JP5796936B2 - 多孔質ガラスの製造方法 - Google Patents

多孔質ガラスの製造方法 Download PDF

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Publication number
JP5796936B2
JP5796936B2 JP2010126329A JP2010126329A JP5796936B2 JP 5796936 B2 JP5796936 B2 JP 5796936B2 JP 2010126329 A JP2010126329 A JP 2010126329A JP 2010126329 A JP2010126329 A JP 2010126329A JP 5796936 B2 JP5796936 B2 JP 5796936B2
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JP
Japan
Prior art keywords
glass
porous
phase
ultrasonic
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010126329A
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English (en)
Japanese (ja)
Other versions
JP2011251872A (ja
JP2011251872A5 (enExample
Inventor
健二 ▲高▼嶋
健二 ▲高▼嶋
張　祖依
祖依 張
佳範 小谷
佳範 小谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010126329A priority Critical patent/JP5796936B2/ja
Priority to CN2011800261383A priority patent/CN102917996A/zh
Priority to US13/700,068 priority patent/US20130068725A1/en
Priority to EP11725539.8A priority patent/EP2576469A1/en
Priority to PCT/JP2011/062151 priority patent/WO2011152288A1/en
Publication of JP2011251872A publication Critical patent/JP2011251872A/ja
Publication of JP2011251872A5 publication Critical patent/JP2011251872A5/ja
Application granted granted Critical
Publication of JP5796936B2 publication Critical patent/JP5796936B2/ja
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Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C03C11/005—Multi-cellular glass ; Porous or hollow glass or glass particles obtained by leaching after a phase separation step
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/008—Other surface treatment of glass not in the form of fibres or filaments comprising a lixiviation step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
JP2010126329A 2010-06-01 2010-06-01 多孔質ガラスの製造方法 Expired - Fee Related JP5796936B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010126329A JP5796936B2 (ja) 2010-06-01 2010-06-01 多孔質ガラスの製造方法
CN2011800261383A CN102917996A (zh) 2010-06-01 2011-05-20 多孔玻璃的制备方法
US13/700,068 US20130068725A1 (en) 2010-06-01 2011-05-20 Method of producing porous glass
EP11725539.8A EP2576469A1 (en) 2010-06-01 2011-05-20 Method of producing porous glass
PCT/JP2011/062151 WO2011152288A1 (en) 2010-06-01 2011-05-20 Method of producing porous glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010126329A JP5796936B2 (ja) 2010-06-01 2010-06-01 多孔質ガラスの製造方法

Publications (3)

Publication Number Publication Date
JP2011251872A JP2011251872A (ja) 2011-12-15
JP2011251872A5 JP2011251872A5 (enExample) 2013-07-18
JP5796936B2 true JP5796936B2 (ja) 2015-10-21

Family

ID=44531558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010126329A Expired - Fee Related JP5796936B2 (ja) 2010-06-01 2010-06-01 多孔質ガラスの製造方法

Country Status (5)

Country Link
US (1) US20130068725A1 (enExample)
EP (1) EP2576469A1 (enExample)
JP (1) JP5796936B2 (enExample)
CN (1) CN102917996A (enExample)
WO (1) WO2011152288A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5725734B2 (ja) 2010-06-01 2015-05-27 キヤノン株式会社 ガラスの製造方法
JP5911240B2 (ja) * 2010-10-04 2016-04-27 キヤノン株式会社 多孔質ガラス、その製造方法、光学部材および撮像装置
JP5882690B2 (ja) 2010-11-30 2016-03-09 キヤノン株式会社 多孔質ガラス、その製造方法
US9296646B2 (en) * 2013-08-29 2016-03-29 Corning Incorporated Methods for forming vias in glass substrates
JP6395489B2 (ja) 2014-07-29 2018-09-26 キヤノン株式会社 ガラス組成物及びその製造方法、並びにガラス部材及び撮像装置
US10194694B2 (en) 2016-01-05 2019-02-05 Rai Strategic Holdings, Inc. Aerosol delivery device with improved fluid transport
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10134657B2 (en) 2016-06-29 2018-11-20 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
US10602775B2 (en) 2016-07-21 2020-03-31 Rai Strategic Holdings, Inc. Aerosol delivery device with a unitary reservoir and liquid transport element comprising a porous monolith and related method
US10617151B2 (en) 2016-07-21 2020-04-14 Rai Strategic Holdings, Inc. Aerosol delivery device with a liquid transport element comprising a porous monolith and related method
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US20200077703A1 (en) 2018-09-11 2020-03-12 Rai Strategic Holdings, Inc. Wicking element for aerosol delivery device
CN114650973A (zh) * 2019-11-11 2022-06-21 日本电气硝子株式会社 多孔玻璃材料的制造方法
US11691908B2 (en) * 2020-10-20 2023-07-04 Whirlpool Corporation Insulation materials for a vacuum insulated structure and methods of forming
US12378151B2 (en) * 2021-05-20 2025-08-05 Corning Incorporated Phase-separated glass compositions
US12426637B2 (en) 2021-08-17 2025-09-30 Rai Strategic Holdings, Inc. Inductively heated aerosol delivery device consumable
WO2023121941A1 (en) * 2021-12-21 2023-06-29 Corning Incorporated Textured glass articles and methods of making same

