JP2011530813A - エンドエフェクタ用磁気パッド - Google Patents
エンドエフェクタ用磁気パッド Download PDFInfo
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- 239000012636 effector Substances 0.000 title claims abstract description 221
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 73
- 230000000712 assembly Effects 0.000 claims abstract description 19
- 238000000429 assembly Methods 0.000 claims abstract description 19
- 238000005304 joining Methods 0.000 claims abstract description 4
- 230000005294 ferromagnetic effect Effects 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000003302 ferromagnetic material Substances 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229920001971 elastomer Polymers 0.000 claims description 5
- 239000000806 elastomer Substances 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 12
- 239000000463 material Substances 0.000 description 21
- 210000000707 wrist Anatomy 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000011156 metal matrix composite Substances 0.000 description 5
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical class [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910000767 Tm alloy Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000012993 chemical processing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002241 glass-ceramic Substances 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910000883 Ti6Al4V Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 239000006094 Zerodur Substances 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- SOWHJXWFLFBSIK-UHFFFAOYSA-N aluminum beryllium Chemical compound [Be].[Al] SOWHJXWFLFBSIK-UHFFFAOYSA-N 0.000 description 1
- 230000008485 antagonism Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/02—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
- B23Q3/06—Work-clamping means
- B23Q3/08—Work-clamping means other than mechanically-actuated
- B23Q3/088—Work-clamping means other than mechanically-actuated using vacuum means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
- B23Q7/04—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of grippers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0052—Gripping heads and other end effectors multiple gripper units or multiple end effectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/08—Gripping heads and other end effectors having finger members
- B25J15/10—Gripping heads and other end effectors having finger members with three or more finger members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本発明の実施形態は、概して、移動操作の間に基板を支持するための装置及び方法に関する。特に、本発明の実施形態は、真空条件において大面積基板を支持して移動するための装置及び方法に関する。
一般に大面積基板は、ソーラーパネル、アクティブマトリックス又は薄膜トランジスタ(TFT)ディスプレイなどのフラットパネルディスプレイ、液晶ディスプレイ(LCD)、プラズマディスプレイ等の製造において使用される。
Claims (15)
- 真空環境内で大面積基板を支持して移動するための装置であって、
駆動機構に結合したリストと、
前記リストに結合し、大面積基板を受け取り支持するために構成される1以上のエンドエフェクタと、
