JP2012104478A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012104478A5 JP2012104478A5 JP2011237151A JP2011237151A JP2012104478A5 JP 2012104478 A5 JP2012104478 A5 JP 2012104478A5 JP 2011237151 A JP2011237151 A JP 2011237151A JP 2011237151 A JP2011237151 A JP 2011237151A JP 2012104478 A5 JP2012104478 A5 JP 2012104478A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- charged particle
- cell
- particle beam
- beam system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 49
- 238000000034 method Methods 0.000 claims 15
- 230000003287 optical effect Effects 0.000 claims 12
- 230000005855 radiation Effects 0.000 claims 12
- 230000007613 environmental effect Effects 0.000 claims 9
- 230000003321 amplification Effects 0.000 claims 2
- 238000004458 analytical method Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims 2
- 238000007789 sealing Methods 0.000 claims 2
- 238000002441 X-ray diffraction Methods 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 229920001971 elastomer Polymers 0.000 claims 1
- 239000000806 elastomer Substances 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 229920002313 fluoropolymer Polymers 0.000 claims 1
- 239000004811 fluoropolymer Substances 0.000 claims 1
- 238000004020 luminiscence type Methods 0.000 claims 1
- 230000005693 optoelectronics Effects 0.000 claims 1
- 238000000085 photoelectron yield spectroscopy Methods 0.000 claims 1
- 238000005424 photoluminescence Methods 0.000 claims 1
- -1 polytetrafluoroethylene Polymers 0.000 claims 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims 1
- 239000004810 polytetrafluoroethylene Substances 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/942,201 | 2010-11-09 | ||
| US12/942,201 US9679741B2 (en) | 2010-11-09 | 2010-11-09 | Environmental cell for charged particle beam system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015220540A Division JP6329523B2 (ja) | 2010-11-09 | 2015-11-10 | 荷電粒子ビーム・システム用の環境セル |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012104478A JP2012104478A (ja) | 2012-05-31 |
| JP2012104478A5 true JP2012104478A5 (enExample) | 2014-12-11 |
| JP5839935B2 JP5839935B2 (ja) | 2016-01-06 |
Family
ID=44905712
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011237151A Expired - Fee Related JP5839935B2 (ja) | 2010-11-09 | 2011-10-28 | 荷電粒子ビーム・システム用の環境セル |
| JP2015220540A Active JP6329523B2 (ja) | 2010-11-09 | 2015-11-10 | 荷電粒子ビーム・システム用の環境セル |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015220540A Active JP6329523B2 (ja) | 2010-11-09 | 2015-11-10 | 荷電粒子ビーム・システム用の環境セル |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9679741B2 (enExample) |
| EP (2) | EP2450935B1 (enExample) |
| JP (2) | JP5839935B2 (enExample) |
| CN (1) | CN102543639B (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5352262B2 (ja) | 2009-02-06 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8853078B2 (en) * | 2011-01-30 | 2014-10-07 | Fei Company | Method of depositing material |
| EP2557584A1 (en) * | 2011-08-10 | 2013-02-13 | Fei Company | Charged-particle microscopy imaging method |
