CN101836303A - 在片材涂覆处理中用于片材的悬浮垫传输 - Google Patents

在片材涂覆处理中用于片材的悬浮垫传输 Download PDF

Info

Publication number
CN101836303A
CN101836303A CN200880113164A CN200880113164A CN101836303A CN 101836303 A CN101836303 A CN 101836303A CN 200880113164 A CN200880113164 A CN 200880113164A CN 200880113164 A CN200880113164 A CN 200880113164A CN 101836303 A CN101836303 A CN 101836303A
Authority
CN
China
Prior art keywords
sheet
gas
guiding device
coating
guiding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200880113164A
Other languages
English (en)
Chinese (zh)
Inventor
沃夫冈·布斯史贝克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN101836303A publication Critical patent/CN101836303A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00—Registering, tensioning, smoothing or guiding webs
    • B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
    • B65H23/24—Registering, tensioning, smoothing or guiding webs longitudinally by fluid action, e.g. to retard the running web
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2515/00—Physical entities not provided for in groups B65H2511/00 or B65H2513/00
    • B65H2515/40—Temperature; Thermal conductivity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2601/00—Problem to be solved or advantage achieved
    • B65H2601/20—Avoiding or preventing undesirable effects
    • B65H2601/25—Damages to handled material
    • B65H2601/253—Damages to handled material to particular parts of material
    • B65H2601/2532—Surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Advancing Webs (AREA)
  • Photovoltaic Devices (AREA)
CN200880113164A 2007-10-25 2008-10-15 在片材涂覆处理中用于片材的悬浮垫传输 Pending CN101836303A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US98263507P 2007-10-25 2007-10-25
EP07020927A EP2053663A1 (en) 2007-10-25 2007-10-25 Hover cushion transport for webs in a web coating process
EP07020927.5 2007-10-25
US60/982,635 2007-10-25
PCT/EP2008/063902 WO2009053289A1 (en) 2007-10-25 2008-10-15 Hover cushion transport for webs in a web coating process

Publications (1)

Publication Number Publication Date
CN101836303A true CN101836303A (zh) 2010-09-15

Family

ID=38824994

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880113164A Pending CN101836303A (zh) 2007-10-25 2008-10-15 在片材涂覆处理中用于片材的悬浮垫传输

Country Status (7)

Country Link
US (1) US20090110809A1 (enExample)
EP (1) EP2053663A1 (enExample)
JP (1) JP2011500480A (enExample)
KR (1) KR20100091984A (enExample)
CN (1) CN101836303A (enExample)
TW (1) TW200933788A (enExample)
WO (1) WO2009053289A1 (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103359500A (zh) * 2012-04-03 2013-10-23 樱井印艺设备公司 单张片输送装置及印刷机
CN107745579A (zh) * 2016-11-10 2018-03-02 北京航空航天大学 一种具有气浮支撑功能的卷对卷印刷电子喷墨加工平台
CN109219673A (zh) * 2016-06-02 2019-01-15 应用材料公司 导向装置和用于在卷材涂覆工艺中控制卷材温度的方法
CN110911335A (zh) * 2019-11-13 2020-03-24 深圳市华星光电半导体显示技术有限公司 气浮支撑平台
CN116067158A (zh) * 2023-02-07 2023-05-05 无锡爱德旺斯科技有限公司 一种气浮烘箱
CN120288561A (zh) * 2025-06-13 2025-07-11 福建省爱珈图服装发展有限公司 一种铺布机模块化磁吸式压布导辊

