JP2012518902A5 - - Google Patents

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Publication number
JP2012518902A5
JP2012518902A5 JP2011550596A JP2011550596A JP2012518902A5 JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5 JP 2011550596 A JP2011550596 A JP 2011550596A JP 2011550596 A JP2011550596 A JP 2011550596A JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5
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JP
Japan
Prior art keywords
lithographic apparatus
common
rows
charged particle
robot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011550596A
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English (en)
Japanese (ja)
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JP2012518902A (ja
JP5539406B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2010/052221 external-priority patent/WO2010094804A1/en
Publication of JP2012518902A publication Critical patent/JP2012518902A/ja
Publication of JP2012518902A5 publication Critical patent/JP2012518902A5/ja
Application granted granted Critical
Publication of JP5539406B2 publication Critical patent/JP5539406B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011550596A 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体 Expired - Fee Related JP5539406B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US15441109P 2009-02-22 2009-02-22
US15441509P 2009-02-22 2009-02-22
US61/154,411 2009-02-22
US61/154,415 2009-02-22
US28940709P 2009-12-23 2009-12-23
US61/289,407 2009-12-23
US30633310P 2010-02-19 2010-02-19
US61/306,333 2010-02-19
PCT/EP2010/052221 WO2010094804A1 (en) 2009-02-22 2010-02-22 Lithography machine and substrate handling arrangement

Publications (3)

Publication Number Publication Date
JP2012518902A JP2012518902A (ja) 2012-08-16
JP2012518902A5 true JP2012518902A5 (https=) 2013-04-11
JP5539406B2 JP5539406B2 (ja) 2014-07-02

Family

ID=42035939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550596A Expired - Fee Related JP5539406B2 (ja) 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体

Country Status (6)

Country Link
US (1) US20110049393A1 (https=)
EP (1) EP2399271B1 (https=)
JP (1) JP5539406B2 (https=)
KR (1) KR20110139699A (https=)
CN (1) CN102414776A (https=)
WO (1) WO2010094804A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
EP2681624B1 (en) * 2010-12-14 2016-07-20 Mapper Lithography IP B.V. Lithography system and method of processing substrates in such a lithography system
CN106933063B (zh) * 2012-03-20 2019-01-18 迈普尔平版印刷Ip有限公司 电子射束光刻系统
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
CN104428866A (zh) 2012-05-14 2015-03-18 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
NL2010624C2 (en) 2013-04-08 2014-10-09 Mapper Lithography Ip Bv Cabinet for electronic equipment.
KR20160044005A (ko) * 2013-08-16 2016-04-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 프로그램가능한 패터닝 디바이스 및 리소그래피 방법
KR102919104B1 (ko) 2020-02-03 2026-01-29 아이엠에스 나노패브릭케이션 게엠베하 멀티―빔 라이터의 블러 변화 보정
WO2021193369A1 (ja) * 2020-03-26 2021-09-30 国立研究開発法人物質・材料研究機構 走査型電子顕微鏡用電子銃チャンバー、これを含む電子銃及び走査電子顕微鏡
KR102922552B1 (ko) 2020-04-24 2026-02-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
EP4095882A1 (en) * 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Pattern data processing for programmable direct-write apparatus
US12500060B2 (en) 2021-07-14 2025-12-16 Ims Nanofabrication Gmbh Electromagnetic lens
US12154756B2 (en) 2021-08-12 2024-11-26 Ims Nanofabrication Gmbh Beam pattern device having beam absorber structure
CN119404299A (zh) * 2022-08-05 2025-02-07 Asml荷兰有限公司 高生产量装载锁定腔室

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US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
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US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
JPH04352410A (ja) * 1991-05-30 1992-12-07 Canon Inc 半導体製造装置
WO1994025880A1 (en) 1993-04-30 1994-11-10 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
JPH09209150A (ja) * 1996-02-06 1997-08-12 Tokyo Electron Ltd 真空チャンバ及びその製造方法
JPH1054369A (ja) * 1996-05-21 1998-02-24 Ebara Corp 真空ポンプの制御装置
US6235634B1 (en) * 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
JP3463855B2 (ja) * 1997-12-18 2003-11-05 富士重工業株式会社 無段変速機の変速制御装置
AU3888400A (en) * 1999-03-19 2000-10-09 Electron Vision Corporation Cluster tool for wafer processing having an electron beam exposure module
JP3019260B1 (ja) * 1999-03-26 2000-03-13 株式会社日立製作所 電子ビ―ム描画装置
JP2007147648A (ja) * 2000-12-01 2007-06-14 Ebara Corp 欠陥検査方法及び基板検査装置
EP1339100A1 (en) * 2000-12-01 2003-08-27 Ebara Corporation Inspection method and apparatus using electron beam, and device production method using it
ATE538412T1 (de) 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
AU2003276779A1 (en) 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
JP2005016255A (ja) * 2003-06-27 2005-01-20 Sumitomo Heavy Ind Ltd 扉ロック装置、及び扉システム
JP2005032505A (ja) * 2003-07-10 2005-02-03 Nikon Corp 磁気シールド構造及び露光装置
ATE381728T1 (de) 2003-07-30 2008-01-15 Mapper Lithography Ip Bv Modulator-schaltkreise
US7819079B2 (en) * 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US8229585B2 (en) * 2005-09-18 2012-07-24 Flitsch Frederick A Methods and apparatus for vertically orienting substrate processing tools in a clean space
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
WO2016158421A1 (ja) 2015-04-03 2016-10-06 株式会社日立ハイテクノロジーズ 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置

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