JP2012507391A5 - - Google Patents

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Publication number
JP2012507391A5
JP2012507391A5 JP2011534510A JP2011534510A JP2012507391A5 JP 2012507391 A5 JP2012507391 A5 JP 2012507391A5 JP 2011534510 A JP2011534510 A JP 2011534510A JP 2011534510 A JP2011534510 A JP 2011534510A JP 2012507391 A5 JP2012507391 A5 JP 2012507391A5
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JP
Japan
Prior art keywords
substrate
processing chamber
adhesive material
coating method
adhesion
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Application number
JP2011534510A
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English (en)
Japanese (ja)
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JP5404803B2 (ja
JP2012507391A (ja
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Priority claimed from US12/606,588 external-priority patent/US8361546B2/en
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Publication of JP2012507391A5 publication Critical patent/JP2012507391A5/ja
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Publication of JP5404803B2 publication Critical patent/JP5404803B2/ja
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JP2011534510A 2008-10-30 2009-10-29 基板とパターン形成層との間の接着性の促進 Active JP5404803B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10952808P 2008-10-30 2008-10-30
US61/109,528 2008-10-30
US12/606,588 2009-10-27
US12/606,588 US8361546B2 (en) 2008-10-30 2009-10-27 Facilitating adhesion between substrate and patterned layer
PCT/US2009/005870 WO2010051024A1 (en) 2008-10-30 2009-10-29 Facilitating adhesion between substrate and patterned layer

Publications (3)

Publication Number Publication Date
JP2012507391A JP2012507391A (ja) 2012-03-29
JP2012507391A5 true JP2012507391A5 (OSRAM) 2013-01-24
JP5404803B2 JP5404803B2 (ja) 2014-02-05

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Family Applications (1)

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JP2011534510A Active JP5404803B2 (ja) 2008-10-30 2009-10-29 基板とパターン形成層との間の接着性の促進

Country Status (5)

Country Link
US (1) US8361546B2 (OSRAM)
JP (1) JP5404803B2 (OSRAM)
KR (1) KR101699060B1 (OSRAM)
MY (1) MY149262A (OSRAM)
WO (1) WO2010051024A1 (OSRAM)

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US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
US10134588B2 (en) 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
US10754244B2 (en) 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10509313B2 (en) 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography
US11448958B2 (en) * 2017-09-21 2022-09-20 Canon Kabushiki Kaisha System and method for controlling the placement of fluid resist droplets
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US11845241B2 (en) 2021-03-18 2023-12-19 Canon Kabushiki Kaisha Laminate containing an adhesion promoter layer and method of making the laminate
US12242205B2 (en) 2021-11-30 2025-03-04 Canon Kabushiki Kaisha Reaction chamber with stop-gapped vacuum seal
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