JP2012129413A - 配線形成装置 - Google Patents
配線形成装置 Download PDFInfo
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- JP2012129413A JP2012129413A JP2010280847A JP2010280847A JP2012129413A JP 2012129413 A JP2012129413 A JP 2012129413A JP 2010280847 A JP2010280847 A JP 2010280847A JP 2010280847 A JP2010280847 A JP 2010280847A JP 2012129413 A JP2012129413 A JP 2012129413A
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- 230000015572 biosynthetic process Effects 0.000 title claims description 8
- 239000000463 material Substances 0.000 claims abstract description 67
- 239000003595 mist Substances 0.000 claims abstract description 67
- 239000002904 solvent Substances 0.000 claims abstract description 62
- 239000012159 carrier gas Substances 0.000 claims abstract description 42
- 238000002156 mixing Methods 0.000 claims abstract description 40
- 238000000889 atomisation Methods 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000007789 gas Substances 0.000 claims abstract description 27
- 238000012545 processing Methods 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 16
- 230000008859 change Effects 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 5
- 230000004044 response Effects 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 claims 1
- 238000005507 spraying Methods 0.000 abstract description 2
- 238000004891 communication Methods 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 11
- 239000012530 fluid Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 230000002265 prevention Effects 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 4
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- 238000010586 diagram Methods 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 101100493711 Caenorhabditis elegans bath-41 gene Proteins 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002082 metal nanoparticle Substances 0.000 description 1
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Images
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
- B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
- B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/51—Plural diverse manufacturing apparatus including means for metal shaping or assembling
- Y10T29/5136—Separate tool stations for selective or successive operation on work
- Y10T29/5137—Separate tool stations for selective or successive operation on work including assembling or disassembling station
- Y10T29/5143—Separate tool stations for selective or successive operation on work including assembling or disassembling station and means to machine product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/51—Plural diverse manufacturing apparatus including means for metal shaping or assembling
- Y10T29/5191—Assembly
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nozzles (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Control Or Security For Electrophotography (AREA)
Abstract
【解決手段】ペースト材料付着装置で絶縁基板上にペースト材料を供給して配線パターンを形成する配線形成装置において、上記ペースト材料付着装置は、上記ペースト材料を霧化する霧化装置と、当該霧化装置で霧化されたペースト材料を上記絶縁基板上に吹き付けるノズルとを備え、上記霧化装置は、溶媒を霧化したガスとキャリアガスとを混合して上記霧化部に補給する溶媒補給部と、ペースト溶剤を霧化して上記溶媒補給部からの混合ガスに取り込んでミスト流を作る霧化部と、上記ミスト流の混合比を調整する混合比調整装置とを備えた。
【選択図】 図3
Description
上記実施形態では、冷却部61、温度制御部62及びキャリアガス流量調節装置63をすべて設けたが、これらのうちのいずれか1つ又は2つだけ設けるようにしてもよい。この場合も、上記実施形態同様の作用、効果を奏することができる。
Claims (5)
- ペースト材料付着装置で絶縁基板上にペースト材料を供給して配線パターンを形成する配線形成装置において、
上記ペースト材料付着装置は、上記ペースト材料を霧化する霧化装置と、当該霧化装置で霧化されたペースト材料を上記絶縁基板上に吹き付けるノズルとを備え、
上記霧化装置は、溶媒を霧化したガスとキャリアガスとを混合して上記霧化部に補給する溶媒補給部と、ペースト溶剤を霧化して上記溶媒補給部からの混合ガスに取り込んでミスト流を作る霧化部と、上記ミスト流の混合比を調整する混合比調整装置とを備えたことを特徴とする配線形成装置。 - 請求項1に記載の配線形成装置において、
上記混合比調整装置が、上記霧化部から上記ノズルへ送られるミスト流を冷却して一部液化させてミスト流の混合比を調整する冷却部で構成されたことを特徴とする配線形成装置。 - 請求項1に記載の配線形成装置において、
上記混合比調整装置が、上記溶媒補給部を温度制御して、一定温度に保つと共に上記霧化部でのミスト流の混合比の変化に対応して当該溶媒補給部の温度を可変させて溶媒補給量を変化させる温度制御部で構成されたことを特徴とする配線形成装置。 - 請求項1に記載の配線形成装置において、
上記混合比調整装置が、上記溶媒補給部に供給されるキャリアガスの流量を調節して、溶媒を霧化したガスとキャリアガスとの混合比を調整するキャリアガス流量調節装置で構成されたことを特徴とする配線形成装置。 - 請求項1乃至4のいずれか1項に記載の配線形成装置において、
形成された配線の線幅を撮像して所定の線幅と比較する画像処理装置と、
当該画像処理装置で撮像した配線の線幅が所定の線幅に達していないとき、上記混合比調整装置を制御してミスト流の混合比を調整する制御装置とを備えたことを特徴とする配線形成装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010280847A JP5599701B2 (ja) | 2010-12-16 | 2010-12-16 | 配線形成装置 |
