JP2012092434A5 - - Google Patents

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Publication number
JP2012092434A5
JP2012092434A5 JP2011204196A JP2011204196A JP2012092434A5 JP 2012092434 A5 JP2012092434 A5 JP 2012092434A5 JP 2011204196 A JP2011204196 A JP 2011204196A JP 2011204196 A JP2011204196 A JP 2011204196A JP 2012092434 A5 JP2012092434 A5 JP 2012092434A5
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JP
Japan
Prior art keywords
silver
pyridyl
hydantoin
acrylic acid
solution
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JP2011204196A
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English (en)
Japanese (ja)
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JP5854727B2 (ja
JP2012092434A (ja
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Publication of JP2012092434A5 publication Critical patent/JP2012092434A5/ja
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JP2011204196A 2010-09-21 2011-09-20 シアン化物を含まない銀電気めっき液 Active JP5854727B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38506610P 2010-09-21 2010-09-21
US61/385066 2010-09-21

Publications (3)

Publication Number Publication Date
JP2012092434A JP2012092434A (ja) 2012-05-17
JP2012092434A5 true JP2012092434A5 (enExample) 2015-12-10
JP5854727B2 JP5854727B2 (ja) 2016-02-09

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ID=44719414

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JP2011204196A Active JP5854727B2 (ja) 2010-09-21 2011-09-20 シアン化物を含まない銀電気めっき液

Country Status (7)

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US (1) US8608932B2 (enExample)
EP (1) EP2431502B1 (enExample)
JP (1) JP5854727B2 (enExample)
KR (1) KR101779410B1 (enExample)
CN (1) CN102409373B (enExample)
SG (1) SG179380A1 (enExample)
TW (1) TWI427194B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103741178B (zh) * 2014-01-20 2017-06-16 厦门大学 一种用于硅表面直接电镀光滑致密银薄膜的溶液及电镀方法
US10889907B2 (en) 2014-02-21 2021-01-12 Rohm And Haas Electronic Materials Llc Cyanide-free acidic matte silver electroplating compositions and methods
CN105506683A (zh) * 2015-12-23 2016-04-20 苏州市金星工艺镀饰有限公司 一种无氰镀银电镀液
CN105463524A (zh) * 2015-12-23 2016-04-06 苏州市金星工艺镀饰有限公司 一种无氰镀银电镀液的电镀方法
CN107604394A (zh) * 2017-09-29 2018-01-19 佛山市春暖花开科技有限公司 一种银的电镀液
DE102019106004B4 (de) * 2019-03-08 2023-11-30 Umicore Galvanotechnik Gmbh Additiv für die cyanidfreie Abscheidung von Silber
WO2020038948A1 (de) 2018-08-21 2020-02-27 Umicore Galvanotechnik Gmbh Elektrolyt für die cyanidfreie abscheidung von silber
DE102018120357A1 (de) * 2018-08-21 2020-02-27 Umicore Galvanotechnik Gmbh Elektrolyt zur Abscheidung von Silber und Silberlegierungsüberzügen
CN111349934A (zh) * 2020-03-12 2020-06-30 华东师范大学 一种柔性银电极及其制备方法
JP7740879B2 (ja) * 2021-01-20 2025-09-17 株式会社Jcu 電解銀めっき浴およびこれを用いた電解銀めっき方法
US11578418B2 (en) * 2021-03-29 2023-02-14 Rohm And Haas Electronic Materials Llc (Rhem) Silver electroplating compositions and methods for electroplating silver with low coefficients of friction
KR102476608B1 (ko) 2021-11-19 2022-12-13 (주)피이솔브 은도금액
FR3155008B1 (fr) 2023-11-06 2025-11-07 Axon Cable Sa Composition de bain d’argenture sans cyanure et ses utilisations

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615737A (en) * 1969-08-04 1971-10-26 Photocircuits Corp Electroless copper deposition
JPS534499B2 (enExample) 1972-11-13 1978-02-17
US4126524A (en) * 1975-03-12 1978-11-21 Technic, Inc. Silver complex, method of making said complex and method and electrolyte containing said complex for electroplating silver and silver alloys
BG29206A1 (en) 1979-07-06 1980-10-15 Novev Combinated brightnessformer for amonia- sulphamate electrolyte for plating with silver
US4478691A (en) * 1981-10-13 1984-10-23 At&T Bell Laboratories Silver plating procedure
GB8334226D0 (en) 1983-12-22 1984-02-01 Learonal Uk Ltd Electrodeposition of gold alloys
US4673472A (en) * 1986-02-28 1987-06-16 Technic Inc. Method and electroplating solution for deposition of palladium or alloys thereof
GB8612361D0 (en) * 1986-05-21 1986-06-25 Engelhard Corp Gold electroplating bath
US5198132A (en) 1990-10-11 1993-03-30 The Lubrizol Corporation Antioxidant products
JPH08104993A (ja) 1994-10-04 1996-04-23 Electroplating Eng Of Japan Co 銀めっき浴及びその銀めっき方法
JP3012182B2 (ja) * 1995-11-15 2000-02-21 荏原ユージライト株式会社 銀および銀合金めっき浴
US6251249B1 (en) * 1996-09-20 2001-06-26 Atofina Chemicals, Inc. Precious metal deposition composition and process
JP4296358B2 (ja) * 1998-01-21 2009-07-15 石原薬品株式会社 銀及び銀合金メッキ浴
JPH11302893A (ja) * 1998-04-22 1999-11-02 Okuno Chem Ind Co Ltd 非シアン系電気銀めっき液
CN1205360C (zh) * 1999-06-17 2005-06-08 德古萨电解技术有限公司 用于电沉积有光泽的金和金合金镀层的酸性浴液及其所用的光泽剂
FR2807422B1 (fr) * 2000-04-06 2002-07-05 Engelhard Clal Sas Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages
FR2807450B1 (fr) 2000-04-06 2002-07-05 Engelhard Clal Sas Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages
US7628903B1 (en) 2000-05-02 2009-12-08 Ishihara Chemical Co., Ltd. Silver and silver alloy plating bath
DE10026680C1 (de) 2000-05-30 2002-02-21 Schloetter Fa Dr Ing Max Elektrolyt und Verfahren zur Abscheidung von Zinn-Silber-Legierungsschichten und Verwendung des Elektrolyten
DE10124002C1 (de) 2001-05-17 2003-02-06 Ami Doduco Gmbh Saures Silberbad
JP2004225063A (ja) * 2003-01-20 2004-08-12 Electroplating Eng Of Japan Co 非シアン系銀めっき液及び銀めっき方法並びにそれによるバンプ形成方法
JP2005105386A (ja) 2003-10-01 2005-04-21 Nagoya Plating Co Ltd 繊維用の無電解銀めっき液
US20050183961A1 (en) 2004-02-24 2005-08-25 Morrissey Ronald J. Non-cyanide silver plating bath composition
JP2007327127A (ja) * 2006-06-09 2007-12-20 Daiwa Fine Chemicals Co Ltd (Laboratory) 銀めっき方法
EP2157209B1 (en) * 2008-07-31 2014-10-22 Rohm and Haas Electronic Materials LLC Inhibiting Background Plating
CN101665963B (zh) * 2009-09-23 2011-08-24 福建师范大学 一种环保型无氰银电镀液
EP2431501B1 (en) * 2010-09-21 2013-11-20 Rohm and Haas Electronic Materials LLC Method of electroplating silver strike over nickel

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