JP2011238612A5 - - Google Patents

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Publication number
JP2011238612A5
JP2011238612A5 JP2011102799A JP2011102799A JP2011238612A5 JP 2011238612 A5 JP2011238612 A5 JP 2011238612A5 JP 2011102799 A JP2011102799 A JP 2011102799A JP 2011102799 A JP2011102799 A JP 2011102799A JP 2011238612 A5 JP2011238612 A5 JP 2011238612A5
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JP
Japan
Prior art keywords
dispersion
electron beam
primary
deflector
sample
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JP2011102799A
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English (en)
Japanese (ja)
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JP2011238612A (ja
JP5637929B2 (ja
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Priority claimed from EP20100162334 external-priority patent/EP2385542B1/en
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Publication of JP2011238612A publication Critical patent/JP2011238612A/ja
Publication of JP2011238612A5 publication Critical patent/JP2011238612A5/ja
Application granted granted Critical
Publication of JP5637929B2 publication Critical patent/JP5637929B2/ja
Expired - Fee Related legal-status Critical Current
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JP2011102799A 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法 Expired - Fee Related JP5637929B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20100162334 EP2385542B1 (en) 2010-05-07 2010-05-07 Electron beam device with dispersion compensation, and method of operating same
EP10162334.6 2010-05-07

Publications (3)

Publication Number Publication Date
JP2011238612A JP2011238612A (ja) 2011-11-24
JP2011238612A5 true JP2011238612A5 (https=) 2014-06-19
JP5637929B2 JP5637929B2 (ja) 2014-12-10

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ID=42647329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011102799A Expired - Fee Related JP5637929B2 (ja) 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法

Country Status (5)

Country Link
US (1) US9048068B2 (https=)
EP (1) EP2385542B1 (https=)
JP (1) JP5637929B2 (https=)
KR (1) KR101556236B1 (https=)
TW (1) TWI488209B (https=)

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EP2779204A1 (en) 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron gun arrangement
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US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
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KR102662658B1 (ko) 2019-03-27 2024-05-03 에이에스엠엘 네델란즈 비.브이. 멀티빔 검사 장치에서 2차 빔의 정렬을 위한 시스템 및 방법
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