JP2012507571A5 - - Google Patents

Download PDF

Info

Publication number
JP2012507571A5
JP2012507571A5 JP2011535068A JP2011535068A JP2012507571A5 JP 2012507571 A5 JP2012507571 A5 JP 2012507571A5 JP 2011535068 A JP2011535068 A JP 2011535068A JP 2011535068 A JP2011535068 A JP 2011535068A JP 2012507571 A5 JP2012507571 A5 JP 2012507571A5
Authority
JP
Japan
Prior art keywords
alkyl
phenyl
substituted
optionally
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011535068A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012507571A (ja
JP5623416B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2009/063963 external-priority patent/WO2010060702A1/en
Publication of JP2012507571A publication Critical patent/JP2012507571A/ja
Publication of JP2012507571A5 publication Critical patent/JP2012507571A5/ja
Application granted granted Critical
Publication of JP5623416B2 publication Critical patent/JP5623416B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011535068A 2008-11-03 2009-10-23 光開始剤混合物 Expired - Fee Related JP5623416B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08168145.4 2008-11-03
EP08168145 2008-11-03
PCT/EP2009/063963 WO2010060702A1 (en) 2008-11-03 2009-10-23 Photoinitiator mixtures

Publications (3)

Publication Number Publication Date
JP2012507571A JP2012507571A (ja) 2012-03-29
JP2012507571A5 true JP2012507571A5 (enExample) 2012-12-06
JP5623416B2 JP5623416B2 (ja) 2014-11-12

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011535068A Expired - Fee Related JP5623416B2 (ja) 2008-11-03 2009-10-23 光開始剤混合物

Country Status (7)

Country Link
US (1) US8507726B2 (enExample)
EP (1) EP2342237B1 (enExample)
JP (1) JP5623416B2 (enExample)
KR (1) KR101648996B1 (enExample)
CN (1) CN102203136B (enExample)
TW (1) TWI453184B (enExample)
WO (1) WO2010060702A1 (enExample)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009147031A2 (en) * 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
US8633258B2 (en) 2010-06-30 2014-01-21 Dsm Ip Assets B.V. D1492 liquid BAPO photoinitiator and its use in radiation curable compositions
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP5677036B2 (ja) 2010-11-08 2015-02-25 キヤノン株式会社 有機発光素子
JP5821401B2 (ja) * 2011-08-19 2015-11-24 大日本印刷株式会社 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
US8878169B2 (en) * 2012-02-07 2014-11-04 Polyera Corporation Photocurable polymeric materials and related electronic devices
RU2613408C2 (ru) 2012-03-22 2017-03-16 Зм Инновейтив Пропертиз Компани Композиция твердого покрытия на основе полиметилметакрилата и изделие с покрытием
US9050820B2 (en) 2012-12-29 2015-06-09 Atasheh Soleimani-Gorgani Three-dimensional ink-jet printing by home and office ink-jet printer
KR102095542B1 (ko) * 2013-02-15 2020-03-31 도레이첨단소재 주식회사 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법
CN105339375A (zh) * 2013-07-08 2016-02-17 巴斯夫欧洲公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
WO2016092595A1 (ja) 2014-12-10 2016-06-16 互応化学工業株式会社 液状ソルダーレジスト組成物及び被覆プリント配線板
JP6368380B2 (ja) * 2014-12-10 2018-08-01 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
US9908990B2 (en) 2015-04-17 2018-03-06 Samsung Sdi Co., Ltd. Organic layer composition, organic layer, and method of forming patterns
CN107614485A (zh) * 2015-08-24 2018-01-19 株式会社艾迪科 肟酯化合物及含有该化合物的聚合引发剂
CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
RU2020110828A (ru) * 2017-08-17 2021-09-17 Колопласт А/С Полимерные покрытия
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
US11359102B2 (en) 2018-03-27 2022-06-14 Sun Chemical Corporation UV-curable compositions comprising cleavage type photoinitiators
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102111789B1 (ko) 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) * 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
JP7472429B2 (ja) * 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138A (zh) * 2023-05-31 2023-12-05 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
WO2025054034A2 (en) * 2023-09-05 2025-03-13 Eastman Chemical Company Energy curable ink compositions and methods thereof
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
KR20250088054A (ko) * 2023-12-08 2025-06-17 주식회사 동진쎄미켐 광경화성 조성물, 점착제 및 디스플레이 장치