| EP2631929A1 (en) | 2012-02-27 | 2013-08-28 | FEI Company | A holder assembly for cooperating with an environmental cell and an electron microscope |
| JP6169334B2 (ja) * | 2012-07-27 | 2017-07-26 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡および電子顕微鏡用試料保持装置 |
| EP2880675A4 (en) * | 2012-07-30 | 2016-03-30 | Fei Co | ELECTRONIC MICROSCOPE GAS INJECTION SYSTEM WITH ENVIRONMENTAL SCAN (SEM) |
| JP6051014B2 (ja) * | 2012-10-29 | 2016-12-21 | 株式会社日立ハイテクノロジーズ | 試料格納用容器、荷電粒子線装置、及び画像取得方法 |
| US9123506B2 (en) * | 2013-06-10 | 2015-09-01 | Fei Company | Electron beam-induced etching |
| CN104076476B (zh) * | 2014-07-11 | 2016-02-03 | 东南大学 | 一种光学透镜的超洁净真空密封方法 |
| US9349564B2 (en) | 2014-07-17 | 2016-05-24 | Fei Company | Charged-particle lens that transmits emissions from sample |
| KR101563495B1 (ko) * | 2014-07-31 | 2015-10-27 | 한국에너지기술연구원 | 광-전자적 측정 시에 샘플의 온도를 제어하는 장치 및 이를 이용한 태양전지 측정 장치 |
| US9449805B2 (en) * | 2014-09-23 | 2016-09-20 | Agilent Technologies Inc. | Isolation of charged particle optics from vacuum chamber deformations |
| CN105764228B (zh) * | 2014-12-19 | 2018-04-24 | 中国科学院空间科学与应用研究中心 | 一种空间中性原子探测仪器的定标系统及方法 |
| US9799490B2 (en) * | 2015-03-31 | 2017-10-24 | Fei Company | Charged particle beam processing using process gas and cooled surface |
| US9905391B2 (en) * | 2015-04-29 | 2018-02-27 | Kla-Tencor Corporation | System and method for imaging a sample with an electron beam with a filtered energy spread |
| US9633816B2 (en) * | 2015-05-18 | 2017-04-25 | Fei Company | Electron beam microscope with improved imaging gas and method of use |
| EP3157041A1 (en) * | 2015-10-13 | 2017-04-19 | FEI Company | Investigation of high-temperature specimens in a charged particle microscope |
| DE112016005577B4 (de) * | 2016-01-29 | 2021-09-16 | Hitachi High-Tech Corporation | Ladungsträgerstrahlvorrichtung und Verfahren zur Einstellung ihrer optischen Achse |
| TWI594288B (zh) * | 2016-03-14 | 2017-08-01 | 台灣電鏡儀器股份有限公司 | 電子顯微鏡 |
| WO2017183168A1 (ja) * | 2016-04-22 | 2017-10-26 | 株式会社 日立ハイテクノロジーズ | 荷電粒子顕微鏡および試料撮像方法 |
| CN106783493B (zh) * | 2016-12-01 | 2018-07-10 | 聚束科技(北京)有限公司 | 一种真空气氛处理装置、样品观测系统及方法 |
| GB201622206D0 (en) * | 2016-12-23 | 2017-02-08 | Univ Of Dundee See Pulcea Ltd Univ Of Huddersfield | Mobile material analyser |
| US11239051B2 (en) * | 2017-02-13 | 2022-02-01 | Hitachi High-Tech Corporation | Charged particle beam device |
| JP6929760B2 (ja) * | 2017-11-07 | 2021-09-01 | キヤノン株式会社 | 電子線検出素子、電子顕微鏡、透過型電子顕微鏡 |
| US10896802B2 (en) * | 2017-12-27 | 2021-01-19 | Fei Company | Combined SEM-CL and FIB-IOE microscopy |
| CN109979793B (zh) * | 2017-12-27 | 2023-11-07 | Fei 公司 | 复合型sem-cl和fib-ioe显微术 |
| DE102018203096B9 (de) * | 2018-03-01 | 2020-02-27 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens |
| DE102018004020A1 (de) * | 2018-05-18 | 2019-11-21 | Forschungszentrum Jülich GmbH | MeV-basierte Ionenstrahl-Analytikanlage |
| DE102018131609B3 (de) * | 2018-12-10 | 2020-02-06 | Carl Zeiss Microscopy Gmbh | Partikelstrahlsystem und Verfahren zum Betreiben eines Partikelstrahlsystems |
| US11491575B2 (en) * | 2019-04-16 | 2022-11-08 | Arcam Ab | Electron beam melting additive manufacturing machine with dynamic energy adjustment |