前記1以上のエンドエフェクタの基板受け取り面上に配置される複数のエンドエフェクタパッドとを含み、前記複数のエンドエフェクタパッドは、前記大面積基板を受け取り、前記大面積基板と1以上のエンドエフェクタとの間の直接接触を防ぐために構成され、前記複数のエンドエフェクタパッドは、1以上のエンドエフェクタに固定具を用いて機械的に接合されない装置。 - 前記複数のエンドエフェクタパッドは、磁力によって前記1以上のエンドエフェクタに結合され、前記装置は、前記1以上のエンドエフェクタ内に配置される複数の磁気アセンブリを更に含み、各磁気アセンブリは、前記1以上のエンドエフェクタに対応するエンドエフェクタパッドを固定するために構成される請求項1記載の装置。
- 各磁気アセンブリは、
前記対応するエンドエフェクタ内に形成される凹部内に配置される磁気コアと、
前記凹部内及び前記磁気コアの上方に配置されるカバーと、
前記磁気コア及び前記カバーを前記対応するエンドエフェクタに固定する固定手段とを含む請求項2記載の装置。 - 前記磁気コアは、酸化イットリウムをコーティングしたサマリウムコバルト磁石で作られており、前記カバーは、ポリイミドベースの高機能ポリマーを含む請求項3記載の装置。
- 前記複数のエンドエフェクタパッドの夫々は、
前記複数の磁気アセンブリのうちの1つの近くに前記エンドエフェクタパッドを固定するために構成される強磁性ベース部材と、
前記強磁性ベース部材と結合されるパッド部材とを含み、前記パッド部材の少なくとも一部は、前記エンドエフェクタパッドが前記対応するエンドエフェクタに固定されるとき、前記1以上のエンドエフェクタの前記基板受け取り面の上方で突出し、前記突出部は、前記大面積基板を受け取るために構成される請求項2記載の装置。 - 前記強磁性ベース部材は、ニッケル及びモリブデンを含む高耐食性合金で作られており、前記パッド部材は、過フッ化エラストマーから作られており、各エンドエフェクタパッドは、前記強磁性ベース部材を前記パッド部材に接続するために構成されるクランプ構造を更に含み、前記強磁性ベース部材は、前記大面積基板を受け取るための前記パッド部材の一部を隆起させるために構成される突出する上部を含む請求項5記載の装置。
- 前記パッド部材は、
前記強磁性ベース部材に接触するために適合される下部と、
前記下部から延びる上部とを含み、前記上部は、断面がU字形を形成する請求項5記載の装置。 - 前記上部は、前記下部から延びる円錐である請求項7記載の装置。
- 真空ロボットのエンドエフェクタ用パッドアセンブリであって、
前記パッドアセンブリを前記エンドエフェクタに固定するために適合され、前記エンドエフェクタと接触する第1側及び前記第1側と反対の第2側を有するベース部材と、
前記ベース部材に結合するパッド部材を含み、前記パッド部材は、前記ベース部材の前記第2側と接触する第1側と、前記パッド部材の前記第1側と反対の第2側とを有し、前記パッド部材の前記第2側の少なくとも一部は、基板を受け取り支持するための接触領域を形成するために隆起し、
前記パッドアセンブリは、前記ベース部材と前記パッド部材を接合する固定手段を更に含むパッドアセンブリ。 - 前記ベース部材は、強磁性体材料を含み、磁力によって前記エンドエフェクタに付けるために構成される請求項9記載のパッドアセンブリ。
- 前記ベース部材は、前記第1側から延びる2つのコラムを有し、前記2つのコラムは、簡単な位置決めのために前記エンドエフェクタ内に形成される凹部に合うように構成される請求項10記載のパッドアセンブリ。
- 前記ベース部材は、前記第2側に隆起中央部を有し、前記隆起中央部は、前記接触領域を形成するために前記パッド部材の一部を隆起させるために構成され、前記ベース部材は、前記隆起中央部内に1以上のサービス穴を形成し、前記1以上のサービス穴は、前記エンドエフェクタから前記パッドアセンブリを取り外すための工具を受け入れるために構成される請求項10記載のパッドアセンブリ。
- 前記パッド部材は、前記パッド部材の前記第2側から延びる隆起構造を含み、前記隆起構造の遠端は、前記接触領域を形成し、前記隆起構造は円錐であり、前記接触領域は、前記円錐の開放端である請求項10記載のパッドアセンブリ。
- 真空ロボットのエンドエフェクタ用パッドアセンブリであって、
前記真空ロボット用の接触領域を提供するために構成されるパッド部材を含み、前記パッド部材は第1側及び前記第1側と反対の第2側を有し、前記第1側は実質的に平面であり、前記第2側は前記第2側から延びる接触構造を有し、前記接触構造の上面は前記接触領域を形成し、
前記パッドアセンブリは、前記パッドアセンブリを前記エンドエフェクタに固定するために適合され、前記第1側から前記パッド部材と接触するベース部材と、
前記第2側から前記パッド部材を接触させ、前記接触構造が露出することを可能にする穴を有するクランプ部材と、
前記ベース部材、前記パッド部材、前記クランプ部材を接合する固定手段とを更に含むパッドアセンブリ。 - 前記接触構造は円錐構造であり、前記円錐構造の開放端は前記接触領域を形成し、前記ベース部材は、強磁性体材料を含み、磁力によって前記パッドアセンブリを前記エンドエフェクタに固定するために構成される請求項14記載のパッドアセンブリ。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8759108P | 2008-08-08 | 2008-08-08 | |
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US20100034625A1 (en) | 2010-02-11 |
WO2010017340A3 (en) | 2010-05-14 |
CN102119438A (zh) | 2011-07-06 |
WO2010017340A2 (en) | 2010-02-11 |
KR101658789B1 (ko) | 2016-10-04 |
CN102119438B (zh) | 2013-08-21 |
US8276959B2 (en) | 2012-10-02 |
KR20110043742A (ko) | 2011-04-27 |
USD624716S1 (en) | 2010-09-28 |
TWI488720B (zh) | 2015-06-21 |
JP5468607B2 (ja) | 2014-04-09 |
TW201012606A (en) | 2010-04-01 |
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