KR20110106923A - ZnAl 타깃의 제조 방법 - Google Patents

ZnAl 타깃의 제조 방법 Download PDF

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Publication number
KR20110106923A
KR20110106923A KR1020117018690A KR20117018690A KR20110106923A KR 20110106923 A KR20110106923 A KR 20110106923A KR 1020117018690 A KR1020117018690 A KR 1020117018690A KR 20117018690 A KR20117018690 A KR 20117018690A KR 20110106923 A KR20110106923 A KR 20110106923A
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KR
South Korea
Prior art keywords
powder
target material
znal
mixture
ball milling
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Application number
KR1020117018690A
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English (en)
Korean (ko)
Inventor
쉥콩 류푸
하오 젱
Original Assignee
이 아이 듀폰 디 네모아 앤드 캄파니
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Application filed by 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 이 아이 듀폰 디 네모아 앤드 캄파니
Publication of KR20110106923A publication Critical patent/KR20110106923A/ko

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/105Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12Both compacting and sintering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/04Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/0483Alloys based on the low melting point metals Zn, Pb, Sn, Cd, In or Ga
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C18/00Alloys based on zinc
    • C22C18/04Alloys based on zinc with aluminium as the next major constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/105Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • B22F2003/1051Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding by electric discharge
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00Aspects linked to processes or compositions used in powder metallurgy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Compositions Of Oxide Ceramics (AREA)
KR1020117018690A 2009-01-12 2010-01-11 ZnAl 타깃의 제조 방법 KR20110106923A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN200910002932.9 2009-01-12
CN200910002932A CN101775578B (zh) 2009-01-12 2009-01-12 制备ZnAl靶材的方法以及制得的ZnAl靶材

Publications (1)

Publication Number Publication Date
KR20110106923A true KR20110106923A (ko) 2011-09-29

Family

ID=41627011

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117018690A KR20110106923A (ko) 2009-01-12 2010-01-11 ZnAl 타깃의 제조 방법

Country Status (6)

Country Link
US (1) US20110268599A1 (zh)
EP (1) EP2376669A1 (zh)
JP (1) JP2012515260A (zh)
KR (1) KR20110106923A (zh)
CN (1) CN101775578B (zh)
WO (1) WO2010081064A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017119790A1 (ko) * 2016-01-08 2017-07-13 (주)부경대학교 기술지주회사 스테인레스 스틸과 알루미늄 또는 그 합금을 포함하는 경량 복합재료의 제조방법 및 이에 의해 제조된 경량 복합재료
CN112958772A (zh) * 2021-02-02 2021-06-15 合肥工业大学 一种废旧WRe/TZM复合旋转阳极靶盘的修复方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9162286B2 (en) 2011-12-05 2015-10-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Glass substrate film sputtering target and preparing method thereof
CN102409294A (zh) * 2011-12-05 2012-04-11 深圳市华星光电技术有限公司 玻璃基板薄膜溅射靶材及其制备方法
EP4039392A1 (en) 2017-04-21 2022-08-10 Raytheon Technologies Corporation Systems, devices and methods for spark plasma sintering
CN109053157B (zh) * 2018-07-13 2021-07-09 华南师范大学 一种Ga2O3基共掺杂材料靶及其制备方法
CN112813397B (zh) * 2020-12-31 2023-06-30 金堆城钼业股份有限公司 一种钼钠合金板状靶材的制备方法
CN113308672A (zh) * 2021-04-15 2021-08-27 基迈克材料科技(苏州)有限公司 ZnSn合金靶材及其制备方法
CN115343275A (zh) * 2022-08-02 2022-11-15 苏州市祥冠合金研究院有限公司 一种YZZnAl4Cu1光谱标准样品的制备方法
CN115595539A (zh) * 2022-09-15 2023-01-13 先导薄膜材料(广东)有限公司(Cn) 一种锌镁靶材及其制备方法
CN117410481B (zh) * 2023-12-14 2024-03-29 河南众新储能科技有限公司 一种高性能的纳米单晶正极材料及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5171411A (en) * 1991-05-21 1992-12-15 The Boc Group, Inc. Rotating cylindrical magnetron structure with self supporting zinc alloy target
CN1142554C (zh) * 2000-10-13 2004-03-17 清华大学 用于制备透明导电薄膜的锌铝氧化物靶材
CN1371885A (zh) * 2002-04-01 2002-10-02 武汉理工大学 放电等离子烧结法制备氮化铝透明陶瓷
CN1238543C (zh) 2002-07-19 2006-01-25 同济大学 一种粉末锌铝合金块材料的制备方法
KR100711833B1 (ko) * 2006-01-04 2007-05-02 한국생산기술연구원 나노 구조 코팅용 타겟 제조공정 및 그 제품

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017119790A1 (ko) * 2016-01-08 2017-07-13 (주)부경대학교 기술지주회사 스테인레스 스틸과 알루미늄 또는 그 합금을 포함하는 경량 복합재료의 제조방법 및 이에 의해 제조된 경량 복합재료
CN112958772A (zh) * 2021-02-02 2021-06-15 合肥工业大学 一种废旧WRe/TZM复合旋转阳极靶盘的修复方法

Also Published As

Publication number Publication date
EP2376669A1 (en) 2011-10-19
JP2012515260A (ja) 2012-07-05
WO2010081064A1 (en) 2010-07-15
US20110268599A1 (en) 2011-11-03
CN101775578B (zh) 2012-09-19
CN101775578A (zh) 2010-07-14

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