| US11195689B2 (en) * | 2019-08-03 | 2021-12-07 | ZoNexus LLC | Sample holder for electron microscopy |
| EP3792952B1 (en) * | 2019-09-16 | 2025-02-19 | FEI Company | Light guide assembly for an electron microscope |
| CN118817747A (zh) * | 2019-10-23 | 2024-10-22 | 加坦公司 | 对准阴极发光光学器件的系统和方法 |
| CN112289668B (zh) * | 2020-09-28 | 2025-01-24 | 北京中科科仪股份有限公司 | 一种电镜探测器的驱动机构及电镜探测器装置 |
| US11817292B2 (en) * | 2020-12-30 | 2023-11-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Primary charged particle beam current measurement |
| DE102022124933A1 (de) * | 2022-09-28 | 2024-03-28 | Carl Zeiss Multisem Gmbh | Vielstrahl-Teilchenmikroskop mit verbessertem Strahlrohr |
Family Cites Families (85)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2819165A1 (de) | 1978-05-02 | 1979-11-15 | Siemens Ag | Rasterelektronenmikroskop |
| US4605566A (en) | 1983-08-22 | 1986-08-12 | Nec Corporation | Method for forming thin films by absorption |
| GB8604004D0 (en) | 1986-02-18 | 1986-03-26 | Cambridge Instr Ltd | Specimen chamber |
| CA1304069C (en) | 1986-08-25 | 1992-06-23 | Johannes C. Oudejans | Hydrogenation catalyst |
| US5250808A (en) | 1987-05-21 | 1993-10-05 | Electroscan Corporation | Integrated electron optical/differential pumping/imaging signal system for an environmental scanning electron microscope |
| US4785182A (en) | 1987-05-21 | 1988-11-15 | Electroscan Corporation | Secondary electron detector for use in a gaseous atmosphere |
| US4823006A (en) | 1987-05-21 | 1989-04-18 | Electroscan Corporation | Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope |
| US4897545A (en) | 1987-05-21 | 1990-01-30 | Electroscan Corporation | Electron detector for use in a gaseous environment |
| US4911103A (en) * | 1987-07-17 | 1990-03-27 | Texas Instruments Incorporated | Processing apparatus and method |
| JPH03273134A (ja) | 1990-03-23 | 1991-12-04 | Shimadzu Corp | 走査型電子顕微鏡付き材料試験機 |
| US5683547A (en) | 1990-11-21 | 1997-11-04 | Hitachi, Ltd. | Processing method and apparatus using focused energy beam |
| US5397956A (en) | 1992-01-13 | 1995-03-14 | Tokyo Electron Limited | Electron beam excited plasma system |
| KR960012334B1 (ko) | 1992-03-31 | 1996-09-18 | 가부시끼가이샤 히다찌세이사꾸쇼 | 하전빔과 반응성가스를 사용해서 시료를 처리하는 방법 및 장치 |
| JP3023246B2 (ja) * | 1992-07-28 | 2000-03-21 | 株式会社日立製作所 | 超高真空用シール材ならびにこれを用いた超高真空装置および電子顕微鏡 |
| US5378898A (en) | 1992-09-08 | 1995-01-03 | Zapit Technology, Inc. | Electron beam system |
| JPH06168695A (ja) | 1992-11-30 | 1994-06-14 | Nikon Corp | 荷電粒子顕微鏡 |
| JPH06265952A (ja) | 1993-03-15 | 1994-09-22 | Toshiba Corp | 光波長変換素子 |
| JPH0719554B2 (ja) * | 1993-03-25 | 1995-03-06 | 工業技術院長 | 荷電ビーム装置 |
| JPH06289299A (ja) | 1993-04-05 | 1994-10-18 | Nikon Corp | 走査光電子顕微鏡 |
| US5446282A (en) * | 1993-04-05 | 1995-08-29 | Nikon Corporation | Scanning photoelectron microscope |
| US5412211A (en) | 1993-07-30 | 1995-05-02 | Electroscan Corporation | Environmental scanning electron microscope |
| US5362964A (en) | 1993-07-30 | 1994-11-08 | Electroscan Corporation | Environmental scanning electron microscope |
