JP2011251872A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011251872A5 JP2011251872A5 JP2010126329A JP2010126329A JP2011251872A5 JP 2011251872 A5 JP2011251872 A5 JP 2011251872A5 JP 2010126329 A JP2010126329 A JP 2010126329A JP 2010126329 A JP2010126329 A JP 2010126329A JP 2011251872 A5 JP2011251872 A5 JP 2011251872A5
- Authority
- JP
- Japan
- Prior art keywords
- porous
- bath
- manufacturing
- less
- ultrasonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 239000005373 porous glass Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims 1
- 229910052810 boron oxide Inorganic materials 0.000 claims 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 230000010355 oscillation Effects 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 230000004075 alteration Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010126329A JP5796936B2 (ja) | 2010-06-01 | 2010-06-01 | 多孔質ガラスの製造方法 |
| CN2011800261383A CN102917996A (zh) | 2010-06-01 | 2011-05-20 | 多孔玻璃的制备方法 |
| US13/700,068 US20130068725A1 (en) | 2010-06-01 | 2011-05-20 | Method of producing porous glass |
| EP11725539.8A EP2576469A1 (en) | 2010-06-01 | 2011-05-20 | Method of producing porous glass |
| PCT/JP2011/062151 WO2011152288A1 (en) | 2010-06-01 | 2011-05-20 | Method of producing porous glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010126329A JP5796936B2 (ja) | 2010-06-01 | 2010-06-01 | 多孔質ガラスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011251872A JP2011251872A (ja) | 2011-12-15 |
| JP2011251872A5 true JP2011251872A5 (enExample) | 2013-07-18 |
| JP5796936B2 JP5796936B2 (ja) | 2015-10-21 |
Family
ID=44531558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010126329A Expired - Fee Related JP5796936B2 (ja) | 2010-06-01 | 2010-06-01 | 多孔質ガラスの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20130068725A1 (enExample) |
| EP (1) | EP2576469A1 (enExample) |
| JP (1) | JP5796936B2 (enExample) |
| CN (1) | CN102917996A (enExample) |
| WO (1) | WO2011152288A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5725734B2 (ja) | 2010-06-01 | 2015-05-27 | キヤノン株式会社 | ガラスの製造方法 |
| JP5911240B2 (ja) * | 2010-10-04 | 2016-04-27 | キヤノン株式会社 | 多孔質ガラス、その製造方法、光学部材および撮像装置 |
| JP5882690B2 (ja) | 2010-11-30 | 2016-03-09 | キヤノン株式会社 | 多孔質ガラス、その製造方法 |
| US9296646B2 (en) * | 2013-08-29 | 2016-03-29 | Corning Incorporated | Methods for forming vias in glass substrates |
| JP6395489B2 (ja) | 2014-07-29 | 2018-09-26 | キヤノン株式会社 | ガラス組成物及びその製造方法、並びにガラス部材及び撮像装置 |
| US10194694B2 (en) | 2016-01-05 | 2019-02-05 | Rai Strategic Holdings, Inc. | Aerosol delivery device with improved fluid transport |
| US10410883B2 (en) | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10134657B2 (en) | 2016-06-29 | 2018-11-20 | Corning Incorporated | Inorganic wafer having through-holes attached to semiconductor wafer |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US10602775B2 (en) | 2016-07-21 | 2020-03-31 | Rai Strategic Holdings, Inc. | Aerosol delivery device with a unitary reservoir and liquid transport element comprising a porous monolith and related method |
| US10617151B2 (en) | 2016-07-21 | 2020-04-14 | Rai Strategic Holdings, Inc. | Aerosol delivery device with a liquid transport element comprising a porous monolith and related method |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US20200077703A1 (en) | 2018-09-11 | 2020-03-12 | Rai Strategic Holdings, Inc. | Wicking element for aerosol delivery device |
| CN114650973A (zh) * | 2019-11-11 | 2022-06-21 | 日本电气硝子株式会社 | 多孔玻璃材料的制造方法 |
| US11691908B2 (en) * | 2020-10-20 | 2023-07-04 | Whirlpool Corporation | Insulation materials for a vacuum insulated structure and methods of forming |
| US12378151B2 (en) * | 2021-05-20 | 2025-08-05 | Corning Incorporated | Phase-separated glass compositions |
| US12426637B2 (en) | 2021-08-17 | 2025-09-30 | Rai Strategic Holdings, Inc. | Inductively heated aerosol delivery device consumable |
