JP2012518902A5 - - Google Patents

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Publication number
JP2012518902A5
JP2012518902A5 JP2011550596A JP2011550596A JP2012518902A5 JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5 JP 2011550596 A JP2011550596 A JP 2011550596A JP 2011550596 A JP2011550596 A JP 2011550596A JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5
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JP
Japan
Prior art keywords
lithographic apparatus
common
rows
charged particle
robot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011550596A
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English (en)
Japanese (ja)
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JP2012518902A (ja
JP5539406B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2010/052221 external-priority patent/WO2010094804A1/en
Publication of JP2012518902A publication Critical patent/JP2012518902A/ja
Publication of JP2012518902A5 publication Critical patent/JP2012518902A5/ja
Application granted granted Critical
Publication of JP5539406B2 publication Critical patent/JP5539406B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011550596A 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体 Expired - Fee Related JP5539406B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US15441109P 2009-02-22 2009-02-22
US15441509P 2009-02-22 2009-02-22
US61/154,415 2009-02-22
US61/154,411 2009-02-22
US28940709P 2009-12-23 2009-12-23
US61/289,407 2009-12-23
US30633310P 2010-02-19 2010-02-19
US61/306,333 2010-02-19
PCT/EP2010/052221 WO2010094804A1 (en) 2009-02-22 2010-02-22 Lithography machine and substrate handling arrangement

Publications (3)

Publication Number Publication Date
JP2012518902A JP2012518902A (ja) 2012-08-16
JP2012518902A5 true JP2012518902A5 (https=) 2013-04-11
JP5539406B2 JP5539406B2 (ja) 2014-07-02

Family

ID=42035939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550596A Expired - Fee Related JP5539406B2 (ja) 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体

Country Status (6)

Country Link
US (1) US20110049393A1 (https=)
EP (1) EP2399271B1 (https=)
JP (1) JP5539406B2 (https=)
KR (1) KR20110139699A (https=)
CN (1) CN102414776A (https=)
WO (1) WO2010094804A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
JP6158091B2 (ja) * 2010-12-14 2017-07-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． リソグラフィシステム及びこのようなリソグラフィシステムで基板を処理する方法
US9123507B2 (en) * 2012-03-20 2015-09-01 Mapper Lithography Ip B.V. Arrangement and method for transporting radicals
CN107359101B (zh) 2012-05-14 2019-07-12 Asml荷兰有限公司 带电粒子射束产生器中的高电压屏蔽和冷却
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
NL2010624C2 (en) 2013-04-08 2014-10-09 Mapper Lithography Ip Bv Cabinet for electronic equipment.
JP2016528556A (ja) * 2013-08-16 2016-09-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブルパターニングデバイスおよびリソグラフィ方法
KR102919104B1 (ko) 2020-02-03 2026-01-29 아이엠에스 나노패브릭케이션 게엠베하 멀티―빔 라이터의 블러 변화 보정
WO2021193369A1 (ja) * 2020-03-26 2021-09-30 国立研究開発法人物質・材料研究機構 走査型電子顕微鏡用電子銃チャンバー、これを含む電子銃及び走査電子顕微鏡
KR102922552B1 (ko) 2020-04-24 2026-02-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
EP4095882A1 (en) * 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Pattern data processing for programmable direct-write apparatus
US12500060B2 (en) 2021-07-14 2025-12-16 Ims Nanofabrication Gmbh Electromagnetic lens
US12154756B2 (en) 2021-08-12 2024-11-26 Ims Nanofabrication Gmbh Beam pattern device having beam absorber structure
US20250379075A1 (en) * 2022-08-05 2025-12-11 Asml Netherlands B.V. High-throughput load lock chamber

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US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
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JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
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EP2302457B1 (en) 2002-10-25 2016-03-30 Mapper Lithography Ip B.V. Lithography system
CN101414534B (zh) 2002-10-30 2012-10-03 迈普尔平版印刷Ip有限公司 电子束曝光系统
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
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JP2005032505A (ja) * 2003-07-10 2005-02-03 Nikon Corp 磁気シールド構造及び露光装置
DE602004010824T2 (de) 2003-07-30 2008-12-24 Mapper Lithography Ip B.V. Modulator-schaltkreise
US7819079B2 (en) * 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
CN105304529B (zh) * 2005-09-18 2019-03-15 弗雷德里克·A·弗里奇 用于在洁净空间中垂直定位基片处理设备的方法和装置
CN107407595B (zh) 2015-04-03 2018-09-07 株式会社日立高新技术 光量检测装置、利用其的免疫分析装置及电荷粒子束装置

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