TW200933788A - Hover cushion transport for webs in a web coating process - Google Patents
Hover cushion transport for webs in a web coating processInfo
- Publication number
- TW200933788A TW200933788A TW097140352A TW97140352A TW200933788A TW 200933788 A TW200933788 A TW 200933788A TW 097140352 A TW097140352 A TW 097140352A TW 97140352 A TW97140352 A TW 97140352A TW 200933788 A TW200933788 A TW 200933788A
- Authority
- TW
- Taiwan
- Prior art keywords
- mesh
- mesh body
- gas
- guiding device
- guiding
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 80
- 239000011248 coating agent Substances 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 61
- 238000004519 manufacturing process Methods 0.000 claims abstract description 17
- 239000010409 thin film Substances 0.000 claims abstract description 17
- 238000000151 deposition Methods 0.000 claims abstract description 12
- 238000001816 cooling Methods 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 5
- 230000003068 static effect Effects 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 123
- 239000010410 layer Substances 0.000 description 21
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 229910052732 germanium Inorganic materials 0.000 description 9
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 9
- 238000000926 separation method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000012809 cooling fluid Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 244000241257 Cucumis melo Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 241000218691 Cupressaceae Species 0.000 description 1
- 101100536354 Drosophila melanogaster tant gene Proteins 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000004204 blood vessel Anatomy 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/24—Registering, tensioning, smoothing or guiding webs longitudinally by fluid action, e.g. to retard the running web
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2515/00—Physical entities not provided for in groups B65H2511/00 or B65H2513/00
- B65H2515/40—Temperature; Thermal conductivity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2601/00—Problem to be solved or advantage achieved
- B65H2601/20—Avoiding or preventing undesirable effects
- B65H2601/25—Damages to handled material
- B65H2601/253—Damages to handled material to particular parts of material
- B65H2601/2532—Surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Advancing Webs (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98263507P | 2007-10-25 | 2007-10-25 | |
| EP07020927A EP2053663A1 (en) | 2007-10-25 | 2007-10-25 | Hover cushion transport for webs in a web coating process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200933788A true TW200933788A (en) | 2009-08-01 |
Family
ID=38824994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097140352A TW200933788A (en) | 2007-10-25 | 2008-10-21 | Hover cushion transport for webs in a web coating process |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20090110809A1 (enExample) |
| EP (1) | EP2053663A1 (enExample) |
| JP (1) | JP2011500480A (enExample) |
| KR (1) | KR20100091984A (enExample) |
| CN (1) | CN101836303A (enExample) |
| TW (1) | TW200933788A (enExample) |
| WO (1) | WO2009053289A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102308368B (zh) | 2008-12-04 | 2014-02-12 | 威科仪器有限公司 | 用于化学气相沉积的进气口元件及其制造方法 |
| EP2455316A4 (en) * | 2009-07-15 | 2012-12-19 | Toyo Kohan Co Ltd | NETFLOW AND CONVEYOR DEVICE AND METHOD FOR THE PRODUCTION THEREOF |
| EP2299473A1 (en) * | 2009-09-22 | 2011-03-23 | Applied Materials, Inc. | Modular substrate processing system and method |
| US20110097494A1 (en) * | 2009-10-27 | 2011-04-28 | Kerr Roger S | Fluid conveyance system including flexible retaining mechanism |
| JP5485928B2 (ja) * | 2011-03-09 | 2014-05-07 | 東京エレクトロン株式会社 | 基板浮上搬送装置及び基板処理装置 |
| US9073250B2 (en) * | 2011-09-08 | 2015-07-07 | Corning Incorporated | Apparatus and methods for producing a ceramic green body |
| JP2013082959A (ja) * | 2011-10-07 | 2013-05-09 | Sony Corp | 自己停止反応成膜装置及び自己停止反応成膜方法 |
| SE537252C2 (sv) * | 2011-12-15 | 2015-03-17 | Andritz Tech & Asset Man Gmbh | Torklåda som har blåslådor för torkning av en bana av cellulosamassa |
| WO2013108751A1 (ja) * | 2012-01-16 | 2013-07-25 | 株式会社アルバック | 成膜装置 |
| JP2013212919A (ja) * | 2012-04-03 | 2013-10-17 | Sakurai Graphic Syst:Kk | 枚葉シート搬送装置及び印刷機 |
| EP2765218A1 (en) * | 2013-02-07 | 2014-08-13 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
| BR112015031114B1 (pt) * | 2013-06-11 | 2020-10-13 | University Of Houston | aparelho e método para deposição de um revestimento |