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
US4318791A (en) 1977-12-22 1982-03-09 Ciba-Geigy Corporation Use of aromatic-aliphatic ketones as photo sensitizers
DE2830927A1 (de) 1978-07-14 1980-01-31 Basf Ag Acylphosphinoxidverbindungen und ihre verwendung
DE3020092A1 (de) 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
US4475999A (en) 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
IT1176018B (it) 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3443221A1 (de) 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5008302A (en) 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US5176984A (en) 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
EP0441232A3 (en) 1990-02-09 1992-10-14 Basf Aktiengesellschaft Cationic photopolymerisation process
US4987159A (en) 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
JP2999274B2 (ja) 1991-01-28 2000-01-17 三菱化学株式会社 エチレン重合体の製造法
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
TW237456B (enExample) 1992-04-09 1995-01-01 Ciba Geigy
AU717137B2 (en) 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JP3587413B2 (ja) 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
SE520727C2 (sv) 1996-03-04 2003-08-19 Ciba Sc Holding Ag Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar
EP0956280B1 (en) 1997-01-30 2002-10-30 Ciba SC Holding AG Non-volatile phenylglyoxalic esters
IT1303775B1 (it) 1998-11-19 2001-02-23 Lamberti Spa Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
ATE221893T1 (de) 1998-11-30 2002-08-15 Ciba Sc Holding Ag Verfahren zur herstellung von acylphosphinen und derivaten
ITVA20010011A1 (it) 2001-04-24 2002-10-24 Lamberti Spa Miscele solide di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene e loro uso.
EP1395615B1 (en) 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
KR101032582B1 (ko) * 2002-12-03 2011-05-06 시바 홀딩 인크 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제
US20060160915A1 (en) 2003-02-20 2006-07-20 Andre Fuchs Photocurable compositions
MXPA05010951A (es) 2003-04-16 2005-11-25 Ciba Sc Holding Ag Tinta para la impresion de inyeccion de tinta, curable por radiacion, que contiene un alfa-hidroxi-cetona como fotoiniciador.
MXPA06000681A (es) 2003-07-18 2006-04-11 Ciba Sc Holding Ag Proceso para preparar acilfosfanos y derivados de los mismos.
KR20070118157A (ko) * 2005-04-01 2007-12-13 바스프 악티엔게젤샤프트 해유화제로서의 단백질의 용도
ITVA20050032A1 (it) 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
DE102005029704A1 (de) * 2005-06-24 2007-01-11 Basf Ag Verwendung von Hydrophobin-Polypeptiden sowie Konjugaten aus Hydrophobin-Polypeptiden mit Wirk-oder Effektstoffen und ihre Herstellung sowie deren Einsatz in der Kosmetik
DE102005033002A1 (de) * 2005-07-14 2007-01-18 Basf Ag Wässrige Monomeremulsionen enthaltend Hydrophobin
US8586268B2 (en) * 2005-12-20 2013-11-19 Basf Se Oxime ester photoinitiators
KR101526619B1 (ko) * 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
WO2008138733A1 (en) * 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) * 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
US20100166627A1 (en) * 2007-05-24 2010-07-01 Basf Se Use of hydrophobins as additives in the crystallization of solids
BRPI0816256A2 (pt) * 2007-09-13 2015-03-17 Basf Se Uso de hidrofobina, e, processo para a preparação de um agente para a absorção melhorada de substâncias ativas no uso tópico
WO2009147031A2 (en) 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
EP2285836B1 (en) * 2008-06-06 2012-01-18 Basf Se Photoinitiator mixtures
WO2010003811A1 (en) * 2008-07-11 2010-01-14 Basf Se Amphiphilic proteins as morphology modifiers

Similar Documents

Publication Publication Date Title
JP2012507571A5 (enExample)
JP2011525480A5 (enExample)
JP2010526846A5 (enExample)
JP2004534797A5 (enExample)
JP2008509967A5 (enExample)
KR101276951B1 (ko) 감광성 도전 페이스트 및 전극 패턴
TW200422356A (en) Process
JP2004536352A5 (enExample)
US8460852B2 (en) Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board
DK200001878A (da) Oximesterfotoinitiatorer
KR101247912B1 (ko) 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 제조방법, 및 프린트 배선판의 제조방법
JP2006515833A5 (enExample)
KR101345930B1 (ko) 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법
JP2000330276A (ja) 紫外線硬化性樹脂組成物、フォトソルダーレジストインク、予備乾燥被膜、基板及びプリント配線板
CN116917108A (zh) 阻燃构建材料和相关的3d印刷制品
US20230350292A1 (en) Photosensitive resin composition, dry film using same, printed wiring board, and printed wiring board manufacturing method
US20060019077A1 (en) Process
KR101350547B1 (ko) 감광성 수지 조성물, 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법, 및 프린트 배선판의 제조 방법
TW200302954A (en) UV curable powder suitable for use as photoresist
JPWO2019189190A1 (ja) 硬化性組成物、その硬化物およびこれを有する電子部品
WO1992006412A1 (en) Photopolymerizable composition and photopolymerizable element
JP4587674B2 (ja) 蓄光塗膜の形成方法
JP2005024893A (ja) 感光性樹脂組成物及びその用途
JP2938960B2 (ja) 液状レジストインク組成物
JP2004144917A (ja) 感光性樹脂組成物これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法