-17 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置
US11532760B2 (en) 2017-05-22 2022-12-20 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
US11117195B2 (en) 2018-07-19 2021-09-14 The University Of Liverpool System and process for in-process electron beam profile and location analyses

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
JP3107593B2 (ja) * 1991-06-10 2000-11-13 富士通株式会社 パターン検査装置
JPH06124884A (ja) * 1992-10-12 1994-05-06 Mitsubishi Electric Corp 電子線露光装置
JP3489644B2 (ja) * 1995-11-10 2004-01-26 富士通株式会社 荷電粒子ビーム露光方法及び装置
JP3393983B2 (ja) * 1997-11-26 2003-04-07 東芝機械株式会社 荷電粒子ビーム露光装置
TW405062B (en) * 1999-02-18 2000-09-11 Asm Lithography Bv Lithographic projection apparatus
JP3146201B2 (ja) * 1999-06-11 2001-03-12 株式会社日立製作所 電子線描画装置
US6483117B1 (en) * 1999-06-16 2002-11-19 Nikon Corporation Symmetric blanking for high stability in electron beam exposure systems
EP1273907A4 (en) * 2000-11-17 2006-08-30 Ebara Corp METHOD AND INSTRUMENT FOR WAFER INSPECTION AND ELECTRON BEAM
JP2003077813A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の評価方法、荷電粒子線露光装置の調整方法、ビームぼけ計測装置及び荷電粒子線露光装置
JP4738723B2 (ja) * 2003-08-06 2011-08-03 キヤノン株式会社 マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法

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