JP2012193391A5 - - Google Patents

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Publication number
JP2012193391A5
JP2012193391A5 JP2011055872A JP2011055872A JP2012193391A5 JP 2012193391 A5 JP2012193391 A5 JP 2012193391A5 JP 2011055872 A JP2011055872 A JP 2011055872A JP 2011055872 A JP2011055872 A JP 2011055872A JP 2012193391 A5 JP2012193391 A5 JP 2012193391A5
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JP
Japan
Prior art keywords
vapor deposition
mask
substrate
evaporation
opening
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Application number
JP2011055872A
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English (en)
Japanese (ja)
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JP2012193391A (ja
JP5883230B2 (ja
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Priority to JP2011055872A priority Critical patent/JP5883230B2/ja
Priority claimed from JP2011055872A external-priority patent/JP5883230B2/ja
Priority to KR1020137026765A priority patent/KR101958499B1/ko
Priority to PCT/JP2012/053621 priority patent/WO2012124428A1/ja
Priority to TW101107918A priority patent/TW201250025A/zh
Publication of JP2012193391A publication Critical patent/JP2012193391A/ja
Publication of JP2012193391A5 publication Critical patent/JP2012193391A5/ja
Application granted granted Critical
Publication of JP5883230B2 publication Critical patent/JP5883230B2/ja
Active legal-status Critical Current
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JP2011055872A 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法 Active JP5883230B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011055872A JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法
KR1020137026765A KR101958499B1 (ko) 2011-03-14 2012-02-16 증착 장치 및 증착 방법
PCT/JP2012/053621 WO2012124428A1 (ja) 2011-03-14 2012-02-16 蒸着装置並びに蒸着方法
TW101107918A TW201250025A (en) 2011-03-14 2012-03-08 Deposition device and deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011055872A JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法

Publications (3)

Publication Number Publication Date
JP2012193391A JP2012193391A (ja) 2012-10-11
JP2012193391A5 true JP2012193391A5 (ko) 2014-05-01
JP5883230B2 JP5883230B2 (ja) 2016-03-09

Family

ID=46830505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011055872A Active JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法

Country Status (4)

Country Link
JP (1) JP5883230B2 (ko)
KR (1) KR101958499B1 (ko)
TW (1) TW201250025A (ko)
WO (1) WO2012124428A1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105324511B (zh) 2013-06-21 2017-09-05 夏普株式会社 有机电致发光元件的制造方法和有机电致发光显示装置
KR102373436B1 (ko) 2015-03-30 2022-03-14 삼성디스플레이 주식회사 표시 장치, 표시 장치의 제조장치 및 표시 장치의 제조방법
JP2018003120A (ja) * 2016-07-05 2018-01-11 キヤノントッキ株式会社 蒸着装置及び蒸発源
KR101866956B1 (ko) * 2016-12-30 2018-06-14 주식회사 선익시스템 선형 증발원용 도가니 및 선형 증발원
JP6566977B2 (ja) * 2017-02-07 2019-08-28 キヤノン株式会社 蒸着装置及び蒸着源
JP6570561B2 (ja) * 2017-02-07 2019-09-04 キヤノン株式会社 蒸着装置及び蒸着源
CN110273133A (zh) * 2019-07-26 2019-09-24 西安拉姆达电子科技有限公司 一种专用于晶片镀膜的磁控溅射镀膜机
US11659759B2 (en) 2021-01-06 2023-05-23 Applied Materials, Inc. Method of making high resolution OLED fabricated with overlapped masks

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9323034D0 (en) * 1993-11-09 1994-01-05 Gen Vacuum Equip Ltd Vacuum web coating
JPH10319870A (ja) * 1997-05-15 1998-12-04 Nec Corp シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法
JP2004055198A (ja) * 2002-07-17 2004-02-19 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子を有するディスプレイ装置の製造装置及び製造方法
JP2004103268A (ja) * 2002-09-05 2004-04-02 Sanyo Electric Co Ltd 有機ｅｌ表示装置の製造方法
JP4156891B2 (ja) * 2002-09-20 2008-09-24 株式会社アルバック 薄膜形成装置
US20080131587A1 (en) 2006-11-30 2008-06-05 Boroson Michael L Depositing organic material onto an oled substrate
JP5042195B2 (ja) * 2008-10-29 2012-10-03 株式会社日立ハイテクノロジーズ 蒸着マスクの洗浄装置および洗浄方法
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
TWI472639B (zh) * 2009-05-22 2015-02-11 Samsung Display Co Ltd 薄膜沉積設備
JP5328726B2 (ja) * 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法

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