KR1020110123798A KR101284538B1 (ko) | 2010-12-16 | 2011-11-24 | 배선 형성 장치 |
TW100145752A TWI457059B (zh) | 2010-12-16 | 2011-12-12 | 配線形成裝置 |
US13/326,541 US8468685B2 (en) | 2010-12-16 | 2011-12-15 | Wire forming device |
CN201110426928.2A CN102573311B (zh) | 2010-12-16 | 2011-12-16 | 布线形成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010280847A JP5599701B2 (ja) | 2010-12-16 | 2010-12-16 | 配線形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012129413A true JP2012129413A (ja) | 2012-07-05 |
JP5599701B2 JP5599701B2 (ja) | 2014-10-01 |
Family
ID=46232498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010280847A Active JP5599701B2 (ja) | 2010-12-16 | 2010-12-16 | 配線形成装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8468685B2 (ja) |
JP (1) | JP5599701B2 (ja) |
KR (1) | KR101284538B1 (ja) |
CN (1) | CN102573311B (ja) |
TW (1) | TWI457059B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114226094A (zh) * | 2021-12-26 | 2022-03-25 | 北京化工大学 | 一种电动手动双功能雾化洗消器 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5599701B2 (ja) * | 2010-12-16 | 2014-10-01 | 株式会社日本マイクロニクス | 配線形成装置 |
JP6049067B2 (ja) * | 2012-12-27 | 2016-12-21 | 株式会社日本マイクロニクス | 配線形成装置、メンテナンス方法および配線形成方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0336784A (ja) * | 1989-07-04 | 1991-02-18 | Matsushita Electric Ind Co Ltd | 吐出式描画装置 |
JPH0660461U (ja) * | 1993-01-30 | 1994-08-23 | 太陽誘電株式会社 | 薄膜原料液霧化装置 |
JPH09141184A (ja) * | 1995-11-20 | 1997-06-03 | Fuji Electric Co Ltd | 誘電体膜の成膜方法 |
JP2001259494A (ja) * | 2000-03-17 | 2001-09-25 | Matsushita Battery Industrial Co Ltd | 薄膜形成方法 |
JP2004223379A (ja) * | 2003-01-22 | 2004-08-12 | Shimada Phys & Chem Ind Co Ltd | 液滴噴射装置 |
WO2009069210A1 (ja) * | 2007-11-29 | 2009-06-04 | Kabushiki Kaisha Nihon Micronics | 霧化装置、霧化方法、配線形成装置及び配線形成方法 |
Family Cites Families (8)
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US2125573A (en) * | 1936-08-10 | 1938-08-02 | Jr Isaac D Kelley | Atomizer |
US2936808A (en) * | 1956-09-07 | 1960-05-17 | Du Mont Allen B Lab Inc | Wire forming device |
ES2146989T3 (es) * | 1996-02-12 | 2000-08-16 | David Finn | Procedimiento y dispositivo para el contacto de un conductor de hilo. |
KR100713319B1 (ko) * | 1999-05-07 | 2007-05-04 | 후루카와 덴키 고교 가부시키가이샤 | 배선 방법 및 배선 장치 |
KR100575139B1 (ko) * | 2004-11-12 | 2006-05-03 | (주)태광테크 | 가스냉각장치가 구비된 저온 스프레이 코팅장치 |
JPWO2007141883A1 (ja) * | 2006-06-06 | 2009-10-15 | 株式会社日本マイクロニクス | 電気配線の形成方法およびその補修方法 |
JP2010027660A (ja) * | 2008-07-15 | 2010-02-04 | Micronics Japan Co Ltd | 回路基板の配線補修方法及びその装置 |
JP5599701B2 (ja) * | 2010-12-16 | 2014-10-01 | 株式会社日本マイクロニクス | 配線形成装置 |
-
2010
- 2010-12-16 JP JP2010280847A patent/JP5599701B2/ja active Active
-
2011
- 2011-11-24 KR KR1020110123798A patent/KR101284538B1/ko active IP Right Grant
- 2011-12-12 TW TW100145752A patent/TWI457059B/zh active
- 2011-12-15 US US13/326,541 patent/US8468685B2/en not_active Expired - Fee Related
- 2011-12-16 CN CN201110426928.2A patent/CN102573311B/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0336784A (ja) * | 1989-07-04 | 1991-02-18 | Matsushita Electric Ind Co Ltd | 吐出式描画装置 |
JPH0660461U (ja) * | 1993-01-30 | 1994-08-23 | 太陽誘電株式会社 | 薄膜原料液霧化装置 |
JPH09141184A (ja) * | 1995-11-20 | 1997-06-03 | Fuji Electric Co Ltd | 誘電体膜の成膜方法 |
JP2001259494A (ja) * | 2000-03-17 | 2001-09-25 | Matsushita Battery Industrial Co Ltd | 薄膜形成方法 |
JP2004223379A (ja) * | 2003-01-22 | 2004-08-12 | Shimada Phys & Chem Ind Co Ltd | 液滴噴射装置 |
WO2009069210A1 (ja) * | 2007-11-29 | 2009-06-04 | Kabushiki Kaisha Nihon Micronics | 霧化装置、霧化方法、配線形成装置及び配線形成方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114226094A (zh) * | 2021-12-26 | 2022-03-25 | 北京化工大学 | 一种电动手动双功能雾化洗消器 |
Also Published As
Publication number | Publication date |
---|---|
US20120151757A1 (en) | 2012-06-21 |
CN102573311A (zh) | 2012-07-11 |
KR20120067933A (ko) | 2012-06-26 |
US8468685B2 (en) | 2013-06-25 |
KR101284538B1 (ko) | 2013-07-11 |
CN102573311B (zh) | 2015-04-01 |
TWI457059B (zh) | 2014-10-11 |
JP5599701B2 (ja) | 2014-10-01 |
TW201238415A (en) | 2012-09-16 |
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