| JP3426001B2 (ja) | 1993-09-16 | 2003-07-14 | 東芝機械株式会社 | ステージ内蔵型雰囲気室装置 |
| US5440124A (en) | 1994-07-08 | 1995-08-08 | Wisconsin Alumni Research Foundation | High mass resolution local-electrode atom probe |
| US5828064A (en) | 1995-08-11 | 1998-10-27 | Philips Electronics North America Corporation | Field emission environmental scanning electron microscope |
| US6025592A (en) | 1995-08-11 | 2000-02-15 | Philips Electronics North America | High temperature specimen stage and detector for an environmental scanning electron microscope |
| JPH0963527A (ja) | 1995-08-18 | 1997-03-07 | Mitsubishi Electric Corp | コンタミネーション低減装置 |
| EP1003200B1 (en) | 1996-08-08 | 2004-06-02 | Fei Company | High temperature specimen stage and detector for an environmental scanning electron microscope |
| GB9623768D0 (en) | 1996-11-15 | 1997-01-08 | Leo Electron Microscopy Limite | Scanning electron microscope |
| JPH10172487A (ja) | 1996-12-13 | 1998-06-26 | Nikon Corp | 試料加熱装置 |
| JP3525674B2 (ja) * | 1997-03-24 | 2004-05-10 | 株式会社豊田中央研究所 | 仕事関数またはイオン化ポテンシャル測定装置およびその方法 |
| US5859079A (en) | 1997-05-21 | 1999-01-12 | Air Products And Chemicals, Inc. | Polyurethane catalyst compositions for improving foam performance |
| JPH11154479A (ja) | 1997-11-20 | 1999-06-08 | Hitachi Ltd | 2次電子画像検出方法及びその装置並びに集束荷電粒子ビームによる処理方法及びその装置 |
| US5945672A (en) | 1998-01-29 | 1999-08-31 | Fei Company | Gaseous backscattered electron detector for an environmental scanning electron microscope |
| JP2000215842A (ja) | 1999-01-26 | 2000-08-04 | Japan Science & Technology Corp | 複合放出電子顕微鏡におけるその場観察システム |
| US6440615B1 (en) | 1999-02-09 | 2002-08-27 | Nikon Corporation | Method of repairing a mask with high electron scattering and low electron absorption properties |
| JP2000304712A (ja) | 1999-04-22 | 2000-11-02 | Canon Inc | 電子線分析・観察装置および電子線マイクロアナライザ |
| EP1122761B1 (en) | 2000-02-01 | 2004-05-26 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Optical column for charged particle beam device |
| TWI294632B (en) | 2000-06-27 | 2008-03-11 | Ebara Corp | Inspecting device using an electron ebam and method for making semiconductor devices with such inspection device |
| CZ302126B6 (cs) | 2000-07-07 | 2010-11-03 | Leo Elektronenmikroskopie Gmbh | Detektor pro prístroje vyzarující korpuskulární zárení, prístroj vyzarující korpuskulární zárení a zpusob detekování existence produktu vzájemného pusobení v tomto prístroji |
| AUPQ932200A0 (en) | 2000-08-11 | 2000-08-31 | Danilatos, Gerasimos Daniel | Environmental scanning electron microscope |
| EP1339100A1 (en) * | 2000-12-01 | 2003-08-27 | Ebara Corporation | Inspection method and apparatus using electron beam, and device production method using it |
| WO2002045871A1 (en) | 2000-12-06 | 2002-06-13 | Angstron Systems, Inc. | System and method for modulated ion-induced atomic layer deposition (mii-ald) |
| JP3926103B2 (ja) | 2001-01-15 | 2007-06-06 | 日本電子株式会社 | 冷却ホルダ並びに走査電子顕微鏡 |
| JP2002289129A (ja) | 2001-03-26 | 2002-10-04 | Jeol Ltd | 低真空走査電子顕微鏡 |
| JP2004537758A (ja) | 2001-07-27 | 2004-12-16 | エフ・イ−・アイ・カンパニー | 電子ビーム処理 |
