JP2011500480A - ウェブコーティングプロセスにおける浮上クッションによるウェブの搬送 - Google Patents

ウェブコーティングプロセスにおける浮上クッションによるウェブの搬送 Download PDF

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Publication number
JP2011500480A
JP2011500480A JP2010530402A JP2010530402A JP2011500480A JP 2011500480 A JP2011500480 A JP 2011500480A JP 2010530402 A JP2010530402 A JP 2010530402A JP 2010530402 A JP2010530402 A JP 2010530402A JP 2011500480 A JP2011500480 A JP 2011500480A
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JP
Japan
Prior art keywords
web
guide device
gas
coating
typically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010530402A
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English (en)
Japanese (ja)
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JP2011500480A5 (enExample
Inventor
ヴォルフガング ブッシュベック，
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Applied Materials Inc
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Applied Materials Inc
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Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2011500480A publication Critical patent/JP2011500480A/ja
Publication of JP2011500480A5 publication Critical patent/JP2011500480A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00—Registering, tensioning, smoothing or guiding webs
    • B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
    • B65H23/24—Registering, tensioning, smoothing or guiding webs longitudinally by fluid action, e.g. to retard the running web
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2515/00—Physical entities not provided for in groups B65H2511/00 or B65H2513/00
    • B65H2515/40—Temperature; Thermal conductivity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2601/00—Problem to be solved or advantage achieved
    • B65H2601/20—Avoiding or preventing undesirable effects
    • B65H2601/25—Damages to handled material
    • B65H2601/253—Damages to handled material to particular parts of material
    • B65H2601/2532—Surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Advancing Webs (AREA)
JP2010530402A 2007-10-25 2008-10-15 ウェブコーティングプロセスにおける浮上クッションによるウェブの搬送 Pending JP2011500480A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US98263507P 2007-10-25 2007-10-25
EP07020927A EP2053663A1 (en) 2007-10-25 2007-10-25 Hover cushion transport for webs in a web coating process
PCT/EP2008/063902 WO2009053289A1 (en) 2007-10-25 2008-10-15 Hover cushion transport for webs in a web coating process

Publications (2)

Publication Number Publication Date
JP2011500480A true JP2011500480A (ja) 2011-01-06
JP2011500480A5 JP2011500480A5 (enExample) 2011-12-01

Family

ID=38824994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010530402A Pending JP2011500480A (ja) 2007-10-25 2008-10-15 ウェブコーティングプロセスにおける浮上クッションによるウェブの搬送

Country Status (7)

Country Link
US (1) US20090110809A1 (enExample)
EP (1) EP2053663A1 (enExample)
JP (1) JP2011500480A (enExample)
KR (1) KR20100091984A (enExample)
CN (1) CN101836303A (enExample)
TW (1) TW200933788A (enExample)
WO (1) WO2009053289A1 (enExample)

Cited By (1)

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JP2024117442A (ja) * 2023-02-17 2024-08-29 プライムプラネットエナジー＆ソリューションズ株式会社 シート搬送装置

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CN102308368B (zh) 2008-12-04 2014-02-12 威科仪器有限公司 用于化学气相沉积的进气口元件及其制造方法
EP2455316A4 (en) * 2009-07-15 2012-12-19 Toyo Kohan Co Ltd NETFLOW AND CONVEYOR DEVICE AND METHOD FOR THE PRODUCTION THEREOF
EP2299473A1 (en) * 2009-09-22 2011-03-23 Applied Materials, Inc. Modular substrate processing system and method
US20110097494A1 (en) * 2009-10-27 2011-04-28 Kerr Roger S Fluid conveyance system including flexible retaining mechanism
JP5485928B2 (ja) * 2011-03-09 2014-05-07 東京エレクトロン株式会社 基板浮上搬送装置及び基板処理装置
US9073250B2 (en) * 2011-09-08 2015-07-07 Corning Incorporated Apparatus and methods for producing a ceramic green body
JP2013082959A (ja) * 2011-10-07 2013-05-09 Sony Corp 自己停止反応成膜装置及び自己停止反応成膜方法
SE537252C2 (sv) * 2011-12-15 2015-03-17 Andritz Tech & Asset Man Gmbh Torklåda som har blåslådor för torkning av en bana av cellulosamassa
WO2013108751A1 (ja) * 2012-01-16 2013-07-25 株式会社アルバック 成膜装置
JP2013212919A (ja) * 2012-04-03 2013-10-17 Sakurai Graphic Syst:Kk 枚葉シート搬送装置及び印刷機
EP2765218A1 (en) * 2013-02-07 2014-08-13 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
BR112015031114B1 (pt) * 2013-06-11 2020-10-13 University Of Houston aparelho e método para deposição de um revestimento
DE102014113047A1 (de) * 2013-09-19 2015-03-19 Von Ardenne Gmbh Vakuumbeschichtungsanlage und Verfahren zur Beschichtung bandförmiger Substrate
US9925761B2 (en) * 2015-12-02 2018-03-27 Eastman Kodak Company Liquid ejection hole orientation for web guide
KR102509129B1 (ko) * 2016-06-02 2023-03-09 어플라이드 머티어리얼스, 인코포레이티드 가이딩 디바이스들 및 웹 코팅 프로세스
CN107745579B (zh) * 2016-11-10 2019-05-28 北京航空航天大学 一种具有气浮支撑功能的卷对卷印刷电子喷墨加工平台
US11440831B2 (en) * 2018-12-13 2022-09-13 Corning Incorporated Conveying apparatus and conveying ribbon
CN110911335B (zh) * 2019-11-13 2022-05-31 深圳市华星光电半导体显示技术有限公司 气浮支撑平台
EP4326919A4 (en) * 2021-04-21 2025-08-20 Elevated Mat Germany Gmbh MATERIAL DEPOSITION APPARATUS, METHOD FOR DEPOSITING MATERIAL ON A SUBSTRATE, AND MATERIAL DEPOSITION SYSTEM
US20220356027A1 (en) * 2021-05-04 2022-11-10 Applied Materials, Inc. Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor
US20220356028A1 (en) * 2021-05-04 2022-11-10 Applied Materials, Inc. Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor
CN116067158B (zh) * 2023-02-07 2023-07-04 无锡爱德旺斯科技有限公司 一种气浮烘箱
EP4530240A1 (en) * 2023-09-29 2025-04-02 CUSTOMCELLS Holding GmbH A system, plant, and method for processing a bendable foil, a plant for obtaining a metalated battery electrode and a method of producing a battery cell
CN120288561B (zh) * 2025-06-13 2025-08-12 福建省爱珈图服装发展有限公司 一种铺布机模块化磁吸式压布导辊

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Cited By (2)

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Publication number Priority date Publication date Assignee Title
JP2024117442A (ja) * 2023-02-17 2024-08-29 プライムプラネットエナジー＆ソリューションズ株式会社 シート搬送装置
JP7731926B2 (ja) 2023-02-17 2025-09-01 プライムプラネットエナジー＆ソリューションズ株式会社 シート搬送装置

Also Published As

Publication number Publication date
WO2009053289A1 (en) 2009-04-30
EP2053663A1 (en) 2009-04-29
TW200933788A (en) 2009-08-01
US20090110809A1 (en) 2009-04-30
CN101836303A (zh) 2010-09-15
KR20100091984A (ko) 2010-08-19

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