JP5623416B2 - 光開始剤混合物 - Google Patents

光開始剤混合物 Download PDF

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Publication number
JP5623416B2
JP5623416B2 JP2011535068A JP2011535068A JP5623416B2 JP 5623416 B2 JP5623416 B2 JP 5623416B2 JP 2011535068 A JP2011535068 A JP 2011535068A JP 2011535068 A JP2011535068 A JP 2011535068A JP 5623416 B2 JP5623416 B2 JP 5623416B2
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JP
Japan
Prior art keywords
alkyl
phenyl
substituted
optionally
halogen
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2011535068A
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English (en)
Japanese (ja)
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JP2012507571A (ja
JP2012507571A5 (enExample
Inventor
ステュデ カティア
ステュデ カティア
セバスティアンヴィルヌーブ
ヴィルヌーブ セバスティアン
松本 啓
啓 松本
久稔 倉
久稔 倉
ズュルテマイアー ヤン
ズュルテマイアー ヤン
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BASF SE
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BASF SE
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Publication of JP2012507571A publication Critical patent/JP2012507571A/ja
Publication of JP2012507571A5 publication Critical patent/JP2012507571A5/ja
Application granted granted Critical
Publication of JP5623416B2 publication Critical patent/JP5623416B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/86Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Dental Preparations (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Materials For Photolithography (AREA)
JP2011535068A 2008-11-03 2009-10-23 光開始剤混合物 Expired - Fee Related JP5623416B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08168145.4 2008-11-03
EP08168145 2008-11-03
PCT/EP2009/063963 WO2010060702A1 (en) 2008-11-03 2009-10-23 Photoinitiator mixtures

Publications (3)

Publication Number Publication Date
JP2012507571A JP2012507571A (ja) 2012-03-29
JP2012507571A5 JP2012507571A5 (enExample) 2012-12-06
JP5623416B2 true JP5623416B2 (ja) 2014-11-12

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011535068A Expired - Fee Related JP5623416B2 (ja) 2008-11-03 2009-10-23 光開始剤混合物

Country Status (7)

Country Link
US (1) US8507726B2 (enExample)
EP (1) EP2342237B1 (enExample)
JP (1) JP5623416B2 (enExample)
KR (1) KR101648996B1 (enExample)
CN (1) CN102203136B (enExample)
TW (1) TWI453184B (enExample)
WO (1) WO2010060702A1 (enExample)

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CN105339375A (zh) * 2013-07-08 2016-02-17 巴斯夫欧洲公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
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JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
RU2020110828A (ru) * 2017-08-17 2021-09-17 Колопласт А/С Полимерные покрытия
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
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KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102111789B1 (ko) 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) * 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
JP7472429B2 (ja) * 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138A (zh) * 2023-05-31 2023-12-05 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
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Also Published As

Publication number Publication date
JP2012507571A (ja) 2012-03-29
CN102203136B (zh) 2013-11-13
US8507726B2 (en) 2013-08-13
KR20110091742A (ko) 2011-08-12
TWI453184B (zh) 2014-09-21
KR101648996B1 (ko) 2016-08-17
CN102203136A (zh) 2011-09-28
TW201033161A (en) 2010-09-16
EP2342237A1 (en) 2011-07-13
EP2342237B1 (en) 2014-04-23
WO2010060702A1 (en) 2010-06-03
US20110218266A1 (en) 2011-09-08

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