| JP2003249188A (ja) * | 2002-02-26 | 2003-09-05 | Jeol Ltd | 電子ビーム照射装置及び電子ビーム照射方法 |
| JP3723846B2 (ja) | 2002-04-15 | 2005-12-07 | 独立行政法人産業技術総合研究所 | 電子ビーム装置 |
| EP2557416A3 (en) * | 2002-04-17 | 2013-02-27 | Ebara Corporation | Sample surface inspection apparatus and method |
| JP2004071486A (ja) * | 2002-08-09 | 2004-03-04 | Seiko Instruments Inc | 集束荷電粒子ビーム装置 |
| US6979822B1 (en) | 2002-09-18 | 2005-12-27 | Fei Company | Charged particle beam system |
| JP4616938B2 (ja) | 2002-09-18 | 2011-01-19 | エフ・イ−・アイ・カンパニー | 環境走査電子顕微鏡および検出器 |
| US7015467B2 (en) * | 2002-10-10 | 2006-03-21 | Applied Materials, Inc. | Generating electrons with an activated photocathode |
| US6674076B1 (en) | 2002-12-12 | 2004-01-06 | Ballard Power Systems Inc. | Humidified imaging with an environmental scanning electron microscope |
| US6897443B2 (en) * | 2003-06-02 | 2005-05-24 | Harald Gross | Portable scanning electron microscope |
| KR100974778B1 (ko) | 2003-06-30 | 2010-08-06 | 삼성전자주식회사 | 유기금속 전구체 조성물 및 이를 이용한 금속 필름 또는패턴 형성방법 |
| US7208221B2 (en) | 2003-10-15 | 2007-04-24 | Board Of Trustees Of Michigan State University | Biocomposites sheet molding and methods of making those |
| JP4248382B2 (ja) | 2003-12-04 | 2009-04-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビームによる検査方法および検査装置 |
| JP2005174591A (ja) | 2003-12-08 | 2005-06-30 | Horon:Kk | 荷電粒子線装置および荷電粒子線像生成方法 |
| JP2005190864A (ja) | 2003-12-26 | 2005-07-14 | Hitachi High-Technologies Corp | 電子線装置及び電子線装置用試料ホルダー |
| NL1026547C2 (nl) | 2004-07-01 | 2006-01-03 | Fei Co | Apparaat voor het evacueren van een sample. |
| JP4262158B2 (ja) | 2004-07-13 | 2009-05-13 | 株式会社日立ハイテクサイエンスシステムズ | 低真空走査電子顕微鏡 |
| US7304302B1 (en) | 2004-08-27 | 2007-12-04 | Kla-Tencor Technologies Corp. | Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis |
| JP4434901B2 (ja) | 2004-09-28 | 2010-03-17 | 京セラ株式会社 | 試料搬送装置 |
| JP4895569B2 (ja) | 2005-01-26 | 2012-03-14 | 株式会社日立ハイテクノロジーズ | 帯電制御装置及び帯電制御装置を備えた計測装置 |
| US7670956B2 (en) | 2005-04-08 | 2010-03-02 | Fei Company | Beam-induced etching |
| EP1724809A1 (en) | 2005-05-18 | 2006-11-22 | FEI Company | Particle-optical apparatus for the irradiation of a sample |
| JP4627682B2 (ja) | 2005-05-27 | 2011-02-09 | 株式会社日立ハイテクノロジーズ | 試料作製装置および方法 |
| EP1739715A3 (en) * | 2005-06-29 | 2008-12-10 | Horiba, Ltd. | Sample measuring device |
| JP2007172886A (ja) | 2005-12-19 | 2007-07-05 | Toyota Motor Corp | 光電子顕微鏡装置 |
| EP1816668A2 (en) | 2006-02-01 | 2007-08-08 | FEI Company | Particle-optical apparatus with a predetermined final vacuum pressure |
| JP2007303924A (ja) * | 2006-05-10 | 2007-11-22 | Sumitomo Jukikai Advanced Machinery Kk | イオン化ポテンシャル測定装置 |
| US7533000B2 (en) * | 2006-07-28 | 2009-05-12 | Oxford Instruments Analytical Limited | Method and apparatus for analysing a dataset of spectra |
| ITMO20060267A1 (it) | 2006-09-05 | 2008-03-06 | Sicam Srl | Macchina equilibratrice perfezionata per ruote di veicoli |
| JP2008066080A (ja) * | 2006-09-06 | 2008-03-21 | National Institutes Of Natural Sciences | 磁気円二色性測定方法、磁気円二色性光電子放出顕微鏡、及び磁気円二色性光電子放出顕微鏡システム |
| JP5227512B2 (ja) * | 2006-12-27 | 2013-07-03 | 株式会社日立ハイテクノロジーズ | 電子線応用装置 |