| WO2023121941A1 (en) * | 2021-12-21 | 2023-06-29 | Corning Incorporated | Textured glass articles and methods of making same |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2106744A (en) * | 1934-03-19 | 1938-02-01 | Corning Glass Works | Treated borosilicate glass |
| US2886420A (en) * | 1956-06-05 | 1959-05-12 | Gen Dynamics Corp | Etching process |
| US3904422A (en) * | 1972-03-27 | 1975-09-09 | Corning Glass Works | Porous glass support material |
| US4052010A (en) * | 1974-03-01 | 1977-10-04 | Corning Glass Works | Suspendable porous glass particles |
| JPH01317135A (ja) * | 1988-03-28 | 1989-12-21 | Hitachi Chem Co Ltd | めつき回路形成用基板の製造法及び該基板を用いた配線板の製造法 |
| RU1779674C (ru) * | 1991-01-09 | 1992-12-07 | Институт Прикладной Физики Ан Бсср | Способ получени высококремнеземистого пористого стекла |
| JPH06279063A (ja) * | 1993-03-26 | 1994-10-04 | Nippon Taisanbin Kogyo Kk | 耐アルカリ性を具備した多孔質ガラス |
| JPH09331049A (ja) * | 1996-04-08 | 1997-12-22 | Canon Inc | 貼り合わせｓｏｉ基板の作製方法及びｓｏｉ基板 |
| JP2000251623A (ja) * | 1999-02-24 | 2000-09-14 | Canon Inc | 電子源および画像形成装置 |
| JP2001325722A (ja) * | 2000-03-08 | 2001-11-22 | Hoya Corp | 情報記録媒体用基板の製造方法および情報記録媒体の製造方法 |
| US6787052B1 (en) * | 2000-06-19 | 2004-09-07 | Vladimir Vaganov | Method for fabricating microstructures with deep anisotropic etching of thick silicon wafers |
| JP4540274B2 (ja) * | 2001-09-27 | 2010-09-08 | ソニー株式会社 | 薄板硝子の加工方法及びその薄板硝子 |
| JP3665323B2 (ja) * | 2002-11-22 | 2005-06-29 | 西山ステンレスケミカル株式会社 | フラットパネルディスプレイ用ガラス基板及びその製造方法 |
| JP3997150B2 (ja) * | 2002-12-06 | 2007-10-24 | ソニー株式会社 | 基板製造装置および製造方法 |
| US7091132B2 (en) * | 2003-07-24 | 2006-08-15 | Applied Materials, Inc. | Ultrasonic assisted etch using corrosive liquids |
| JP4951799B2 (ja) * | 2005-01-11 | 2012-06-13 | 宮崎県 | 分相性ガラスを前駆体とする多孔質ガラス及びその製造方法 |
| JP4572733B2 (ja) * | 2005-02-24 | 2010-11-04 | 独立行政法人産業技術総合研究所 | 表面微細加工チタン含有ガラス基材、およびその製造方法 |
| JP2007192811A (ja) * | 2005-12-22 | 2007-08-02 | Japan Advanced Institute Of Science & Technology Hokuriku | 薄板型多孔質ガラス担体及びその作成方法並びに薄板型多孔質ガラス集積体 |
| US8062732B2 (en) * | 2007-05-22 | 2011-11-22 | Corning Incorporated | Glass article having improved edge |
| JP2010126329A (ja) | 2008-11-28 | 2010-06-10 | Sharp Corp | シート排出装置及びそれを備えた画像形成装置 |
-
2010
- 2010-06-01 JP JP2010126329A patent/JP5796936B2/ja not_active Expired - Fee Related
-
2011
- 2011-05-20 CN CN2011800261383A patent/CN102917996A/zh active Pending
- 2011-05-20 EP EP11725539.8A patent/EP2576469A1/en not_active Withdrawn
- 2011-05-20 WO PCT/JP2011/062151 patent/WO2011152288A1/en not_active Ceased
- 2011-05-20 US US13/700,068 patent/US20130068725A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011251872A5 (enExample) | ||
| JP5796936B2 (ja) | 多孔質ガラスの製造方法 | |
| CN105149607B (zh) | 纳米多孔钛粉的制备方法 | |
| CN102877106B (zh) | 具有纳米粗糙结构的铝箔梯度润湿性表面的制备方法 | |
| JP2014212312A5 (ja) | 半導体装置の作製方法 | |
| CN103087850B (zh) | 一种单晶硅片预清洗液及其清洗方法 | |
| CN102097526A (zh) | 一种晶体硅rie制绒的表面损伤层清洗工艺 | |
| IN2014DN07580A (enExample) | ||
| WO2014187049A1 (zh) | 铝或铝合金表面微纳米加工方法及铝或铝合金结构 | |
| CN103112819A (zh) | 一种有序硅纳米线阵列的制备方法 | |
| CN201655813U (zh) | 晶体硅太阳能电池钝化膜 | |
| WO2013181117A3 (en) | Removal of stressor layer from a spalled layer and method of making a bifacial solar cell using the same | |
| JP2011071494A5 (ja) | 半導体基板の再生方法 | |
| JP2009506538A5 (enExample) | ||
| CN107039241A (zh) | 一种超薄硅的化学切割方法 | |
| CN103979485A (zh) | 一种微纳多孔硅材料的制备方法 | |
| CN103834983B (zh) | 金属型材的环保节能液相等离子清洗方法 | |
| CN105174381B (zh) | 一种采用氧化石墨烯辅助制作Ti‑石墨烯电极的方法 | |
| CN103014735A (zh) | 用于退除钛合金阳极氧化膜的退膜方法 | |
| JP2011251871A5 (enExample) | ||
| WO2011152289A3 (en) | Method of producing porous glass | |
| CN103382578A (zh) | 单晶硅片表面的处理方法 | |
| CN102806217A (zh) | 用有机溶剂进行硅片清洗的方法 | |
| CN105903710A (zh) | 一种高功率激光装置的铜、铝元件表面的洁净处理方法 | |
| CN103192313B (zh) | 小型扭曲模音叉晶片的抛光方法 |