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010065695A2 (en) 2008-12-04 2010-06-10 Veeco Instruments Inc. Chemical vapor deposition flow inlet elements and methods
US20120213599A1 (en) * 2009-07-15 2012-08-23 Toyo Kohan Co., Ltd Web Floating and Conveying Device and Method of Manufacturing Same
EP2299473A1 (en) * 2009-09-22 2011-03-23 Applied Materials, Inc. Modular substrate processing system and method
US20110097494A1 (en) * 2009-10-27 2011-04-28 Kerr Roger S Fluid conveyance system including flexible retaining mechanism
JP5485928B2 (ja) * 2011-03-09 2014-05-07 東京エレクトロン株式会社 基板浮上搬送装置及び基板処理装置
US9073250B2 (en) * 2011-09-08 2015-07-07 Corning Incorporated Apparatus and methods for producing a ceramic green body
JP2013082959A (ja) * 2011-10-07 2013-05-09 Sony Corp 自己停止反応成膜装置及び自己停止反応成膜方法
SE537252C2 (sv) * 2011-12-15 2015-03-17 Andritz Tech & Asset Man Gmbh Torklåda som har blåslådor för torkning av en bana av cellulosamassa
JP5931091B2 (ja) * 2012-01-16 2016-06-08 株式会社アルバック 成膜装置
EP2765218A1 (en) * 2013-02-07 2014-08-13 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
SG11201510198PA (en) * 2013-06-11 2016-01-28 Univ Houston Fixed and portable coating apparatuses and methods
DE102014113047A1 (de) * 2013-09-19 2015-03-19 Von Ardenne Gmbh Vakuumbeschichtungsanlage und Verfahren zur Beschichtung bandförmiger Substrate
US9925761B2 (en) * 2015-12-02 2018-03-27 Eastman Kodak Company Liquid ejection hole orientation for web guide
JP7488819B2 (ja) 2018-12-13 2024-05-22 コーニング インコーポレイテッド リボンを搬送するための搬送装置及び方法
EP4326919A4 (en) * 2021-04-21 2025-08-20 Elevated Mat Germany Gmbh MATERIAL DEPOSITION APPARATUS, METHOD FOR DEPOSITING MATERIAL ON A SUBSTRATE, AND MATERIAL DEPOSITION SYSTEM
US20220356027A1 (en) * 2021-05-04 2022-11-10 Applied Materials, Inc. Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor
US20220356028A1 (en) * 2021-05-04 2022-11-10 Applied Materials, Inc. Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor
JP7731926B2 (ja) * 2023-02-17 2025-09-01 プライムプラネットエナジー＆ソリューションズ株式会社 シート搬送装置
EP4530240A1 (en) * 2023-09-29 2025-04-02 CUSTOMCELLS Holding GmbH A system, plant, and method for processing a bendable foil, a plant for obtaining a metalated battery electrode and a method of producing a battery cell

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3477764A (en) * 1968-04-15 1969-11-11 Leon W Smith Air-propelling cushioning conveyor
US4410558A (en) * 1980-05-19 1983-10-18 Energy Conversion Devices, Inc. Continuous amorphous solar cell production system
JPS60102357A (ja) * 1983-11-04 1985-06-06 Sumitomo Light Metal Ind Ltd 帯状平滑体の非接触保持移送装置
US4848633A (en) * 1986-02-28 1989-07-18 Thermo Electron Web Systems, Inc. Non-contact web turning and drying apparatus
US4824002A (en) * 1986-06-06 1989-04-25 Ford John W Contactless web support guide
DE3901042A1 (de) * 1989-01-14 1990-07-26 Nukem Gmbh Verfahren und vorrichtung zur herstellung eines halbleiter-schichtsystems
JPH0346447U (enExample) * 1989-09-13 1991-04-30
DE3936846C1 (enExample) * 1989-11-06 1991-04-18 Hilmar 5653 Leichlingen De Vits
DE4308276C2 (de) * 1993-03-16 1997-09-04 Heidelberger Druckmasch Ag Leiteinrichtung für einen Bogen
JP3659512B2 (ja) * 1993-12-20 2005-06-15 キヤノン株式会社 光起電力素子及びその形成方法及びその形成装置
US6238808B1 (en) * 1998-01-23 2001-05-29 Canon Kabushiki Kaisha Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device
JP2000128345A (ja) * 1998-08-20 2000-05-09 Matsushita Electric Ind Co Ltd 気体浮揚・搬送装置、熱処理装置および熱処理方法
JP2000128346A (ja) * 1998-08-20 2000-05-09 Matsushita Electric Ind Co Ltd 浮揚装置、浮揚搬送装置および熱処理装置
US6336775B1 (en) * 1998-08-20 2002-01-08 Matsushita Electric Industrial Co., Ltd. Gas floating apparatus, gas floating-transporting apparatus, and thermal treatment apparatus
US6969224B2 (en) * 2003-12-01 2005-11-29 Smc Kabushiki Kaisha Workpiece levitating device
DE102004014779A1 (de) * 2004-03-26 2005-10-13 Grenzebach Maschinenbau Gmbh Berührungsfreier Plattenförderer, insbesondere für Glasplatten
ITUD20050196A1 (it) * 2005-11-17 2007-05-18 Gisulfo Baccini Apparecchiatura per la produzione di celle fotovoltaiche sottili in silicio e di circuiti elettronici in materiale rigido e flessibile