| DE102014113047A1 (de) * | 2013-09-19 | 2015-03-19 | Von Ardenne Gmbh | Vakuumbeschichtungsanlage und Verfahren zur Beschichtung bandförmiger Substrate |
| US9925761B2 (en) * | 2015-12-02 | 2018-03-27 | Eastman Kodak Company | Liquid ejection hole orientation for web guide |
| KR102509129B1 (ko) * | 2016-06-02 | 2023-03-09 | 어플라이드 머티어리얼스, 인코포레이티드 | 가이딩 디바이스들 및 웹 코팅 프로세스 |
| CN107745579B (zh) * | 2016-11-10 | 2019-05-28 | 北京航空航天大学 | 一种具有气浮支撑功能的卷对卷印刷电子喷墨加工平台 |
| US11440831B2 (en) * | 2018-12-13 | 2022-09-13 | Corning Incorporated | Conveying apparatus and conveying ribbon |
| CN110911335B (zh) * | 2019-11-13 | 2022-05-31 | 深圳市华星光电半导体显示技术有限公司 | 气浮支撑平台 |
| EP4326919A4 (en) * | 2021-04-21 | 2025-08-20 | Elevated Mat Germany Gmbh | MATERIAL DEPOSITION APPARATUS, METHOD FOR DEPOSITING MATERIAL ON A SUBSTRATE, AND MATERIAL DEPOSITION SYSTEM |
| US20220356027A1 (en) * | 2021-05-04 | 2022-11-10 | Applied Materials, Inc. | Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor |
| US20220356028A1 (en) * | 2021-05-04 | 2022-11-10 | Applied Materials, Inc. | Roller for transporting a flexible substrate, vacuum processing apparatus, and methods therefor |
| CN116067158B (zh) * | 2023-02-07 | 2023-07-04 | 无锡爱德旺斯科技有限公司 | 一种气浮烘箱 |
| JP7731926B2 (ja) * | 2023-02-17 | 2025-09-01 | プライムプラネットエナジー＆ソリューションズ株式会社 | シート搬送装置 |
| EP4530240A1 (en) * | 2023-09-29 | 2025-04-02 | CUSTOMCELLS Holding GmbH | A system, plant, and method for processing a bendable foil, a plant for obtaining a metalated battery electrode and a method of producing a battery cell |
| CN120288561B (zh) * | 2025-06-13 | 2025-08-12 | 福建省爱珈图服装发展有限公司 | 一种铺布机模块化磁吸式压布导辊 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3477764A (en) * | 1968-04-15 | 1969-11-11 | Leon W Smith | Air-propelling cushioning conveyor |
| US4410558A (en) * | 1980-05-19 | 1983-10-18 | Energy Conversion Devices, Inc. | Continuous amorphous solar cell production system |
| JPS60102357A (ja) * | 1983-11-04 | 1985-06-06 | Sumitomo Light Metal Ind Ltd | 帯状平滑体の非接触保持移送装置 |
| US4848633A (en) * | 1986-02-28 | 1989-07-18 | Thermo Electron Web Systems, Inc. | Non-contact web turning and drying apparatus |
| US4824002A (en) * | 1986-06-06 | 1989-04-25 | Ford John W | Contactless web support guide |
| DE3901042A1 (de) * | 1989-01-14 | 1990-07-26 | Nukem Gmbh | Verfahren und vorrichtung zur herstellung eines halbleiter-schichtsystems |
| JPH0346447U (enExample) * | 1989-09-13 | 1991-04-30 | ||
| DE3936846C1 (enExample) * | 1989-11-06 | 1991-04-18 | Hilmar 5653 Leichlingen De Vits | |
| DE4308276C2 (de) * | 1993-03-16 | 1997-09-04 | Heidelberger Druckmasch Ag | Leiteinrichtung für einen Bogen |
| JP3659512B2 (ja) * | 1993-12-20 | 2005-06-15 | キヤノン株式会社 | 光起電力素子及びその形成方法及びその形成装置 |
| US6238808B1 (en) * | 1998-01-23 | 2001-05-29 | Canon Kabushiki Kaisha | Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device |
| JP2000128346A (ja) * | 1998-08-20 | 2000-05-09 | Matsushita Electric Ind Co Ltd | 浮揚装置、浮揚搬送装置および熱処理装置 |
| US6336775B1 (en) * | 1998-08-20 | 2002-01-08 | Matsushita Electric Industrial Co., Ltd. | Gas floating apparatus, gas floating-transporting apparatus, and thermal treatment apparatus |
| JP2000128345A (ja) * | 1998-08-20 | 2000-05-09 | Matsushita Electric Ind Co Ltd | 気体浮揚・搬送装置、熱処理装置および熱処理方法 |
| DE102004057904A1 (de) * | 2003-12-01 | 2005-06-30 | Smc K.K. | Werkstücklevitationsvorrichtung |
| DE102004014779A1 (de) * | 2004-03-26 | 2005-10-13 | Grenzebach Maschinenbau Gmbh | Berührungsfreier Plattenförderer, insbesondere für Glasplatten |
| ITUD20050196A1 (it) * | 2005-11-17 | 2007-05-18 | Gisulfo Baccini | Apparecchiatura per la produzione di celle fotovoltaiche sottili in silicio e di circuiti elettronici in materiale rigido e flessibile |
-
2007
- 2007-10-25 EP EP07020927A patent/EP2053663A1/en not_active Withdrawn
-
2008
- 2008-10-15 CN CN200880113164A patent/CN101836303A/zh active Pending
- 2008-10-15 KR KR1020107011354A patent/KR20100091984A/ko not_active Withdrawn
- 2008-10-15 JP JP2010530402A patent/JP2011500480A/ja active Pending
- 2008-10-15 WO PCT/EP2008/063902 patent/WO2009053289A1/en not_active Ceased
- 2008-10-21 US US12/255,389 patent/US20090110809A1/en not_active Abandoned
- 2008-10-21 TW TW097140352A patent/TW200933788A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009053289A1 (en) | 2009-04-30 |
| EP2053663A1 (en) | 2009-04-29 |
| US20090110809A1 (en) | 2009-04-30 |
| JP2011500480A (ja) | 2011-01-06 |
| CN101836303A (zh) | 2010-09-15 |
| KR20100091984A (ko) | 2010-08-19 |
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