| US8921811B2 (en) * | 2007-02-06 | 2014-12-30 | Fei Company | High pressure charged particle beam system |
| EP1956633A3 (en) * | 2007-02-06 | 2009-12-16 | FEI Company | Particle-optical apparatus for simultaneous observing a sample with particles and photons |
| EP2006881A3 (en) | 2007-06-18 | 2010-01-06 | FEI Company | In-chamber electron detector |
| JP5069540B2 (ja) * | 2007-11-12 | 2012-11-07 | 株式会社コベルコ科研 | 電子分光分析複合装置、及び電子分光分析方法 |
| DE102007054074A1 (de) * | 2007-11-13 | 2009-05-14 | Carl Zeiss Nts Gmbh | System zum Bearbeiten eines Objekts |
| EP2105944A1 (en) * | 2008-03-28 | 2009-09-30 | FEI Company | Environmental cell for a particle-optical apparatus |
| US7791020B2 (en) * | 2008-03-31 | 2010-09-07 | Fei Company | Multistage gas cascade amplifier |
| WO2010006067A2 (en) | 2008-07-09 | 2010-01-14 | Fei Company | Method and apparatus for laser machining |
| US20110006205A1 (en) * | 2009-07-12 | 2011-01-13 | Raymond Browning | Ambient pressure photoelectron microscope |
-
2010
- 2010-11-09 US US12/942,201 patent/US9679741B2/en active Active
-
2011
- 2011-10-28 JP JP2011237151A patent/JP5839935B2/ja not_active Expired - Fee Related
- 2011-11-07 EP EP11187989.6A patent/EP2450935B1/en not_active Not-in-force
- 2011-11-07 EP EP11187990.4A patent/EP2450934B1/en not_active Not-in-force
- 2011-11-08 CN CN201110349835.4A patent/CN102543639B/zh not_active Expired - Fee Related
-
2015
- 2015-11-10 JP JP2015220540A patent/JP6329523B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012104478A5 (enExample) | ||
| JP6329523B2 (ja) | 荷電粒子ビーム・システム用の環境セル | |
| US9741526B2 (en) | Charged particle beam apparatus and sample image acquiring method | |
| JP5634030B2 (ja) | 粒子光学装置用環境セル | |
| US8530856B2 (en) | Beam device system comprising a particle beam device and an optical microscope | |
| US9810649B2 (en) | X-ray fluorescence analyzer | |
| WO2016158421A1 (ja) | 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置 | |
| US8513604B2 (en) | Detection device and particle beam device having a detection device | |
| US9453801B2 (en) | Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems | |
| US9536701B2 (en) | Radiation analyzer including a support for tilting an energy-dispersive radiation detector | |
| KR102029869B1 (ko) | 탈착가능한 전자현미경용 시료실 장치 및 이를 포함하는 전자현미경 | |
| TWI399780B (zh) | 包含場發射陰極之x射線源 | |
| JP2005174591A (ja) | 荷電粒子線装置および荷電粒子線像生成方法 | |
| US11393658B2 (en) | Charged particle beam apparatus and sample observation method | |
| JP4796791B2 (ja) | 荷電粒子線装置および荷電粒子線像生成方法 | |
| JP5127313B2 (ja) | 検査システム | |
| US9400255B2 (en) | X-ray fluorescence spectrometer comprising a gas blowing mechanism | |
| JP4079503B2 (ja) | 分析電子顕微鏡 | |
| KR102139936B1 (ko) | 전기적 광원을 구비한 기체 전리형 검출기 및 이를 이용한 점검, 교정, 자동 출력안정화 방사선 계측 장치 | |
| JP3965691B2 (ja) | 走査電子顕微鏡 | |
| JP2015076321A (ja) | 真空装置 | |
| EP1953793B1 (en) | Specimen holder, specimen inspection apparatus, specimen inspection method, and method of fabricating specimen holder | |
| JP6228870B2 (ja) | 検出器および荷電粒子線装置 | |
| JP4960393B2 (ja) | 荷電粒子線装置及び該装置を用いたデバイス製造方法 | |
| JPH06289299A (ja) | 走査光電子顕微鏡 |