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2106744A (en) * 1934-03-19 1938-02-01 Corning Glass Works Treated borosilicate glass
US2886420A (en) * 1956-06-05 1959-05-12 Gen Dynamics Corp Etching process
US3904422A (en) * 1972-03-27 1975-09-09 Corning Glass Works Porous glass support material
US4052010A (en) * 1974-03-01 1977-10-04 Corning Glass Works Suspendable porous glass particles
JPH01317135A (ja) * 1988-03-28 1989-12-21 Hitachi Chem Co Ltd めつき回路形成用基板の製造法及び該基板を用いた配線板の製造法
RU1779674C (ru) * 1991-01-09 1992-12-07 Институт Прикладной Физики Ан Бсср Способ получени высококремнеземистого пористого стекла
JPH06279063A (ja) * 1993-03-26 1994-10-04 Nippon Taisanbin Kogyo Kk 耐アルカリ性を具備した多孔質ガラス
JPH09331049A (ja) * 1996-04-08 1997-12-22 Canon Inc 貼り合わせｓｏｉ基板の作製方法及びｓｏｉ基板
JP2000251623A (ja) * 1999-02-24 2000-09-14 Canon Inc 電子源および画像形成装置
JP2001325722A (ja) * 2000-03-08 2001-11-22 Hoya Corp 情報記録媒体用基板の製造方法および情報記録媒体の製造方法
US6787052B1 (en) * 2000-06-19 2004-09-07 Vladimir Vaganov Method for fabricating microstructures with deep anisotropic etching of thick silicon wafers
JP4540274B2 (ja) * 2001-09-27 2010-09-08 ソニー株式会社 薄板硝子の加工方法及びその薄板硝子
JP3665323B2 (ja) * 2002-11-22 2005-06-29 西山ステンレスケミカル株式会社 フラットパネルディスプレイ用ガラス基板及びその製造方法
JP3997150B2 (ja) * 2002-12-06 2007-10-24 ソニー株式会社 基板製造装置および製造方法
US7091132B2 (en) * 2003-07-24 2006-08-15 Applied Materials, Inc. Ultrasonic assisted etch using corrosive liquids
JP4951799B2 (ja) * 2005-01-11 2012-06-13 宮崎県 分相性ガラスを前駆体とする多孔質ガラス及びその製造方法
JP4572733B2 (ja) * 2005-02-24 2010-11-04 独立行政法人産業技術総合研究所 表面微細加工チタン含有ガラス基材、およびその製造方法
JP2007192811A (ja) * 2005-12-22 2007-08-02 Japan Advanced Institute Of Science & Technology Hokuriku 薄板型多孔質ガラス担体及びその作成方法並びに薄板型多孔質ガラス集積体
US8062732B2 (en) * 2007-05-22 2011-11-22 Corning Incorporated Glass article having improved edge
JP2010126329A (ja) 2008-11-28 2010-06-10 Sharp Corp シート排出装置及びそれを備えた画像形成装置

Also Published As

Publication number Publication date
JP2011251872A (ja) 2011-12-15
CN102917996A (zh) 2013-02-06
EP2576469A1 (en) 2013-04-10
WO2011152288A1 (en) 2011-12-08
US20130068725A1 (en) 2013-03-21

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