JP2012515260A - ＺｎＡｌターゲットの作製方法およびそれにより作製されたＺｎＡｌターゲット - Google Patents

ＺｎＡｌターゲットの作製方法およびそれにより作製されたＺｎＡｌターゲット Download PDF

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Publication number
JP2012515260A
JP2012515260A JP2011545482A JP2011545482A JP2012515260A JP 2012515260 A JP2012515260 A JP 2012515260A JP 2011545482 A JP2011545482 A JP 2011545482A JP 2011545482 A JP2011545482 A JP 2011545482A JP 2012515260 A JP2012515260 A JP 2012515260A
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JP
Japan
Prior art keywords
target material
powder
znal
mixture
ball milling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011545482A
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English (en)
Japanese (ja)
Inventor
シェンコン・リューフー
ハオ・ゼン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2012515260A publication Critical patent/JP2012515260A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0483—Alloys based on the low melting point metals Zn, Pb, Sn, Cd, In or Ga
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C18/00—Alloys based on zinc
    • C22C18/04—Alloys based on zinc with aluminium as the next major constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • B22F2003/1051—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding by electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP2011545482A 2009-01-12 2010-01-11 ＺｎＡｌターゲットの作製方法およびそれにより作製されたＺｎＡｌターゲット Pending JP2012515260A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN200910002932A CN101775578B (zh) 2009-01-12 2009-01-12 制备ZnAl靶材的方法以及制得的ZnAl靶材
CN200910002932.9 2009-01-12
PCT/US2010/020598 WO2010081064A1 (en) 2009-01-12 2010-01-11 Process for preparing znal target

Publications (1)

Publication Number Publication Date
JP2012515260A true JP2012515260A (ja) 2012-07-05

Family

ID=41627011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011545482A Pending JP2012515260A (ja) 2009-01-12 2010-01-11 ＺｎＡｌターゲットの作製方法およびそれにより作製されたＺｎＡｌターゲット

Country Status (6)

Country Link
US (1) US20110268599A1 (zh)
EP (1) EP2376669A1 (zh)
JP (1) JP2012515260A (zh)
KR (1) KR20110106923A (zh)
CN (1) CN101775578B (zh)
WO (1) WO2010081064A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109053157A (zh) * 2018-07-13 2018-12-21 华南师范大学 一种Ga2O3基共掺杂材料靶及其制备方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9162286B2 (en) 2011-12-05 2015-10-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Glass substrate film sputtering target and preparing method thereof
CN102409294A (zh) * 2011-12-05 2012-04-11 深圳市华星光电技术有限公司 玻璃基板薄膜溅射靶材及其制备方法
KR101773603B1 (ko) * 2016-01-08 2017-08-31 (주)부경대학교 기술지주회사 스테인레스 스틸과 알루미늄 또는 그 합금을 포함하는 경량 복합재료의 제조방법 및 이에 의해 제조된 경량 복합재료
US11229950B2 (en) 2017-04-21 2022-01-25 Raytheon Technologies Corporation Systems, devices and methods for spark plasma sintering
CN112813397B (zh) * 2020-12-31 2023-06-30 金堆城钼业股份有限公司 一种钼钠合金板状靶材的制备方法
CN112958772A (zh) * 2021-02-02 2021-06-15 合肥工业大学 一种废旧WRe/TZM复合旋转阳极靶盘的修复方法
CN113308672A (zh) * 2021-04-15 2021-08-27 基迈克材料科技（苏州）有限公司 ZnSn合金靶材及其制备方法
CN115343275A (zh) * 2022-08-02 2022-11-15 苏州市祥冠合金研究院有限公司 一种YZZnAl4Cu1光谱标准样品的制备方法
CN117410481B (zh) * 2023-12-14 2024-03-29 河南众新储能科技有限公司 一种高性能的纳米单晶正极材料及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5171411A (en) * 1991-05-21 1992-12-15 The Boc Group, Inc. Rotating cylindrical magnetron structure with self supporting zinc alloy target
CN1142554C (zh) * 2000-10-13 2004-03-17 清华大学 用于制备透明导电薄膜的锌铝氧化物靶材
CN1371885A (zh) * 2002-04-01 2002-10-02 武汉理工大学 放电等离子烧结法制备氮化铝透明陶瓷
CN1238543C (zh) 2002-07-19 2006-01-25 同济大学 一种粉末锌铝合金块材料的制备方法
KR100711833B1 (ko) * 2006-01-04 2007-05-02 한국생산기술연구원 나노 구조 코팅용 타겟 제조공정 및 그 제품

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109053157A (zh) * 2018-07-13 2018-12-21 华南师范大学 一种Ga2O3基共掺杂材料靶及其制备方法
CN109053157B (zh) * 2018-07-13 2021-07-09 华南师范大学 一种Ga2O3基共掺杂材料靶及其制备方法

Also Published As

Publication number Publication date
CN101775578B (zh) 2012-09-19
US20110268599A1 (en) 2011-11-03
KR20110106923A (ko) 2011-09-29
EP2376669A1 (en) 2011-10-19
CN101775578A (zh) 2010-07-14
WO2010081064A1 (en) 2010-07-15

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