JP5623416B2 - 光開始剤混合物 - Google Patents

光開始剤混合物 Download PDF

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Publication number
JP5623416B2
JP5623416B2 JP2011535068A JP2011535068A JP5623416B2 JP 5623416 B2 JP5623416 B2 JP 5623416B2 JP 2011535068 A JP2011535068 A JP 2011535068A JP 2011535068 A JP2011535068 A JP 2011535068A JP 5623416 B2 JP5623416 B2 JP 5623416B2
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JP
Japan
Prior art keywords
alkyl
phenyl
substituted
optionally
halogen
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Expired - Fee Related
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JP2011535068A
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English (en)
Japanese (ja)
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JP2012507571A (ja
JP2012507571A5 (enExample
Inventor
ステュデ カティア
ステュデ カティア
セバスティアンヴィルヌーブ
ヴィルヌーブ セバスティアン
松本　啓
啓 松本
久稔 倉
久稔 倉
ズュルテマイアー ヤン
ズュルテマイアー ヤン
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BASF SE
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BASF SE
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Application filed by BASF SE filed Critical BASF SE
Publication of JP2012507571A publication Critical patent/JP2012507571A/ja
Publication of JP2012507571A5 publication Critical patent/JP2012507571A5/ja
Application granted granted Critical
Publication of JP5623416B2 publication Critical patent/JP5623416B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Dental Preparations (AREA)
  • Materials For Photolithography (AREA)
JP2011535068A 2008-11-03 2009-10-23 光開始剤混合物 Expired - Fee Related JP5623416B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08168145.4 2008-11-03
EP08168145 2008-11-03
PCT/EP2009/063963 WO2010060702A1 (en) 2008-11-03 2009-10-23 Photoinitiator mixtures

Publications (3)

Publication Number Publication Date
JP2012507571A JP2012507571A (ja) 2012-03-29
JP2012507571A5 JP2012507571A5 (enExample) 2012-12-06
JP5623416B2 true JP5623416B2 (ja) 2014-11-12

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011535068A Expired - Fee Related JP5623416B2 (ja) 2008-11-03 2009-10-23 光開始剤混合物

Country Status (7)

Country Link
US (1) US8507726B2 (enExample)
EP (1) EP2342237B1 (enExample)
JP (1) JP5623416B2 (enExample)
KR (1) KR101648996B1 (enExample)
CN (1) CN102203136B (enExample)
TW (1) TWI453184B (enExample)
WO (1) WO2010060702A1 (enExample)

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KR102095542B1 (ko) * 2013-02-15 2020-03-31 도레이첨단소재 주식회사 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법
CN111116777A (zh) * 2013-07-08 2020-05-08 Igm集团公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
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CN105517648B (zh) 2014-12-10 2017-06-20 互应化学工业株式会社 液体阻焊剂组合物和被覆印刷线路板
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
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CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
CN110023307B (zh) * 2017-03-16 2024-01-02 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
US12070531B2 (en) * 2017-08-17 2024-08-27 Coloplast A/S Polymeric coatings
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
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WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
KR102111789B1 (ko) * 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
EP3902878B1 (en) * 2018-12-28 2026-05-06 IGM Resins Italia S.r.l. Photoinitiators
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138B (zh) * 2023-05-31 2026-01-20 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
CN121794337A (zh) * 2023-09-05 2026-04-03 伊士曼化工公司 能量固化油墨组合物及其方法
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
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Also Published As

Publication number Publication date
TWI453184B (zh) 2014-09-21
JP2012507571A (ja) 2012-03-29
EP2342237B1 (en) 2014-04-23
KR101648996B1 (ko) 2016-08-17
TW201033161A (en) 2010-09-16
WO2010060702A1 (en) 2010-06-03
KR20110091742A (ko) 2011-08-12
EP2342237A1 (en) 2011-07-13
US8507726B2 (en) 2013-08-13
US20110218266A1 (en) 2011-09-08
CN102203136A (zh) 2011-09-28
CN102203136B (zh) 2013-11-13

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