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103359500A (zh) * 2012-04-03 2013-10-23 樱井印艺设备公司 单张片输送装置及印刷机
CN109219673A (zh) * 2016-06-02 2019-01-15 应用材料公司 导向装置和用于在卷材涂覆工艺中控制卷材温度的方法
CN107745579A (zh) * 2016-11-10 2018-03-02 北京航空航天大学 一种具有气浮支撑功能的卷对卷印刷电子喷墨加工平台
CN107745579B (zh) * 2016-11-10 2019-05-28 北京航空航天大学 一种具有气浮支撑功能的卷对卷印刷电子喷墨加工平台
CN110911335A (zh) * 2019-11-13 2020-03-24 深圳市华星光电半导体显示技术有限公司 气浮支撑平台
CN116067158A (zh) * 2023-02-07 2023-05-05 无锡爱德旺斯科技有限公司 一种气浮烘箱
CN116067158B (zh) * 2023-02-07 2023-07-04 无锡爱德旺斯科技有限公司 一种气浮烘箱
CN120288561A (zh) * 2025-06-13 2025-07-11 福建省爱珈图服装发展有限公司 一种铺布机模块化磁吸式压布导辊

Also Published As

Publication number Publication date
US20090110809A1 (en) 2009-04-30
JP2011500480A (ja) 2011-01-06
WO2009053289A1 (en) 2009-04-30
TW200933788A (en) 2009-08-01
KR20100091984A (ko) 2010-08-19
EP2053663A1 (en) 2009-04-29

Similar Documents

Publication Publication Date Title
CN101836303A (zh) 在片材涂覆处理中用于片材的悬浮垫传输
KR102509129B1 (ko) 가이딩 디바이스들 및 웹 코팅 프로세스
US20100266766A1 (en) Guiding devices and methods for contactless guiding of a web in a web coating process
EP2762608B1 (en) Gas separation by adjustable separation wall
EP2762607B1 (en) Deposition source with adjustable electrode
EP2762609B1 (en) Apparatus and method for depositing at least two layers on a substrate
US20160340776A1 (en) Roller for spreading of a flexible substrate, apparatus for processing a flexible substrate and method of operating thereof
EP2883980A1 (en) Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device and method for operating same
KR20240005827A (ko) 가요성 기판을 이송하기 위한 롤러, 진공 프로세싱 장치 및 그 방법들
EP3743539A1 (en) Evaporator for evaporating a source material, material deposition source, deposition apparatus and methods therefor
WO2010122030A2 (en) Guiding devices and methods for contactless guiding of a web in a web coating process
KR20240005826A (ko) 가요성 기판을 이송하기 위한 롤러, 진공 프로세싱 장치 및 그 방법들
EP2243735A1 (en) Guiding devices and methods for contactless guiding of a web in a web coating process
JP2018537586A (ja) フレキシブル基板用のキャリア
CA3201305A1 (en) Roll-to-roll processing
JP2024518481A (ja) フレキシブル基板搬送用ローラ、真空処理装置及びローラの冷却方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20100915