JP2012513624A - 感光性ペーストおよびそれを用いたパターン生産方法 - Google Patents

感光性ペーストおよびそれを用いたパターン生産方法 Download PDF

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Publication number
JP2012513624A
JP2012513624A JP2011543666A JP2011543666A JP2012513624A JP 2012513624 A JP2012513624 A JP 2012513624A JP 2011543666 A JP2011543666 A JP 2011543666A JP 2011543666 A JP2011543666 A JP 2011543666A JP 2012513624 A JP2012513624 A JP 2012513624A
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JP
Japan
Prior art keywords
paste
compound
pattern
polymerizable monomer
linked
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2011543666A
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English (en)
Japanese (ja)
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JP2012513624A5 (enExample
Inventor
和重 伊藤
浩章 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2012513624A publication Critical patent/JP2012513624A/ja
Publication of JP2012513624A5 publication Critical patent/JP2012513624A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
JP2011543666A 2008-12-23 2009-12-23 感光性ペーストおよびそれを用いたパターン生産方法 Pending JP2012513624A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/342,163 US7887992B2 (en) 2008-12-23 2008-12-23 Photosensitive paste and process for production of pattern using the same
US12/342,163 2008-12-23
PCT/US2009/069358 WO2010075485A1 (en) 2008-12-23 2009-12-23 Photosensitive paste and process for production of pattern using the same

Publications (2)

Publication Number Publication Date
JP2012513624A true JP2012513624A (ja) 2012-06-14
JP2012513624A5 JP2012513624A5 (enExample) 2013-02-14

Family

ID=41683381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011543666A Pending JP2012513624A (ja) 2008-12-23 2009-12-23 感光性ペーストおよびそれを用いたパターン生産方法

Country Status (6)

Country Link
US (1) US7887992B2 (enExample)
JP (1) JP2012513624A (enExample)
KR (1) KR20110098846A (enExample)
CN (1) CN102308257A (enExample)
TW (1) TW201030116A (enExample)
WO (1) WO2010075485A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8129088B2 (en) * 2009-07-02 2012-03-06 E.I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
JP2012073494A (ja) * 2010-09-29 2012-04-12 Taiyo Holdings Co Ltd 感光性樹脂組成物
US9081278B2 (en) * 2012-03-22 2015-07-14 Toray Industries, Inc. Photosensitive conductive paste and method of producing conductive pattern
CN103198877A (zh) * 2013-03-06 2013-07-10 东南大学 一种空气中可烧结感光银包铜电极浆料及其制备方法
US20160179234A1 (en) * 2013-07-03 2016-06-23 Amosense Co., Ltd. Touch sensor for touch screen panel, manufacturing method thereof, and touch screen panel including same
CN109572231B (zh) * 2018-11-16 2020-04-24 潮州三环（集团）股份有限公司 热敏打印头及其制备方法
CN110335700B (zh) * 2019-06-28 2021-11-26 乾宇电子材料(苏州)有限公司 高温烧结型黄光导电浆料、导电线路及制备方法

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JPH10148950A (ja) * 1996-11-18 1998-06-02 Dainippon Printing Co Ltd パターン形成方法
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JP2005506569A (ja) * 2001-10-12 2005-03-03 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトスピード促進剤を含有する水性現像可能な光画像形成性厚膜組成物
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JP2006321976A (ja) * 2005-03-09 2006-11-30 E I Du Pont De Nemours & Co 黒色導電性組成物、黒色電極、およびその形成方法
JP2008225477A (ja) * 2007-03-12 2008-09-25 Samsung Sdi Co Ltd 感光性ペースト組成物、これを利用して製造されたプラズマディスプレイパネルおよびその製造方法

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JPH1055758A (ja) * 1996-06-03 1998-02-24 Dainippon Printing Co Ltd 厚膜パターン形成方法
JPH09329891A (ja) * 1996-06-12 1997-12-22 Nippon Kayaku Co Ltd 樹脂組成物、そのフィルム及びその硬化物
JPH10148950A (ja) * 1996-11-18 1998-06-02 Dainippon Printing Co Ltd パターン形成方法
JP2001100405A (ja) * 1999-09-30 2001-04-13 Sumitomo Bakelite Co Ltd 感光性銀ペースト及びそれを用いた画像表示装置
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JP2003043676A (ja) * 2001-07-30 2003-02-13 Sumitomo Bakelite Co Ltd 感光性銀ペースト及びそれを用いた画像表示装置
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Also Published As

Publication number Publication date
WO2010075485A1 (en) 2010-07-01
KR20110098846A (ko) 2011-09-01
US20100159391A1 (en) 2010-06-24
US7887992B2 (en) 2011-02-15
CN102308257A (zh) 2012-01-04
TW201030116A (en) 2010-08-16

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